with organic non-macromolecular light-sensitive compounds not otherwise provided for

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G03F7/0045

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GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/0045with organic non-macromolecular light-sensitive compounds not otherwise provided for

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Photosensitive composition
- Patent number 12,210,284
- Issue date Jan 28, 2025
- XSYS Germany GmbH
- Thomas Paulöhrl
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for preparing pixel define layer
- Patent number 12,207,498
- Issue date Jan 21, 2025
- DUK SAN NEOLUX CO., LTD.
- Hyunsang Cho
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition and patterning process
- Patent number 12,204,245
- Issue date Jan 21, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Metal oxide resist patterning with electrical field guided post-exp...
- Patent number 12,204,246
- Issue date Jan 21, 2025
- Applied Materials, Inc.
- Huixiong Dai
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Positive photosensitive resin composition, positive photosensitive...
- Patent number 12,195,568
- Issue date Jan 14, 2025
- Shin-Etsu Chemical Co., Ltd.
- Masashi Iio
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method of manufacturing a semiconductor device
- Patent number 12,189,293
- Issue date Jan 7, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chieh-Hsin Hsieh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Production method for resist composition purified product, resist p...
- Patent number 12,186,715
- Issue date Jan 7, 2025
- Tokyo Ohka Kogyo Co., Ltd.
- Akihiko Nakata
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Photoresist composition and method of forming photoresist pattern
- Patent number 12,189,287
- Issue date Jan 7, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Li-Po Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist compositions and semiconductor fabrication methods using the...
- Patent number 12,181,799
- Issue date Dec 31, 2024
- Samsung Electronics Co., Ltd.
- Thanh Cuong Nguyen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resist composition and resist pattern forming method
- Patent number 12,181,800
- Issue date Dec 31, 2024
- Tokyo Ohka Kogyo Co., Ltd.
- Tsuyoshi Nakamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of manufacturing a semiconductor device
- Patent number 12,174,540
- Issue date Dec 24, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- An-Ren Zi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resist composition and pattern forming process
- Patent number 12,174,536
- Issue date Dec 24, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masaki Ohashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Salt, acid generator, resist composition and method for producing r...
- Patent number 12,174,537
- Issue date Dec 24, 2024
- Sumitomo Chemical Company, Limited
- Tatsuro Masuyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive resin composition, method for producing resist patte...
- Patent number 12,174,538
- Issue date Dec 24, 2024
- JSR Corporation
- Naoki Nishiguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and patterning process
- Patent number 12,169,360
- Issue date Dec 17, 2024
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, res...
- Patent number 12,164,228
- Issue date Dec 10, 2024
- FUJIFILM Corporation
- Michihiro Ogawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and method for producing resist pattern
- Patent number 12,164,229
- Issue date Dec 10, 2024
- Sumitomo Chemical Company, Limited
- Masako Sugihara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chemically amplified negative resist composition and resist pattern...
- Patent number 12,164,227
- Issue date Dec 10, 2024
- Shin-Etsu Chemical Co., Ltd.
- Keiichi Masunaga
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, act...
- Patent number 12,164,230
- Issue date Dec 10, 2024
- FUJIFILM Corporation
- Taro Miyoshi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chemically amplified positive resist composition and resist pattern...
- Patent number 12,164,231
- Issue date Dec 10, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masaaki Kotake
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive resin composition, method for forming resist pattern...
- Patent number 12,158,700
- Issue date Dec 3, 2024
- JSR Corporation
- Hirokazu Sakakibara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor photoresist composition and method of forming pattern...
- Patent number 12,158,699
- Issue date Dec 3, 2024
- Samsung SDI Co., Ltd.
- Changsoo Woo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive resin composition
- Patent number 12,153,345
- Issue date Nov 26, 2024
- Sumitomo Bakelite Co., Ltd.
- Makoto Horii
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist underlayer film material, patterning process, and method for...
- Patent number 12,147,160
- Issue date Nov 19, 2024
- Shin-Etsu Chemical Co., Ltd.
- Daisuke Kori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photocurable composition and method for producing semiconductor device
- Patent number 12,147,158
- Issue date Nov 19, 2024
- NISSAN CHEMICAL CORPORATION
- Hikaru Tokunaga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resist composition and resist pattern forming method
- Patent number 12,140,867
- Issue date Nov 12, 2024
- Tokyo Ohka Kogyo Co., Ltd.
- Tsuyoshi Nakamura
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photoacid generators, photoresist compositions, and pattern formati...
- Patent number 12,140,866
- Issue date Nov 12, 2024
- Rohm and Haas Electronic Materials LLC
- Emad Aqad
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photoresist composition and method of manufacturing a semiconductor...
- Patent number 12,134,690
- Issue date Nov 5, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yen-Hao Chen
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resin, photoresist composition, and method of manufacturing semicon...
- Patent number 12,135,502
- Issue date Nov 5, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Siao-Shan Wang
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Composition for resist underlayer, and pattern forming method using...
- Patent number 12,130,552
- Issue date Oct 29, 2024
- Samsung SDI Co., Ltd.
- Yoojeong Choi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Method For Forming Resist Underlayer Film And Patterning Process
- Publication number 20250036029
- Publication date Jan 30, 2025
- Shin-Etsu Chemical Co., Ltd.
- Naoki KOBAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN
- Publication number 20250036028
- Publication date Jan 30, 2025
- Tokyo Ohka Kogyo Co., Ltd.
- Tomoyuki Hirano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
THIOL-ACRYLATE POLYMERS, METHODS OF SYNTHESIS THEREOF AND USE IN AD...
- Publication number 20250028241
- Publication date Jan 23, 2025
- Board of Regents, The University of Texas System
- Benjamin LUND
- B33 - ADDITIVE MANUFACTURING TECHNOLOGY
Information Patent Application
POSITIVE TONE ULTRA THICK PHOTORESIST COMPOSITION
- Publication number 20250028245
- Publication date Jan 23, 2025
- Merck Patent GmbH
- Weihong LIU
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20250020999
- Publication date Jan 16, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
BOTTOM ANTI-REFLECTIVE COATING FOR DEEP ULTRAVIOLET LITHOGRAPHY, PR...
- Publication number 20250021002
- Publication date Jan 16, 2025
- SHANGHAI SINYANG SEMICONDUCTOR MATERIALS CO., LTD.
- Shunong FANG
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ION IMPLANTATION THICK FILM RESIST COMPOSITION, A METHOD FOR MANUFA...
- Publication number 20250021004
- Publication date Jan 16, 2025
- MERCK ELECTRONICS LTD.
- TETSUMASA TAKAICHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ADDITIVE FOR 193 NM DRY PHOTORESIST AND PREPARATION METHOD FOR AND...
- Publication number 20250013149
- Publication date Jan 9, 2025
- SHANGHAI SINYANG SEMICONDUCTOR MATERIALS CO., LTD.
- Shunong FANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE COMPOSITION, PATTERN FORMATION METHOD, AND PHOT...
- Publication number 20250013150
- Publication date Jan 9, 2025
- JSR Corporation
- Ryuichi NEMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN...
- Publication number 20250013152
- Publication date Jan 9, 2025
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION, RESIST PATTERN FORMING METHOD, COMPOUND, AND AC...
- Publication number 20250013148
- Publication date Jan 9, 2025
- Tokyo Ohka Kogyo Co., Ltd.
- Takuya Uehara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
QUANTUM DOT MIXTURE, QUANTUM DOT LIGHT EMITTING LAYER AND PREPARATI...
- Publication number 20250013147
- Publication date Jan 9, 2025
- Beijing BOE Technology Development Co., Ltd.
- Zhuo CHEN
- B82 - NANO-TECHNOLOGY
Information Patent Application
RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, COMPOUND, ACID...
- Publication number 20250004366
- Publication date Jan 2, 2025
- Tokyo Ohka Kogyo Co., Ltd.
- Masatoshi ARAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POLYMER, RESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF FORMI...
- Publication number 20250004370
- Publication date Jan 2, 2025
- Samsung Electronics Co., Ltd.
- Beomseok KIM
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
- Publication number 20250004374
- Publication date Jan 2, 2025
- FUJIFILM CORPORATION
- Michihiro SHIRAKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...
- Publication number 20250004377
- Publication date Jan 2, 2025
- FUJIFILM CORPORATION
- Eiji FUKUZAKI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST UNDERLAYER FILM-FORMING COMPOSITION
- Publication number 20250004367
- Publication date Jan 2, 2025
- NISSAN CHEMICAL CORPORATION
- Hikaru TOKUNAGA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN...
- Publication number 20250004371
- Publication date Jan 2, 2025
- Shin-Etsu Chemical Co., Ltd.
- Masahiro FUKUSHIMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN
- Publication number 20240427244
- Publication date Dec 26, 2024
- Tokyo Ohka Kogyo Co., Ltd.
- Yasuo SOMEYA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR PRODUCING ACID GENERATOR
- Publication number 20240425440
- Publication date Dec 26, 2024
- Tokyo Ohka Kogyo Co., Ltd.
- Rin Odashima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
- Publication number 20240427242
- Publication date Dec 26, 2024
- FUJIFILM CORPORATION
- Yosuke BEKKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
- Publication number 20240427243
- Publication date Dec 26, 2024
- FUJIFILM CORPORATION
- Michihiro SHIRAKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIN, RESIST COMPOSITION A...
- Publication number 20240417365
- Publication date Dec 19, 2024
- Sumitomo Chemical Company, Limited
- Shohei TERAHIGASHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...
- Publication number 20240419071
- Publication date Dec 19, 2024
- FUJIFILM CORPORATION
- Tsutomu YOSHIMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FORMATION OF SUB-LITHOGRAPHIC MANDREL PATTERNS USING REVERSIBLE OVE...
- Publication number 20240419074
- Publication date Dec 19, 2024
- TOKYO ELECTRON LIMITED
- Michael Murphy
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN...
- Publication number 20240402599
- Publication date Dec 5, 2024
- Shin-Etsu Chemical Co., Ltd.
- Keiichi Masunaga
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...
- Publication number 20240402601
- Publication date Dec 5, 2024
- FUJIFILM CORPORATION
- Minoru UEMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
- Publication number 20240402600
- Publication date Dec 5, 2024
- Sumitomo Chemical Company, Limited
- Saki KATO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, COMPOUND, AN...
- Publication number 20240402604
- Publication date Dec 5, 2024
- Tokyo Ohka Kogyo Co., Ltd.
- Rin Odashima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD
- Publication number 20240393687
- Publication date Nov 28, 2024
- JSR Corporation
- Fuyuki EGAWA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

with organic non-macromolecular light-sensitive compounds not otherwise provided for

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Photosensitive composition

Method for preparing pixel define layer

Positive resist composition and patterning process

Metal oxide resist patterning with electrical field guided post-exp...

Positive photosensitive resin composition, positive photosensitive...

Method of manufacturing a semiconductor device

Production method for resist composition purified product, resist p...

Photoresist composition and method of forming photoresist pattern

Resist compositions and semiconductor fabrication methods using the...

Resist composition and resist pattern forming method

Method of manufacturing a semiconductor device

Resist composition and pattern forming process

Salt, acid generator, resist composition and method for producing r...

Photosensitive resin composition, method for producing resist patte...

Resist composition and patterning process

Actinic ray-sensitive or radiation-sensitive resin composition, res...

Resist composition and method for producing resist pattern

Chemically amplified negative resist composition and resist pattern...

Actinic ray-sensitive or radiation-sensitive resin composition, act...

Chemically amplified positive resist composition and resist pattern...

Photosensitive resin composition, method for forming resist pattern...

Semiconductor photoresist composition and method of forming pattern...

Photosensitive resin composition

Resist underlayer film material, patterning process, and method for...

Photocurable composition and method for producing semiconductor device

Resist composition and resist pattern forming method

Photoacid generators, photoresist compositions, and pattern formati...

Photoresist composition and method of manufacturing a semiconductor...

Resin, photoresist composition, and method of manufacturing semicon...

Composition for resist underlayer, and pattern forming method using...

Patents Applicationslast 30 patents

Method For Forming Resist Underlayer Film And Patterning Process

RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN

THIOL-ACRYLATE POLYMERS, METHODS OF SYNTHESIS THEREOF AND USE IN AD...

POSITIVE TONE ULTRA THICK PHOTORESIST COMPOSITION

RESIST COMPOSITION AND PATTERN FORMING PROCESS

BOTTOM ANTI-REFLECTIVE COATING FOR DEEP ULTRAVIOLET LITHOGRAPHY, PR...

ION IMPLANTATION THICK FILM RESIST COMPOSITION, A METHOD FOR MANUFA...

ADDITIVE FOR 193 NM DRY PHOTORESIST AND PREPARATION METHOD FOR AND...

RADIATION-SENSITIVE COMPOSITION, PATTERN FORMATION METHOD, AND PHOT...

CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN...

RESIST COMPOSITION, RESIST PATTERN FORMING METHOD, COMPOUND, AND AC...

QUANTUM DOT MIXTURE, QUANTUM DOT LIGHT EMITTING LAYER AND PREPARATI...

RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, COMPOUND, ACID...

POLYMER, RESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF FORMI...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...

RESIST UNDERLAYER FILM-FORMING COMPOSITION

CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN...

RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN

METHOD FOR PRODUCING ACID GENERATOR

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...

CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIN, RESIST COMPOSITION A...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...

FORMATION OF SUB-LITHOGRAPHIC MANDREL PATTERNS USING REVERSIBLE OVE...

CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...

RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, COMPOUND, AN...

RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD