with organic non-macromolecular light-sensitive compounds not otherwise provided for

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CPC
G03F7/0045

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/0045with organic non-macromolecular light-sensitive compounds not otherwise provided for

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Photoacid generator for chemically amplified photoresists
- Patent number 12,242,190
- Issue date Mar 4, 2025
- International Business Machines Corporation
- Gerhard Ingmar Meijer
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist underlayer film-forming composition comprising epoxy adduct...
- Patent number 12,242,194
- Issue date Mar 4, 2025
- Nissan Chemical Industries, Ltd.
- Takafumi Endo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Onium salt, chemically amplified resist composition and patterning...
- Patent number 12,240,804
- Issue date Mar 4, 2025
- Shin-Etsu Chemical Co., Ltd.
- Takayuki Fujiwara
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Compound, photosensitive fluorescent resin composition comprising s...
- Patent number 12,242,191
- Issue date Mar 4, 2025
- LG Chem, Ltd.
- Hanbit Jang
- G02 - OPTICS
Information Patent Grant
Photosensitive resin composition, method for producing the same, re...
- Patent number 12,242,192
- Issue date Mar 4, 2025
- FUJIFILM Corporation
- Kei Yamamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for producing actinic ray-sensitive or radiation-sensitive r...
- Patent number 12,235,579
- Issue date Feb 25, 2025
- FUJIFILM Corporation
- Keiyu Ou
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition and patterning process
- Patent number 12,228,856
- Issue date Feb 18, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Coating composition for forming resist underlayer film for EUV lith...
- Patent number 12,228,858
- Issue date Feb 18, 2025
- DuPont Specialty Materials Korea Ltd.
- Jae Hwan Sim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic printing plate precursor and method of use
- Patent number 12,222,645
- Issue date Feb 11, 2025
- Eastman Kodak Company
- Christopher D. Simpson
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Salt, acid generator, resist composition and method for producing r...
- Patent number 12,222,648
- Issue date Feb 11, 2025
- Sumitomo Chemical Company, Limited
- Masahiko Shimada
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Positive resist composition and pattern forming process
- Patent number 12,222,649
- Issue date Feb 11, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoacid generator
- Patent number 12,216,402
- Issue date Feb 4, 2025
- International Business Machines Corporation
- Gerhard Ingmar Meijer
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Sulfonium salt, chemically amplified resist composition, and patter...
- Patent number 12,216,401
- Issue date Feb 4, 2025
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
On-press development type lithographic printing plate precursor,met...
- Patent number 12,214,582
- Issue date Feb 4, 2025
- FUJIFILM Corporation
- Kazuaki Enomoto
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Photosensitive composition
- Patent number 12,210,284
- Issue date Jan 28, 2025
- XSYS Germany GmbH
- Thomas Paulöhrl
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition and patterning process
- Patent number 12,204,245
- Issue date Jan 21, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Metal oxide resist patterning with electrical field guided post-exp...
- Patent number 12,204,246
- Issue date Jan 21, 2025
- Applied Materials, Inc.
- Huixiong Dai
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for preparing pixel define layer
- Patent number 12,207,498
- Issue date Jan 21, 2025
- DUK SAN NEOLUX CO., LTD.
- Hyunsang Cho
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive photosensitive resin composition, positive photosensitive...
- Patent number 12,195,568
- Issue date Jan 14, 2025
- Shin-Etsu Chemical Co., Ltd.
- Masashi Iio
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method of manufacturing a semiconductor device
- Patent number 12,189,293
- Issue date Jan 7, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chieh-Hsin Hsieh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Production method for resist composition purified product, resist p...
- Patent number 12,186,715
- Issue date Jan 7, 2025
- Tokyo Ohka Kogyo Co., Ltd.
- Akihiko Nakata
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Photoresist composition and method of forming photoresist pattern
- Patent number 12,189,287
- Issue date Jan 7, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Li-Po Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist compositions and semiconductor fabrication methods using the...
- Patent number 12,181,799
- Issue date Dec 31, 2024
- Samsung Electronics Co., Ltd.
- Thanh Cuong Nguyen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resist composition and resist pattern forming method
- Patent number 12,181,800
- Issue date Dec 31, 2024
- Tokyo Ohka Kogyo Co., Ltd.
- Tsuyoshi Nakamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of manufacturing a semiconductor device
- Patent number 12,174,540
- Issue date Dec 24, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- An-Ren Zi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resist composition and pattern forming process
- Patent number 12,174,536
- Issue date Dec 24, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masaki Ohashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Salt, acid generator, resist composition and method for producing r...
- Patent number 12,174,537
- Issue date Dec 24, 2024
- Sumitomo Chemical Company, Limited
- Tatsuro Masuyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive resin composition, method for producing resist patte...
- Patent number 12,174,538
- Issue date Dec 24, 2024
- JSR Corporation
- Naoki Nishiguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and patterning process
- Patent number 12,169,360
- Issue date Dec 17, 2024
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, res...
- Patent number 12,164,228
- Issue date Dec 10, 2024
- FUJIFILM Corporation
- Michihiro Ogawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD
- Publication number 20250068072
- Publication date Feb 27, 2025
- Tokyo Ohka Kogyo Co., Ltd.
- Tomonari Sunamichi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ONIUM SALT, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION, AND R...
- Publication number 20250068067
- Publication date Feb 27, 2025
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIN, RESIST COMPOSITION A...
- Publication number 20250068068
- Publication date Feb 27, 2025
- Sumitomo Chemical Company, Limited
- Shohei Terahigashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERN FO...
- Publication number 20250068069
- Publication date Feb 27, 2025
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE
- Publication number 20250068075
- Publication date Feb 27, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- An-Ren ZI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
NANOPARTICLE FILM PATTERNING METHOD, METHOD FOR PRODUCING LIGHT-EMI...
- Publication number 20250060518
- Publication date Feb 20, 2025
- SHARP KABUSHIKI KAISHA
- Yuma YAGUCHI
- B82 - NANO-TECHNOLOGY
Information Patent Application
SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING R...
- Publication number 20250060667
- Publication date Feb 20, 2025
- Sumitomo Chemical Company, Limited
- Shohei Terahigashi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERN FO...
- Publication number 20250053087
- Publication date Feb 13, 2025
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION AND RESIST PATTERN FORMATION METHOD
- Publication number 20250051501
- Publication date Feb 13, 2025
- Tokyo Ohka Kogyo Co., Ltd.
- Minoru Adegawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST UNDERLAYER COMPOSITION, AND METHOD OF FORMING PATTERNS USING...
- Publication number 20250053091
- Publication date Feb 13, 2025
- Samsung SDI Co., Ltd.
- Ahra CHO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST UNDERLAYER COMPOSITION AND METHOD OF FORMING PATTERNS USING...
- Publication number 20250053090
- Publication date Feb 13, 2025
- Samsung SDI Co., Ltd.
- Hwayoung JIN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ORGANOTIN PHOTORESIST COMPOSITION AND METHOD OF STABILIZATION
- Publication number 20250053085
- Publication date Feb 13, 2025
- Feng Lu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20250044688
- Publication date Feb 6, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C07 - ORGANIC CHEMISTRY
Information Patent Application
SILICON-CONTAINING RESIST UNDERLAYER FILM FORMING COMPOSITION
- Publication number 20250044692
- Publication date Feb 6, 2025
- NISSAN CHEMICAL CORPORATION
- Wataru SHIBAYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POLYMER, COMPOSITION INCLUDING THE SAME, AND METHOD OF FORMING PATT...
- Publication number 20250043046
- Publication date Feb 6, 2025
- Samsung Electronics Co., Ltd.
- Minsang KIM
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTOCURABLE COMPOSITION AND PATTERN FORMING METHOD
- Publication number 20250043126
- Publication date Feb 6, 2025
- Tokyo Ohka Kogyo Co., Ltd.
- Ryuma MIZUSAWA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
METHOD OF FORMING PATTERNS
- Publication number 20250044686
- Publication date Feb 6, 2025
- Samsung SDI Co., Ltd.
- Yaeun SEO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR USING COMPOSITION COMPRISING ORGANIC ACID COMPOUND, LITH...
- Publication number 20250044695
- Publication date Feb 6, 2025
- Merck Patent GmbH
- Tomotsugu YANO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20250044687
- Publication date Feb 6, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOSENSITIVE COMPOSITION
- Publication number 20250044691
- Publication date Feb 6, 2025
- DUKSAN NEOLUX CO., LTD
- Jin Hyun Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method For Forming Resist Underlayer Film And Patterning Process
- Publication number 20250036029
- Publication date Jan 30, 2025
- Shin-Etsu Chemical Co., Ltd.
- Naoki KOBAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN
- Publication number 20250036028
- Publication date Jan 30, 2025
- Tokyo Ohka Kogyo Co., Ltd.
- Tomoyuki Hirano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
THIOL-ACRYLATE POLYMERS, METHODS OF SYNTHESIS THEREOF AND USE IN AD...
- Publication number 20250028241
- Publication date Jan 23, 2025
- Board of Regents, The University of Texas System
- Benjamin LUND
- B33 - ADDITIVE MANUFACTURING TECHNOLOGY
Information Patent Application
POSITIVE TONE ULTRA THICK PHOTORESIST COMPOSITION
- Publication number 20250028245
- Publication date Jan 23, 2025
- Merck Patent GmbH
- Weihong LIU
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20250020999
- Publication date Jan 16, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
BOTTOM ANTI-REFLECTIVE COATING FOR DEEP ULTRAVIOLET LITHOGRAPHY, PR...
- Publication number 20250021002
- Publication date Jan 16, 2025
- SHANGHAI SINYANG SEMICONDUCTOR MATERIALS CO., LTD.
- Shunong FANG
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ION IMPLANTATION THICK FILM RESIST COMPOSITION, A METHOD FOR MANUFA...
- Publication number 20250021004
- Publication date Jan 16, 2025
- MERCK ELECTRONICS LTD.
- TETSUMASA TAKAICHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ADDITIVE FOR 193 NM DRY PHOTORESIST AND PREPARATION METHOD FOR AND...
- Publication number 20250013149
- Publication date Jan 9, 2025
- SHANGHAI SINYANG SEMICONDUCTOR MATERIALS CO., LTD.
- Shunong FANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE COMPOSITION, PATTERN FORMATION METHOD, AND PHOT...
- Publication number 20250013150
- Publication date Jan 9, 2025
- JSR Corporation
- Ryuichi NEMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN...
- Publication number 20250013152
- Publication date Jan 9, 2025
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

with organic non-macromolecular light-sensitive compounds not otherwise provided for

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Photoacid generator for chemically amplified photoresists

Resist underlayer film-forming composition comprising epoxy adduct...

Onium salt, chemically amplified resist composition and patterning...

Compound, photosensitive fluorescent resin composition comprising s...

Photosensitive resin composition, method for producing the same, re...

Method for producing actinic ray-sensitive or radiation-sensitive r...

Resist composition and patterning process

Coating composition for forming resist underlayer film for EUV lith...

Lithographic printing plate precursor and method of use

Salt, acid generator, resist composition and method for producing r...

Positive resist composition and pattern forming process

Photoacid generator

Sulfonium salt, chemically amplified resist composition, and patter...

On-press development type lithographic printing plate precursor,met...

Photosensitive composition

Positive resist composition and patterning process

Metal oxide resist patterning with electrical field guided post-exp...

Method for preparing pixel define layer

Positive photosensitive resin composition, positive photosensitive...

Method of manufacturing a semiconductor device

Production method for resist composition purified product, resist p...

Photoresist composition and method of forming photoresist pattern

Resist compositions and semiconductor fabrication methods using the...

Resist composition and resist pattern forming method

Method of manufacturing a semiconductor device

Resist composition and pattern forming process

Salt, acid generator, resist composition and method for producing r...

Photosensitive resin composition, method for producing resist patte...

Resist composition and patterning process

Actinic ray-sensitive or radiation-sensitive resin composition, res...

Patents Applicationslast 30 patents

RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD

ONIUM SALT, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION, AND R...

CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIN, RESIST COMPOSITION A...

ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERN FO...

METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE

NANOPARTICLE FILM PATTERNING METHOD, METHOD FOR PRODUCING LIGHT-EMI...

SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING R...

ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERN FO...

RESIST COMPOSITION AND RESIST PATTERN FORMATION METHOD

RESIST UNDERLAYER COMPOSITION, AND METHOD OF FORMING PATTERNS USING...

RESIST UNDERLAYER COMPOSITION AND METHOD OF FORMING PATTERNS USING...

ORGANOTIN PHOTORESIST COMPOSITION AND METHOD OF STABILIZATION

RESIST COMPOSITION AND PATTERN FORMING PROCESS

SILICON-CONTAINING RESIST UNDERLAYER FILM FORMING COMPOSITION

POLYMER, COMPOSITION INCLUDING THE SAME, AND METHOD OF FORMING PATT...

PHOTOCURABLE COMPOSITION AND PATTERN FORMING METHOD

METHOD OF FORMING PATTERNS

METHOD FOR USING COMPOSITION COMPRISING ORGANIC ACID COMPOUND, LITH...

RESIST COMPOSITION AND PATTERN FORMING PROCESS

PHOTOSENSITIVE COMPOSITION

Method For Forming Resist Underlayer Film And Patterning Process

RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN

THIOL-ACRYLATE POLYMERS, METHODS OF SYNTHESIS THEREOF AND USE IN AD...

POSITIVE TONE ULTRA THICK PHOTORESIST COMPOSITION

RESIST COMPOSITION AND PATTERN FORMING PROCESS

BOTTOM ANTI-REFLECTIVE COATING FOR DEEP ULTRAVIOLET LITHOGRAPHY, PR...

ION IMPLANTATION THICK FILM RESIST COMPOSITION, A METHOD FOR MANUFA...

ADDITIVE FOR 193 NM DRY PHOTORESIST AND PREPARATION METHOD FOR AND...

RADIATION-SENSITIVE COMPOSITION, PATTERN FORMATION METHOD, AND PHOT...

CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN...