Claims
- 1. An electrode structure of a display panel comprising:
a plurality of electrodes formed on a substrate constituting the display panel, the electrodes including display electrode portions provided in almost parallel in a central part of the substrate and oblique lead electrode portions converged in a predetermined number for each block from the display electrode portions to reach terminal portions at an end of the substrate; and a dummy electrode provided between two oblique lead electrode portions extending in different directions in a block boundary portion, for limiting a flow of an etching solvent into the block boundary portion during etching when the electrodes are formed.
- 2. The electrode structure according to claim 1, wherein the dummy electrode is an almost V-shaped electrode formed along the two oblique lead electrode portions extending in different directions in the block boundary portion.
- 3. The electrode structure according to claim 1, wherein the width of the dummy electrode is larger than that of the electrodes.
- 4. The electrode structure according to claim 2, wherein the width of the dummy electrode is larger than that of the electrodes.
- 5. The electrode structure according to claim 1, wherein the dummy electrode comprises a plurality of electrodes arranged in the direction of the flow of the etching solvent.
- 6. The electrode structure according to claim 2, wherein the dummy electrode comprises a plurality of electrodes arranged in the direction of the flow of the etching solvent.
- 7. The electrode structure according to claim 1, wherein a coupling portion for coupling the dummy electrode to at least one of the oblique lead electrode portions is further formed on the same substrate.
- 8. A method of forming electrodes of a display panel, comprising the steps of:
forming an electrode material layer on a substrate; forming a resist pattern for forming a plurality of display electrodes including display electrode portions arranged in almost parallel on a central part of the substrate and oblique lead electrode portions converged in a predetermined number for each block from the display electrode portions to reach terminal portions at an end of the substrate; simultaneously forming a resist pattern for limiting a flow of an etching solvent into a block boundary portion between the resist patterns for forming the electrodes which traces correspond to two oblique lead electrode portions extending in different directions in the block boundary portion; and then carrying out etching to form the electrodes.
- 9. The method according to claim 8, wherein the resist pattern for limiting the flow of the etching solvent is an almost V-shaped pattern formed along the trances of the resist pattern corresponding to the two oblique lead electrodes extending in different directions in the block boundary portion.
- 10. The method according to claim 8, wherein the width of the resist pattern for limiting the flow of the etching solvent is larger than that of the resist pattern for forming the electrodes.
- 11. The method according to claim 9, wherein the width of the resist pattern for limiting the flow of the etching solvent is larger than that of the resist pattern for forming the electrodes.
- 12. The method according to claim 8, wherein the resist pattern for limiting the flow of the etching solvent comprises a plurality of resist patterns arranged in the direction of the flow of the etching solvent.
- 13. The method according to claim 9, wherein the resist pattern for limiting the flow of the etching solvent comprises a plurality of resist patterns arranged in the direction of the flow of the etching solvent.
- 14. A method of manufacturing a display panel having a plurality of display electrodes including electrode portions provided at an equal pitch and electrode terminal portions provided partially at an unequal pitch on an substrate, comprising the steps of:
forming an electrode material layer on the substrate; forming a resist film corresponding to a pattern of the display electrodes to be formed on the electrode material layer and also a resist film having a pattern for limiting a flow of a resist liquid into a region where the pitch of the electrode terminal portions are large; and carrying out etching.
Priority Claims (1)
Number |
Date |
Country |
Kind |
2000-178872 |
Jun 2000 |
JP |
|
CROSS-REFERENCE TO RELATED APPLICATION
[0001] This application is related to Japanese Patent Application No. 2000-178872 filed on Jun. 14, 2000, whose priority is claimed under 35 USC § 119, the disclosure of which is incorporated by reference in its entirety.