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H01L21/31116

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HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

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H01L21/31116by dry-etching

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Epitaxial high-K etch stop layer for backside reveal integration
- Patent number 12,272,601
- Issue date Apr 8, 2025
- Tokyo Electron Limited
- Robert D. Clark
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of forming semiconductor devices
- Patent number 12,272,555
- Issue date Apr 8, 2025
- Samsung Electronics Co., Ltd.
- Jinyoung Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Oxygen and iodine-containing hydrofluorocarbon compound for etching...
- Patent number 12,272,562
- Issue date Apr 8, 2025
- L'Aire Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés G...
- Fabrizio Marchegiani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for preparing semiconductor structure
- Patent number 12,272,565
- Issue date Apr 8, 2025
- NANYA TECHNOLOGY CORPORATION
- Wei-Chuan Fang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor structure and method for forming the same
- Patent number 12,274,081
- Issue date Apr 8, 2025
- United Microelectronics Corp.
- Ming-Hua Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method and etching apparatus
- Patent number 12,272,541
- Issue date Apr 8, 2025
- Tokyo Electron Limited
- Naoki Shindo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resonant filter for solid state RF impedance matching network
- Patent number 12,272,522
- Issue date Apr 8, 2025
- ASM America, Inc.
- Imran Ahmed Bhutta
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vertical memory devices
- Patent number 12,268,003
- Issue date Apr 1, 2025
- Samsung Electronics Co., Ltd.
- Kohji Kanamori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and methods of manufacture
- Patent number 12,266,576
- Issue date Apr 1, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yen-Ting Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective barrier metal etching
- Patent number 12,266,537
- Issue date Apr 1, 2025
- Applied Materials, Inc.
- Jonathan Shaw
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing semiconductor device using etchant composi...
- Patent number 12,266,538
- Issue date Apr 1, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chia-Chien Kuang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor devices
- Patent number 12,266,539
- Issue date Apr 1, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Ru-Gun Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method
- Patent number 12,266,541
- Issue date Apr 1, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Sung-En Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device with source/drain contact formed using bottom-...
- Patent number 12,266,688
- Issue date Apr 1, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Sung-Li Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor structure having buried word lines
- Patent number 12,267,993
- Issue date Apr 1, 2025
- NANYA TECHNOLOGY CORPORATION
- Min-Chung Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for fabricating layer structure having target topological pr...
- Patent number 12,266,540
- Issue date Apr 1, 2025
- ASM IP Holding B.V.
- Eiichiro Shiba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective etch of a substrate
- Patent number 12,261,049
- Issue date Mar 25, 2025
- Applied Materials , Inc.
- David Thompson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing with material modification and removal
- Patent number 12,261,054
- Issue date Mar 25, 2025
- Tokyo Electron Limited
- Ivo Otto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device with reduced loading effect
- Patent number 12,261,085
- Issue date Mar 25, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Wei-Lun Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
3D NAND memory device and method of forming the same
- Patent number 12,262,539
- Issue date Mar 25, 2025
- Yangtze Memory Technologies Co., Ltd.
- Yali Song
- G11 - INFORMATION STORAGE
Information Patent Grant
Multi-layer hardmask for defect reduction in EUV patterning
- Patent number 12,261,044
- Issue date Mar 25, 2025
- Lam Research Corporation
- Bhaskar Nagabhirava
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing with selective etching
- Patent number 12,261,053
- Issue date Mar 25, 2025
- Tokyo Electron Limited
- Ivo Otto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Contact over active gate structures with etch stop layers for advan...
- Patent number 12,261,122
- Issue date Mar 25, 2025
- Intel Corporation
- Atul Madhavan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-layer line structure
- Patent number 12,255,145
- Issue date Mar 18, 2025
- Dai Nippon Printing Co., Ltd.
- Hiroshi Kudo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inner spacer structures for gate-all-around field effect transistors
- Patent number 12,255,249
- Issue date Mar 18, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Mrunal Abhijith Khaderbad
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor structure and manufacturing method thereof
- Patent number 12,255,095
- Issue date Mar 18, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yu-Kai Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Manufacturing method of memory device using mask patterns
- Patent number 12,249,516
- Issue date Mar 11, 2025
- SK hynix Inc.
- Kyung Min Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Carbon based depositions used for critical dimension control during...
- Patent number 12,249,514
- Issue date Mar 11, 2025
- Lam Research Corporation
- Jon Henri
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method and etching apparatus
- Patent number 12,249,515
- Issue date Mar 11, 2025
- Tokyo Electron Limited
- Shigeru Tahara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Protection structures for bonded wafers
- Patent number 12,243,772
- Issue date Mar 4, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Ssu-Chiang Weng
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SELECTIVE HARDMASK ETCH FOR SEMICONDUCTOR PROCESSING
- Publication number 20250118557
- Publication date Apr 10, 2025
- Applied Materials, Inc.
- Sonam Dorje Sherpa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING DEVICE
- Publication number 20250118566
- Publication date Apr 10, 2025
- HITACHI HIGH-TECH CORPORATION
- Junya Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MICROWAVE HIGH-DENSITY PLASMA FOR SELECTIVE ETCH
- Publication number 20250118536
- Publication date Apr 10, 2025
- Applied Materials, Inc.
- Yi-Hsuan Hsiao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING SAME
- Publication number 20250120083
- Publication date Apr 10, 2025
- KIOXIA Corporation
- Shinya ARAI
- G11 - INFORMATION STORAGE
Information Patent Application
MANUFACTURING METHOD OF FIELD EFFECT TRANSISTOR STRUCTURE
- Publication number 20250120171
- Publication date Apr 10, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chun Hsiung Tsai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCT...
- Publication number 20250118567
- Publication date Apr 10, 2025
- Kokusai Electric Corporation
- Kenshiro USUKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REDUCED TEMPERATURE ETCHING OF DOPED SILICON OXIDE
- Publication number 20250118568
- Publication date Apr 10, 2025
- LAM RESEARCH CORPORATION
- Jonathan CHURCH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CARBON REPLENISHMENT OF SILICON-CONTAINING MATERIALS TO REDUCE THIC...
- Publication number 20250112054
- Publication date Apr 3, 2025
- Applied Materials, Inc.
- Yuriy Shusterman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LINE EDGE ROUGHNESS (LER) IMPROVEMENT OF RESIST PATTERNS
- Publication number 20250112056
- Publication date Apr 3, 2025
- Applied Materials, Inc.
- Sonam Dorje Sherpa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FORMING SEMICONDUCTOR DEVICE STRUCTURE WITH PROTECTION L...
- Publication number 20250113519
- Publication date Apr 3, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Kung-Pin CHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EPI HEIGHT REDUCTION FOR IMPROVED TRANSISTOR PERFORMANCE
- Publication number 20250113564
- Publication date Apr 3, 2025
- Intel Corporation
- Leonard Guler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MANUFACTURING METHOD OF CMOS ACOUSTIC PRESSURE SENSOR
- Publication number 20250112053
- Publication date Apr 3, 2025
- CHUAN-WEI WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR STRUCTURE AND METHOD FOR FORMING THE SAME
- Publication number 20250107130
- Publication date Mar 27, 2025
- UNITED MICROELECTRONICS CORP.
- Ming-Hua Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR MANUFACTURING METHOD
- Publication number 20250105019
- Publication date Mar 27, 2025
- Taiwan Semiconductor Manufacturing company Ltd.
- HAN-YU LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MANUFACTURING METHOD OF SEMICONDUCTOR MEMORY DEVICE
- Publication number 20250105018
- Publication date Mar 27, 2025
- SK HYNIX INC.
- Seung Cheol LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF FILLING TRENCHES ON SUBSTRATE SURFACE
- Publication number 20250104999
- Publication date Mar 27, 2025
- ASM IP HOLDING B.V.
- Alexey Remnev
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
REWORK OF METAL-CONTAINING PHOTORESIST
- Publication number 20250093781
- Publication date Mar 20, 2025
- LAM RESEARCH CORPORATION
- Daniel PETER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD
- Publication number 20250095981
- Publication date Mar 20, 2025
- Hitachi High-Tech Corporation
- Jiahui LIU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR STRUCTURES AND METHOD FOR MANUFACTURING THE SAME
- Publication number 20250096004
- Publication date Mar 20, 2025
- Taiwan Semiconductor Manufacturing company Ltd.
- HSIN-YUAN LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20250095991
- Publication date Mar 20, 2025
- TOKYO ELECTRON LIMITED
- Koki MUKAIYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20250096006
- Publication date Mar 20, 2025
- TOKYO ELECTRON LIMITED
- Rin SASAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Composition For Forming Organic Film, Method For Forming Organic Fi...
- Publication number 20250095989
- Publication date Mar 20, 2025
- Shin-Etsu Chemical Co., Ltd.
- Keisuke NIIDA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
TIN OXIDE MANDRELS IN PATTERNING
- Publication number 20250087498
- Publication date Mar 13, 2025
- LAM RESEARCH CORPORATION
- Jengyi Yu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Compound For Forming Metal-Containing Film, Composition For Forming...
- Publication number 20250087495
- Publication date Mar 13, 2025
- Shin-Etsu Chemical Co., Ltd.
- Shohei Iwamori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
- Publication number 20250089332
- Publication date Mar 13, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Zhi-Qiang WU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CIRCULAR-SHAPED RESISTOR
- Publication number 20250089347
- Publication date Mar 13, 2025
- International Business Machines Corporation
- Ashim Dutta
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, PR...
- Publication number 20250087493
- Publication date Mar 13, 2025
- Kokusai Electric Corporation
- Ryota UENO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LAMINATED SUBSTRATE, MANUFACTURING METHOD THEREFOR, AND LIQUID DISC...
- Publication number 20250074054
- Publication date Mar 6, 2025
- Canon Kabushiki Kaisha
- YUKI KOMORI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIELECTRIC PLASMA ETCHING USING C2H2F2
- Publication number 20250079127
- Publication date Mar 6, 2025
- L'air Liquide, Societe Anonyme Pour L'Etude et L'Exploitation Des Procedes Ge...
- Nathan STAFFORD
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods for Extreme Ultraviolet (EUV) Resist Patterning Development
- Publication number 20250076771
- Publication date Mar 6, 2025
- TOKYO ELECTRON LIMITED
- Yun Han
- H01 - BASIC ELECTRIC ELEMENTS

by dry-etching

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Epitaxial high-K etch stop layer for backside reveal integration

Methods of forming semiconductor devices

Oxygen and iodine-containing hydrofluorocarbon compound for etching...

Method for preparing semiconductor structure

Semiconductor structure and method for forming the same

Etching method and etching apparatus

Resonant filter for solid state RF impedance matching network

Vertical memory devices

Semiconductor device and methods of manufacture

Selective barrier metal etching

Method for manufacturing semiconductor device using etchant composi...

Method of manufacturing semiconductor devices

Semiconductor device and method

Semiconductor device with source/drain contact formed using bottom-...

Semiconductor structure having buried word lines

Method for fabricating layer structure having target topological pr...

Selective etch of a substrate

Substrate processing with material modification and removal

Semiconductor device with reduced loading effect

3D NAND memory device and method of forming the same

Multi-layer hardmask for defect reduction in EUV patterning

Substrate processing with selective etching

Contact over active gate structures with etch stop layers for advan...

Multi-layer line structure

Inner spacer structures for gate-all-around field effect transistors

Semiconductor structure and manufacturing method thereof

Manufacturing method of memory device using mask patterns

Carbon based depositions used for critical dimension control during...

Etching method and etching apparatus

Protection structures for bonded wafers

Patents Applicationslast 30 patents

SELECTIVE HARDMASK ETCH FOR SEMICONDUCTOR PROCESSING

PLASMA PROCESSING METHOD AND PLASMA PROCESSING DEVICE

MICROWAVE HIGH-DENSITY PLASMA FOR SELECTIVE ETCH

SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING SAME

MANUFACTURING METHOD OF FIELD EFFECT TRANSISTOR STRUCTURE

METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCT...

REDUCED TEMPERATURE ETCHING OF DOPED SILICON OXIDE

CARBON REPLENISHMENT OF SILICON-CONTAINING MATERIALS TO REDUCE THIC...

LINE EDGE ROUGHNESS (LER) IMPROVEMENT OF RESIST PATTERNS

METHOD FOR FORMING SEMICONDUCTOR DEVICE STRUCTURE WITH PROTECTION L...

EPI HEIGHT REDUCTION FOR IMPROVED TRANSISTOR PERFORMANCE

MANUFACTURING METHOD OF CMOS ACOUSTIC PRESSURE SENSOR

SEMICONDUCTOR STRUCTURE AND METHOD FOR FORMING THE SAME

SEMICONDUCTOR MANUFACTURING METHOD

MANUFACTURING METHOD OF SEMICONDUCTOR MEMORY DEVICE

METHODS OF FILLING TRENCHES ON SUBSTRATE SURFACE

REWORK OF METAL-CONTAINING PHOTORESIST

PLASMA PROCESSING METHOD

SEMICONDUCTOR STRUCTURES AND METHOD FOR MANUFACTURING THE SAME

ETCHING METHOD AND PLASMA PROCESSING APPARATUS

ETCHING METHOD AND PLASMA PROCESSING APPARATUS

Composition For Forming Organic Film, Method For Forming Organic Fi...

TIN OXIDE MANDRELS IN PATTERNING

Compound For Forming Metal-Containing Film, Composition For Forming...

SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF

CIRCULAR-SHAPED RESISTOR

PROCESSING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, PR...

LAMINATED SUBSTRATE, MANUFACTURING METHOD THEREFOR, AND LIQUID DISC...

DIELECTRIC PLASMA ETCHING USING C2H2F2

Methods for Extreme Ultraviolet (EUV) Resist Patterning Development