The present application relates to the field of display technologies, and especially relates to an electrodeposition apparatus and a method for electrodeposition.
Nanomaterials refer to materials with structural units of which dimension ranging from 1 nanometer to 100 nanometers. Since the dimension of nanomaterials has approached the coherence length of electrons, properties of nanomaterials have greatly changed due to self-organization caused by strong coherence. Moreover, the dimension of nanomaterials approaches the wavelength of light, and nanomaterials have volume effects, surface effects, quantum dimension effects, and macroscopic quantum tunneling effects. Therefore, nanomaterials have unique properties in terms of melting point, magnetism, optics, thermal conductivity, and electrical conductivity properties. Nanomaterials have important application value in many fields.
Quantum dots (QD) are a typical nanomaterial. The quantum dots have characteristics of small dimension, high energy conversion efficiency and the like. The quantum dots have great application in the fields of lighting, display technology, solar cells, optical switches, sensing, detection and the like. Moreover, the quantum dots also have characteristics of high brightness, narrow emission, adjustable luminous color, and good stability, which is in line with the development trend of ultra-thin, high-brightness, high color gamut, and high color saturation in the field of display technology. Therefore, the quantum dots have become the most potential new display technology material in recent years.
The development of patterning technology for nanomaterials such as the quantum dots is of great value for their applications in LED, display technology, solar cells, optical switches, sensing, detection and other fields. At present, patterning technologies of the quantum dots mainly include a photolithography process and an inkjet printing. However, the photolithography and the inkjet printing are faced with the problems such as low luminous efficiency, poor stability and repeatability, and long processing time, respectively.
Embodiments of the present application provide an electrodeposition apparatus to solve a technical problem existing in background technology mentioned above.
In one aspect, in order to solve the technical problem mentioned above, embodiments of the present application provide an electrodeposition apparatus including a laminating mechanism, a dispensing platform, a liquid-feed device, a power supply device, and a control module.
The dispensing platform includes a first surface, and is configured to fix a first electrode substrate on the first surface.
The laminating mechanism includes a second surface opposite to the first surface, and is configured to fix a second electrode substrate on the second surface.
The control module is electrically connected to the laminating mechanism, the liquid-feed device, and the power supply device, respectively. The control module is configured to control a movement of the laminating mechanism so that a gap being uniform is defined between the first surface and the second surface.
The control module is further configured to control the liquid-feed device to inject a nanoparticle solution being preset into the gap, and control the power supply device to apply voltages to the first electrode substrate and the second electrode substrate, so as to perform an electrodeposition process on the first electrode substrate and/or the second electrode substrate. The nanoparticle solution includes nanoparticles with charges.
In another aspect, in order to solve the technical problem mentioned above, embodiments of the present application further provide a method for electrodeposition including the following steps:
Embodiments of the present application provide the electrodeposition apparatus and the method for electrodeposition. The control module controls the movement of the laminating mechanism, so that the gap is defined between the first surface of the dispensing platform and the second surface of the laminating mechanism. The control module further controls the liquid-feed device to inject the nanoparticle solution being preset into the gap, and controls the power supply device to apply voltages to the first electrode substrate fixed on the first surface and the second electrode substrate fixed on the second surface, so as to perform the electrodeposition process on the first electrode substrate and/or the second electrode substrate. Process of electrodeposition patterning of nanoparticles is realized, so that patterned nanoparticle films with high-quality can be obtained efficiently and quickly.
In order to more clearly illustrate technical solutions in embodiments of the present application, the drawings needed to be used in the description of the embodiments are briefly introduced below. Obviously, the drawings in the following description are only some embodiments of the present application. For those skilled in the art, other drawings can also be obtained based on these drawings without exerting creative efforts.
Annotations in each drawing are as follows:
The technical solutions in the embodiments of the present application are clearly and completely described below in conjunction with the drawings in the embodiments of the present application. Obviously, the embodiments described are only a part of the embodiments of the present application, rather than all the embodiments. Based on the embodiments in the present application, all other embodiments obtained by those skilled in the art without creative works should be deemed as falling within the claims of the present application.
In the description of the present application, it should to be understood that the terms such as “longitudinal”, “lateral”, “length”, “width”, “upper”, “lower”, “front”, “rear”, “left”, “right”, “vertical”, “horizontal”, and etc. indicate orientation or positional relationship based on the orientation or positional relationship shown in the drawings, and is merely for the convenience of the description of the present application and the simplified description, rather than indicating or implying that the device or component referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore can not be construed as limiting to the present application. In addition, the terms “first” and “second” are used for descriptive purposes only and cannot be understood as indicating or implying relative importance or implying the number of technical features indicated. Thus, features defined as “first” and “second” may explicitly or implicitly include one or more of the described features. In the description of the present application, the meaning of “plurality” is two or more unless specifically defined otherwise. In the present application, “/” means “or”.
The present application may repeat reference numerals and/or reference letters in different examples. Such repetition is for the purpose of simplification and clarity, and does not indicate the relationship between the various embodiments and/or settings discussed.
Among related technologies, the development of patterning technology for nanomaterials such as quantum dots (QD) is of great value for their applications in LED, display technology, solar cells, optical switches, sensing, detection and other fields. At present, QD patterning technologies mainly include inkjet printing and photolithography. Heating and UV curing of photolithography process, as well as washing of developer, affect stability of the quantum dots. Requirements for ink of inkjet printing process is too high, and there is no mature and stable mass production material system at present. Meanwhile, reproducibilities of the inkjet printing and the photolithography are poor, and the preparation times are too long, which greatly restrict the development and application of patterning technology for nanomaterials such as QD.
In order to solve a technical problem mentioned above, embodiments of the present application provide an electrodeposition apparatus and a method for electrodeposition, which are described in detail below, respectively.
Please refer to
The dispensing platform 10 includes a first surface. The dispensing platform 10 is configured to fix a first electrode substrate on the first surface. The laminating mechanism 20 includes a second surface disposed opposite to the first surface. The laminating mechanism 20 is configured to fix the second electrode substrate on the second surface.
The control module 40 is electrically connected to the laminating mechanism 20, the liquid-feed device 30, and the power supply device, respectively. The control module 40 is configured to control a movement of the laminating mechanism 20, so that a uniform gap is defined between the second surface and the first surface. The control module 40 is further configured to control the liquid-feed device 30 to inject a nanoparticle solution being preset into the gap, and control the power supply device to apply voltages to the first electrode substrate and the second electrode substrate, so as to perform an electrodeposition process on the first electrode substrate and/or the second electrode substrate. The nanoparticle solution includes nanoparticles with charges.
In this embodiment, the nanoparticle solution provided by this embodiment includes a solvent and nanoparticles dispersed in the solvent. Surfactant ligands are bound to surfaces of the nanoparticles. The solvent may be a polar solvent or a non-polar solvent. In order to facilitate subsequent volatilization to form a film, the solvent may be a colorless, transparent, low-boiling point, and easily volatile organic solvent or inorganic solvent.
Wherein, the nanoparticles used to make a nanoparticle film may be selected from nanoparticles such as non-metallic inorganic nanoparticles, metal nanoparticles, colloidal nanosheets, colloidal nanorods, and the like. Optionally, the nanoparticles may be quantum dots. The material of the quantum dots involved in the present application may be selected from core-shell quantum dots. Wherein, a luminescent core of the core-shell quantum dots may be selected from one of ZnCdSe2, InP, Cd2Se, CdSe, Cd2SeTe, and InAs. An inorganic protective shell may be selected from at least one of CdS, ZnSe, ZnCdS2, ZnS, and ZnO. The material of the quantum dots may also be selected from composite quantum dots with high-stability, such as quantum dot structures loaded by hydrogel, CdSe—SiO2, and the like. The material of the quantum dots may be perovskite quantum dots and the like. It can be understood that the material of the quantum dots used in the present application is not limited to the above types. Hereinafter, the quantum dots are used as an example of the nanoparticles of the present application, but the nanoparticles of the present application are not limited to the quantum dots.
Surfactants provided in this embodiment may be selected from cationic surfactants, anionic surfactants, zwitterionic surfactants, and some nonionic surfactants that are easily ionized in the solvent. The cationic surfactants may be amine salt cationic surfactants such as primary amine salts, secondary amine salts, tertiary amine salt surfactants and the like, quaternary ammonium salt cationic surfactants, heterocyclic cationic surfactants including a nitrogen-containing heterocyclic ring such as a morpholine ring, a pyridine ring, a imidazole ring, a piperazine ring and a quinoline ring, or a onium salt cationic surfactant such as a onium salt, a sulfonium salt, an iodonium salt, a phosphonium salt compound and the like. Specifically, the cationic surfactants may be, for example, alkyltrimethylammonium chloride, alkylbenzyldimethylammonium chloride, dialkyldimethylammonium chloride, trimethyldodecyl ammonium chloride, cetylpyridinium chloride or bromide, dodecylpyridinium bromide, cetylpyridinium chloride, cetylpyridinium bromide and the like.
The anionic surfactants include four categories, which include carboxylates, sulfonates, sulfate ester salts, and phosphate ester salts. Carboxylate anionic surfactants include potassium, sodium, ammonium salt, and triethanolamine salt of higher fatty acids. For example, alkali metal soaps (monovalent soaps), alkaline earth metal soaps (divalent soaps), and organic amine soaps (triethanolamine soaps), and metal soap surfactants such as naphthoates or stearates of metals such as cobalt, aluminum, iron and the like. Sulfonate anionic surfactants include alkyl benzene sulfonates, alpha olefin sulfonates, alkyl sulfonates, alpha sulfomonocarboxylates, fatty acid sulfoalkyl esters, succinate sulfonates, alkyl naphthalene sulfonates, petroleum sulfonates, lignin sulfonates, alkyl glyceryl ether sulfonate and the like. For example, sodium dioctyl succinate sulfonate, calcium dodecylbenzene sulfonate, sodium dodecylbenzene sulfonate, barium dinonylnaphthalene sulfonate, and other organic sulfonate surfactants. Sulfate ester salt anionic surfactants include fatty alcohol sulfate ester salts (also known as primary alkyl sulfate ester salts) and secondary alkyl sulfate ester salts. Alkyl phosphate ester salts include alkyl phosphate mono-ester salts and alkyl phosphate double-ester salts, as well as phosphate mono-ester salts and double-ester salts of fatty alcohol polyoxyethylene ethers and phosphate mono-ester salts and diester salts of alkylphenol polyoxyethylene ethers.
The zwitterionic surfactants include lecithin zwitterionic surfactants, amino acid zwitterionic surfactants, and betaine zwitterionic surfactants. Anionic parts of the amino acid zwitterionic surfactants and the betaine zwitterionic surfactants are mainly carboxylate, and cationic parts of the amino acid zwitterionic surfactants and the betaine zwitterionic surfactants is quaternary ammonium salt or amine salt. The cationic part composed of amine salt are amino acid type, and the cationic part composed of quaternary ammonium salts is the betaine type. For example, the amino acid zwitterionic surfactant include stearyl dihydroxyethyl amine oxide, stearyl amidopropyl amine oxide, and lauryl amidopropyl amine oxide. The betaine zwitterionic surfactants include dodecyl ethoxy sulfobetaine, dodecyl hydroxypropyl sulfobetaine, dodecyl sulfopropyl betaine, myristyl amide propyl hydroxyl propyl sulfobetaine, decyl hydroxypropyl sulfobetaine.
The nonionic surfactant may be N-vinylpyrrolidone polymer (polyvinylpyrrolidone) and the like.
Optionally, the surfactant is preferably at least one of organic sulfonate surfactants (such as calcium dodecylbenzene sulfonate, sodium dodecylbenzene sulfonate, barium dinonylnaphthalene sulfonate and the like), metal soap surfactants (such as naphthoate or stearate of metals such as cobalt, aluminum, iron and the like), organic amine surfactants (such as octadecyl dihydroxyethyl amine oxide), N-vinyl pyrrolidone polymers, organic phosphate surfactants, and phosphate ester surfactants, which have strong binding force with the quantum dots.
The surfactants used in the present application can be ionized in the solvent, and have binding forces with surfaces of the quantum dots. In order to ensure the binding forces between the quantum dots and the surfactants, optionally, in a case that the surfaces of the quantum dots have acidic groups, alkaline surfactants are selected; and in a case that the surfaces of the quantum dots have alkaline groups, acidic surfactants are selected. It should be noted that the surfaces of the quantum dots may include the surfactant ligands, or may also include other types of ligands, for example, oleic acid, thiols, carboxylic acids, organic amine ligands and the like.
Due to existing ligands bound to the surfaces of the quantum dots, such as oleic acids, thiols, carboxylic acids, organic amines and the like, are difficult to dissociate in the solvents or have a low degree of dissociation, so that the quantum dots in quantum dot solutions are in a low charge level. In a case that a quantum dot film is made by electrodeposition, driving voltages required to drive the quantum dots to deposit and form a film is too high due to charges of the quantum dots are too low. In the present application, the surfactant ligands with a high degree of dissociation in the solution are modified onto the surfaces of the quantum dots to make the surfaces of the quantum dots charged, and charge amounts of the quantum dots are increased by increasing ionization degrees of the ligands. In a case that the quantum dot film is formed by electrodeposition, the driving voltages can be reduced.
As such, in the embodiments mentioned above, the surfaces of the nanoparticles are bound with the surfactant ligands, so that the nanoparticle solution includes nanoparticles with charges. Therefore, in a case that the voltages are subsequently applied to the first electrode substrate and the second electrode substrate, the nanoparticles with charges can move in the electric field and gather on the electrode substrate which has charges opposite to charges of the nanoparticles with charges, thereby achieve the electrodeposition process on the first electrode substrate and/or the second electrode substrate.
In this embodiment, for the electrodeposition apparatus provided by embodiments of the present application, the control module 40 controls a movement of the laminating mechanism 20, so that the gap being uniform is defined between the first surface of the dispensing platform 10 and the second surface of the laminating mechanism 20. The control module 40 further controls the liquid-feed device 30 to inject the nanoparticle solution being preset into the gap, and controls the power supply device to apply voltages to the first electrode substrate fixed on the first surface and the second electrode substrate fixed on second surface, so as to perform the electrodeposition process on the first electrode substrate and/or the second electrode substrate. Process of electrodeposition patterning of nanoparticles is realized, so that patterned nanoparticle films with high-quality can be obtained efficiently and quickly.
In some embodiments, please refer to
Further, please continue to refer to
As an optional embodiment of the present application, the power-on probe 11 provided in this embodiment is a retractable probe. As such, the power-on probe 11 can be connected to the pad of the second electrode substrate through telescopic function of the power-on probe 11 to facilitate power supply to the second electrode substrate.
As another optional embodiment of the present application, the power-on probe 11 provided in this embodiment is a movable probe. As such, in a case that the electrodeposition processes are performed on the second electrode substrates of different specifications, there is no need to reconfigure the dispensing platform 10 due to the position of the pads of the second electrode substrates being different. Just by moving the power-on probe 11, the power-on probe 11 can be in contact with the pad on the second electrode substrate fixed on the second surface, thereby further improving processing efficiency of the electrodeposition process.
In this embodiment, the second surface of the laminating mechanism 20 provided in this embodiment is also provided with a plurality of micropores (not shown in the
Further, the second surface of the laminating mechanism 20 provided in this embodiment is also provided with a power-on probe being protruding (not shown in
In some embodiments, the laminating mechanism 20 further includes an X-axis moving slide rail (not shown in
Wherein, in a case that the laminating mechanism 20 provided in this embodiment moves along the X-axis direction, Y-axis direction or the Z-axis direction, a moving step distance ranges from 1 micron to 100 millimeters, and a moving speed ranges from 0 to 100 millimeters per second. Specifically, the maximum moving step distance of the laminating mechanism 20 can be set according to actual technical requirements, and is not limited to 100 millimeters. The maximum moving step distance may be a value less than 100 millimeters or greater than 100 millimeters, which is not give examples one by one here. It should be pointed out that the minimum moving step distance of the laminating mechanism 20 provided in this embodiment is 1 micron. As such, uniformity of the distance between the first electrode substrate and the second electrode substrate can be more accurately controlled, thereby effectively improving efficiency of the electrodeposition process and achieving the purpose of obtaining the nanoparticle film that is more uniform.
As an optional embodiment, in this embodiment, the dispensing platform 10 can be further provided with an X-axis moving slide rail, a Y-axis moving slide rail, and a Z-axis moving slide rail, so that the dispensing platform 10 can also move along the X-axis direction, the Y-axis direction, and the Z-axis direction. Thus, Alignment efficiency of the first electrode substrate and the second electrode substrate is effectively improved, thereby further improving processing efficiency of the electrodeposition process.
Specifically, in order to ensure stability of the laminating mechanism 20 provided in this embodiment in a case that the laminating mechanism 20 is moving, the material used for the platform on which the second surface of the laminating mechanism 20 provided in this embodiment is disposed may be a material with a relatively large mass, such as marble. Thus, in the case that the laminating mechanism 20 is moving, the stability of the laminating mechanism 20 is effectively ensured.
In this embodiment, the laminating mechanism 20 provided in this embodiment further includes a counterweight module (not shown in
In some embodiments, please refer to
In this embodiment, there may be one or more micrometer heads 22 and height measuring sensors 23 provided in this embodiment. Optionally, in order to ensure the uniformity of the gap between the first electrode substrate and the second electrode substrate, one micrometer head 22 and one height measuring sensor 23 are respectively provided at each of the four corners of the second surface of the laminating mechanism 20. Therefore, the first electrode substrate can be adjusted according to horizontal conditions of the four corners of the second surface of the laminating mechanism 20 and the distance of the gap, so as to ensure the uniformity of the gap between the first electrode substrate and the second electrode substrate.
Further, after the distance between the first electrode substrate and the second electrode substrate is detected by the height measuring sensor 23, the control module 40 can determine voltage value according to the distance in the case that the voltages are applied to the first electrode substrate and the second electrode substrate in this embodiment. Specifically, in this embodiment, in the case that the voltages are applied to the first electrode substrate and the second electrode substrate, the voltage value is proportional to the distance between the first electrode substrate and the second electrode substrate. That is, in a case that the distance is greater, the voltage value in the case that the voltages are applied to the first electrode substrate and the second electrode substrate is also greater. In a case that the distance is less, the voltage value in the case that the voltages are applied to the first electrode substrate and the second electrode substrate is also less.
As an optional embodiment, in a case that the distance between the first electrode substrate and the second electrode substrate is 200 microns, the voltage value in the case that the voltages are applied to the first electrode substrate and the second electrode substrate is 200 volts to obtain an electric field intensity of 1 volt per micron. As such, after the voltages are applied to the first electrode substrate and the second electrode substrate, an electric field force is generated between the first electrode substrate and the second electrode substrate. The nanoparticles in the nanoparticle solution move and gather on the electrode of which the charges is opposite the charges of the nanoparticles under effects of the electric field force.
Therefore, in a case that a target electrode substrate needs to be patterned and the nanoparticles in the nanoparticle solution are with positive charges, the target electrode substrate may be negatively charged. In a case that the nanoparticles in the nanoparticle solution are with negative charges, the target electrode substrate may be positively charged. As such, the nanoparticles in the nanoparticle solution may move and gather on the target electrode substrate.
Wherein, the distance between the first electrode substrate and the second electrode substrate provided in this embodiment is not limited to 200 microns. The distance between the first electrode substrate and the second electrode substrate may be 150 microns, 120 microns, 100 microns and the like. As long as the electrodeposition process can be performed, there is no specific limitation here. By the same token, in the case that the voltages are applied to the first electrode substrate and the second electrode substrate, the voltage value is not limited to 200 volts. The voltage value needs to be set accordingly according to the dimension of the gap and the electric field intensity being required. Wherein, the electric field intensity ranges from 0.01V/micron to 200V/micron. The electric field intensity is mainly related to the thickness of the nanoparticle film formed in the end. That is, in a case that a thicker nanoparticle film is required, a greater electric field intensity can be used, such as 100V/micron, 150V/micron, 200V/micron and the like. In a case that a thinner nanoparticle film is required, a less electric field intensity can be used, such as 10V/micron, 5V/micron, 1V/micron and the like. Therefore, the electric field intensity being required is set according to the thickness of the nanoparticle film required, which is not specifically limited here.
In this embodiment, after the electric field intensity and the distance between the first electrode substrate and the second electrode substrate are determined, the electrodeposition process can be performed for a preset time. Wherein, The preset time is a time for applying the voltages to the first electrode substrate and the second electrode substrate. The preset time period is inversely proportional to an electric charge of the particles with charges in the nanoparticle solution. That is, in a case that the electric charge of the particles with charges in the nanoparticle solution is greater, the shorter the time of applying the voltages to the first electrode substrate and the second electrode substrate. In a case that the electric charge of the particles with charges in the nanoparticle solution is less, the longer the time of applying the voltages to the first electrode substrate and the second electrode substrate. Specifically, the preset time ranges from 10 seconds to 120 seconds. Therefore, in the case that the electric charge of the particles with charges in the nanoparticle solution is greater, the preset time can be set to a shorter time such as 50 seconds, 40 seconds, 30 seconds or the like. In the case that the electric charge of the particles with charges in the nanoparticle solution is less, the preset time can be set to a longer time such as 80 seconds, 90 seconds, 100 seconds or the like.
It should be noted that the target electrode substrate may be the first electrode substrate or the second electrode substrate, or may be both the first electrode substrate and the second electrode substrate. That is, in this embodiment, the patterning processing may be performed on the first electrode substrate or the second electrode substrate, respectively; the patterning processing may be simultaneously performed on the first electrode substrate and the second electrode substrate, thereby effectively improving the efficiency of the patterning processing on the electrode substrates.
As a preferred embodiment of the present application, due to the movement of the laminating mechanism 20 may exist errors, that is, in the case that the control module 40 controls the movement of the laminating mechanism 20, there may be a certain error. Therefore, in order to improve accuracy of the movement of the laminating mechanism 20 to effectively ensure a precise distance between the first electrode substrate and the second electrode substrate, the electrodeposition apparatus provided in this embodiment may also include a distance measuring device. The accuracy of the movement of the laminating mechanism 20 is ensured by measuring the distance between the first electrode substrate and the second electrode substrate by the distance measuring device.
Optionally, in this embodiment, the distance between the first electrode substrate and the second electrode substrate can be determined based on datas collected by the height measuring sensor 23 provided on the laminating mechanism 20, so as to ensure accuracy in the case that the laminating mechanism 20 is moving.
Specifically, in the case that the distance between the first electrode substrate and the second electrode substrate needs to be 200 microns, an actual distance between the first electrode substrate and the second electrode substrate may be 190 microns due to errors in the case the laminating mechanism 20 is moving. In order to obtain the electric field intensity of 1 V/micron, a voltage of 190V needs to be applied instead of 200V. As such, it is possible to avoid applying wrong voltages to the first electrode substrate and the second electrode substrate, thereby effectively improving the accuracy of patterning the electrode substrates. In some embodiments, please refer to
In this embodiment, the diameter of the needle provided in this embodiment ranges from 300 microns to 500 microns, and the distance between the first electrode substrate and the second electrode substrate during the electrodeposition process is usually less than 300 microns such as 200 microns, 150 microns, 120 microns, 100 microns and the like. In this embodiment, in order to make it that the nanoparticle solution is in contact with the first electrode substrate and the second electrode substrate at the same time, and the nanoparticle solution is adsorbed and fixed in the gap between the first electrode substrate and the second electrode substrate through the surface tension of the liquid, the control module 40 needs to first control the movement of the laminating mechanism 20 so that the first electrode substrate and the second electrode substrate are adjacent to each other. Then, the control module 40 controls the distance between the first electrode substrate and the second electrode to be greater than the diameter of the needle. For example, the distance between the first electrode substrate and the second electrode substrate is controlled to be 600 micrometers, so that the liquid-feed device 30 provided in this embodiment can easily inject the nanoparticle solution into the gap between the first electrode substrate and the second electrode substrate.
After the nanoparticle solution is injected into the gap between the first electrode substrate and the second electrode substrate by the liquid-feed device 30 provided in this embodiment, it is necessary to control the movement of the laminating mechanism 20 by the control module 40 again, so as to control the distance between the first electrode substrate and the second electrode substrate to be the distance required for the electrodeposition process. That is, the distance of 200 microns, 150 microns, 120 microns, or 100 microns provided in the above embodiments. Then, the voltages are applied to the first electrode substrate and the second electrode substrate to form the electric field force between the first electrode substrate and the second electrode substrate, so that the electrodeposition process is performed on the first electrode substrate and/or the second electrode substrate based on the effect of the electric field force.
As an optional embodiment, after completing the electrodeposition process of the first electrode substrate and/or the second electrode substrate, the electrode substrate after the electrodeposition process also needs to be cleaned to obtain a high-quality pattern nanoparticle films.
Specifically, please continue to refer to
Wherein, the cleaning device provided in this embodiment may also perform a vacuum drying process on the first electrode substrate and/or the second electrode substrate after clean process, so as to achieve the purpose of volatilizing the solution present on the first electrode substrate and/or the second electrode substrate into a gas.
Further, by collecting the volatilized gas through the gas collection device 50 provided in this embodiment, environmental pollution caused by the volatilization of the solvents to the outside of the electrodeposition apparatus can be effectively avoided. As such, the gas collection device 50 can effectively protect the environment from being polluted.
To sum up, the electrodeposition apparatus provided by the embodiments of the present application includes the laminating mechanism, the dispensing platform, the liquid-feed device, the power supply device, and the control module. The dispensing platform includes the first surface, and the dispensing platform is configured to fix the first electrode substrate on the first surface. The laminating mechanism includes the second surface opposite to the first surface, and the laminating mechanism is configured to fix the second electrode substrate on the second surface. The control module is configured to control a movement of the laminating mechanism so that the gap being uniform is defined between the first surface and the second surface. The control module is further configured to control the liquid-feed device to inject the nanoparticle solution being preset into the gap, and is further configured to control the power supply device to apply voltages to the first electrode substrate and the second electrode substrate to perform the electrodeposition process on the first electrode substrate and/or the second electrode substrate. Thus, the electrodeposition and patterning of nanoparticles are achieved, so that high-quality patterned nanoparticle films can be obtained efficiently and quickly.
In order to solve the same technical problem, an embodiment of the present application further provides a method for electrodeposition. Please refer to
In the step S101, fixing a first electrode substrate and a second electrode substrate on a first surface and a second surface that are arranged oppositely, respectively.
In this embodiment, the first electrode substrate and the second electrode substrate are fixed to the first surface of the dispensing platform and the second surface of the laminating mechanism by vacuum adsorption performing by the dispensing platform and the laminating mechanism, respectively. For specific implementation methods, please refer to relevant embodiments of the electrodeposition apparatus mentioned above, which is not described again here.
The step S102, moving the first surface to form a gap defined between the first surface and the second surface.
In this embodiment, the control module controls the movement of the laminating mechanism to form the uniform gap defined between the first surface and the second surface. For specific implementation methods, please refer to relevant embodiments of the electrodeposition apparatus mentioned above, which is not described again here.
The step S103, injecting a nanoparticle solution into the gap, the nanoparticle solution includes nanoparticles with charge.
In this embodiment, for implementation methods that the nanoparticles in the nanoparticle solution provided by this embodiment are charged, please refer to relevant embodiments of the electrodeposition apparatus mentioned above, which is not described again here.
The step S104, applying voltages to the first electrode substrate and the second electrode substrate to perform an electrodeposition process on the first electrode substrate and/or the second electrode substrate.
In this embodiment, the control module controls the liquid-feed device to inject the nanoparticle solution being preset into the gap, and controls the power supply device to apply voltages to the first electrode substrate and the second electrode substrate, so as to perform the electrodeposition process on the first electrode substrate and/or the second electrode substrate. For specific implementation methods, please refer to the relevant embodiments of the electrodeposition apparatus mentioned above, which is not described again here.
In some embodiments, the nanoparticle solution includes nanoparticles with positive charges and/or negative charges. The step of applying voltages to the first electrode substrate and the second electrode substrate to perform an electrodeposition process on the first electrode substrate and/or the second electrode substrate specifically includes, applying voltages to the first electrode substrate and the second electrode substrate to form an electric field between the first electrode substrate and the second electrode substrate, so that the nanoparticles form a nanoparticle thin film on the first electrode substrate and/or the second electrode based on an electric field force of the electric field.
In this embodiment, since the nanoparticles in the nanoparticle solution are charged, in the case that the voltages are applied to the first electrode substrate and the second electrode substrate, the nanoparticles with charges can move in the electric field and gather on the electrode substrate of which the charges are opposite to the charges of the nanoparticles. Thus, the electrodeposition process of the first electrode substrate and/or the second electrode substrate is realized, so that the nanoparticle film is formed on the first electrode substrate and/or the second electrode substrate.
It should be noted that those skilled in the art can clearly understand that the specific implementation process and beneficial effects of the above-mentioned devices and each unit can be referred to the corresponding descriptions in the foregoing method embodiments. For convenience and simplicity of description, it is not described again.
Number | Date | Country | Kind |
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202310255573.8 | Mar 2023 | CN | national |