Number | Date | Country | Kind |
---|---|---|---|
99 08522 | Jun 1999 | FR |
Filing Document | Filing Date | Country | Kind |
---|---|---|---|
PCT/FR00/01837 | WO | 00 |
Publishing Document | Publishing Date | Country | Kind |
---|---|---|---|
WO01/03177 | 1/11/2001 | WO | A |
Number | Name | Date | Kind |
---|---|---|---|
4371587 | Peters | Feb 1983 | A |
4474829 | Peters | Oct 1984 | A |
6095084 | Shamouilian et al. | Aug 2000 | A |
Number | Date | Country |
---|---|---|
07 297246 | Mar 1996 | JP |
WO 9835383 | Aug 1998 | WO |
Entry |
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T Heiser et al., “Transient Ion Drift Detection of Low Level Copper Contamination in Silicon” Applied Physics Letters, US, American Institute of Physics, New York, vol. 70, No. 26, Jun. 30, 1997, pp 3576-3578. |
T. Heiser et al., “Determination of the Copper Diffusion Coefficient in Silicon from Transient Ion-Drift”, Applied Physics A. Solids and Surfaces, DE, Springer Verlag. Heidelberg, vol. A57, No. 4, Jan. 1, 1993, pp 325-328. |