The present invention relates generally to charged particle beam apparatuses and sample-moving devices, and more particularly to a sample micromotion stage for reducing sample drifts to thereby permit photographing or shooting of distortion-lessened images at high throughputs.
Using a charged particle beam apparatus, especially, transmission electron microscope (TEM), observation has been performed at magnifications capable of directly observing atoms. A sample to be observed is processed by a focused ion beam apparatus or the like into a thin piece on the order of several tens of nm, which is then mounted on a sample table. This sample table is attached to a sample holder and is introduced through an pre-evacuation chamber (airlock room) into a column which has been evacuated to approximately 10 5 Pa. In order to determine the position of such sample under observation, a sample movement device is driven in three respective axis directions, when defining a vertical direction as Z-axis and also defining in-plane axes at right angles to the axis as X-axis and Y-axis respectively. In addition, in order to determine the sample's crystal orientation, it is driven in rotation directions (α-direction and (β-direction, respectively) with the X-and Y-axis directions being as respective axes. Usually, the X-axis is defined as the longitudinal direction of sample holder whereas the Y-direction is defined as a direction perpendicular to the X-axis and Z-axis.
To determine an observation region in the atomic level, a drive mechanism capable of performing step motions of several nm for each axis has been chosen.
Regarding a holder driving scheme used for the sample movement device, a technique is contrived for driving in the X-direction while letting the sample holder's leading end be in contact as disclosed in Patent Literature 1. In addition, as disclosed in Patent Literature 2, a technique is also devised for providing a step-like difference at one part of the sample holder and for causing this step-like difference to come into contact with an X-axis drive mechanism.
As for drift factors, although each axis drive mechanism is rendered operative in order to determine the sample observation position, the so-called sample drift phenomenon can take place-that is, the sample behaves to perform undesired movement even after having deactivated the drive mechanism, which movement is due to gear backlash of the drive mechanism and deformation of the drive mechanism per se.
Other factors of the sample drift phenomenon include thermal deformation of the holder in a temperature relaxation process, which deformation is due to a difference in temperature between the holder and column at the time of holder introduction. As a remedy for this factor, a technique for using low heat expansion material is devised as disclosed in Patent Literature 3.
Patent Literature 1: JP-A-2004-214087
Patent Literature 2: JP3736772 (B2)
Patent Literature 3: JP-A-2010-165649
In the case of performing high-magnification observation using a charged particle apparatus, the following problem occurs: image distortion takes place with tiny movement (drift) of the sample, which is not intended by an apparatus operator. Usually, the drift amount becomes maximal immediately after having introduced a sample that was loaded in the sample holder into the charged particle apparatus. This factor is as follows: the thermal deformation caused by a temperature difference between the sample holder and the column of charged particle apparatus and the distortion of O-ring provided in the sample holder for sealing a vacuum-retained sample chamber and atmosphere apply elastic force to the holder, resulting deformation of the sample holder due to release of the elastic force.
Also note that even in the process of sample observation, with movement in the sample holder longitudinal direction of a sample micromotion mechanism, the O-ring provided in the sample holder is undergoing elastic deformation due to the presence of friction force produced as a result of mutual rubbing of the O-ring against a vacuum seal plane at all times.
An electron microscope with a sample holder being inserted into a column, the electron microscope including: an O-ring which makes airtight the column of the electron microscope and the sample holder; a slider tube which slides in a longitudinal direction of the sample holder and performs positioning of the sample holder in the longitudinal direction; a bellows which makes airtight the slider tube and the column; means for driving the slider tube in the longitudinal direction of the sample holder; and a touching member which performs position determination of the sample holder in the longitudinal direction, characterized by further including a sample movement device which has an elastic material for connection of the touching member and the slider tube.
In high-magnification observation using the electron microscope, it becomes possible to acquire good images owing to the ability to lessen sample drifts. It is also possible to shorten the length of a wait time taken until sample drifts have lowered; thus, it becomes possible to improve the throughput.
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A structure embodying the present invention will be explained using an electron microscope which permits insertion of a sample holder of the side entry type shown in
When introducing the sample holder 2 into the column 1, an O-ring 4 provided in the sample holder 2 exhibits sliding movement with an inner wall of slider tube 30 and is then position-determined in the longitudinal direction by the holder-touching part 40. The slid O-ring 4 deforms and becomes the cause of sample drift.
After having introduced the sample holder into column 1 and then position-determined at a final position, the sample holder is pressed to the X-direction minus side in
Another embodiment of this invention will be explained using
[Installation of X-Micromotion Mechanism]
An explanation will be given of installation of an X-micromotion mechanism. As shown in
Although in
[Introducing Sample Holder into Column]
An operation of introducing the sample holder 2 into column 1 will be explained. The sample holder 2 with a sample 3 attached thereto is introduced up to a position shown in
[Regarding O-ring Deformation]
An explanation will be given of the O-ring that is provided in the sample holder in the event of introducing the sample holder 2. The O-ring is required to secure a prespecified crush amount in order to isolate the vacuum from the atmosphere pressure. By elastic force which is almost proportional to this crush amount, friction force acts on the O-ring and the inner wall of slider tube 30; so, the O-ring is deformed to have a shape which is pulled and tensioned toward the X-direction plus-side as shown in
O-ring distortion removing schemes include one conceivable way which follows. The deformed O-ring is forced to move in a direction indicated by arrow x in
[O-ring Distortion Removing Method]
As shown in
By supporting the holder-touching part 40 by elastic material 31 in this way, it becomes possible to press in an X-axis minus direction than the finally determined position, thereby making it possible to reduce the O-ring's distortion by the aforesaid technique. The elastic material 31 is required to have a spring constant large enough to counter the force that causes the sample holder to be drawn into the column under atmosphere pressure.
[Slider Tube and Holder-Touching Part]
Another embodiment of the holder-touching part 40 for slider tube 30 will be explained using
Another embodiment is shown in
Although the mechanism for supporting the holder-touching part 40 by elastic material 31 was described so far, when the positional relationship of the holder-touching part 40 and slider tube 30 is changeable, it becomes possible to alleviate the distortion of O-ring. Hence, the elastic material shown in
[Holder Fixation Direction]
The sample holder 2 is fixed in the perpendicular direction to the holder's longitudinal direction by means of a member provided at the spherical support point 37 fixed at the X-direction minus-side leading end of the outer cylinder 38. This member is made of sapphire having enhanced abrasion resistance. Desirably, the member is arranged to fix the sample holder 2 by use of three or more points. The holder's X-direction plus-side rear end is also fixed by a similar method using a member provided at the outer cylinder 38.
Regarding a contact point(s) of the holder and the holder-touching part 40 also, it is desirable from a viewpoint of thermal insulation of the holder 2 to make them come into point-contact by semispherical sapphire or the like. Desirably, more than one contact point is provided.
1 . . . Column, 2 . . . Holder, 3 . . . Sample, 4 . . . 0-Ring for Holder, 5 . . . Holder-Positioning Pin, 10 . . . X-Driving Linear Mechanism, 20 . . . Rotation Tube, 21 . . . Z-Driving Linear Mechanism, 22 . . . Z-Spring, 23 . . . Bearing, 24 . . . Base, 25 . . . Lever Mechanism, 30 . . . Slider Tube, 31 . . . Elastic material, 32 . . . Bellows, 33 . . . Inner Cylinder, 34 . . . Valve, 35 . . . Valve Fixation Part, 36 . . . Spherical Surface Bracket, 37 . . . Spherical Supporting Point, 38 . . . Outer Cylinder, 39 . . . Holder Guide, 40 . . . Holder-Touching Part, 41 . . . Pin, 50 . . . Raised Portion.
Number | Date | Country | Kind |
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2012-181303 | Aug 2012 | JP | national |
Filing Document | Filing Date | Country | Kind |
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PCT/JP2013/067430 | 6/26/2013 | WO | 00 |