Claims
- 1. A method for removing photoresist from a substrate comprising contacting said substrate with a stripping solution for a time sufficient to remove said photoresist from said substrate, said stripping solution consisting essentially of:(a) from about 5% to about 95% by weight of one or more dibasic esters having the general formula: R1CO2—(CH2)n—CO2R2 where R1 and R2 are alkyl groups of 1-4 carbons and n =1-5; (b) from about 1% to about 65% by weight of tetrahydrofurfuryl alcohol or a water soluble alcohol, glycol, glycol ether, or mixtures thereof having the general formula: R—(CHOH)n—R′ where R and R′ are selected from the group consisting of a hydrogen atom, an alkyl group of 1 to 7 carbon atoms, and an alkoxyl group of 1 to 4 carbon atoms, n=1-3; (c) from about 5% to about 70% by weight of an organic solvent selected from the group consisting of dimethyl sulfoxide, n-hydroxethyl-pyrrolidinone, n-methyl pyrrolidinone, sulfolane, and mixtures thereof; and (d) from about 5% to about 60% by weight of deionized water.
- 2. The method of claim 1 where the dibasic ester is present in an amount of from about 25% to about 50% by weight.
- 3. The method of claim 1 where the water soluble alcohol, glycol, glycol ether, or mixture thereof, is present in an amount of from about 30% to about 50% by weight.
- 4. The method of claim 1, where the organic solvent, or mixture thereof, is present in an amount of from about 20% to about 50% by weight.
- 5. The method of claim 1 where the deionized water is present in an amount of from about 25% to about 55% by weight.
- 6. The method of claim 1 where the dibasic ester is selected from the group consisting of dimethyl adipate, dimethyl glutarate and dimethyl succinate.
- 7. The method of claim 1 where the water soluble alcohol is selected from the group consisting of ethanol, methanol, 2-propanol, n-propanol, n-butanol, n-pentanol, n-hexanol, and n-heptanol.
- 8. The method of claim 1 where the glycol or glycol ether is selected from the group consisting of ethylene glycol, propylene glycol, ethylene glycol ethers, and propylene glycol ethers.
- 9. The method of claim 1 where(a) the dibasic esters are present in an amount of from about 25% to about 50% by weight, and are selected from the group consisting of dimethyl adipate, dimethyl glutarate and dimethyl succinate; (b) the alcohol, glycol, glycol ether, or mixture thereof is present in an amount of from about 30% to about 50% by weight, and are selected from the group consisting of ethanol, methanol, 2-propanol, n-propanol, n-butanol, n-pentanol, n-hexanol, n-heptanol, tetrahydrofurfuryl alcohol, ethylene glycol, propylene glycol, ethylene glycol ethers, and propylene glycol ethers; (c) the organic solvent, or mixture thereof, is present in an amount of from about 20% to about 50% by weight; and (d) the deionized water is present in an amount of from about 25% to about 55% by weight.
- 10. A method of removing photoresist from a substrate comprising contacting said substrate with a stripping solution for a time sufficient to remove said photoresist from said substrate, wherein said stripping solution consists essentially of:(a) from about 2% to about 45% by weight of one or more dibasic esters having the general formula: R1CO2—(CH2)n—CO2R2 where R1 and R2 are alkyl groups of 1-4 carbons and n=1-5; (b) from about 1% to about 40% by weight of tetrahydrofurfuryl alcohol or a water soluble alcohol, glycol, glycol ether, or mixtures thereof having the general formula: R—(CHOH)n—R′ where R and R′ are selected from the group consisting of a hydrogen atom, an alkyl group of 1 to 7 carbon atoms, and an alkoxyl group of 1 to 4 carbon atoms, n=1-3; (c) from about 2% to about 35% by weight of an organic solvent selected from the group consisting of dimethyl sulfoxide, n-hydroxethyl-pyrrolidinone, n-methyl pyrrolidinone, sulfolane, and mixtures thereof; and (d) from about 5% to about 60% by weight deionized water; and (e) from about 5% to about 60% by weight of an amine selected from the group consisting of monoethanolamine, monoisopropanolamine, aminoethylethanolamine, diglycolamine, and mixtures thereof.
Parent Case Info
This application a CIP of Ser. No. 09/328,176, dated Jun. 8, 1999, now abandoned, which is a continuation of application Ser. No. 09/063,627, filed on Apr. 20, 1998 now U.S. Pat. No. 5,909,744, which is a continuation-in-part of application Ser. No. 08/593,628, filed on Jan. 30, 1996, now U.S. Pat. No. 5,741,368.
US Referenced Citations (22)
Foreign Referenced Citations (2)
Number |
Date |
Country |
0 163 202 |
May 1985 |
EP |
267-540 |
Oct 1986 |
EP |
Continuations (1)
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Number |
Date |
Country |
Parent |
09/063627 |
Apr 1998 |
US |
Child |
09/328176 |
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US |
Continuation in Parts (2)
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Number |
Date |
Country |
Parent |
09/328176 |
Jun 1999 |
US |
Child |
09/661723 |
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US |
Parent |
08/593628 |
Jan 1996 |
US |
Child |
09/063627 |
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US |