1. Technical Field
This disclosure relates to an electromechanical switch, more particularly relates to a contact structure for electromechanical switch utilizing a PCB based construction and a moving contact to allow the actuations and have excellent switch performances, such as high isolation and low insertion loss, and the electromechanical switch is capable of transmitting electronic signals ranged from DC to microwave.
2. Description of Related Art
The electronic signal transmission speed is requested growing fast with the technology progress, so that the control switches or relays are required to be capable of processing the 1 GHz or higher frequency signal. The electromechanical switches or relays are for connecting or disconnecting current or circuitry with mechanical design. Conventional contact structure of those electromechanical switches or relays does not consider the problem of high frequency transmission while designing, so that the contact structure is only capable of transmitting DC or extremely low frequency signals. If the present contact structure with mechanical design desires to be added a processing device for high frequency signals, it will meet the problems which are the cost increase in large scale and hard to mass production.
The MEMS switch or relay is used for resolving the problems mentioned above. In brief, it is fabricated on the silicon wafer with semiconductor technology and having the potential of mass production. The micro design is capable of minimizing the volume of the switches or relays. The typical MEMS switch 5, shown as
The MEMS switch is very small, so that the charged dielectric medium and effects of static friction always interference the stable actuation and release. And the MEMS switch needs low insertion loss and high isolation while transmitting the high frequency electronic signals, so as to define the gap between the electrodes 11 and 14. Therefore, the MEMS switch is restricted while being used for transmitting the high frequency electronic signals.
In addition, the MEMS switch is fabricated with semiconductor technology, and the processes are including repeatedly oxidizing, depositing, transferring, and etching. The processes are complicated and the steps are numerous. If one of the processes is error, the total element must be reworked, so as to make the manufacturing time and cost higher.
The objective of this disclosure is providing a contact structure for electromechanical switch, which provides stable switch characteristics, such as low insertion loss while ON, and high isolation while OFF.
The contact structure of this disclosure matches the condition of low driving power.
The contact structure of this disclosure allows many kinds of actuations, such as electrostatic force, electro-magnetic force, piezoelectric effect, or heating effect.
The contact structure of this disclosure applies to the switch or relay with the application range from DC to microwave, and is capable of processing the 1 GHz or higher frequency signal.
The contact structure of this disclosure is using PCB structure and suitable for low cost mass production. Compared to conventional MEMS switch, the switch of this disclosure has lower manufacturing cost and simpler manufacturing method.
The contact structure of this disclosure is capable of minimizing the volume of the MEMS switch.
The contact structure of this disclosure utilizes PCB and moving contact. Although the PCB has been already used in RF switch and thin film switch, there are still many characteristics different from the RF switch and the thin film switch, which comprise:
In one embodiment, the contact structure of this disclosure is capable of transmitting high frequency signals in a one-in-multi-out, a multi-in-one-out or a multi-in-multi-out mode.
Other features or advantages of the present disclosure will be apparent from the following drawings and detailed description of several embodiments, and also from the appending claims.
The present disclosure can be more fully understood by reading the following detailed description of the embodiment, with reference made to the accompanying drawings as follows:
Reference will now be made in detail to the present embodiments of the disclosure, examples of which are illustrated in the accompanying drawings. Wherever possible, the same reference numbers are used in the drawings and the description to refer to the same or like parts.
Please refer to
The basic layer 21 is rigid material but not limited to insulation material, such as FR4, or a material capable of responding microwave with some frequency range, such as RO4003 high frequency circuit board material. A lower surface of the basic layer 21 has a grounding structure (not shown) which is formed by metalizing the lower surface of the basic layer 21. An upper surface of the basic layer 21 is set signal traces by printed circuit technology to become static contacts 211. A static contact 211 is formed on an upper surface of the basic layer 21 via printed circuit technology. The static contact 211 can be viewed as a metal signal trace.
The spacing layer 22 is stacked on the upper surface of the basic layer 21. The spacing layer 22 can be made from various PCB materials, such as kapton, typical FR4, or solid bonding film made from acrylic with a predetermined thickness. The spacing layer 22 includes a window 221 to make the static contacts 211 of the basic layer 21 be not covered by the spacing layer 22.
The top layer 23 is stacked on an upper surface of the spacing layer 22, and made from a flexible circuit board material. A static contact 211 is formed on an upper surface of the basic layer 21 via printed circuit technology. The static contact 211 can be viewed as a metal signal trace. A nick 232 is specifically machined at the flexible circuit board surrounding the moving contacts 231, so that a floating area 233 is surrounding the moving contacts 231. The floating area 233 can be moved downwardly while a force is applied and moved upwardly to become flat while the force is released.
Finally, the basic layer 21, the spacing layer 22 and the top layer 23 are stacked together, shown as
The static contacts 211 and the moving contacts 231 are metal printed conducting paths with specified geometry, which are defined in accordance with different application range. Therefore, the layouts of the paths of the static contacts 211 and the moving contacts 231 are defined according to the performance of the switch or relay. That makes the application range of the contact structure 20 wider. It is suitable for the application range from DC to microwave, especially capable of processing 1 GHz or higher frequency signal, and capable of performing low insertion loss.
The static contacts 211 and the moving contacts 231 have specified impedance, normally 50Ω. The static contacts 211 and the moving contacts 231 are micro strip lines. The micro strip line is a kind of signal transmission line having good impedance control and capable for passing high frequency signals.
Commonly when the static contacts 211 and the moving contacts 231 are contacted for conducting a waveguide to transmit signals, an overlapping area is formed. The overlapping area can be referred as a capacitor. At high frequency, signal can couple through the capacitor. Therefore, even the static contacts 211 and the moving contacts 231 are not contacted (switch is OFF), the signal is not isolated. Insufficient isolation will reduce performance of the devices such as switch or relay utilizing the contact structure 20. Owing to the isolation is related to the overlapping area, to minimize the phenomena of insufficient isolation, the overlapping area should be reduced. For example, in
However, the impedance variation occurred owing to line width change of the static contacts 211 and the moving contacts 231. Therefore, a compensation structure is set along the metal printed conducting paths to compensate the impedance variation. In this embodiment, a tuning circuit 212 and a tuning circuit 234 adjacent to the static contacts 211 and the moving contacts 231 are utilized for compensating the impedance variation. The tuning circuit 212 and the tuning circuit 234 have specifically designed geometry for effectively compensating the impedance variation.
The gap between the static contacts 211 and the moving contacts 231 is defined by the thickness of the spacing layer 22 and the required electric power for actuating the contact structure 20. However, the narrow gap is preferable to make sure that the moving contacts 231 are certainly contacting with the static contacts 211 and in a condition of low driving power. The gap can be controlled by controlling the thickness of the spacing layer 22.
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Embodiments of packaging processes of the contact structure 20 and the actuating device 30 are showed in
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In on example, two grounding interconnections 402 are used to connect the ground layer 342 located on a back surface of the basic layer 330 and the ground layer 342 located on a back surface of the RF layer 340.
In the aforementioned embodiment, the number of the moving contacts 311 and the RF interconnections 401 can be varied with different applications, thereby achieving multi-in-multi-out functionality.
In summary, this disclosure provides a contact structure for electromechanical switch utilizing PCB process and moving contact. Therefore, the volume of the electromechanical switch can be substantially minimized, the production and manufacturing cost of the electromechanical switch is low, various kinds of actuations can be allowed, various kinds of actuating devices can be matched, and the electromechanical switch has excellent performances, such as high isolation and low insertion loss. And the application range can be from DC to microwave.
Although the present disclosure has been described in considerable detail with reference to certain embodiments thereof, other embodiments are possible. Therefore, the spirit and scope of the appended claims should not be limited to the description of the embodiments contained herein.
It will be apparent to those skilled in the art that various modifications and variations can be made to the structure of the present disclosure without departing from the scope or spirit of the disclosure. In view of the foregoing, it is intended that the present disclosure cover modifications and variations of this disclosure provided they fall within the scope of the following claims.
Number | Date | Country | Kind |
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100119622 A | Jun 2011 | TW | national |
This application is a continuation-in-part of U.S. patent application Ser. No. 13/204,668, filed on Aug. 6, 2011, which claims priority to Taiwan Application Serial Number 100119622, filed on Jun. 3, 2011. The entire disclosures of both applications are hereby incorporated by reference herein.
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6307452 | Sun | Oct 2001 | B1 |
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Number | Date | Country | |
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20150021149 A1 | Jan 2015 | US |
Number | Date | Country | |
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Parent | 13204668 | Aug 2011 | US |
Child | 14509067 | US |