The present disclosure is directed towards delivery of a charged particle beam.
A charged particle beam refers to any spatially localized and directed beam that includes particles with an electric charge such as an electrons or ions. Charged particle beams can be used in a wide variety of applications including, for example, medical therapy and diagnostics, ion implantation, sterilization, synchrotron radiation experiments and industrial radiography. In some cases, the charged particle beam in those applications has a relatively small cross-section and is delivered to various locations on a target that has a much larger cross-sectional area. In this way, it is possible to deliver the beam to discrete positions on the target or to simulate the effect of a beam having a large cross-sectional area by quickly scanning the particle beam across the target. To bring about a particular desired effect on the target, the dwell time of the incident beam can be modified.
In some applications, an object that has yet to be examined or dosed is translated on a conveyor or, equivalently, the beam generation apparatus is translated relative to the object. The particle beam is directed towards the object along a line substantially orthogonal to the relative movement of the object and can be scanned at a much higher rate than the relatively slow mechanical translation, in order to cover the entire target with the beam. The particle beam may strike the object directly, or, if the particles are electrons, they may strike a target to create X-ray beams which then are directed to the object with collimation as necessary. In radiographic imaging applications, the beam position along the line can define one coordinate of a volume element that is being examined at any instant, with the other coordinates set by the detector system and the mechanical translation device.
In another application, a charged particle beam is delivered to work-pieces such as semiconductor wafers for doping, or to work-pieces such as metal, polymer items or bulk material for changing their material properties or sterilizing them. In those cases, it is beneficial if the beam can be exposed uniformly on the material. Accordingly, it is preferable if the beam delivery motion profile can be appropriately controlled. In many such applications it also is important that the angle of incidence of the beam on the work piece be controlled.
An example of a way to deliver a charged particle beam is shown in
U.S. Pat. No. 4,295,048 describes a linear array of discrete dipole magnets 11, in which energizing a single magnet in the array is capable of bending a particle beam 1 by 90° to impinge upon a target 7 (see
The details of one or more embodiments of the invention are set forth in the description below, the accompanying drawings and the claims.
For example, in one aspect a method for delivering a beam of charged particles includes providing the beam along a first trajectory to a linear array of magnets and energizing two or more of the magnets in the linear array to deflect the beam to a second trajectory, in which the second trajectory is substantially orthogonal to the first trajectory.
Some implementations include one or more of the following features. For example, the beam is deflectable to any position along a straight linear path.
In some cases, the first trajectory is substantially parallel to the straight linear path.
In some examples, two or more magnets in the linear array can be subsequently energized to deflect the beam to a third trajectory, in which the third trajectory is substantially parallel to the second trajectory.
In some cases, charged particles from the second and third trajectory are aligned at any position along a straight linear path.
In some implementations, the first trajectory is substantially parallel to the straight linear path.
In some examples, the beam is deflected onto a target.
In certain cases, energizing the two or more magnets includes retrieving energy from an energy storage device.
In some implementations, the two or more magnets can be de-energized. De-energizing the two or magnets can include delivering energy to an energy storage device.
In some cases, the linear array of magnets includes one or more spacings, in which each spacing is between a set of adjacent magnets and extends in a direction parallel to the first trajectory and in which the second trajectory coincides with one of the spacings.
In another aspect, a method of delivering a charged particle beam includes providing the beam along a first trajectory to a linear array of deflecting elements and deflecting the beam along a plurality of exit trajectories to any position on a linear path, in which each exit trajectory is substantially parallel to one another.
For example, in some cases, each exit trajectory is substantially orthogonal to the linear path.
In some implementations, each exit trajectory is substantially orthogonal to the first trajectory.
In certain instances, the first trajectory is substantially parallel to the linear path.
In some implementations, deflecting the beam along a plurality of exit trajectories includes successively activating a plurality of the deflecting elements in the linear array. Activating the plurality of deflecting elements can include retrieving energy from an energy storage device.
In some examples, a plurality of deflecting elements can be de-activated. De-activating the plurality of deflecting elements can include delivering energy to an energy storage device.
In some cases, the linear path is arranged at an oblique angle with respect to a direction of motion of a target.
The deflecting elements can be sequentially activated such that charged particles within the exit trajectories impinge on the target along a line substantially orthogonal to the target direction of motion.
In another aspect, an apparatus for delivering a beam of charged particles includes a deflecting instrument operable to deflect the beam along a plurality of exit trajectories to any position on a linear path, in which the exit trajectories are substantially parallel to one another.
For example, in some implementations, the deflecting instrument includes a linear array of dipole magnets. Each dipole magnet can be separated from an adjacent dipole magnet by a spacing in which the linear array of magnets is parallel to an incident beam direction. The number of positions on the linear path to which the beam can be deflected can be greater than the number of magnets.
In some cases, the apparatus includes a power source and a plurality of amplifiers coupled to the power source in which activation of one or more of the amplifiers allows the deflecting instrument to be energized by the power source. Each amplifier can include a switch mode amplifier or a power amplifier. The number of amplifiers can be less than the number of dipole magnets.
In some implementations, the apparatus can include an energy storage device coupled to the power source. The energy storage device can be a capacitive storage bank.
In certain cases, the apparatus includes a beam conditioning element selected from the group including quadrupole magnets, steerer magnets, sextupoles, solenoids and combinations thereof.
In some cases, the apparatus includes a high voltage power source.
In some examples, the deflecting instrument includes one or more modular units.
In another aspect, a system for delivering a beam of charged particles includes a source for producing the beam of charged particles, a deflecting instrument operable to deflect the beam along a plurality of exit trajectories to any position on a linear path, in which the exit trajectories are substantially parallel to each other and a controller to activate the deflecting instrument.
For example, in some implementations, the deflecting instrument includes a linear array of dipole magnets. The number of positions on the linear path to which the beam can be deflected can be greater than the number of magnets.
In some cases, the system includes memory to store settings for the dipole magnets. The processor is operable to interpolate settings for the dipole magnets.
In some implementations, the system includes a power source and a plurality of amplifiers coupled to the power source in which activation of one or more of the amplifiers allows the deflecting instrument to be energized by the power source. Each amplifier can include a switch mode amplifier. Each amplifier can include a power amplifier. The number of amplifiers can be less than the number of dipole magnets.
In some cases, the system can include an energy storage device coupled to the power source. The energy storage device can be a capacitive storage bank.
In some implementations, the system can include a beam conditioning element selected from the group including quadrupole magnets, steerer magnets, sextupoles, solenoids and combinations thereof.
In certain instances, the system includes a high voltage power source.
In some implementations, the deflecting instrument includes one or more modular units.
Various features and advantages will be apparent from the description, drawings and the claims.
In contrast to a linear array in which only a single magnet is energized, the present system utilizes multiple energized dipole magnets to deflect a charged particle beam by multiple angles along the length of the array. An example system 20 for delivering charged particle beams is shown in
Depending on the power applied to each energized magnet 24, the combined magnetic field can deflect the beam 22 by various angles onto a target 26. Moreover, by energizing multiple magnets 24, a user can select an exit beam trajectory that is substantially orthogonal to the entrance trajectory and which is not constrained to a single exit position. Instead, the beam can exit the array 23 at any arbitrary position along a straight linear path, including positions that coincide with a spacing 27 between adjacent magnets 24. Thus, energizing multiple magnets 24 provides an additional degree of freedom for positioning the exit beam trajectory.
The magnet poles 17 and return yokes 25 can be composed of materials including, but not limited to, ferrite compounds, silicon steel or low carbon steel. The magnets 24 can be formed to have an appropriate size for the particular application.
Typically, the path of the particle beam is under vacuum conditions in order to obtain acceptable beam transmission. The beam can be placed under vacuum conditions according to multiple different system arrangements. For example, a thin-walled vacuum vessel through which the beam travels may be placed between the poles of each magnet 24 of the linear array 23. To minimize the generation of eddy current loops due to the presence of the vacuum vessel, the vessel walls can be formed of a poor conductivity material such as stainless steel. Alternatively, the vacuum vessel can be formed from a non-conducting material such as ceramic, and include a very thin layer of conductive material on its inner walls to allow charge to dissipate. In another example, the magnet poles can be arranged in the walls of the vacuum vessel such that the pole faces are in the vacuum. In that case, a vacuum seal may be necessary around each pole. In some implementations, the complete magnet array can be placed inside a large vacuum vessel. Other vacuum arrangements can be used as well.
An example application of the system under operation is shown in
The power consumed by each energized magnet at each exit trajectory is not necessarily the same. Each outgoing beam is deflected 90° from its corresponding input trajectory towards the target 26. In some implementations, for example, the distance between the impact positions of the beams on the target can be several centimeters or less. At the limit, the motion of the beam spot may be continuous.
If only two magnets 24 are energized, there is a single composite field solution at every position along the exit face 21 of the linear array 23 where the beam 22 can be deflected by 90°. If three or more magnets are energized, there are multiple field solutions for deflecting the beam 22 by 90° at each position along the exit face 21 of the array 23. Preferably, the solution which consumes the least amount of power or which provides the easiest transition between settings is the one used to direct the beam onto the target 26. In addition, energizing three or more magnets allows the user to switch between energized magnets faster because the change in supply current with time, or slew rate, is reduced.
The charged particles can, in some cases, be deflected along exit beam trajectories that coincide with the spacing 27 between magnets 24, while remaining substantially orthogonal to the input beam trajectory. Such deflection can be achieved by utilizing the fringe magnetic fields which extend into the spacing 27. In addition, the fringe magnetic fields can be compensated or modified depending on the number of adjacent energized magnets 24.
During beam scanning, magnets 24 that are not actively deflecting the beam 22 can be set to a desired field strength in preparation for future deflection of the beam 22. Setting the magnetic field involves increasing or decreasing the magnetic field energy by changing the current supplied to the magnet 24. Since the dipole magnet 24 can be modeled as an inductor and resistor in series, the voltage V needed to drive the magnet 24 is given by the equation V=L*(dI/dt)+IR where L is the coil inductance, I is the current, and R is the resistance. Accordingly, fast current switching of the magnet 24 requires high driving voltages for typical magnet inductance values. High voltages typically correspond to voltage levels of approximately 1000 Volts or more, depending on the available technology. However, the power amplifiers capable of providing such high voltages can be costly. In order to reduce the voltage requirement, the current supplied to the magnet 24 can be ramped to the desired setting over a long period of time rather than quickly switched. As a result, less expensive power amplifiers can be used.
In some cases, beam conditioning elements can be included in the system. For example, beam focus elements, such as quadrupole magnets 34, can be located upstream to control the divergence of the beam 22 such that it comes to a focus at a given position relative to the target 26 after the deflection. Each quadrupole focuses along a single axis. Accordingly, additional quadrupoles can be included in the system to control the beam divergence along multiple axial directions. An example of a quadrupole magnet 34 focusing a parallel beam 22 is shown in
Fine adjustments to the exit trajectories can be made using one or more steerer magnets 38 also positioned upstream. Thus, adjustments to the input beam 22 using the steerer magnet 38 can, in some applications, cause corresponding changes in the beam output trajectory. An example of a steerer magnet 38 is shown in
Additionally, apertures 32, through which the beams must pass, can be used to ensure that any beams exiting the array 23 propagate in a direction perpendicular to the target 26. For example, in some cases, a beam passing through the magnet array 23 is dispersed transverse to the direction of propagation. Typically, the amount of dispersion is proportional to the amount p/q where p is particle momentum and q is the particle charge. Given that only particles with a narrow range of momenta, and thus energy, can pass through an aperture 32, the dipole magnet 24 and aperture 32 combine to effectively act as a filter which restricts passage to those particles propagating in a direction substantially perpendicular to the target 26. For applications in which there are multiple exit positions per magnet, multiple apertures 32 should be provided as shown in
High energy beams or electron beams are particularly suited for use in the system 20 as they generally can be formed with low emittance. Accordingly, the beams may be transported along the dipole magnet array 23 without significant spreading. This can be important in applications that favor similar angular characteristics for each exit beam. Furthermore, given that electron beams are easy to bend in magnetic fields, relative to other charged particle beams, the magnets 24 can be designed for use at higher energies.
In the case where the magnet poles and yokes are clear of saturation, the total magnet power is linearly related to the sum of the squares of the pole gap field values. Thus, magnet power P=m(I2), where m is the coil resistance when no eddy currents are present and I is the current. The current I is linearly proportional to the magnetic field B according to I=kB, where k is a proportionality constant. As shown in the graph of
The energized magnets 24 store energy in their fields. Given that the total field energy applied to a magnet array does not change greatly with exit beam position, a power supply switching circuit can be constructed that recovers energy from and delivers energy to a capacitive storage bank as the magnets 24 are respectively energized and de-energized. In this way, the energy necessary to generate the magnetic fields can be recycled and the energy discarded by de-energizing magnets can be reduced. Accordingly, the efficiency of the system can be improved. Without the use of the power supply switching circuit and a capacitive storage bank, field energy would be lost as heat generated in resistors.
For example,
As an example, when a magnet 24 is no longer in use after deflecting a beam to a given position, an amplifier associated with that magnet operates to recover energy from the magnet 24 and store the energy in a storage capacitor 68 until it is needed again. The operation of the amplifier can be in response to a signal received from a control system, which indicates that there is zero demand for current. By recycling the magnetic energy between magnet coils, a high-efficiency system is possible.
Additionally, in some applications, the total number of independent power amplifiers 72 can be reduced by coupling each amplifier 72 to multiple magnets 24 using an arrangement of high power fast current switches 76. For example, as illustrated in the switching circuit 75 of
In some implementations, a cost-efficient system can be employed that does not utilize expensive current-programmed amplifiers. As discussed above, fast current switching of the magnet 24 requires high driving voltages. Accordingly, a fixed high-voltage signal can be applied to the magnet coil so as to rapidly ramp to the desired magnetic field strength at a rate limited only by the magnet inductance and the voltage level. A suitable switching sequence could cause a wave of excitation to pass along the magnet array to scan the beam at a particular rate. If the beam is to be held at a particular position, then a feedback control system can be used to maintain constant current in each energized magnet during the hold. This feedback system could utilize the same switches, but now operating in a pulse width modulated manner.
The magnet coil current settings needed to move the exit beam trajectory to a finite number of arbitrary positions along a target may be stored in an electronic memory 88. By storing a large number of such settings in the memory 88, it is possible to obtain smooth, continuous and stable scans across a target. Furthermore, if the settings for only a few scan positions are available, the processor 86 can derive any intermediate settings by means of mathematical fitting functions, such as polynomials or splines. The ability to switch between settings or scan the exit beam position at high speed may be limited by the inductance of the magnets and the voltage compliance and bandwidth of the power amplifiers, if used.
The processor 86 and memory 88 can be provided in a user terminal 89 that also includes a user interface displayed on a display. The terminal 89 allows a user operating the charged particle delivery system to observe changes in or make adjustments to system parameters such as beam position and angle, magnet field strength, and current and voltage levels. The user terminal 89 also may include a number of additional external or internal devices, such as, without limitation, a mouse, a CD-ROM, digital signals processors, field programmable gate arrays and a keyboard.
As shown in
In some cases, a portion of the magnetic flux of a first magnet couples to one or more adjacent magnets and produces a magnetic field in the adjacent pole gaps 16. The amount of coupling depends on the relative geometry of the pole gaps 16 as well as the spacing 27 between magnets 24. This effect can complicate the calculation of where the beam will go upon deflection. However, a computer-control system can compensate for the adverse magnetic field coupling. For example, the positions and/or the angles of deflected beams on a target can be measured at various target positions for nominal magnet excitation patterns. The measurements then are recorded by the computer system and the excitation pattern is automatically tuned or adjusted by the computer system to achieve the desired positions and angles, thus compensating for the adverse effects of magnetic field coupling between magnets.
Various aspects of the system may be implemented in hardware, software or a combination of hardware and software. Circuitry, including dedicated or general purpose machines, such as computer systems and processors, may be adapted to execute machine-readable instructions to implement the techniques described above. Computer-executable instructions for implementing the techniques can be stored, for example, as encoded information on a computer-readable medium such as a magnetic floppy disk, magnetic tape, or compact disc read only memory (CD-ROM).
A number of embodiments of the invention have been described. Nevertheless, various modifications may be made without departing from the spirit and scope of the invention. Other implementations are within the scope of the claims.
This application claims the priority of U.S. Provisional Patent Application No. 60/866,227, filed on Nov. 17, 2006. The disclosure of that application is incorporated herein by reference.
Number | Date | Country | |
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60866227 | Nov 2006 | US |