Number | Date | Country | Kind |
---|---|---|---|
3-145660 | May 1991 | JPX |
Number | Name | Date | Kind |
---|---|---|---|
4450042 | Purdes | May 1984 | |
4490209 | Hartman | Dec 1984 | |
4502915 | Carter et al. | Mar 1985 | |
4799991 | Dockrey | Jan 1989 | |
4855017 | Douglas | Aug 1989 | |
4971653 | Powell et al. | Nov 1990 | |
5007982 | Tsou | Apr 1991 |
Number | Date | Country |
---|---|---|
0474244 | Mar 1992 | EPX |
Entry |
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R. A. Morgan, Plasma Etching in Semiconductor Fabrication, Elsevier, New York, 1985, pp. 75-80. |
VLSI Technology, 1981, Chapter 8, pp. 303-345, C. J. Mogab, "Dry Etching", S. M. Sze, ed. |