J. L. Vossen, "Glow Discharge Phenomena in Plasma Etching and Plasma Deposition", J. Electrochem. Soc.: Solid-State and Technology (Feb. 1979), pp. 319, 320. |
Mitsuo Kawamura et al., "A Capacitively Coupled RF-Excited CW-HCN Laser", IEEE Journal of Quantum Electronics, vol. QE-21, No. 11 (Nov. 1965), pp. 1833-1837. |
R. W. Boswell, "Very Efficient Plasma Generation by Whistler Waves Near the Lower Hybrid Frequency" Plasma Physics and Controlled Fusion, vol. 26, No. 10, pp. 1147-1162, 1984. |
G. N. Harding et al, "A Study of Helicon Waves in Indium", Proc. Phys. Soc., 1965, vol. 85. |
R. W. Boswell et al, "Fast Etching of Silicon in a Plasma Reactor with Ripe Source" Le Vide, Les Couches Minces, Supplement au No. 246, Mar., Apr. 1989, pp. 160-162. |
Oechsner, H., "Electron Cyclotron Wave Resonances and Power Absorption Effects in Electrodeless Low Pressure H.F. Plasmas with a Superimposed Static Magnetic Field," Plasma Physics, vol. 16, pp. 835-844 (1974). |
Uesugi, T. et al., "A tandem radio-frequency plasma torch," J. Appl. Phys., 64(8), 15 Oct. 1988, pp. 3874-3878. |