Number | Date | Country | Kind |
---|---|---|---|
5-060755 | Mar 1993 | JPX |
Number | Name | Date | Kind |
---|---|---|---|
4162185 | Coburn et al. | Jul 1979 | |
4180432 | Clark | Dec 1979 | |
5286344 | Blalock et al. | Feb 1994 |
Entry |
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"Reactive Ion Etching of Silicon and Silicon Dioxide In CF.sub.4 Plasmas Containing H.sub.2 or C.sub.2 F.sub.4 Additives"; J. Electrochem. Soc.; vol. 138, No. 9; Sep. 1991; Simko et al.; pp. 2748-2752. |