Claims
- 1. An energy sensitive material comprising:
- a photoacid generator, a polymer that is a copolymer of at least a first monomer having the general structure selected from the group consisting of: ##STR7## wherein R.sub.A is a lower alkylene moiety that contains 4 or fewer carbon atoms, R.sub.B is an alkyl group or an aryl alkyl group, X is selected from the group consisting of NHSO.sub.2 and SO.sub.2 NH, and R.sub.C is an aliphatic or aromatic moiety that contains ethylenic unsaturation and a second monomer selected from the group consisting of styrene monomers, acetoxystyrene monomers, methacrylate monomers, and maleimide monomers, wherein at least 10 mole percent of the repeat units in the copolymer have a sulfonamide moiety, NHSO.sub.2, and an acid-sensitive component selected from the group consisting of acid labile substituent groups on the second monomer and a dissolution inhibitor and wherein the energy-sensitive resist material after being exposed to radiation at a wavelength in the range of about 190 nm to 370 nm is substantially more soluble in a solution of aqueous base than the energy-sensitive material before being exposed to the radiation.
- 2. The energy sensitive material of claim 1 wherein the polymer is the copolymerization product of about 30 mole percent to about 90 mole percent of a vinylphenylalkylenesulfonamide monomer and about 10 to about 50 mole percent of a second monomer wherein the acid-sensitive component is the second monomer and the second monomer is a styrene with an acid-labile substituent group.
- 3. The energy sensitive resist material of claim 2 wherein the resist polymer is the copolymerization product of about 20 to about 40 mole percent of a third monomer wherein the third monomer is selected from the group consisting of SO.sub.2, acetoxystyrene monomers and trimethylsilylstyrene monomers.
- 4. The energy-sensitive resist material of claim 1 wherein the acid-sensitive component is a dissolution inhibitor wherein the polymer is a copolymer of the sulfonamide monomer and a monomer selected from the group consisting of styrene monomers, acetoxystyrene monomers, methacrylate monomers, and maleimide monomers.
- 5. The energy sensitive material of claim 1 wherein the first monomer has a general structure that is selected from the group consisting of: ##STR8## wherein R' is a lower alkyl group.
- 6. The energy sensitive material of claim 5 wherein R.sub.A is selected from the group consisting of methylene, ethylene, and propylene.
Parent Case Info
This application is a division of application Ser. No. 08/399,400, filed on Mar. 7, 1995, now abandoned.
US Referenced Citations (9)
Foreign Referenced Citations (2)
Number |
Date |
Country |
0174405 |
Oct 1983 |
JPX |
58-174405 |
Oct 1993 |
JPX |
Non-Patent Literature Citations (2)
Entry |
McGraw-Hill Dictionary of Chemical Terms, Sybil P. Parker, ed, McGraw-Hill Book Company, New York, NY, 1984, p. 408. |
Adin et al. 18436, "Inhibition of image formation utilizing cobalt (III) complexes", Research Disclosure, Aug. 1979, pp. 446-454. |
Divisions (1)
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Number |
Date |
Country |
Parent |
399400 |
Mar 1995 |
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