Marcoux et al., "Methods of End Point Detection for Plasma Etching," Solid State Technology, pp. 115-122, Apr. 1981. |
Hitchman et al., "A Simple Method of End-Point Determination for Plasma Etching," J. Vac. Sci. Technol., vol. 17, No. 6, pp. 1378-1381, Nov./Dec. 1980. |
Fok, "Plasma Etching of Aluminium Films Using CCl.sub.4," ECS Extended Abstracts, vol. 80-1, Spring Mtg., St. Louis, pp. 301-303, May 11-16, 1980. |
Ukai et al., "End-Point Determination of Aluminum Reactive Ion Etching by Discharge Impedance Monitoring," J. Vac. Sci. Technol., vol. 16, No. 2, pp. 385-387, Mar./Apr. 1979. |
Thomas et al., "Use of Chemically-Reactive Gas Plasmas in Preparing Specimens for Scanning Electron Microscopy and Electron Probe Microanalysis," _Scanning Electron Microscopy/1974 (Part 1), Proceedings of the Seventh Annual Scanning Electron Microscope Symposium, IIT Research Institute, Chicago, Apr. 1974, pp. 84-92 and 323-326. |
Gorin, "Monitoring of Plasma Chemical Reaction for Ashing and Etching," (Unpublished) Invention Disclosure of the Tegal Corp., Mar. 20, 1974. |