Patent Application
20080151466
1. Field of the Disclosure
This disclosure is directed to an electrostatic chuck (ESC) and is particularly directed to an electrostatic chuck for holding electrically insulating workpieces.
2. Description of the Related Art
Chucks are used to support and hold wafers and substrates in place within high temperature and corrosive processing chambers such as those used for chemical vapor deposition, physical vapor deposition, or etching. Several main types of chucks have been developed. Mechanical chucks stabilize wafers on a supporting surface by using mechanical holders. Mechanical chucks have a disadvantage in that they often cause distortion of workpieces due to non-uniform forces being applied to the wafers. Thus, wafers are often chipped or otherwise damaged, resulting in a lower yield. Vacuum chucks operate by lowering the pressure between the wafer and the chuck below that of the chamber, thereby holding the wafer. Although the force applied by vacuum chucks is more uniform than that applied by mechanical chucks, improved performance is desired. In this respect, pressures in the chamber during semiconductor manufacturing processes tend to be quite low, and sufficient force cannot always be applied.
Recently, electrostatic chucks (ESCs) have been used to hold workpieces in a processing chamber. Electrostatic chucks work by utilizing a voltage difference between the workpiece and electrodes which can be embedded in the body of the electrostatic chuck, and may apply a more uniform force than mechanical chucks or vacuum chucks.
Broadly, there exist two types of ESCs: a unipolar type and a bipolar type. The unipolar, or parallel plate ESC includes a single electrode and relies upon plasma used within the processing chamber to form the second “electrode” and provide the necessary attractive forces to hold the substrate in place on the chucking surface. The bipolar, or integrated electrode ESC, includes two electrodes of opposite polarity within the chuck body and relies upon the electric field generated between the two electrodes to hold the workpiece in place.
Additionally, in an ESC, the chucking of a wafer can be achieved using a Coulombic force or Johnsen-Rahbek (JR) effect. Chucks using a JR effect achieve efficient chucking performance through the flow of charges through a dielectric layer. ESCs utilizing a Coulombic force are advantageous when using a plasma which provides the necessary second electrode to create a capacitive chucking force on the workpiece.
Despite improvements in ESCs, various industries continue to demand improved performance, for example, those industries processing larger, more massive substrates and workpieces. Notably, the glass industry and particularly the display industry are moving rapidly to produce displays of larger size. This shift to processing of larger workpieces, generally within high temperature and corrosive processing environments, places further demands on ESCs used during processing.
According to one aspect, an electrostatic chuck is disclosed which includes a substrate and a patterned conductive layer overlying the substrate. The patterned conductive layer defines electrode pathways that are separated by gaps. The electrostatic chuck further includes a resistive layer overlying the patterned conductive layer, and a low-k dielectric layer overlying the substrate and disposed in the gaps between the electrode pathways. The low-k dielectric layer includes a material having a different phase than the material of the substrate.
According to another aspect, a method of forming an electrostatic chuck is disclosed which includes providing a substrate and forming a conductive layer made of a conductive material overlying the substrate. The method further includes forming a resistive layer made of a resistive material overlying the conductive layer, and forming a patterned conductive layer and resistive layer having electrode pathways made of the conductive material, wherein the electrode pathways are separated by gaps and the resistive layer overlies the electrode pathways. The method further includes forming a low-k dielectric layer within the gaps.
According to another aspect a method of forming an electronic device is provided which includes providing an electrostatic chuck having (i) a substrate, and (ii) a patterned conductive layer overlying the substrate, such that the patterned conductive layer defining electrode pathways separated by gaps. The electrostatic chuck also includes (iii) a resistive layer overlying the patterned conductive layer defining a work surface, and (iv) a low-k dielectric layer overlying the substrate and disposed in the gaps between the electrode pathways, wherein the low-k dielectric layer comprises a material having a different phase than the material of the substrate. The method further includes providing a workpiece overlying the work surface, providing a voltage across the electrostatic chuck to maintain the workpiece in proximity to the work surface, and processing the workpiece to form an electronic device.
The present disclosure may be better understood, and its numerous features and advantages made apparent to those skilled in the art by referencing the accompanying drawings.
The use of the same reference symbols in different drawings indicates similar or identical items.
Referring to
Other suitable inorganic materials for the substrate 151 can include conductors such as metals and metal alloys. Suitable metals generally include aluminum, ferrous metals, or combinations thereof. In applications where a high stiffness-to-weight is needed, the use of a silicon carbide substrate may be advantageous. In embodiments utilizing a conductive substrate 151, the conductor forms a base of the substrate, and a coating can be applied to a surface of the base. Generally the overlying layer, noted above, is in contact with the coating. Such a coating can also be an inorganic composition, generally being single crystal, polycrystalline, or amorphous. Suitable coating materials generally include insulating materials, such as a ceramic, glass-ceramic, or glass material. As such, suitable insulating materials can be oxide-based materials, such as yttrium oxide, aluminum oxide, zirconium oxide, or silicon oxide. Such oxides can be compound oxides or multiphase oxides.
Generally, the substrate 151 is a robust component having a thickness of greater than about 2 mm, such as greater than about 10 mm, and in some cases greater than 25 mm. Moreover, the substrate is generally a dense material suitable for forming layers thereon. Accordingly, the porosity of the substrate is generally less than about 10 vol %, such as less than about 5.0 vol %, and in some instances, less than about 1.0 vol %.
In reference to those embodiments utilizing a substrate having a coating, generally the coating is a dense structure. As such, the porosity of the coating is generally not greater than about 20 vol %, such as not greater than about 10 vol %, and even, not greater than about 5.0 vol %.
Referring again to
The conductive layer 153 is generally formed of an inorganic material, generally an electrically conductive material, such as a conductive metal, or metal alloy. Suitable metals can include high temperature metals such as titanium, molybdenum, nickel, copper, tungsten, iron, silicon, aluminum, and combinations or alloys thereof. In one particular embodiment, the conductive layer 153 includes molybdenum. Generally, the conductive layer 153 includes not less than about 50 wt % metal species, such as not less than about 80 wt % metal species, or even not less than about 95 wt % metal species. According to one particular embodiment, the conductive layer 153 is made entirely of a metal species, which may be in the form of a metal alloy.
The conductive layer 153 can be a composite material, and as such, in addition to the conductive material, the conductive layer 153 can contain adhesion promoters. Such adhesion promoters can be inorganic materials, such as conductive, semiconductive or even insulating materials. Suitable materials can be single crystal, polycrystalline, or amorphous, such as for example, ceramics, glass-ceramics, or glasses. Particularly suitable adhesion promoters can include oxide-based materials, such as yttrium oxide, aluminum oxide, zirconium oxide, hafnium oxide, titanium oxide, chromium oxide, iron oxide, silicon oxide, barium titanate, tantalum oxide, barium oxide, or compound oxides thereof. According to one particular embodiment, a suitable adhesion promoter is the same material of the underlying layer and/or overlying layer.
Adhesion promoters are generally present within the conductive layer 153 in an amount of less than about 75 vol %, such as less than about 50 vol %, and even less than about 25 vol %. Accordingly, the amount of adhesion promoter can be less, such that the conductive layer 153 contains not greater than about 10 vol %.
In reference to the electrical characteristics of the conductive layer 153, generally the resistivity of the conductive layer 153 at room temperature is not greater than about 103 Ohm-cm, such as not greater than about 101 Ohm-cm. Still, in other embodiments, the resistivity of the conductive layer is not greater than about 10−1 Ohm-cm. The sheet resistance of the conductive layer 153 is generally less than 107 Ohms, such as less than about 106 Ohms, or not less than 106 Ohms.
Accordingly, in one embodiment the conductive layer 153 is formed via a thermal spraying process during which the adhesion promoter material is provided simultaneously with the conductor material (e.g., a metal). In one particular embodiment, the conductive layer 153 is formed via a spraying process that utilizes a composite powder composition, which includes the conductor material and the adhesion promoter. The composite powder composition, comprises not less than about 25 vol % conductor material, such as not less than about 35 vol % conductor material, and in particular instances, not less than about 50 vol % conductor. The composite powder composition typically includes not greater than about 75 vol % adhesion promoter, such as not greater than about 50 vol % adhesion promoter, and even not greater than about 25 vol % adhesion promoter.
The conductive layer 153 is generally a thinner layer in comparison to the substrate 151, and generally has a thickness of not greater than about 200 microns. According to one embodiment, the conductive layer 153 has an average thickness of not greater than about 100 microns, and in some instances not greater than about 50 microns.
In further reference to
The resistive layer 155 is generally a robust layer and can have average thicknesses of greater than about 100 microns, such as greater than about 200 microns, and in some cases greater than about 300 microns. Still, the resistive layer 155 is generally not greater than about 600 microns, and according to one embodiment, the average thickness of the resistive layer 155 is within a range of between about 200 microns to about 500 microns. The resistive layer 155 can be a dense layer having minimized porosity, which is generally closed porosity. The average porosity of the resistive layer 155 can be not greater than about 10 vol %, such as not greater than about 5.0 vol %. According to one particular embodiment, the resistive layer has a porosity of not greater than about 1.0 vol %.
The resistive layer 155 is described herein as such due to its particular electrical properties relative to the underlying conductive layer 153. More particularly, the resistive layer 155 can have a resistivity that is at least an order of magnitude more resistive than the underlying conductive layer 153. Its resistance may be greater than about 104 Ohm/cm2, such as greater than about 105 Ohm/cm2, as measured between the top and the bottom faces of the layer. The resistance however, may be limited, for example to less than about 1010 Ohm/cm2. According to another embodiment, the resistive layer 155 has a resistance of less than about 109 Ohm/cm2, such as less than about 108 Ohm/cm2, such as within a range of between about 104 Ohm/cm2 and about 108 Ohm/cm2. The foregoing resistance values are normalized to the surface area of a contact. In particular, the resistance is measured with upper and lower contacts, each having a surface area, and as such the resistance is normalized for the total surface area of the contacts.
The resistive layer 155 generally includes an inorganic material, and particularly semiconductive materials, which can include a single crystal, polycrystalline, or amorphous material. Suitable semiconductive materials can include ceramics, glass-ceramics, or glasses. According to one embodiment, the resistive layer 155 can include an oxide-based material. Suitable oxide-based materials can include for example, aluminum oxide, silicon oxide, zirconium oxide, haffiium oxide, titanium oxide, chromium oxide, yttrium oxide, iron oxide, barium oxide, haffiium oxide, manganese oxide, cobalt oxide, nickel oxide, copper oxide, zinc oxide, niobium oxide, tin oxide, cadmium oxide, gallium oxide, and tantalum oxide. Certain oxide-based species are particularly adapted to be combined with modifiers. For example, aluminum oxide and/or zirconium oxide alone may be combined with other materials, such as for example titanium oxide, to decrease the resistivity.
Additionally, the resistive layer 155 may include other inorganic materials, such as an ionic conductor. Suitable ionic conductors generally include materials having a glass-ceramic or glass phase, such as solid electrolyte materials. According to one embodiment, suitable ionic conductors can include oxide-based materials, such as silicates. Particularly suitable silicate materials include doped silicate materials. Doped silicate materials can be doped with ions, such as cations, and particularly monovalent cations, such as Li. Other ionic conductors can include fluorine-based materials, particularly fluorine-based materials having a glass phase. Suitable fluorine-based materials can include fluorine compositions having transition metals, for example, lanthanum fluoride. As such, the fluorine-based materials can be doped with a cation, particularly a divalent cation, such as Ca.
After forming the resistive layer 155, formation of a high-k dielectric layer 157 overlying the conductive layer 153 and resistive layer 155 can be completed at step 107. Formation of the high-k dielectric layer 157 can be carried out by a deposition process, including, for example a thick film deposition process such as printing or spraying (e.g., thermal spraying) or a thin film deposition process such as chemical vapor deposition or physical vapor deposition. In the context of a thermal spraying process, plasma spraying may be utilized. The high-k dielectric layer 157 may advantageously have a lamellar microstructure, which may be produced by the thermal spray process and which may be effective to increase the dielectric strength of the resistive layer. Description of lamellar structures is provided above in connection with the resisvtive layer.
The high-k dielectric layer 157 can contain an inorganic or organic material, or a combination of both. According to one embodiment, the high-k dielectric layer 157 includes inorganic materials such as ceramics, glass-ceramics, or glasses. Such materials generally include oxide-based materials, such as, aluminum oxide, titanium oxide, chromium oxide, yttrium oxide, iron oxide, barium oxide, haffiium oxide, zirconium oxide, barium titanate, tantalum oxide, lead magnesium niobate, sodium-bismuth titanates, lithium tantalate and combinations and compound oxides thereof. According to a particular embodiment, the high-k dielectric includes at least one of, titanium oxide, chromium oxide, barium titanate, haffiium oxide, or zirconium oxide, or a combination or compound oxide thereof. Certain oxide-based species are particularly adapted to be combined with modifiers. For example, aluminum oxide and yttrium oxide alone may be combined with other materials to increase the dielectric constant of the high-k dielectric layer. Species such as iron oxide may be combined with other materials, typically oxide-based materials, to form a combination or compound oxide material having an increased resistivity.
As provided above, the high-k dielectric layer 157 can include an organic material. The organic material can include polymers, and may particularly include non-ionic polymers, and/or non-polar polymers. Generally suitable polymers can include polyolefins, such as polyethylene, polypropylene, and polybutene. Additionally, polymers such as polyimides and polyamides can be used. Other suitable polymer compositions can include, polyesters, polyethers, acrylates, and silicones, such as dialkylpolysiloxane and fluorosilicates. Such organic compounds facilitate reduced porosity and typically do not comprise greater than about 50 wt % of the high-k dielectric layer 157. Other embodiments utilize smaller amounts, such that the high-k dielectric layer 157 includes less than about 25 wt %, such as less than about 10 wt %, or even less than about 5.0 wt % of an organic compound.
Generally, the high-k dielectric layer 157 has a dielectric constant of not less than about 10. According to one embodiment, the high-k dielectric layer 157 has a dielectric constant of not less than about 15, such as not less than about 20, and in particular instances not less than about 25.
Generally, the high-k dielectric layer 157 is a robust layer having an average thickness of not less than about 100 microns. According to one embodiment, the high-k dielectric layer 157 has an average thickness of not less than about 200 microns, such as not less than about 300 microns. Still, the high-k dielectric layer 157 has an average thickness generally not greater than about 600 microns. In one embodiment, the high-k dielectric layer 157 has an average thickness within a range of between about 200 microns to about 500 microns.
After forming a high-k dielectric layer 157, patterning at step 109 may be carried out to pattern the conductive layer 153, resistive layer 155, and high-k dielectric layer 157. Patterning is generally carried out to form electrical pathways, depicted in the cross-sectional illustration of
Referring again to
The process of forming the low-k dielectric layer 159, particularly in the context of a non-selective deposition, can further include a selective removal process in which a portion of the low-k dielectric layer 159 is removed to expose the top surface of the electrode stacks 175. Such a selective removal process can include a mechanical or chemical process. According to one embodiment, a mechanical process can include a selective grinding or polishing step, such as one utilizing an abrasive having a particular hardness. The selective removal process can also include a chemical process, which may be used alone or in conjunction with a mechanical process, such as a chemical mechanical polishing process (CMP). Such a chemical process can include a selective etching process in which an etchant, such as an acid, is used to remove portions of the low-k dielectric layer 159.
Generally the low-k dielectric layer 159 has a dielectric constant not greater than about 10. According to one embodiment, the low-k dielectric layer 159 has a dielectric constant of not greater than about 8.0, such as not greater than about 5.0, not greater than about 3.0, or even not greater than about 2.0. In a particular embodiment, the dielectric constant of the low-k dielectric layer 159 is within a range of between about 2.0 and about 8.0.
Further, the low-k dielectric layer 159 is resistive. For example, the low-k dielectric layer may have a resistivity of not less than about 108 Ohm-cm, such as not less than about 109 Ohm-cm, or not greater than 1011 Ohm-cm. According to another embodiment, the resistivity of the low-k dielectric layer 159 is not less than about 1012 Ohm-cm, such as not less than about 1013 Ohm-cm, or not less than about 1014 Ohm-cm. In one embodiment, the resistivity of the low-k dielectric layer 159 is within a range of between about 109 Ohm-cm and about 1014 Ohm-cm. According to a particular embodiment, the low-k dielectric layer 159 has a resistivity that is at least 10 times greater than the resistivity of the resistive layer 155. In another embodiment, the resistivity of the low-k dielectric layer 159 is not less than about 100 times greater, or even, not less than about 1000 times greater than the resistivity of the resistive layer 155.
In further reference to the materials of the low-k dielectric layer, notably, the low-k dielectric layer 159 includes a material having a different phase than the material of the substrate, for example a different crystalline phase, often a different composition. Generally, the low-k dielectric layer 159 includes an inorganic material, such as a polycrystalline or amorphous material. Particularly suitable materials can include ceramic, glass-ceramic, or glass materials, such as for example, fluorine-based materials or oxide-based materials. Suitable oxide-based materials can include, for example silicon oxide or aluminum oxide. Such oxide-based materials can include compound oxides or multiphase materials. Additionally, the low-k dielectric layer 159 can incorporate an organic material. The organic material can include polymers, which may include non-ionic polymers, and/or non-polar polymers. Generally, suitable polymers can include polyolefins, such as polyethylene, polypropylene, and polybutene. Additionally, polymers such as polyimides and polyamides can be used. Other suitable polymer compositions can include, polyesters, polyethers, acrylates, and silicones, such as dialkylpolysiloxane and fluorosilicates.
According to one embodiment, the low-k dielectric layer utilizes both inorganic and organic components. Generally, the organic material is used as an additive or filler material for additional stabilization of the inorganic component. Accordingly, the concentration of such additives within the low-k dielectric layer is less than about 50 wt %, such as less than about 25 wt %, and in even less than about 10 wt %.
The low-k dielectric layer 159 typically has a thickness on the order of the total thickness of the electrode stacks 175. The low-k dielectric layer 159 generally has an average thickness of greater than about 100 microns, such as greater than about 300 microns. According to one embodiment, the low-k dielectric layer has an average thickness of less than about 600 microns, such as less than about 400 microns. Further, the low-k dielectric layer 159, the layer is generally dense. The low-k dielectric layer generally has a porosity of not greater than about 10 vol %, wherein such porosity is generally closed porosity. In another embodiment, the low-k dielectric layer has a porosity of not greater than about 5.0 vol %, such as not greater than about 2.0 vol %.
Generally, the low-k dielectric layer 159 has a thickness less than the total thickness of the electrode stacks 175, such that there is a step distance from the top surface of the electrode stacks 175 down to the top surface of the low-k dielectric layer. According to one embodiment, the average step distance is not less than about 5.0 microns, such as not less than about 10 microns, and even, at not less than about 20 microns.
According to a particular feature of an embodiment, the low-k and high-k dielectric layers have a particular dielectric constant ratio. Dielectric constant ratio is defined herein as the ratio between the dielectric constant of the low-k dielectric layer 159 and the dielectric constant of the high-k dielectric layer 157. In one embodiment, the dielectric ratio is not less than about 1.0:1.5, such as not less than 1.0:2.0. In another embodiment, the dielectric ratio is not less than about 1.0:2.5, or not less than about 1.0:3.0, or even not less than 1.0:4.0.
Referring to
In reference to the materials comprising the capping layer 161, the capping layer generally includes an inorganic material, such as a polycrystalline or amorphous material, which may include a ceramic, glass-ceramic, or glass material. Particularly suitable materials can include oxide-based materials, such as aluminum oxide and yttrium oxide, or combinations thereof. Such materials can be compound oxides or multiphase oxides. In reference to such oxide materials, generally the capping layer 161 comprises a high purity content of those oxides to reduce potential contamination to the workpieces. The capping layer 161 generally includes not less than about 75 wt % oxide-based material.
Generally the capping layer 161 is a thin layer in comparison to the dielectric layers. As such, the capping layer 161 generally has an average thickness of not greater than about 100 microns, such as not greater than about 75 microns, and in some instances not greater than about 50 microns. According to one particular embodiment, the capping layer 161 has an average thickness within a range of between about 10 microns and about 50 microns. According to various embodiments, the capping layer 161 has an average thickness limited by the thickness of the high-k dielectric layer 157, such that the average thickness of the capping layer is not greater than about 60% of the average thickness of the high-k dielectric layer 157. According to other embodiments, the average thickness of the capping layer 161 is not greater than about 50%, not greater than about 45%, or not greater than about 40% of the average thickness of the high-k dielectric layer 157. The thickness of the capping layer 161 may be further limited by average electrode spacing, discussed in more detail below.
Referring to
In particular reference to the electrode portions 205 and 203, as described previously, adjacent electrodes within the electrostatic chuck have opposite polarities such that a cathode is adjacent two anodes and vice versa. Accordingly, electrode portion 205 can be an anode and electrode portion 203 can be a cathode, or alternatively, electrode portion 205 can be a cathode and electrode portion 203 can be an anode.
As illustrated in this embodiment, the top surfaces of the resistive layer portions 209 and 207 protrude from surrounding layers and form the receiving surfaces 241 and 243 for receiving and holding the workpiece 217. Notably, the top surfaces 244, 245, and 246 (244-246) of the low-k dielectric portions 211, 213, and 215 are formed such that they are not co-planar with the receiving surfaces 241 and 243 and form a step as described above. Moreover, in another embodiment, the corners of the resistant layer portions 209 and 207 can be rounded, and particularly those corners at the receiving surfaces 241 and 243 can be rounded, to reduce the likelihood of arcing between electrode stacks 275 and 276. The radius of curvature of the rounded corners can be not less than about 1.0 micron, such as not less than about 5.0 microns, and even, not less than about 10 microns.
Referring to
The electrostatic chuck 300 further includes low-k dielectric portions 311, 313, and 315 overlying the substrate and disposed within gaps between the electrode stacks 375 and 376. The electrostatic chuck 300 further includes receiving surfaces 341 and 343, which protrude from the top surface for receiving a workpiece 325 which are defined by the top surfaces of the capping layer portions 321 and 323. Notably, while previous embodiments describe the capping layer as a conformal layer overlying the entire surface of the electrostatic chuck,
Referring to
Referring to
Generally, the width of the electrode pathways and the gaps have a relationship that can be expressed by a width ratio. As used herein, the width ratio is the width of the conductive pathways as compared to the width of the gaps. According to one embodiment, the width ratio is not less than about 0.05, such as not less than about 0.1, and in some instances not less than about 0.3. According to one particular embodiment, the width ratio is generally within a range of between 0.1 to about 0.9, such that the width ratio is generally not greater than about 1.0.
Moreover, the thickness of the capping layer may be limited by the average electrode spacing, or the width of the gaps. According to one embodiment, the average thickness of the capping layer is not greater than about 30% of the average width of the gaps. As such, the average thickness may be less by comparison, such that it is not greater than about 25%, or not greater than about 15%, or even not greater than about 10% of the average width of the gaps.
Referring to
In reference to the dimensions of the entire electrostatic chuck, according to one particular embodiment, the electrostatic chuck has a rectangular contour. As such, in one embodiment the electrostatic chuck has an average length of not less than about 0.5 meters, such as not less than about 0.75 meters, or even, not less than about 1.0 meter. Accordingly, the electrostatic chuck has a comparable width, and typically has an average width of not less than about 0.5 meters, such as not less than about 0.75 meters, and in some instances not less than about 1.0 meter.
This disclosure also provides a method of forming an electronic device using an electrostatic chuck as described in embodiments herein. Once the electrostatic chuck is provided within the processing chamber a workpiece can be provided to the work surface of the electrostatic chuck. According to embodiments herein, the work surface of the electrostatic chucks generally includes a high-k dielectric layer or a capping layer. The workpiece can be provided in proximity to the work surface. The workpiece can generally include an inorganic material and particularly is formed principally of a glass phase, such as a silicon-oxide based component. According to one embodiment, the workpiece is a display panel, intended for final application as a display, or the like. Notably, such displays can include liquid crystal displays (LCDs), plasma displays, electroluminescent displays, displays utilizing thin-film-transistors (TFTs), and the like.
Generally, the workpieces can be large and in some cases, rectangular in shape, such that they have a length of not less than about 0.25 m, such as not less than about 0.5 m or even not less than about 1.0 m. Accordingly, the average width of such workpieces is generally not less than about 0.25 m, such as not less than about 0.5 m, and still, not less than about 1.0 m.
According to one embodiment, an electrostatic chuck and workpiece can be provided within a processing chamber for processing. Generally, processing of the workpiece can include chemical processing, such as a photolithography and chemical processing, and more particularly can include a masking, etching, or deposition process, or a combination of all such processes. In one embodiment, processing of the workpiece includes etching, such as a plasma etching process. According to another embodiment, processing of the workpiece includes a thin-film deposition process, such as one utilizing a vapor deposition process, such as chemical vapor deposition (CVD), and particularly a plasma assisted CVD process.
According to one embodiment, processing of the workpiece includes forming electronic devices on the workpiece, such as transistors, and more particularly, processing of the workpiece includes forming a series of transistors, or an array of transistors, such as a TFT. As such, the workpiece can undergo multiple masking, deposition and etching processes. Moreover, such a process can include deposition of metals, semiconductive materials, and insulating materials.
Generally, such processing is undertaken at reduced pressures, and according to one embodiment, processing of the workpiece is done at a pressure of not greater than about 0.5 atm, such as not greater than about 0.3 atm, or not greater than about 0.1 atm.
According to embodiments described above, an electrostatic chuck having a bipolar design incorporating an interdigitated electrode pattern in cooperation with multiple layers is provided. In particular, present embodiments describe a combination of features including, a bipolar and interdigitated electrode design, patterned layers having particular compositions, geometries, and electrical characteristics, as well as a particular architectural design. The combination of features disclosed in the embodiments herein provide electrostatic chucks particularly well-suited for performing effective chucking operations in corrosive environments. In the particular context of large substrates, the embodiments herein disclose electrostatic chucks capable of holding large insulating workpieces, particularly insulating workpieces that require the use of large electrical potentials, such as those in excess of 3 kV. As such, the electrostatic chucks provided herein are well-suited to effectively hold such workpieces, avoid catastrophic failure, and exhibit improved durability.
While the invention has been illustrated and described in the context of specific embodiments, it is not intended to be limited to the details shown, since various modifications and substitutions can be made without departing in any way from the scope of the present invention. For example, additional or equivalent substitutes can be provided and additional or equivalent production steps can be employed. As such, further modifications and equivalents of the invention herein disclosed may occur to persons skilled in the art using no more than routine experimentation, and all such modifications and equivalents are believed to be within the scope of the invention as defined by the following claims.
The present application claims priority from U.S. Provisional Patent Application No. 60/871,880, filed Dec. 26, 2006, entitled “ELECTROSTATIC CHUCK AND METHOD OF FORMING”, naming inventor Matthew A. Simpson, which application is incorporated by reference herein in its entirety.
| Number | Date | Country | |
|---|---|---|---|
| 60871880 | Dec 2006 | US |
