Patent Application
20060240992
The present invention relates generally to magnetic structures and methods, and more particularly to a device having a structural element with magnetic properties, and method.
Magnetic semiconductors form important parts of modern components used in magnetoelectronics or spintronics since they provide spin-polarized charge carriers. Important examples of components that are based on utilizing spin degrees of freedom, include magnetic random access memories (MRAMs), magnetic field sensors, light-emitting diodes and lasers, which emit circular-polarized light, spin transistors and components, which are used to realize quantum-logic gates. In components of this type, the transport of charge carriers is preferably altered by varying the magnetization of individual layers, by varying the spin-polarized density of states, by varying the spin-dependent scatter at interfaces or by internal or external magnetic or electrical fields, which are applied, for example by means of gate electrodes. These effects are collectively known as magnetoresistive effects (MR or XMR for short). A distinction is drawn, inter alia, between changes to the charge carrier transport, due to spin-dependent scattering (giant magnetoresistance, GMR) and due to tunneling processes between ferromagnets with different spin-polarized density of states (tunneling magnetoresistance, TMR). Unlike ferromagnetic metals, the use of magnetic semiconductors in such components has the particular advantage that the magnetic properties can be electrically switchable by gate electrodes, see for example, A. Waag et al., Journal of Superconductivity 14, 291 (2001), which is incorporated herein by reference.
In conventional semiconductors such as Si, Ge, GaAs or ZnSe, all electron shells are completely filled; the materials are diamagnetic. Other magnetic properties can be generated by the introduction of special atoms with unsaturated electron shells. Atoms of the transition metals or of the rare earths are preferably used for this purpose, since, according to Hund's rule, high spin states are formed in their unsaturated d-shells or f-shells. With low concentrations of such atoms with unsaturated shells in semiconductors, paramagnetic behavior results. At higher concentrations, interactions occur between the magnetic moments, so that semimagnetic behavior (characterized by a high magnetic susceptibility but without the formation of a spontaneous magnetic order) or ferromagnetic behavior is established.
The preferred atom for producing ferromagnetic semiconductors is Mn. In its oxidation state 2+, Mn has an electron spin of S=5/2. This is the highest electron spin that can be achieved in transition metal atoms according to Hund's rule. Mn is used to generate ferromagnetism both in elemental semiconductors, such as Ge, in III-V compound semiconductors, for example GaAs and also in II-VI compound semiconductors such as, for example, ZnTe (Y. D. Park, et al., Science 295, 651 (2002), T. Dietl, et al., Phys. Rev. B 63, 195205 (2001) and D. Ferrand, et al., Phys. Rev. B 63, 085201 (2001), all of which are incorporated herein by reference).
In addition to the localized magnetic moments, a sufficiently strong magnetic interaction between them is required to generate ferromagnetism. In semiconductors, this interaction can be imparted by electronic charge carriers (electrons or holes) if they are likewise present in sufficient concentration in the material. The precise magnetic properties of the semiconductors are dependent to a significant degree on the concentration of the charge carriers. The required charge carriers can be produced in various ways, for example by the introduced transition metal or rare earth atoms themselves, if they have electronic states in a band of the semiconductor, or if they form donor or acceptor states in the vicinity of the band edges, (such as for example Mn in GaAs) or by co-doping with other atoms that act as donors or acceptors (such as for example N in ZnTe:Mn).
In connection with conventional doped semiconductors, it is known that the electronic effects of doping atoms can be influenced by the introduction of hydrogen. For example, in many cases, the doping can be completely reversed; the charge carrier concentration decreases drastically as a result of the introduction of hydrogen. In most cases, this happens as a result of the formation of complexes of the doping atom with hydrogen, which are no longer electronically active. This situation is referred to as passivation of the donors or acceptors. For Zn acceptors in GaAs, this is discussed inter alia in M. Stutzmann, et al., Appl. Phys. A 53, 47 (1991), which is incorporated herein by reference.
Hydrogen, however, may also occur in isolation in semiconductors and then itself forms electronically active acceptor or donor states (C. van de Walle, et al., Nature 423, 626 (2003), which is incorporated herein by reference), which lead to the formation of free charge carriers. These acceptor or donor states of hydrogen may, however, also lead to a reduction in the concentration of free charge carriers as a result of what is known as compensation for other acceptors or donors.
In the present context, the term semiconductors also encompasses materials that are semiconducting without the introduction of transition metal, rare earth or doping atoms but become metallically conductive as a result of the introduction of such atoms.
Preferred embodiments of the present invention fundamentally widen the technical options for influencing magnetic properties of materials, in particular of solids. In particular, a device is provided having a structural element that contains a base material whereof the magnetic properties can be altered compared to the conventionally known magnetic behavior of the same base material. Furthermore, a basic method is provided allowing the magnetic properties of materials, in particular of solids, to be significantly altered, by which, for example, phase transitions of the magnetic state of a material can be achieved.
In a preferred embodiment, a device is provided having a structural element that has magnetic properties that are dependent on the hydrogen content in the structural element, the structural element containing hydrogen.
According to a preferred embodiment of the invention, a structural element is provided made from a material that has magnetic properties, i.e., which is not only diamagnetic but rather its diamagnetism has superimposed on it at least one further, stronger manifestation of magnetism, for example ferromagnetism or antiferromagnetism, paramagnetism, ferrimagnetism, or any other magnetic manifestation.
According to a further preferred embodiment of the invention, a magnetic material whose magnetic properties depend on the hydrogen content in this material is selected for the structural element. Hitherto, these dependent relationships between magnetic properties and the hydrogen content have not been exploited at a technical level; the magnetic properties of a solid are usually set by the complex production and targeted mixing of extremely complex metal-containing compounds. According to a preferred embodiment of the invention, however, it has been established that if the magnetic material is appropriately selected, a small hydrogen content that is introduced into the solid can drastically alter the magnetic behavior. For example, in a magnetic semiconductor with limited electrical conductivity at room temperature, not only the electrical properties but also the magnetic properties can be altered by the introduction of hydrogen.
Finally, according to a preferred embodiment of the invention, a suitable base material is provided with hydrogen. The hydrogen content causes the magnetic behavior of the main constituent from which the structural element is substantially formed to be different than the conventionally known magnetic behavior of the same main constituent. By way of example, a material that is actually ferromagnetic can be converted into a paramagnetic material by the introduction of hydrogen. Other phase transitions can also be achieved with the aid of adding hydrogen.
According to a preferred embodiment of the invention, the hydrogen can be introduced in any form, for example in the form of atomic particles, of radicals, of ions or of hydrogen-containing molecules that release hydrogen when they come into contact with the base material. Furthermore, it is possible to use all isotopes of hydrogen, for example including deuterium, to alter the magnetic properties. Furthermore, according to a preferred embodiment of the invention, it is also appropriate in particular to introduce hydrogen in initially molecular form, in ionic form or in the form of a radical, although this list is not conclusive. The only crucial factor is that hydrogen particles that alter the magnetic properties of the base material be formed in the base material into which the hydrogen is introduced. An alteration of this nature may, in particular, be a magnetic phase transition, in which the presence of a defined magnetic phase is dependent on the presence and concentration of the hydrogen. Furthermore, transition parameters between different magnetic phases can be altered by the hydrogen content. Therefore, preferred embodiments of the invention for the first time make technical use of the fact that adding hydrogen to a material, preferably a solid, alters not only its electrical properties but also its magnetic properties.
The subject matter of preferred embodiments of the invention also encompass semiconductors whereof the magnetic properties are altered with the aid of hydrogen, methods for manipulating the magnetic properties by means of hydrogen and components in which semiconductors whereof the magnetic properties have been altered by hydrogen are used.
Preferred embodiments of the invention allow a large number of problems involved in using semi-magnetic or ferromagnetic semiconductor layers to be solved in an advantageous way. By the targeted, and if appropriate different laterally and in the depth of the layers, introduction of hydrogen, it is possible to influence the magnetic properties of such layers after growth, for example in order to compensate for the presence of inhomogeneities or in order to magnetically structure the films and produce magnetoelectronic components. One particular advantage of preferred embodiments of the present invention is that only one semiconductor material is required to produce magnetic/nonmagnetic heterostructures, and, therefore, significantly lower defect densities occur at the interfaces of the heterostructure than if different materials, such as for example metals and oxides, are used to realize corresponding heterostructures.
One problem of ferromagnetic materials that is advantageously solved by preferred embodiments of the present invention is the lateral structuring of their magnetic properties. This is usually achieved by etching the layers by means of wet-chemical or ion-assisted methods. However, this produces a new surface structure (surface corrugation) and defects in a high concentration as well as stresses. The introduction of hydrogen, by contrast, allows the magnetic properties to be structured with a high lateral resolution without altering the surface topography. It is in this way possible to produce nanomagnets (e.g., magnetic quantum dots or quantum wires) in a structurally homogeneous layer with minimal internal stresses. The surface remains smooth, so that further films can be grown on the layer, which has only been magnetically structured without the need for additional planarization steps.
Another problem with ferromagnetic semiconductors, which is likewise solved in an advantageous way by preferred embodiments of the present invention, is the fact that the growth of the magnetic layers fixedly predetermines a magnetic anisotropy that is difficult to alter by etching structures. However, the magnetic anisotropy can be controlled with a very high level of accuracy by setting the concentration of the charge carriers and can, therefore, be altered by suitable treatment with hydrogen, even after the layer growth. The laterally different introduction of hydrogen then also allows the implementation of lateral anisotropy superlattices.
Furthermore, preferred embodiments of the invention can be used to produce further new types of magnetic and magnetic/nonmagnetic heterostructures and components. The Curie temperature of the magnetic transition can be altered by the charge carrier concentration. An inhomogeneous distribution of hydrogen can, therefore, be utilized to produce regions with different Curie temperatures and, therefore, to produce heterostructures made from different ferromagnetic materials. If hydrogen is introduced with a concentration gradient, it is possible to produce a material with gradients in its magnetic properties. If a sufficient amount of hydrogen is introduced, so that the ferromagnetism is completely destroyed in a region, the result is heterostructures comprising ferromagnetic and nonmagnetic layers. By accurately setting the hydrogen concentration introduced, it is also possible to set the electrical conductivity of the nonmagnetic parts over a wide range. In particular, in addition to magnetic structuring, it is also possible to achieve electrical structuring in this way. Adjacent magnetic regions can thus be connected to one another by semiconducting regions or separated from one another by insulating regions. Unlike corresponding structures as conventionally used in magnetoelectronics or spintronics, the structures obtained can be produced using just one materials system, such as for example GaAs:Mn. The resulting low-defect interfaces between the magnetic regions and the insulating regions have a positive effect on the properties of these components.
Various methods are suitable for manipulating the magnetic properties of semiconductors by means of hydrogen. In this context, it is preferable to use methods in which the semiconductors are exposed to atomic hydrogen or hydrogen ions. This may take place as early as during the growth of the semiconductor or alternatively after the semiconductor has been produced. Molecular hydrogen can be decomposed inter alia by means of DC or AC plasmas, by means of contact with hot surfaces or catalytically at metals such as for example palladium. For hydrogen to be introduced into a semiconductor after the latter has been produced, it is preferable to use a plasma discharge, in which case the semiconductor to be treated is advantageously not located directly in the plasma. It is particularly preferable to use a DC plasma, for example at a discharge voltage of 1000 V and an electrode-to-electrode distance of 5 cm. To extract hydrogen ions from the plasma, it is advantageous to apply a negative voltage, preferably of over 50 V, to the holder for the semiconductors.
A lateral variation in the concentration of hydrogen that is introduced into the material can be achieved for example with the aid of masks, which either locally prevent diffusion of hydrogen or lead to local dissociation of hydrogen (e.g., when using palladium as gate electrode in
To increase the diffusion of hydrogen in the semiconductor and to improve the formation of complexes, it is expedient for the semiconductor to be heated during the hydrogen treatment. For the passivation of GaAs:Mn with hydrogen, it is preferable to use a temperature of from about 100 to about 300° C., particularly preferably a temperature of from about 150 to about 200° C.
In addition to hydrogen, deuterium can also advantageously be used for the methods, semiconductors and components described here since complexes with deuterium may be more stable than the corresponding complexes with hydrogen. Therefore, in the above text the term hydrogen encompasses all isotopes of hydrogen.
It is preferably provided that the structural element contains a base material that is formed predominantly from a ferromagnetic constituent, and that the base material is paramagnetic at least in a first region on account of the hydrogen content. Conversely, it is also possible for the base material to be paramagnetic and for a region provided with hydrogen to be converted into a ferromagnetic material. An example of a ferromagnetic base material is manganese-doped gallium arsenide, which becomes paramagnetic when hydrogen is added. As a result of the addition of hydrogen, the Curie temperature and the spontaneous magnetization of the material of the structural element also change. The base material of the structural element is preferably electrically insulating or semiconducting. In the latter case, the electrical conductivity can be varied considerably by means of the hydrogen content. In particular, the electrical conductivity of the structural element can be varied in three dimensions by using an inhomogeneous distribution of the hydrogen.
The hydrogen may be present in the structural element in the form of atomic or ionic hydrogen, for example including the deuterium isotope. Furthermore, the hydrogen may be present in the form of complexes with atoms of transition metals or of rare earths. The hydrogen is preferably used to passivate some of the free charge carriers that are present in the structural element and thereby to alter the magnetic properties of the structural element. In terms of its external geometric shape, the structural element may be a homogeneous layer or a structured layer. It may also be a layer of a layer sequence arranged on a substrate. Besides its external three-dimensional configuration, the structural element may also have an inhomogeneous magnetic structure, which is produced by the three-dimensionally varying concentration of hydrogen and cannot be readily recognized from the outside. In particular, the entire structural element may be formed from a uniform base material that is provided with hydrogen only in first regions. Therefore, the magnetic properties are altered in the first regions.
The hydrogen in the structural element may be inhomogeneously distributed in the lateral direction parallel to a main face of the structural element. The hydrogen content may also be inhomogeneous in a vertical direction perpendicular to the main face of the structural element. It is also possible for the hydrogen to be concentrated and restricted to a small depth region within the extent of the depth of the structural element.
It is preferably provided that the hydrogen is arranged predominantly in a first region of the structural element and that the structural element also has a second region, the hydrogen content of which is lower than the hydrogen content in the first region. The second region of the structural element is preferably free of hydrogen. By contrast, hydrogen is present in the first region. According to the invention, the hydrogen content is a deliberately introduced hydrogen content that has been introduced with the aid of a controlled introduction method in order to alter the magnetic properties of the material of the structural element. Unintentional or inevitable impurities in the magnetic material, which on account of extremely small traces of hydrogen have no significant technical effect on the magnetic properties and are present only as traces of impurities, are, therefore, not to be considered as a deliberately introduced hydrogen content in the sense of the present invention.
The first region and the second region may each be layers or layer regions of a heterostructure. It is preferable for the second region to adjoin the first region. The first region may in particular be arranged between two second regions with a lower or negligible hydrogen content. It is preferable for the second region to be ferromagnetic and the first region to be paramagnetic on account of the hydrogen content.
A particularly preferred embodiment provides that the first region and the second region contain the same base material and that the first region additionally contains hydrogen. By contrast the second region is virtually free of hydrogen. One of a plurality of second regions may adjoin a layer made from a different base material than the base material of the structural element, for example a ferromagnetic layer made from iron, for example. This second region, together with the layer made from the other base material, forms a heterostructure, which overall has a different magnetic behavior, for example a different coercive force, than another second region.
The first region of the structural element may adjoin an end face, for example an outer face, of the structural element and extend from there into the structural element; in the finished device, the outer face or end face may be an interface with a different material or a different structural element. One advantage of this embodiment is that the hydrogen does not have to be implanted through a region that is to be kept free of hydrogen, but rather can be formed, for example through contact between the outer face and a hydrogen-containing plasma with hydrogen.
The outer face is preferably a main face of the structural element. The structural element may be free of hydrogen over a first part of its base face running parallel to the main face. Over a second part of the base face, a first, hydrogen-containing region can extend from the main face into the structural element down to a first depth. Over a third part of the base face, the first, hydrogen-containing region can extend from the main face into the structural element down to a different, second depth. This provides a first region that contains hydrogen and has a different layer thickness over different parts of the base face of the structural element. The remaining, second regions of the structural element, which contain little, if any, hydrogen, are located between the first, hydrogen-containing regions and the base face of the structural element. In the latter, magnetic properties, for example the Curie temperature or the preferred direction of the magnetic moment, may be dependent on the respective layer thickness of the second region between the base face of the structural element and the first, hydrogen-containing region, which extends from the main face into the structural element.
In accordance with a preferred embodiment of the invention, a method for altering magnetic properties of a material comprises providing a base material that has magnetic properties which alter when hydrogen is introduced into the base material, and introducing hydrogen into the base material with the result that the magnetic properties of the base material are altered at least in a first region of the base material.
The hydrogen can be introduced into the base material of the structural element by implantation, for example exclusively within a limited depth region within the depth extent of the structural element. Alternatively, the hydrogen can be introduced into the structural element by at least one end face or outer face of the structural element being brought into contact with a hydrogen-containing plasma. In preferred embodiments of the present invention in which a part of the structural element is brought into contact with a hydrogen-containing plasma, it is also conceivable for the hydrogen to be introduced into the structural element in a different way through the corresponding outer face or end face of the structural element, preferably in such a manner that the first region, which permanently contains hydrogen, extends as far as the outer face or end face of the structural element.
A first part-face of a face (main or end face) of the structural element can be protected from contact with the hydrogen-containing plasma, for example with the aid of a mask. A second part-face of the same face of the structural element can be exposed to the hydrogen-containing plasma for a first period of time. A third part-face of the same face of the structural element can be exposed to the hydrogen-containing plasma for another period of time with a different duration, in order to form a first region with a different, for example lower layer thickness beneath the third part-face of the main face of the structural element. In addition to using lithographic and mask technology methods, it is also possible for the structural element to be structured in terms of its magnetic properties with the aid of an ion beam writer that releases hydrogen-containing particles.
It is preferable for the hydrogen to be introduced into the structural element in such a way that the hydrogen content is inhomogeneous in at least one direction within the structural element. As a result, a magnetically inhomogeneous structure is produced in the structural element. The three-dimensionally inhomogeneous structure of the magnetic properties of the structural element varies over distances that are of the same order of magnitude as the geometric dimensions of structures produced lithographically in the customary way.
It is preferable for the entire structural element to initially be made from a uniform base material that has magnetic properties. Then the magnetic properties of the base material are subsequently altered by the introduction of hydrogen in at least a first region of the structural element. In particular, in this way a base material that was originally ferromagnetic is made paramagnetic in the first regions. By way of example, manganese-doped gallium arsenide can be rendered paramagnetic by introduction of hydrogen.
It is preferably provided that the first region and the second region of the structural element together form a monolithic material, for example a monolithic, epitaxial layer, which is free of interfaces or interfacial states between the first, hydrogen-containing region and the second region. As a result, the material of the structural element can be entirely grown epitaxially, which significantly simplifies the production process. Those regions of the structural element whose magnetic behavior is to be subsequently changed can then be provided with hydrogen.
A preferred device may include a spin valve transistor, a magnetic field sensor, a magnetic memory cell or an integrated semiconductor circuit. Other conceivable applications include, for example lasers or light-emitting diodes. A preferred device may, in particular be or include a microelectronic component.
A preferred embodiment of the invention is formed by magnetic semiconductors in which the semi-magnetism or ferromagnetism is reduced or completely suppressed by hydrogen. As a result of the formation of complexes or as a result of compensation, the concentration of the charge carriers, which impart the magnetic interaction in the semiconductor, is reduced by hydrogen. This leads to a drop in the transition or Curie temperature Tc and/or the spontaneous magnetization even to the extent of the ferromagnetism being eliminated altogether.
In the present context, the term magnetic semiconductors encompasses in particular materials which, if they are not doped by transition metal atoms or rare earth atoms, are semiconducting. Examples of these materials include C, Si, Ge, GaAs, InAs, GaSb, ZnSe, ZnS or ZnTe. If a semiconductor of this type is degeneratively doped, i.e., if high dopant concentrations of, for example transition metal atoms or rare earth atoms are introduced into these semiconductors, the materials that have thereby been doped may still have a finite conductivity at low temperatures, which is actually characteristic of metals. Irrespective of this, in the language used in the specialist field, these materials are nonetheless referred to as magnetic or ferromagnetic semiconductors.
A preferred semiconductor whereof the magnetic properties can be altered in this way is GaAs:Mn. In this context GaAs, which has an Mn concentration of between 0.5 and 10% of the Ga atoms, is particularly preferred. GaAs:Mn is advantageously produced with the aid of molecular beam epitaxy, at substrate temperatures of from 100 to 600° C., preferably at substrate temperatures of from 220 to 280° C. Introducing hydrogen into GaAs:Mn in the same concentration as that of the Mn leads to a considerable reduction in the electrical conductivity in GaAs:Mn:H, as is illustrated in an Arrhenius diagram (see subsequent description of
In generally all magnetic semiconductors in which the magnetism is imparted by charge carriers and in which the charge carrier concentration is reduced by complex formation or compensation, the ferromagnetism can be correspondingly reduced or eliminated altogether by the introduction of hydrogen. This, in particular also applies to semiconductors in which the charge carriers required for the magnetic interaction have to be provided by co-doping, as for example in Mn-doped II-VI compound semiconductors. Since the local magnetic moments of the transition metal or rare earth atoms generally remain unchanged by the hydrogen, semiconductors in which the hydrogen completely eliminates the ferromagnetism are generally paramagnetic. A weak residual interaction between the magnetic moments may, under certain circumstances, also lead to anti-ferromagnetism or ferrimagnetism in these semiconductors.
Another preferred implementation is semiconductors in which local magnetic moments are present and in which semi-magnetism or ferromagnetism is produced or increased by hydrogen. The electronically active acceptor or donor states of the isolated hydrogen in these semiconductors allows free charge carriers to be produced, which impart the interaction between the local magnetic moments and, therefore, produce or improve the magnetic properties, such as Curie temperature or spontaneous magnetization. Furthermore, an existing compensation in co-doped semiconductors can be eliminated by complex formation with hydrogen, and in this way the charge carrier concentration can be increased and the magnetic properties improved.
Preferred embodiments of the invention are described below with reference to FIGS. 1 to 12. In the drawing:
Two possible realizations of components in which the magnetic properties of a structural element are inhomogeneous because of the introduced hydrogen are diagrammatically depicted in
Electronic transport processes through these structures can be influenced by varying the magnetization of individual layers, by varying the spin-polarized density of states of individual layers, by varying the spin-dependent scatter at interfaces between the layers, by varying the conductivity of the layers or by varying the internal or external magnetic or electric fields. Structures of this type can advantageously be used, for example as sensors for magnetic fields or as magnetic random access memories.
If necessary, these structures can be extended, for example by contact layers and supply conductors, by suitable insulating interlayers to avoid electronic transport through the substrate, by magnetically hard layers for defining magnetic preferred orientations and by other semiconductor structures or components. The layers 12 and 14 themselves may comprise a combination of different semiconductors or may have inhomogeneous dopings or inhomogeneous magnetic properties. Heterostructures comprising magnetic and nonmagnetic layers can, according to embodiments of the invention also be produced from combinations of ferromagnetic metals and semiconductors in which, as described here, the ferromagnetism has been destroyed by hydrogen, or from combinations of semiconductors in which, as described here, ferromagnetism is produced by hydrogen, and nonmagnetic materials.
A particularly preferred implementation is a component as shown in
To ensure switching of the two ferromagnetic layers 12 at different coercive forces, it is possible to select different layer thicknesses for them. Alternatively, it is also possible for different coercive forces to be realized by varying the Mn concentration in the two layers, preferably by a difference of at least 1% between the concentrations. It is particularly preferable for different coercive forces to be realized by the introduction of hydrogen into one of the two layers 12, by implantation or treatment in a hydrogen plasma. This treatment preferably produces a difference in the coercive forces in the two layers 12 of at least 1 kA/m, or 1% of hydrogen, based on the concentration of the Ga atoms in GaAs:Mn is introduced in at least one of the two layers 12, taken as an average over the respective layer. Alternatively, different coercive forces of the layers can also be produced by using heterostructures, as illustrated in
If the layer 14 in the above structures is insulating, the conductivity between the layers 12, on account of the tunneling magnetoresistance, will be dependent on the relative orientation of the magnetizations in the layers 12. If the layer 14 is metallically conductive but not ferromagnetic, the resistance of the entire layer structure, on account of giant magnetoresistance will be dependent on the relative orientation of the magnetizations in the layers 12. Both structures can be used to measure magnetic fields or can be used in magnetic random access memories.
Another particularly preferred implementation is a lateral heterostructure, in which the magnetic properties of an initially magnetically homogeneous layer have been altered by introduction of hydrogen. A particularly preferred realization is a heterostructure in which hydrogen has been introduced only into some regions of the layer. The heterostructure may also include regions in which hydrogen has been introduced to different depths and/or in different concentrations. This can be achieved, for example by parts of the layer being exposed to the dc plasma described above for different lengths of time, in which case the lateral structuring can be achieved by using masks. Preferred masks that prevent hydrogen from diffusing in are thin films of gold (thickness preferably about 5-1000 nm) or SiO2 or Si3N4 (thickness preferably about 50-5000 nm). It is particularly preferable to use lateral heterostructures in which the hydrogen has diffused in such a way that a non-ferromagnetic layer 14, which may be of different thicknesses, is formed locally at the surface of the originally ferromagnetic layer 12. An embodiment of this type will be explained further with reference to
On account of the uniform base material, which has been grown by a single method step, in particular the boundary between the paramagnetic, first region 14 and the ferromagnetic regions 12 are free of an increased concentration of defects or other disruptive interfacial states that would lead to disruptive effects when operating the spin transistor. Increased defect concentrations, by contrast, are inevitable at metal-insulator interfaces of metal-insulator-metal heterostructures in conventional devices if the metal and insulator are produced by different process steps, for example by deposition or growth.
Charge carriers L marked by large dots are arranged in the base material 22. Hydrogen H, which is indicated by small dots, has additionally been introduced in the first region 14. The hydrogen H passivates or neutralizes some of the charge carriers L arranged in the first region 14, and thereby alters the electrical conductivity but also the magnetic behavior in the first region 14. In particular, the material 22 in the first region 14 is no longer ferromagnetic, but rather is now paramagnetic. As a result, the material of the structural element 2 has a different Curie temperature Tc′ and a different magnetization M′ in the first region 14 than in the ferromagnetic second regions 12. The material of the structural element in the first region 14 may also be paramagnetic in a temperature-independent way, i.e., may no longer have a Curie temperature.
A dopant atom, for example manganese, as acceptor withdraws an electron from the valence band of the base material and produces a hole or defect electron in the valence band of the base material. In the case of passivation of acceptors, a donor, according to embodiments of the invention hydrogen, is introduced into the base material, and the electron, which it releases into the conduction band is recombined with the defect electron. Hydrogen can, therefore, be introduced in particular as counter-doping into a base material that has already been doped (compensation). In the case of a further mechanism, complexes of the hydrogen with another dopant, for example, manganese, are formed. This is known as passivation.
In manufacturing technology terms, the lower depth of penetration of the hydrogen below the third part-face IIIa of the end face 34 (and, therefore, the reduced depth t3 of the boundary between the paramagnetic first region 14 and the ferromagnetic second region 12) can be achieved by the end face 34 of the structural element 2 being temporarily exposed to the hydrogen-containing plasma 30, or alternatively by it being temporarily covered with a mask 35 as indicated in
The device illustrated in
Structures as illustrated in
| Number | Date | Country | Kind |
|---|---|---|---|
| 103 32 826.2 | Jul 2003 | DE | national |
This application is a continuation of co-pending International Application No. PCT/DE2004,001559, filed Jul. 19, 2004, which designated the United States and was not published in English, and which is based on German Application No. 103 32 826.2 filed Jul. 18, 2003, both of which applications are incorporated herein by reference.
| Number | Date | Country | |
|---|---|---|---|
| Parent | PCT/DE04/01559 | Jul 2004 | US |
| Child | 11334796 | Jan 2006 | US |
