Number | Name | Date | Kind |
---|---|---|---|
3567445 | Atkinson et al. | Mar 1971 | |
3635709 | Kobayashi | Jan 1972 | |
4283478 | Kubotera et al. | Aug 1981 | |
4299912 | Shiba et al. | Nov 1981 | |
4326018 | Jargiello | Apr 1982 | |
4341856 | Toyama et al. | Jul 1982 | |
4348471 | Shelnut et al. | Sep 1982 | |
4350753 | Shelnut et al. | Sep 1982 | |
4447512 | Rowe et al. | May 1984 | |
4483758 | Rowe et al. | Nov 1984 | |
4758497 | Shah et al. | Jul 1988 | |
4842988 | Herrmann et al. | Jun 1989 | |
5330875 | Adelman et al. | Jul 1994 | |
5512420 | Hallman et al. | Apr 1996 | |
5609981 | Hallman et al. | Mar 1997 |
Number | Date | Country |
---|---|---|
1227603 | Apr 1971 | GB |
Entry |
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“Photoreactive Polymers. The Science and Technology of Resists”. By Arnost Reiser. Institute of Imaging Sciences. Chapter 5: Positive Resists Based on Diazonaphthoquinones. pp. 178-225. 1989. |