by dry-etching

Industry

CPC
H01L21/31116

This industry / category may be too specific. Please go to a parent level for more data

Parent Industries

HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Current Industry

H01L21/31116by dry-etching

Industries

Please log in for detailed analytics

Patents Grantslast 30 patents

Information Patent Grant
Nanosheet transistor
- Patent number 12,369,379
- Issue date Jul 22, 2025
- Adeia Semiconductor Solutions LLC
- Kangguo Cheng
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Transistor with dielectric spacers and field plate and method of fa...
- Patent number 12,369,380
- Issue date Jul 22, 2025
- NXP USA, INC.
- Darrell Glenn Hill
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of engraving a three-dimensional dielectric layer
- Patent number 12,369,340
- Issue date Jul 22, 2025
- Commissariat a l'Energie Atomique et Aux Energies Alternatives
- Nicolas Posseme
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method
- Patent number 12,368,031
- Issue date Jul 22, 2025
- HITACHI HIGH-TECH CORPORATION
- Kosa Hirota
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 12,368,050
- Issue date Jul 22, 2025
- Tokyo Electron Limited
- Masahiko Yokoi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Interconnect structure and methods of forming the same
- Patent number 12,368,076
- Issue date Jul 22, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yu-An Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Nitride semiconductor device and fabrication method therefor
- Patent number 12,369,346
- Issue date Jul 22, 2025
- Rohm Co., Ltd.
- Kenji Yamamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vertical semiconductor device and method for fabricating the same
- Patent number 12,363,902
- Issue date Jul 15, 2025
- SK hynix Inc.
- Hye-Hyeon Byeon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam etching chamber with etching by-product redistributor
- Patent number 12,362,154
- Issue date Jul 15, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Te-Hsien Hsieh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Nanosheet field-effect transistor device including multi-layer spac...
- Patent number 12,363,979
- Issue date Jul 15, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Wen-Kai Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device structures
- Patent number 12,362,229
- Issue date Jul 15, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Hsin-Che Chiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method
- Patent number 12,363,959
- Issue date Jul 15, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chih-Chuan Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Field effect transistor with negative capacitance dielectric struct...
- Patent number 12,363,978
- Issue date Jul 15, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chansyun David Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor devices
- Patent number 12,362,177
- Issue date Jul 15, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Po-Han Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for fabricating a strained structure and structure formed
- Patent number 12,356,674
- Issue date Jul 8, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Tsung-Lin Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High aspect ratio etch with infinite selectivity
- Patent number 12,354,880
- Issue date Jul 8, 2025
- Lam Research Corporation
- Leonid Belau
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
In-situ focus ring coating
- Patent number 12,354,842
- Issue date Jul 8, 2025
- Tokyo Electron Limited
- Minjoon Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Optical image capturing system, image capturing device and electron...
- Patent number 12,352,932
- Issue date Jul 8, 2025
- LARGAN PRECISION CO., LTD
- Lin-Yao Liao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for heating the top lid of a process chamber
- Patent number 12,354,844
- Issue date Jul 8, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Kuo-Shiou Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Contact structure for semiconductor device
- Patent number 12,354,913
- Issue date Jul 8, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yun-Yu Hsieh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Optical integrated circuit structure including edge coupling protec...
- Patent number 12,353,034
- Issue date Jul 8, 2025
- Taiwan Semiconductor Manufacturing Company Limited
- Chen-Hao Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method for manufacturing the same
- Patent number 12,356,646
- Issue date Jul 8, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Jung-Hao Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for treating substrate
- Patent number 12,347,694
- Issue date Jul 1, 2025
- Semes Co., Ltd.
- Dong-Hun Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Directional selective deposition
- Patent number 12,347,674
- Issue date Jul 1, 2025
- Applied Materials, Inc.
- Bhargav S. Citla
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming a semiconductor device
- Patent number 12,347,681
- Issue date Jul 1, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chia-Cheng Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and methods of formation
- Patent number 12,347,689
- Issue date Jul 1, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Hsu Ming Hsiao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vertical device having a protrusion source
- Patent number 12,349,435
- Issue date Jul 1, 2025
- Taiwan Semiconductor Manufacturing Company Limited
- De-Fang Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 12,347,645
- Issue date Jul 1, 2025
- Tokyo Electron Limited
- Shinya Morikita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching apparatus, plasma etching method using the same, and...
- Patent number 12,347,657
- Issue date Jul 1, 2025
- Samsung Electronics Co., Ltd.
- Jongchul Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method
- Patent number 12,347,670
- Issue date Jul 1, 2025
- STMicroelectronics (Crolles 2) SAS
- Delia Ristoiu
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SEMICONDUCTOR MEMORY DEVICE
- Publication number 20250240972
- Publication date Jul 24, 2025
- KIOXIA Corporation
- Hidenobu NAGASHIMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Composition For Forming Adhesive Film And Patterning Process
- Publication number 20250237955
- Publication date Jul 24, 2025
- Shin-Etsu Chemical Co., Ltd.
- Naoki KOBAYASHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE-TREATMENT METHOD AND SUBSTRATE-TREATMENT SYSTEM
- Publication number 20250239446
- Publication date Jul 24, 2025
- TOKYO ELECTRON LIMITED
- Isao GUNJI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Different Via Configurations for Different Via Interface Requirements
- Publication number 20250239527
- Publication date Jul 24, 2025
- Taiwan Semiconductor Manufacturing Co., LTD
- Shih-Che Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF ETCHING METAL OXIDE LAYER BY USING ATOMIC LAYER ETCHING
- Publication number 20250239460
- Publication date Jul 24, 2025
- Samsung Electronics Co., Ltd.
- Kunsu PARK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING GAS MIXTURE AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT...
- Publication number 20250239461
- Publication date Jul 24, 2025
- Samsung Electronics Co., Ltd.
- Changgil SON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
- Publication number 20250233016
- Publication date Jul 17, 2025
- Taiwan Semiconductor Manufacturing company Ltd.
- JHENG-HONG JIANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE STRUCTURE AND METHODS OF FORMING THE SAME
- Publication number 20250234594
- Publication date Jul 17, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chao-Hsuan CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Contact Structures in Semiconductor Devices
- Publication number 20250234602
- Publication date Jul 17, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chi-Cheng HUNG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Compound For Forming Metal-Containing Film, Composition For Forming...
- Publication number 20250231485
- Publication date Jul 17, 2025
- Shin-Etsu Chemical Co., Ltd.
- Nobuhiro NAGAMACHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITION FOR FORMING ORGANIC FILM, METHOD FOR FORMING ORGANIC FI...
- Publication number 20250231487
- Publication date Jul 17, 2025
- Shin-Etsu Chemical Co., Ltd.
- Keisuke NIIDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD, METHOD FOR PRODUCING SEMICONDUCTOR DEVICE, ETCHING...
- Publication number 20250232983
- Publication date Jul 17, 2025
- Central Glass Company, Limited
- Yuki FUKUI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
IN SITU DECLOGGING IN PLASMA ETCHING
- Publication number 20250226233
- Publication date Jul 10, 2025
- LAM RESEARCH CORPORATION
- Zhongkui TAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MANUFACTURING STACK AND METHOD FOR MANUFACTURING SEMICON...
- Publication number 20250226234
- Publication date Jul 10, 2025
- SEMICONDUCTOR ENERGY LABORATORY CO., LTD.
- Ryota HODO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Contact Structure For Semiconductor Device
- Publication number 20250226263
- Publication date Jul 10, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yun-Yu HSIEH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD FOR MODULATING IONS AND RADICAL SPECIES IN PLA...
- Publication number 20250226184
- Publication date Jul 10, 2025
- Applied Materials, Inc.
- THAI CHENG CHUA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING DEVICE ISOLATION LAYER AND METHOD OF MANUFA...
- Publication number 20250218862
- Publication date Jul 3, 2025
- Samsung Electronics Co., Ltd.
- Yunboo JEONG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Composition For Forming Silicon-Containing Anti-Reflective Film And...
- Publication number 20250218768
- Publication date Jul 3, 2025
- Shin-Etsu Chemical Co., Ltd.
- Naoki KOBAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MANUFACTURING SEMICONDUCTOR MEMORY DEVICE AND SEMICONDUC...
- Publication number 20250220909
- Publication date Jul 3, 2025
- KIOXIA Corporation
- Hirotaka TSUDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE STRESS MANAGEMENT USING DIRECT SELECTIVE AREA PROCESSING
- Publication number 20250218788
- Publication date Jul 3, 2025
- Applied Materials, Inc.
- Morgan EVANS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TREATING SILICON NITRIDE BASED DIELECTRIC FILMS
- Publication number 20250218763
- Publication date Jul 3, 2025
- Applied Materials, Inc.
- Dongjoon KIM
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ETCHING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20250215320
- Publication date Jul 3, 2025
- TOKYO ELECTRON LIMITED
- Ryo MATSUBARA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
SEMICONDUCTOR DEVICE AND METHODS OF FABRICATION THEREOF
- Publication number 20250220942
- Publication date Jul 3, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yi-Chen LO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD
- Publication number 20250218789
- Publication date Jul 3, 2025
- TES CO., LTD.
- Bongsoo KWON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20250210370
- Publication date Jun 26, 2025
- TOKYO ELECTRON LIMITED
- Fumiya TAKATA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING ETCHANT COMPOSI...
- Publication number 20250210372
- Publication date Jun 26, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chia-Chien KUANG
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
SEMICONDUCTOR DEVICE WITH HELMET STRUCTURE BETWEEN TWO SEMICONDUCTO...
- Publication number 20250212505
- Publication date Jun 26, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Kuo-Cheng CHING
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for Forming a Semiconductor Structure
- Publication number 20250212494
- Publication date Jun 26, 2025
- IMEC vzw
- Serge Biesemans
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-LAYER LINE STRUCTURE
- Publication number 20250210524
- Publication date Jun 26, 2025
- DAI NIPPON PRINTING CO., LTD.
- Hiroshi Kudo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND STRUCTURES FOR IMPROVING ETCH PROFILE OF METALLIC LAYER
- Publication number 20250210374
- Publication date Jun 26, 2025
- TOKYO ELECTRON LIMITED
- Christopher CATANO
- H01 - BASIC ELECTRIC ELEMENTS

by dry-etching

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Nanosheet transistor

Transistor with dielectric spacers and field plate and method of fa...

Method of engraving a three-dimensional dielectric layer

Plasma processing method

Plasma processing method and plasma processing apparatus

Interconnect structure and methods of forming the same

Nitride semiconductor device and fabrication method therefor

Vertical semiconductor device and method for fabricating the same

Ion beam etching chamber with etching by-product redistributor

Nanosheet field-effect transistor device including multi-layer spac...

Semiconductor device structures

Semiconductor device and method

Field effect transistor with negative capacitance dielectric struct...

Method of manufacturing semiconductor devices

Method for fabricating a strained structure and structure formed

High aspect ratio etch with infinite selectivity

In-situ focus ring coating

Optical image capturing system, image capturing device and electron...

System and method for heating the top lid of a process chamber

Contact structure for semiconductor device

Optical integrated circuit structure including edge coupling protec...

Semiconductor device and method for manufacturing the same

Method and apparatus for treating substrate

Directional selective deposition

Method of forming a semiconductor device

Semiconductor device and methods of formation

Vertical device having a protrusion source

Substrate processing method and substrate processing apparatus

Plasma etching apparatus, plasma etching method using the same, and...

Etching method

Patents Applicationslast 30 patents

SEMICONDUCTOR MEMORY DEVICE

Composition For Forming Adhesive Film And Patterning Process

SUBSTRATE-TREATMENT METHOD AND SUBSTRATE-TREATMENT SYSTEM

Different Via Configurations for Different Via Interface Requirements

METHOD OF ETCHING METAL OXIDE LAYER BY USING ATOMIC LAYER ETCHING

ETCHING GAS MIXTURE AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT...

SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME

SEMICONDUCTOR DEVICE STRUCTURE AND METHODS OF FORMING THE SAME

Contact Structures in Semiconductor Devices

Compound For Forming Metal-Containing Film, Composition For Forming...

COMPOSITION FOR FORMING ORGANIC FILM, METHOD FOR FORMING ORGANIC FI...

ETCHING METHOD, METHOD FOR PRODUCING SEMICONDUCTOR DEVICE, ETCHING...

IN SITU DECLOGGING IN PLASMA ETCHING

METHOD FOR MANUFACTURING STACK AND METHOD FOR MANUFACTURING SEMICON...

Contact Structure For Semiconductor Device

APPARATUS AND METHOD FOR MODULATING IONS AND RADICAL SPECIES IN PLA...

METHOD OF MANUFACTURING DEVICE ISOLATION LAYER AND METHOD OF MANUFA...

Composition For Forming Silicon-Containing Anti-Reflective Film And...

METHOD FOR MANUFACTURING SEMICONDUCTOR MEMORY DEVICE AND SEMICONDUC...

SUBSTRATE STRESS MANAGEMENT USING DIRECT SELECTIVE AREA PROCESSING

TREATING SILICON NITRIDE BASED DIELECTRIC FILMS

ETCHING METHOD AND PLASMA PROCESSING APPARATUS

SEMICONDUCTOR DEVICE AND METHODS OF FABRICATION THEREOF

SUBSTRATE PROCESSING METHOD

ETCHING METHOD AND PLASMA PROCESSING APPARATUS

METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING ETCHANT COMPOSI...

SEMICONDUCTOR DEVICE WITH HELMET STRUCTURE BETWEEN TWO SEMICONDUCTO...

Method for Forming a Semiconductor Structure

MULTI-LAYER LINE STRUCTURE

METHODS AND STRUCTURES FOR IMPROVING ETCH PROFILE OF METALLIC LAYER