Monitoring and controlling tubes by information coming from the object and/or discharge

Industry

CPC
H01J37/32935

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/32935Monitoring and controlling tubes by information coming from the object and/or discharge

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Multi-state RF pulsing to control mask shape and breaking selectivi...
- Patent number 12,322,571
- Issue date Jun 3, 2025
- Lam Research Corporation
- Nikhil Dole
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
RF immune sensor probe for monitoring a temperature of an electrost...
- Patent number 12,308,265
- Issue date May 20, 2025
- Lam Research Corporation
- Siyuan Tian
- G01 - MEASURING TESTING
Information Patent Grant
Throughput improvement with interval conditioning purging
- Patent number 12,291,777
- Issue date May 6, 2025
- Lam Research Corporation
- Chun-Hao Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Cylindrical cavity with impedance shifting by irises in a power-sup...
- Patent number 12,288,675
- Issue date Apr 29, 2025
- Applied Materials, Inc.
- Satoru Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and substrate transfer position adju...
- Patent number 12,288,678
- Issue date Apr 29, 2025
- Tokyo Electron Limited
- Joji Takayoshi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for filtering radio frequencies from a signal o...
- Patent number 12,283,451
- Issue date Apr 22, 2025
- Lam Research Corporation
- Vince Burkhart
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma viewport
- Patent number 12,272,534
- Issue date Apr 8, 2025
- Lam Researh Corporation
- Bin Luo
- G02 - OPTICS
Information Patent Grant
Substrate test apparatus and method for measuring dechucking force...
- Patent number 12,261,072
- Issue date Mar 25, 2025
- Semes Co., Ltd.
- Jong Ho Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Protection system for switches in direct drive circuits of substrat...
- Patent number 12,261,029
- Issue date Mar 25, 2025
- Lam Research Corporation
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor process apparatus and plasma ignition method
- Patent number 12,261,022
- Issue date Mar 25, 2025
- BEIJING NAURA MICROELECTRONICS EQUIPMENT CO., LTD.
- Jing Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and systems for depositing a layer
- Patent number 12,255,053
- Issue date Mar 18, 2025
- ASM IP Holding B.V.
- Daniele Piumi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Diagnostic method and system for measuring potential and electric f...
- Patent number 12,255,056
- Issue date Mar 18, 2025
- Southwest Jiaotong University
- Yuhong Xu
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Apparatus to control ion energy
- Patent number 12,255,048
- Issue date Mar 18, 2025
- Advanced Energy Industries, Inc.
- Victor Brouk
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Carbon based depositions used for critical dimension control during...
- Patent number 12,249,514
- Issue date Mar 11, 2025
- Lam Research Corporation
- Jon Henri
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and systems for transmission and detection of free radicals
- Patent number 12,247,920
- Issue date Mar 11, 2025
- Wisconsin Alumni Research Foundation
- J. Leon Shohet
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Plasma measurement method
- Patent number 12,237,157
- Issue date Feb 25, 2025
- Tokyo Electron Limited
- Eiki Kamata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma reactor having array of coaxial multiple pins and processing...
- Patent number 12,230,481
- Issue date Feb 18, 2025
- HANGZHOU CITY UNIVERSITY
- Qi Qiu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Radio frequency (RF) system with embedded RF signal pickups
- Patent number 12,224,164
- Issue date Feb 11, 2025
- Tokyo Electron Limited
- Chelsea Dubose
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Performing radio frequency matching control using a model-based dig...
- Patent number 12,211,670
- Issue date Jan 28, 2025
- Applied Materials, Inc.
- Tao Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Recipe updating method
- Patent number 12,211,678
- Issue date Jan 28, 2025
- Tokyo Electron Limited
- Masafumi Urakawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cover with a sensor system for a configurable measuring system for...
- Patent number 12,183,561
- Issue date Dec 31, 2024
- SOLERAS ADVANCED COATINGS BV
- Ivan Van De Putte
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film forming position misalignment correction method and film formi...
- Patent number 12,180,580
- Issue date Dec 31, 2024
- Tokyo Electron Limited
- Atsushi Takeuchi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Terminal device and RF power supply device
- Patent number 12,175,569
- Issue date Dec 24, 2024
- Hitachi Kokusai Electric Inc.
- Naoto Takahashi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Early warning systems and methods for determining capacitor failures
- Patent number 12,176,189
- Issue date Dec 24, 2024
- Lam Research Corporation
- Sunil Kapoor
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Synchronization of bias supplies
- Patent number 12,176,184
- Issue date Dec 24, 2024
- Advanced Energy Industries, Inc.
- Denis Shaw
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method for manufacturing semiconductor structure
- Patent number 12,165,851
- Issue date Dec 10, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yu-Lun Ke
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cover ring to mitigate carbon contamination in plasma doping chamber
- Patent number 12,165,852
- Issue date Dec 10, 2024
- Applied Materials, Inc.
- Vikram M. Bhosle
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inductively coupled plasma light source
- Patent number 12,165,856
- Issue date Dec 10, 2024
- Hamamatsu Photonics K.K.
- Stephen F. Horne
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Spatial control of plasma processing environments
- Patent number 12,159,767
- Issue date Dec 3, 2024
- Advanced Energy Industries, Inc.
- Daniel Carter
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus to control a waveform
- Patent number 12,154,759
- Issue date Nov 26, 2024
- Advanced Energy Industries, Inc.
- Daniel Carter
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PROGRAMMABLE PRECISION ETCHING
- Publication number 20250183019
- Publication date Jun 5, 2025
- Board of Regents, The University of Texas System
- Sidlgata V. Sreenivasan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTROL OF PLASMA SHEATH WITH BIAS SUPPLIES
- Publication number 20250166970
- Publication date May 22, 2025
- Advanced Energy Industries, Inc.
- Denis Shaw
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MONITORING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20250157799
- Publication date May 15, 2025
- TOKYO ELECTRON LIMITED
- Mohd Fairuz BIN BUDIMAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20250149316
- Publication date May 8, 2025
- TOKYO ELECTRON LIMITED
- Naoki MATSUMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD TO MEASURE ION PROPERTIES IN A PLASMA SYSTEM
- Publication number 20250132138
- Publication date Apr 24, 2025
- TOKYO ELECTRON LIMITED
- Zhiying Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA MODULATION APPARATUS FOR SUBSTRATE PROCESSING SYSTEM
- Publication number 20250132131
- Publication date Apr 24, 2025
- ASM IP HOLDING B.V.
- Akshay Gunaji
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTROL METHOD OF SUBSTRATE PROCESSING APPARATUS INCLUDING PARTIALL...
- Publication number 20250125130
- Publication date Apr 17, 2025
- TOKYO ELECTRON LIMITED
- Sho KUMAKURA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma Discharge Monitoring Method
- Publication number 20250118531
- Publication date Apr 10, 2025
- UCL Business LTD
- M. Emre SENER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR CENTRAL FREQUENCY TUNING
- Publication number 20250118534
- Publication date Apr 10, 2025
- LAM RESEARCH CORPORATION
- Ranadeep Bhowmick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Processing Apparatus and Method for Measuring Resonance Freq...
- Publication number 20250095973
- Publication date Mar 20, 2025
- TOKYO ELECTRON LIMITED
- Kazushi KANEKO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PULSED VOLTAGE-ASSISTED PLASMA STRIKE
- Publication number 20250087461
- Publication date Mar 13, 2025
- Applied Materials, Inc.
- Shreeram Jyoti DASH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RADIO-FREQUENCY (RF) MATCHING NETWORK AND TUNING TECHNIQUE
- Publication number 20250087462
- Publication date Mar 13, 2025
- Applied Materials, Inc.
- Yue GUO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MODEL REFERENCE ADAPTIVE CONTROL WITH SIGNUM PROJECTION TENSOR OPER...
- Publication number 20250087473
- Publication date Mar 13, 2025
- Advanced Energy Industries, Inc.
- Chad S. Samuels
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INSPECTING APPARATUS AND SEMICONDUCTOR MANUFACTURING EQUIPMENT INCL...
- Publication number 20250085320
- Publication date Mar 13, 2025
- Hyo Seong SEONG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EARLY WARNING SYSTEMS AND METHODS FOR DETERMINING CAPACITOR FAILURES
- Publication number 20250079140
- Publication date Mar 6, 2025
- LAM RESEARCH CORPORATION
- Sunil Kapoor
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POWER SUPPLY ARRANGEMENT, PLASMA GENERATING DEVICE AND METHOD FOR C...
- Publication number 20250079125
- Publication date Mar 6, 2025
- TRUMPF Hüttinger GmbH + Co. KG
- Jan Peter Engelstaedter
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IGNITION CONTROL METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20250079139
- Publication date Mar 6, 2025
- TOKYO ELECTRON LIMITED
- Takeshi Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SENSOR DEVICE AND SYSTEM USING THE SAME
- Publication number 20250069846
- Publication date Feb 27, 2025
- Samsung Electronics Co., Ltd.
- Solhee IN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IN SITU REAL-TIME SENSING AND COMPENSATION OF NON-UNIFORMITIES IN S...
- Publication number 20250069866
- Publication date Feb 27, 2025
- LAM RESEARCH CORPORATION
- Changyou JING
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Inductively Coupled Plasma Light Source
- Publication number 20250069870
- Publication date Feb 27, 2025
- Hamamatsu Photonics K. K.
- Stephen F. Horne
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD FOR MANUFACTURING SEMICONDUCTOR STRUCTURE
- Publication number 20250069860
- Publication date Feb 27, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yu-Lun KE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR ION ENERGY ANALYSIS OF PLASMA PROCESSES
- Publication number 20250054740
- Publication date Feb 13, 2025
- Impedans Ltd
- Paul SCULLIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING DEVICE AND SUBSTRATE PROCESSING METHOD FOR IMP...
- Publication number 20250054803
- Publication date Feb 13, 2025
- PSK Holdings Inc.
- Gunwoo LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTROL AND PREDICTION OF MULTIPLE PLASMA COUPLING SURFACES AND COR...
- Publication number 20250037973
- Publication date Jan 30, 2025
- Applied Materials, Inc.
- David Coumou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM FOR MONITORING PERFORMANCE OF ELECTROSTATIC CHUCKS IN SUBSTR...
- Publication number 20250022740
- Publication date Jan 16, 2025
- LAM RESEARCH CORPORATION
- Liwei AN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VAPOR INJECTION SYSTEM FOR A PLASMA REACTOR AND METHOD OF USE THEREOF
- Publication number 20250022687
- Publication date Jan 16, 2025
- Nox Box Technologies LLC
- Joseph E. Lewis
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CLOSED-LOOP MULTIPLE-OUTPUT RADIO FREQUENCY (RF) MATCHING
- Publication number 20250015819
- Publication date Jan 9, 2025
- LAM RESEARCH CORPORATION
- Eller Y. Juco
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH POWER GENERATOR AND METHOD OF SUPPLYING HIGH POWER PULSES
- Publication number 20250006463
- Publication date Jan 2, 2025
- TRUMPF Huettinger Sp. z o. o.
- Andrzej KLIMCZAK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH POWER GENERATOR AND METHOD OF SUPPLYING HIGH POWER PULSES
- Publication number 20240429024
- Publication date Dec 26, 2024
- TRUMPF Huettinger Sp. z o. o.
- Andrzej KLIMCZAK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RF REFERENCE MEASURING CIRCUIT FOR A DIRECT DRIVE SYSTEM SUPPLYING...
- Publication number 20240429035
- Publication date Dec 26, 2024
- LAM RESEARCH CORPORATION
- Maolin LONG
- H01 - BASIC ELECTRIC ELEMENTS

Monitoring and controlling tubes by information coming from the object and/or discharge

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Multi-state RF pulsing to control mask shape and breaking selectivi...

RF immune sensor probe for monitoring a temperature of an electrost...

Throughput improvement with interval conditioning purging

Cylindrical cavity with impedance shifting by irises in a power-sup...

Substrate processing apparatus and substrate transfer position adju...

Systems and methods for filtering radio frequencies from a signal o...

Plasma viewport

Substrate test apparatus and method for measuring dechucking force...

Protection system for switches in direct drive circuits of substrat...

Semiconductor process apparatus and plasma ignition method

Methods and systems for depositing a layer

Diagnostic method and system for measuring potential and electric f...

Apparatus to control ion energy

Carbon based depositions used for critical dimension control during...

Methods and systems for transmission and detection of free radicals

Plasma measurement method

Plasma reactor having array of coaxial multiple pins and processing...

Radio frequency (RF) system with embedded RF signal pickups

Performing radio frequency matching control using a model-based dig...

Recipe updating method

Cover with a sensor system for a configurable measuring system for...

Film forming position misalignment correction method and film formi...

Terminal device and RF power supply device

Early warning systems and methods for determining capacitor failures

Synchronization of bias supplies

Plasma processing method for manufacturing semiconductor structure

Cover ring to mitigate carbon contamination in plasma doping chamber

Inductively coupled plasma light source

Spatial control of plasma processing environments

Apparatus to control a waveform

Patents Applicationslast 30 patents

PROGRAMMABLE PRECISION ETCHING

CONTROL OF PLASMA SHEATH WITH BIAS SUPPLIES

MONITORING METHOD AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

SYSTEM AND METHOD TO MEASURE ION PROPERTIES IN A PLASMA SYSTEM

PLASMA MODULATION APPARATUS FOR SUBSTRATE PROCESSING SYSTEM

CONTROL METHOD OF SUBSTRATE PROCESSING APPARATUS INCLUDING PARTIALL...

Plasma Discharge Monitoring Method

SYSTEMS AND METHODS FOR CENTRAL FREQUENCY TUNING

Plasma Processing Apparatus and Method for Measuring Resonance Freq...

PULSED VOLTAGE-ASSISTED PLASMA STRIKE

RADIO-FREQUENCY (RF) MATCHING NETWORK AND TUNING TECHNIQUE

MODEL REFERENCE ADAPTIVE CONTROL WITH SIGNUM PROJECTION TENSOR OPER...

INSPECTING APPARATUS AND SEMICONDUCTOR MANUFACTURING EQUIPMENT INCL...

EARLY WARNING SYSTEMS AND METHODS FOR DETERMINING CAPACITOR FAILURES

POWER SUPPLY ARRANGEMENT, PLASMA GENERATING DEVICE AND METHOD FOR C...

IGNITION CONTROL METHOD AND SUBSTRATE PROCESSING APPARATUS

SENSOR DEVICE AND SYSTEM USING THE SAME

IN SITU REAL-TIME SENSING AND COMPENSATION OF NON-UNIFORMITIES IN S...

Inductively Coupled Plasma Light Source

PLASMA PROCESSING METHOD FOR MANUFACTURING SEMICONDUCTOR STRUCTURE

APPARATUS FOR ION ENERGY ANALYSIS OF PLASMA PROCESSES

SUBSTRATE PROCESSING DEVICE AND SUBSTRATE PROCESSING METHOD FOR IMP...

CONTROL AND PREDICTION OF MULTIPLE PLASMA COUPLING SURFACES AND COR...

SYSTEM FOR MONITORING PERFORMANCE OF ELECTROSTATIC CHUCKS IN SUBSTR...

VAPOR INJECTION SYSTEM FOR A PLASMA REACTOR AND METHOD OF USE THEREOF

CLOSED-LOOP MULTIPLE-OUTPUT RADIO FREQUENCY (RF) MATCHING

HIGH POWER GENERATOR AND METHOD OF SUPPLYING HIGH POWER PULSES

HIGH POWER GENERATOR AND METHOD OF SUPPLYING HIGH POWER PULSES

RF REFERENCE MEASURING CIRCUIT FOR A DIRECT DRIVE SYSTEM SUPPLYING...