Monitoring and controlling tubes by information coming from the object and/or discharge

Industry

CPC
H01J37/32935

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/32935Monitoring and controlling tubes by information coming from the object and/or discharge

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Glow plasma stabilization
- Patent number 12,362,140
- Issue date Jul 15, 2025
- Servomex Group Limited
- Bahram Alizadeh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for measuring magnetic fields in PVD system
- Patent number 12,360,179
- Issue date Jul 15, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Wen-Hao Cheng
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
System, method, and apparatus for controlling ion energy distributi...
- Patent number 12,354,836
- Issue date Jul 8, 2025
- Advanced Energy Industries, Inc.
- Victor Brouk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing device, substrate processing system, control m...
- Patent number 12,354,841
- Issue date Jul 8, 2025
- Tokyo Electron Limited
- Hiroshi Tsujimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
End point detection method and apparatus for anisotropic etching us...
- Patent number 12,347,663
- Issue date Jul 1, 2025
- SanDisk Technologies, Inc.
- Shoichi Murakami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
RF impedance matching network
- Patent number 12,334,306
- Issue date Jun 17, 2025
- ASM America, Inc.
- Imran Ahmed Bhutta
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma generation quality monitoring using multi-channel sensor data
- Patent number 12,327,714
- Issue date Jun 10, 2025
- Applied Materials, Inc.
- Jeremy Smith
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-state RF pulsing to control mask shape and breaking selectivi...
- Patent number 12,322,571
- Issue date Jun 3, 2025
- Lam Research Corporation
- Nikhil Dole
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
RF immune sensor probe for monitoring a temperature of an electrost...
- Patent number 12,308,265
- Issue date May 20, 2025
- Lam Research Corporation
- Siyuan Tian
- G01 - MEASURING TESTING
Information Patent Grant
Throughput improvement with interval conditioning purging
- Patent number 12,291,777
- Issue date May 6, 2025
- Lam Research Corporation
- Chun-Hao Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Cylindrical cavity with impedance shifting by irises in a power-sup...
- Patent number 12,288,675
- Issue date Apr 29, 2025
- Applied Materials, Inc.
- Satoru Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and substrate transfer position adju...
- Patent number 12,288,678
- Issue date Apr 29, 2025
- Tokyo Electron Limited
- Joji Takayoshi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for filtering radio frequencies from a signal o...
- Patent number 12,283,451
- Issue date Apr 22, 2025
- Lam Research Corporation
- Vince Burkhart
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma viewport
- Patent number 12,272,534
- Issue date Apr 8, 2025
- Lam Researh Corporation
- Bin Luo
- G02 - OPTICS
Information Patent Grant
Substrate test apparatus and method for measuring dechucking force...
- Patent number 12,261,072
- Issue date Mar 25, 2025
- Semes Co., Ltd.
- Jong Ho Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Protection system for switches in direct drive circuits of substrat...
- Patent number 12,261,029
- Issue date Mar 25, 2025
- Lam Research Corporation
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor process apparatus and plasma ignition method
- Patent number 12,261,022
- Issue date Mar 25, 2025
- BEIJING NAURA MICROELECTRONICS EQUIPMENT CO., LTD.
- Jing Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and systems for depositing a layer
- Patent number 12,255,053
- Issue date Mar 18, 2025
- ASM IP Holding B.V.
- Daniele Piumi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Diagnostic method and system for measuring potential and electric f...
- Patent number 12,255,056
- Issue date Mar 18, 2025
- Southwest Jiaotong University
- Yuhong Xu
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Apparatus to control ion energy
- Patent number 12,255,048
- Issue date Mar 18, 2025
- Advanced Energy Industries, Inc.
- Victor Brouk
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Carbon based depositions used for critical dimension control during...
- Patent number 12,249,514
- Issue date Mar 11, 2025
- Lam Research Corporation
- Jon Henri
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and systems for transmission and detection of free radicals
- Patent number 12,247,920
- Issue date Mar 11, 2025
- Wisconsin Alumni Research Foundation
- J. Leon Shohet
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Plasma measurement method
- Patent number 12,237,157
- Issue date Feb 25, 2025
- Tokyo Electron Limited
- Eiki Kamata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma reactor having array of coaxial multiple pins and processing...
- Patent number 12,230,481
- Issue date Feb 18, 2025
- HANGZHOU CITY UNIVERSITY
- Qi Qiu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Radio frequency (RF) system with embedded RF signal pickups
- Patent number 12,224,164
- Issue date Feb 11, 2025
- Tokyo Electron Limited
- Chelsea Dubose
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Performing radio frequency matching control using a model-based dig...
- Patent number 12,211,670
- Issue date Jan 28, 2025
- Applied Materials, Inc.
- Tao Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Recipe updating method
- Patent number 12,211,678
- Issue date Jan 28, 2025
- Tokyo Electron Limited
- Masafumi Urakawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cover with a sensor system for a configurable measuring system for...
- Patent number 12,183,561
- Issue date Dec 31, 2024
- SOLERAS ADVANCED COATINGS BV
- Ivan Van De Putte
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film forming position misalignment correction method and film formi...
- Patent number 12,180,580
- Issue date Dec 31, 2024
- Tokyo Electron Limited
- Atsushi Takeuchi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Terminal device and RF power supply device
- Patent number 12,175,569
- Issue date Dec 24, 2024
- Hitachi Kokusai Electric Inc.
- Naoto Takahashi
- G06 - COMPUTING CALCULATING COUNTING

Patents Applicationslast 30 patents

Information Patent Application
PULSING CONTROL MATCH NETWORK AND GENERATOR
- Publication number 20250232955
- Publication date Jul 17, 2025
- COMET TECHNOLOGIES USA, INC.
- Stephen E. SAVAS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS, PLASMA PROCESSING METHOD, AND WAFER PR...
- Publication number 20250233023
- Publication date Jul 17, 2025
- Samsung Electronics Co., Ltd.
- Jewon Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND POWER SUPPLY SYSTEM
- Publication number 20250232954
- Publication date Jul 17, 2025
- TOKYO ELECTRON LIMITED
- Mitsuhiro IWANO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSING SYSTEM AND PROCESSING METHOD
- Publication number 20250232967
- Publication date Jul 17, 2025
- TOKYO ELECTRON LIMITED
- Norihiko AMIKURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA VIEWPORT
- Publication number 20250226191
- Publication date Jul 10, 2025
- LAM RESEARCH CORPORATION
- Bin Luo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20250218743
- Publication date Jul 3, 2025
- SEMES CO., LTD.
- In Ho KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REAL-TIME MEASUREMENT OF MICROWAVE RESONATORS AS PLASMA DIAGNOSTICS...
- Publication number 20250218751
- Publication date Jul 3, 2025
- Applied Materials, Inc.
- DAVID PETERSON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Fast Frequency Tracking Control for Radiofrequency Power Amplifiers...
- Publication number 20250218726
- Publication date Jul 3, 2025
- LAM RESEARCH CORPORATION
- Sanghyeon Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR AND METHOD OF PROCESSING SUBSTRATE
- Publication number 20250218746
- Publication date Jul 3, 2025
- SEMES CO., LTD.
- In Hee KANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND CONTROL METHOD
- Publication number 20250210308
- Publication date Jun 26, 2025
- TOKYO ELECTRON LIMITED
- Takamitsu TAKAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20250210331
- Publication date Jun 26, 2025
- TOKYO ELECTRON LIMITED
- Takumi IMAHASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND SYSTEMS FOR DEPOSITING A LAYER
- Publication number 20250201526
- Publication date Jun 19, 2025
- ASM IP HOLDING B.V.
- Daniele Piumi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20250191880
- Publication date Jun 12, 2025
- TOKYO ELECTRON LIMITED
- Yohei YAMAZAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PULSED VOLTAGE WAVEFORM BIASING OF PLASMA
- Publication number 20250191884
- Publication date Jun 12, 2025
- Applied Materials, Inc.
- Shreeram Jyoti DASH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CARBON BASED DEPOSITIONS USED FOR CRITICAL DIMENSION CONTROL DURING...
- Publication number 20250191926
- Publication date Jun 12, 2025
- LAM RESEARCH CORPORATION
- Jon HENRI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROGRAMMABLE PRECISION ETCHING
- Publication number 20250183019
- Publication date Jun 5, 2025
- Board of Regents, The University of Texas System
- Sidlgata V. Sreenivasan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTROL OF PLASMA SHEATH WITH BIAS SUPPLIES
- Publication number 20250166970
- Publication date May 22, 2025
- Advanced Energy Industries, Inc.
- Denis Shaw
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MONITORING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20250157799
- Publication date May 15, 2025
- TOKYO ELECTRON LIMITED
- Mohd Fairuz BIN BUDIMAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20250149316
- Publication date May 8, 2025
- TOKYO ELECTRON LIMITED
- Naoki MATSUMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD TO MEASURE ION PROPERTIES IN A PLASMA SYSTEM
- Publication number 20250132138
- Publication date Apr 24, 2025
- TOKYO ELECTRON LIMITED
- Zhiying Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA MODULATION APPARATUS FOR SUBSTRATE PROCESSING SYSTEM
- Publication number 20250132131
- Publication date Apr 24, 2025
- ASM IP HOLDING B.V.
- Akshay Gunaji
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTROL METHOD OF SUBSTRATE PROCESSING APPARATUS INCLUDING PARTIALL...
- Publication number 20250125130
- Publication date Apr 17, 2025
- TOKYO ELECTRON LIMITED
- Sho KUMAKURA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma Discharge Monitoring Method
- Publication number 20250118531
- Publication date Apr 10, 2025
- UCL Business LTD
- M. Emre SENER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR CENTRAL FREQUENCY TUNING
- Publication number 20250118534
- Publication date Apr 10, 2025
- LAM RESEARCH CORPORATION
- Ranadeep Bhowmick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Processing Apparatus and Method for Measuring Resonance Freq...
- Publication number 20250095973
- Publication date Mar 20, 2025
- TOKYO ELECTRON LIMITED
- Kazushi KANEKO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PULSED VOLTAGE-ASSISTED PLASMA STRIKE
- Publication number 20250087461
- Publication date Mar 13, 2025
- Applied Materials, Inc.
- Shreeram Jyoti DASH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RADIO-FREQUENCY (RF) MATCHING NETWORK AND TUNING TECHNIQUE
- Publication number 20250087462
- Publication date Mar 13, 2025
- Applied Materials, Inc.
- Yue GUO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MODEL REFERENCE ADAPTIVE CONTROL WITH SIGNUM PROJECTION TENSOR OPER...
- Publication number 20250087473
- Publication date Mar 13, 2025
- Advanced Energy Industries, Inc.
- Chad S. Samuels
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INSPECTING APPARATUS AND SEMICONDUCTOR MANUFACTURING EQUIPMENT INCL...
- Publication number 20250085320
- Publication date Mar 13, 2025
- Hyo Seong SEONG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EARLY WARNING SYSTEMS AND METHODS FOR DETERMINING CAPACITOR FAILURES
- Publication number 20250079140
- Publication date Mar 6, 2025
- LAM RESEARCH CORPORATION
- Sunil Kapoor
- H01 - BASIC ELECTRIC ELEMENTS

Monitoring and controlling tubes by information coming from the object and/or discharge

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Glow plasma stabilization

System and method for measuring magnetic fields in PVD system

System, method, and apparatus for controlling ion energy distributi...

Substrate processing device, substrate processing system, control m...

End point detection method and apparatus for anisotropic etching us...

RF impedance matching network

Plasma generation quality monitoring using multi-channel sensor data

Multi-state RF pulsing to control mask shape and breaking selectivi...

RF immune sensor probe for monitoring a temperature of an electrost...

Throughput improvement with interval conditioning purging

Cylindrical cavity with impedance shifting by irises in a power-sup...

Substrate processing apparatus and substrate transfer position adju...

Systems and methods for filtering radio frequencies from a signal o...

Plasma viewport

Substrate test apparatus and method for measuring dechucking force...

Protection system for switches in direct drive circuits of substrat...

Semiconductor process apparatus and plasma ignition method

Methods and systems for depositing a layer

Diagnostic method and system for measuring potential and electric f...

Apparatus to control ion energy

Carbon based depositions used for critical dimension control during...

Methods and systems for transmission and detection of free radicals

Plasma measurement method

Plasma reactor having array of coaxial multiple pins and processing...

Radio frequency (RF) system with embedded RF signal pickups

Performing radio frequency matching control using a model-based dig...

Recipe updating method

Cover with a sensor system for a configurable measuring system for...

Film forming position misalignment correction method and film formi...

Terminal device and RF power supply device

Patents Applicationslast 30 patents

PULSING CONTROL MATCH NETWORK AND GENERATOR

PLASMA PROCESSING APPARATUS, PLASMA PROCESSING METHOD, AND WAFER PR...

PLASMA PROCESSING APPARATUS AND POWER SUPPLY SYSTEM

PROCESSING SYSTEM AND PROCESSING METHOD

PLASMA VIEWPORT

SUBSTRATE PROCESSING APPARATUS

REAL-TIME MEASUREMENT OF MICROWAVE RESONATORS AS PLASMA DIAGNOSTICS...

Fast Frequency Tracking Control for Radiofrequency Power Amplifiers...

APPARATUS FOR AND METHOD OF PROCESSING SUBSTRATE

PLASMA PROCESSING APPARATUS AND CONTROL METHOD

PLASMA PROCESSING APPARATUS

METHODS AND SYSTEMS FOR DEPOSITING A LAYER

PLASMA PROCESSING APPARATUS

PULSED VOLTAGE WAVEFORM BIASING OF PLASMA

CARBON BASED DEPOSITIONS USED FOR CRITICAL DIMENSION CONTROL DURING...

PROGRAMMABLE PRECISION ETCHING

CONTROL OF PLASMA SHEATH WITH BIAS SUPPLIES

MONITORING METHOD AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

SYSTEM AND METHOD TO MEASURE ION PROPERTIES IN A PLASMA SYSTEM

PLASMA MODULATION APPARATUS FOR SUBSTRATE PROCESSING SYSTEM

CONTROL METHOD OF SUBSTRATE PROCESSING APPARATUS INCLUDING PARTIALL...

Plasma Discharge Monitoring Method

SYSTEMS AND METHODS FOR CENTRAL FREQUENCY TUNING

Plasma Processing Apparatus and Method for Measuring Resonance Freq...

PULSED VOLTAGE-ASSISTED PLASMA STRIKE

RADIO-FREQUENCY (RF) MATCHING NETWORK AND TUNING TECHNIQUE

MODEL REFERENCE ADAPTIVE CONTROL WITH SIGNUM PROJECTION TENSOR OPER...

INSPECTING APPARATUS AND SEMICONDUCTOR MANUFACTURING EQUIPMENT INCL...

EARLY WARNING SYSTEMS AND METHODS FOR DETERMINING CAPACITOR FAILURES