This relates generally to electronic devices, and more particularly, to display for use in electronic devices.
Electronic devices such as portable computers and other electronic equipment may have displays. Driver circuitry may be used to control operation of the displays. In some displays, such as liquid crystal displays, a layer such as a thin-film transistor layer may have a ledge portion on which a display driver integrated circuit is mounted. The minimum size needed for the ledge is at least partly dictated by the size of the driver integrated circuit. In some device designs, such as designs for compact portable devices, the inclusion of this type of driver ledge may give rise to a border region for a liquid crystal display that is larger than desired. In other displays, driver circuitry may be coupled to the display using a flexible printed circuit cable. The attachment structures needed to accommodate attachment of the flexible printed circuit cable to the display may consume more area than desired, particularly in compact devices and in arrangements where thin display borders are desired.
It would therefore be desirable to provide improved ways to interconnect displays with associated circuitry such as display driver circuitry.
An electronic device may include thin film active devices such as a display. The display may be an organic light-emitting diode display. The organic light-emitting diode display may, for example, have a substrate layer, a layer of organic light-emitting diode structures, and a layer of sealant.
Vias may be formed in a display substrate layer by laser drilling, etching, or other via hole formation techniques. The vias may be formed before completion of the display or after completion of the display. The vias may be at least partially filled with a conductive material such as metal using electroplating or other metal deposition techniques. The vias may be connected to contacts on the rear surface of the display. Traces on the rear surface of the display may be used to route signals from the vias to desired locations on the rear surface of the display. Components such as flexible printed circuits, integrated circuits, connectors, and other circuitry may be mounted to the contacts on the rear surface of the display. Conductive materials such as solder and conductive adhesive may be used in mounting components to the contacts.
The display may include top surface emission portions (e.g., portions of the display that include light emission structures located at the top surface of the display) and bottom surface emission portions (e.g., having light emission structures at the bottom surface of the display that emit light from the top surface through the substrate). Vias may be formed in regions of the display substrate layer under the top surface emission portions. The vias may be coupled to the bottom surface emission portions through traces formed on the bottom surface of the display substrate layer.
Vias in a display substrate layer may be formed by at least partially melting the display substrate layer and inserting wires, rods, or other conductive structures to form the vias. The display substrate layer may be subsequently cooled and excess via material may be removed.
Further features of the invention, its nature and various advantages will be more apparent from the accompanying drawings and the following detailed description.
Electronic devices may be provided with displays having vias. An illustrative electronic device of the type that may be provided with a display having vias is shown in
Housing 12 may be formed from plastic, metal, fiber-composite materials, glass, ceramic, other materials, or combinations of these materials. Display 14 may be a liquid crystal display, an organic light-emitting diode display, a plasma display, an electrochromic display, an electrophoretic ink display, an electrowetting display, or other suitable display. Examples in which display 14 is implemented as an organic light-emitting diode display are sometimes described herein as an example. This is, however, merely illustrative. Display 14 may be formed using any suitable display if desired. If desired, display 14 may be covered with a cover layer of glass or plastic or other protective display layer. In the example of
Internal components 16 may include printed circuits such as circuits on rigid printed circuit boards (e.g., fiberglass-filled epoxy printed circuit boards), flexible printed circuits (“flex circuits”) formed from flexible sheets of polymers such as polyimide, “rigid flex” printed circuits (e.g., printed circuit boards including rigid printed circuit portions with integral flex circuit tails), or other printed circuit structures. As an example, device 10 may include a printed circuit such as printed circuit board 18 on which one or more components such as electrical components 20 or other internal components 16 have been mounted. Components 20 may include switches, connectors, discrete components such as capacitors, resistors, and inductors, integrated circuits such as general purpose processors or application-specific integrated circuits, and other electronic components.
As shown in
Vias such as vias 28 may be formed in display 14. As shown in
Vias 28 may be formed by drilling and electroplating or using other via fabrication techniques. For example, via holes may be formed using a laser drill or a mechanical drill. As another example, etching tools may be used to etch via holes in display layers such as substrate layer 22.
Conductive material in vias 28 such as metal may be used to form signal paths in display 14. The signal paths of display 14 may, for example, be used to route signals between the circuitry of layer 24 (e.g., thin-film transistors, organic semiconductor circuitry, oxide transistors, etc.) and external circuitry such as display driver circuitry. Conductive materials used to form vias 28 may include copper, titanium, molybdenum, indium, palladium, rhodium, chromium, gold, silver, platinum, combinations of these materials, or other conductive materials. For example, gold-plated copper may be deposited to cover via holes. Conductive materials such as copper or other heavy metals that are used to form vias 28 may be coated with a protective layer of materials such as titanium, gold, or chromium to help prevent diffusion to neighboring materials (e.g., to protect neighboring materials from being contaminated).
In the example of
Vias 28 may convey control signals from display driver circuit 30 to circuitry such as transistor structures in light-emitting layer 24. By using vias 28 in display layers such as layers 22, 24, and/or 26, the need to form flex circuit attachments or driver circuit attachments to the front (upper/exterior) surface of display 14 may be avoided, allowing the edge regions surrounding the active display pixels in display 14 to be minimized. More area in display 14 may therefore be available for forming the array of pixels that displays images to a user (e.g., for forming an active region of display 14).
If desired, a jumper structure such as structure 38 may be attached to vias on the rear surface of substrate 22 and may be used to route signals between two or more different locations in display 14. Structure 38 may be formed from a printed circuit such as a flex circuit or rigid printed circuit board. Traces 40 in structures 38 may be used to help distribute signals for display 14. Any suitable signals may be routed through flex circuits or other jumper structures on the rear of display 14. For example, structures 38 may be used to carry gate line signals, data line signals, power supply signals, or other information or power signals associated with operating display 14. By implementing at least some of the interconnect resources associated with display 14 using structures located on the rear surface of display 14, more room may be made available on the front surface of display 14 for active pixel structures and the size of any inactive border regions on the front side of display 14 may be minimized.
Structure 38 may, if desired, be formed by depositing conductive materials on the rear of display 14. For example, deposition equipment may be used to deposit conductive materials such as copper, titanium, molybdenum, indium, palladium, rhodium, gold, silver, platinum, or other conductive materials on the rear surface of display 14. The conductive materials may be deposited using deposition techniques such as chemical vapor deposition (CVD), metalorganic chemical vapor deposition (MOCVD), physical vapor deposition (PVD), atomic layer deposition (ALD), or other desired deposition techniques. The conductive materials may be patterned (e.g., using lithography equipment) to form traces for routing display signals.
In the illustrative arrangement of
As shown in
Flex circuit 42 may be mounted underneath a central active region 33 as shown in
In some scenarios, it can be challenging to route display signals from circuitry in central active regions to peripheral inactive regions, especially when multiple routing paths are required within a limited amount of available routing space or area. To reduce the number of routing paths required between central regions and peripheral regions of display 14, vias may be formed within the central regions.
As shown in
Signal lines 52 and 54 may be coupled to vias 28A and 28B. Vias such as vias 28C may be formed within array 50 (e.g., at intermediate locations in the rows or columns of display pixels 48). Edge vias such as vias 28D that are formed in inactive region 31 may be used for handling signals associated with operating display pixels 48 (e.g., signals for lines 52 and/or 54). Vias 28A, 28B, 28C, and 28D may be formed within substrate layer 22 of display 14 or spanning multiple layers of display 14 (e.g., substrate layer 22, layer 24, and/or layer 26).
A cross-sectional side view of a portion of display 14 containing a via 28 is shown in
If desired, traces may be formed on the surface of substrate 22. As shown in
Vias such as via 28 may be formed to span multiple layers of a display.
Via hole formation equipment 70 such as laser drilling equipment, mechanical drilling equipment, etching equipment (e.g., chemical or physical etching equipment), field ionization beam equipment, or other via hole formation equipment may be used to form one or more via holes such as via hole 72 in substrate 22.
Following formation of via holes such as via hole 72, conductive material deposition equipment such as metal plating equipment 74 may be used to form conductive structures for vias 28 such as conductive sidewalls 60. Traces such as contact trace 62 may also be formed on lower surface 64 of substrate 22. If desired, traces such as trace 29 of
Organic light-emitting diode (OLED) fabrication equipment 76 or other display fabrication equipment may be used to complete display 14. For example, OLED fabrication equipment 76 may be used to form thin-film transistor structures and interconnects in layer 24. Layer 24 may include organic emissive material and light-emitting diode structures that are used to form display pixels such as display pixels 48 of
Additional processing equipment 78 may then be used to form electrical connections to additional circuitry 84. As shown in
Deposition equipment 102 may be used to deposit conductive layers 104 on the front and rear surfaces of substrate 22. Conductive layers 104 may be formed from any desired conductive material such as copper, titanium, molybdenum, indium, palladium, rhodium, gold, silver, platinum, or other conductive materials. If desired, optional protective layers 106 may be deposited over conductive layers 104 using deposition equipment 102. For example, it may be desirable to coat conductive layers 104 that are formed from copper or other heavy metals with protective layers 106, because copper and other heavy metals can potentially diffuse into and contaminate other materials such as silicon. Protective layers 106 may be formed from conductive or non-conductive materials. For example, protective layers 106 may be formed from a conductive titanium layer that helps block diffusion of the materials of conductive layers 104 into neighboring materials. As another example, protective layers 106 may be formed similar to sealant layer 26 of
In a subsequent step, via hole formation equipment 70 may be used to form opening 72 in substrate 22 and conductive layers 104 (and, if desired, any associated protective layers 106). Plating and lithography equipment 105 may then be used to form conductive structures for vias 28 (e.g., conductive sidewalls 60 and contacts 62) and traces such as traces 108. Lithography equipment 105 may be used to selectively remove portions of conductive layers 104 to form traces 108 and contacts 62. Traces 108 may be used to convey display signals for the display. Lithography equipment 105 may also be used to remove conductive materials that cover region 33 of substrate 22 (e.g., so that region 33 of substrate 22 is exposed). Region 33 may serve as an active display region.
Organic light-emitting diode fabrication equipment 76 may be subsequently used to complete active region 33 by forming layers 24 and 26. For example, OLED fabrication equipment 76 may be used to form thin-film transistor structures and organic emissive material and light-emitting diode structures in layer 24 and subsequently deposit a sealant layer that covers active region 26. If desired, sealant layer 26 may be deposited to extend over part or all of inactive region 31 (e.g., regions that do not include active pixels). Additional processing equipment 78 may then be used to form electrical connections to additional circuitry 84 using conductive material 82 (e.g., similar to
The examples of
In the example of
Via 28 of
As shown in
As shown in
If desired, display 14 may be provided with portions (regions) in which light is emitted through substrate 22 (sometimes referred to as bottom surface emission portions or bottom emission portions) and portions in which light is directly emitted by a light emission layer without passing through substrate 22 (sometimes referred to as top surface emission portions or top emission portions). In other words, bottom surface emission portions include light-emitting structures located at the bottom surface of display 14 that emit light through the top surface of display 14, whereas top surface emission portions include light-emitting structures located at the top surface of display 14 that emit light directly through the top surface.
Vias 28 may be formed on the rear surface of substrate 22 underneath top surface emission portion 24A. Vias 28 may be electrically connected to top surface emission region 24A, bottom surface emission region 24B, and printed circuit 32 (e.g., vias 28 may be used to convey display signals between top surface emission region 24A, bottom surface emission region 24B, and printed circuit 32). Vias 28 may be coupled to bottom surface emission region 24B via traces 29 formed on the rear surface of substrate 22.
If desired, display vias may be formed as conductive rods that are inserted through a display substrate.
Wire insertion equipment 144 may be used to insert wires 142 or other conductive structures such as conductive rods into melted substrate 22. Wires 142 may be formed from any desired conductive materials. As substrate 22 cools, the materials of substrate 22 may solidify around wires 142. If desired, substrate 22 may be cooled using cooling equipment (not shown). Excess portions of wires 142 may then be removed using cutting equipment 146 to form vias 28. OLED fabrication equipment such as equipment 76 of
The foregoing is merely illustrative of the principles of this invention and various modifications can be made by those skilled in the art without departing from the scope and spirit of the invention.
This application is a division of U.S. patent application Ser. No. 13/766,657, filed Feb. 13, 2013, which claims the benefit of U.S. provisional patent application No. 61/664,060 filed Jun. 25, 2012. This application claims the benefit of and claims priority to U.S. patent application Ser. No. 13/766,657, filed Feb. 13, 2013, and U.S. provisional patent application No. 61/664,060 filed Jun. 25, 2012, which are hereby incorporated by reference herein in their entireties.
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Child | 14866624 | US |