with organic non-macromolecular light-sensitive compounds not otherwise provided for

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CPC
G03F7/0045

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GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/0045with organic non-macromolecular light-sensitive compounds not otherwise provided for

Industries

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Patents Grantslast 30 patents

Information Patent Grant
EUV metallic resist performance enhancement via additives
- Patent number 12,360,456
- Issue date Jul 15, 2025
- TAIWAN SEMICONDUCTOR MANUFACTURING CO., TLD.
- An-Ren Zi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist underlayer film-forming composition
- Patent number 12,360,452
- Issue date Jul 15, 2025
- NISSAN CHEMICAL CORPORATION
- Hikaru Tokunaga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resin, resist composition and method for producing resist pattern,...
- Patent number 12,360,450
- Issue date Jul 15, 2025
- Sumitomo Chemical Company, Limited
- Yuji Kita
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Quantum dot light-emitting structure and manufacturing method there...
- Patent number 12,344,787
- Issue date Jul 1, 2025
- BEIJING BOE TECHNOLOGY DEVELOPMENT CO., LTD.
- Wenhai Mei
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Methods of synthesizing a polynucleotide array using photoactivated...
- Patent number 12,319,712
- Issue date Jun 3, 2025
- Vibrant Holdings, LLC
- John J. Rajasekaran
- C12 - BIOCHEMISTRY BEER SPIRITS WINE VINEGAR MICROBIOLOGY ENZYMOLOGY MUTATION...
Information Patent Grant
Curable resin composition, cured film formed therefrom, and electro...
- Patent number 12,321,096
- Issue date Jun 3, 2025
- Samsung SDI Co., Ltd.
- Seungeun Lee
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Resist underlayer composition, and method of forming patterns using...
- Patent number 12,313,974
- Issue date May 27, 2025
- Samsung SDI Co., Ltd.
- Jaeyeol Baek
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Semiconductor photoresist composition and method of forming pattern...
- Patent number 12,306,534
- Issue date May 20, 2025
- Samsung SDI Co., Ltd.
- Seung Han
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photoacid generator for chemically amplified photoresists for deep...
- Patent number 12,306,535
- Issue date May 20, 2025
- International Business Machines Corporation
- Gerhard Ingmar Meijer
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resin composition and flow cells incorporating the same
- Patent number 12,287,574
- Issue date Apr 29, 2025
- Illumina, Inc.
- Yekaterina Rokhlenko
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Photosensitive resin composition
- Patent number 12,282,253
- Issue date Apr 22, 2025
- JSR Corporation
- Kimiyuki Kanno
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist compositions and pattern formation methods
- Patent number 12,282,254
- Issue date Apr 22, 2025
- DuPont Electronic Materials International, LLC
- Irvinder Kaur
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Onium salt, chemically amplified resist composition and patterning...
- Patent number 12,275,693
- Issue date Apr 15, 2025
- Shin-Etsu Chemical Co., Ltd.
- Masayoshi Sagehashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist compositions and pattern formation methods
- Patent number 12,276,910
- Issue date Apr 15, 2025
- DuPont Electronic Materials International, LLC
- Emad Aqad
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Stabilized matrix-filled liquid radiation curable resin composition...
- Patent number 12,269,933
- Issue date Apr 8, 2025
- Stratasys, Inc.
- Mingbo He
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, act...
- Patent number 12,265,329
- Issue date Apr 1, 2025
- FUJIFILM Corporation
- Kotaro Takahashi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photosensitive, inorganic ligand-capped inorganic nanocrystals
- Patent number 12,259,651
- Issue date Mar 25, 2025
- The University of Chicago
- Dmitri V. Talapin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive resin composition, method of forming resist pat...
- Patent number 12,259,653
- Issue date Mar 25, 2025
- JSR Corporation
- Katsuaki Nishikori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUV metallic resist performance enhancement via additives
- Patent number 12,253,800
- Issue date Mar 18, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- An-Ren Zi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition and pattern forming process
- Patent number 12,253,802
- Issue date Mar 18, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Silicon-containing resist underlayer film-forming composition inclu...
- Patent number 12,248,251
- Issue date Mar 11, 2025
- NISSAN CHEMICAL CORPORATION
- Wataru Shibayama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photocurable composition including a reactive polymer
- Patent number 12,247,133
- Issue date Mar 11, 2025
- Canon Kabushiki Kaisha
- Fen Wan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoacid generator for chemically amplified photoresists
- Patent number 12,242,190
- Issue date Mar 4, 2025
- International Business Machines Corporation
- Gerhard Ingmar Meijer
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist underlayer film-forming composition comprising epoxy adduct...
- Patent number 12,242,194
- Issue date Mar 4, 2025
- Nissan Chemical Industries, Ltd.
- Takafumi Endo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Onium salt, chemically amplified resist composition and patterning...
- Patent number 12,240,804
- Issue date Mar 4, 2025
- Shin-Etsu Chemical Co., Ltd.
- Takayuki Fujiwara
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Compound, photosensitive fluorescent resin composition comprising s...
- Patent number 12,242,191
- Issue date Mar 4, 2025
- LG Chem, Ltd.
- Hanbit Jang
- G02 - OPTICS
Information Patent Grant
Photosensitive resin composition, method for producing the same, re...
- Patent number 12,242,192
- Issue date Mar 4, 2025
- FUJIFILM Corporation
- Kei Yamamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for producing actinic ray-sensitive or radiation-sensitive r...
- Patent number 12,235,579
- Issue date Feb 25, 2025
- FUJIFILM Corporation
- Keiyu Ou
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition and patterning process
- Patent number 12,228,856
- Issue date Feb 18, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Coating composition for forming resist underlayer film for EUV lith...
- Patent number 12,228,858
- Issue date Feb 18, 2025
- DuPont Specialty Materials Korea Ltd.
- Jae Hwan Sim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
RESIST COMPOSITION, METHOD FOR MANUFACTURING RESIST FILM, AND METHO...
- Publication number 20250237949
- Publication date Jul 24, 2025
- Merck Patent GmbH
- Tetsumasa Takaichi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...
- Publication number 20250237951
- Publication date Jul 24, 2025
- FUJIFILM CORPORATION
- Kotaro Takahashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING PATTERN USING THE SAME
- Publication number 20250237945
- Publication date Jul 24, 2025
- Samsung Electronics Co., Ltd.
- Kyuhyun IM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN FILM, PHOTOS...
- Publication number 20250237952
- Publication date Jul 24, 2025
- Shin-Etsu Chemical Co., Ltd.
- Hitoshi Maruyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20250231480
- Publication date Jul 17, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
MANUFACTURE OF INTEGRATED CIRUIT USING POSITIVE TONE PHOTOPATTERNAB...
- Publication number 20250231492
- Publication date Jul 17, 2025
- SUNTIFIC MATERIALS (WEIFANG), LTD.
- Sam SUN
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
COMPOSITION FOR FORMING ORGANIC FILM, METHOD FOR FORMING ORGANIC FI...
- Publication number 20250231487
- Publication date Jul 17, 2025
- Shin-Etsu Chemical Co., Ltd.
- Keisuke NIIDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
- Publication number 20250224671
- Publication date Jul 10, 2025
- FUJIFILM CORPORATION
- Takahiro Mori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION, RESIST PATTERN FORMING METHOD, AND COMPOUND
- Publication number 20250224670
- Publication date Jul 10, 2025
- Tokyo Ohka Kogyo Co., Ltd.
- Daichi TAKAKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
NEGATIVE TYPE PHOTOSENSITIVE RESIN COMPOSITION, DRY FILM, CURED PRO...
- Publication number 20250216781
- Publication date Jul 3, 2025
- TAIYO HOLDINGS CO., LTD.
- Daiki YUKIMORI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IN-RESIST PROCESS FOR HIGH DENSITY CONTACT FORMATION
- Publication number 20250216784
- Publication date Jul 3, 2025
- Geminatio, Inc.
- Brennan Peterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN
- Publication number 20250216780
- Publication date Jul 3, 2025
- Tokyo Ohka Kogyo Co., Ltd.
- Tetsuya Matsushita
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
FILM-FORMING COMPOSITION, METHOD FOR PRODUCING CURED FILM, CAGE-TYP...
- Publication number 20250208507
- Publication date Jun 26, 2025
- Tokyo Ohka Kogyo Co., Ltd.
- Keiichi Ibata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FILM-FORMING COMPOSITION, METHOD FOR PRODUCING CURED FILM, AND CAGE...
- Publication number 20250208508
- Publication date Jun 26, 2025
- Tokyo Ohka Kogyo Co., Ltd.
- Saburo KOBAYASHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICALLY AMPLIFIED POSITIVE PHOTORESIST COMPOSITION FOR IMPROVING...
- Publication number 20250199406
- Publication date Jun 19, 2025
- YCCHEM CO., LTD.
- Young Cheol CHOI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICALLY-AMPLIFIED POSITIVE PHOTORESIST COMPOSITION FOR PATTERN P...
- Publication number 20250199405
- Publication date Jun 19, 2025
- YCCHEM CO., LTD.
- Young Cheol CHOI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DISPLAY DEVICE AND PHOTOSENSITIVE COMPOSITION
- Publication number 20250204164
- Publication date Jun 19, 2025
- TORAY INDUSTRIES, INC.
- Yugo TANIGAKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIN COMPOSITION, CURED PRODUCT, ELECTRONIC COMPONENT, AND DISPLAY...
- Publication number 20250199401
- Publication date Jun 19, 2025
- TORAY INDUSTRIES, INC.
- Kenta AOSHIMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POLY-O-HYDROXYAMIDES COMPRISING NOVEL INDANE BIS-O-AMINOPHENOLS, PH...
- Publication number 20250189892
- Publication date Jun 12, 2025
- Fujifilm Electronic Materials U.S.A., Inc.
- Binod B. De
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN
- Publication number 20250189893
- Publication date Jun 12, 2025
- Tokyo Ohka Kogyo Co., Ltd.
- Yosuke SUZUKI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD
- Publication number 20250180988
- Publication date Jun 5, 2025
- Tokyo Ohka Kogyo Co., Ltd.
- Yasuo SOMEYA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTOSENSITIVE COMPOSITION, METH...
- Publication number 20250172872
- Publication date May 29, 2025
- Tokyo Ohka Kogyo Co., Ltd.
- Daisuke Ojima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20250172870
- Publication date May 29, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, CURED ARTICLE, METHOD FOR MANUFAC...
- Publication number 20250172873
- Publication date May 29, 2025
- TORAY INDUSTRIES, INC.
- Yusuke KOMORI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIN COMPOSITION, RESIN COMPOSITION FILM AND SEMICONDUCTOR DEVICE...
- Publication number 20250164880
- Publication date May 22, 2025
- TORAY INDUSTRIES, INC.
- Keigo Kato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR PRODUCING ACTIVE RAY-SENSITIVE OR RADIATION-SENSITIVE RE...
- Publication number 20250164884
- Publication date May 22, 2025
- FUJIFILM CORPORATION
- Akihiro Kaneko
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION, RESIST PATTERN FORMING METHOD, COMPOUND, AND AC...
- Publication number 20250164875
- Publication date May 22, 2025
- Tokyo Ohka Kogyo Co., Ltd.
- KhanhTin NGUYEN
- C07 - ORGANIC CHEMISTRY
Information Patent Application
FLEXOGRAPHIC PRINTING PLATE PRECURSOR AND MANUFACTURING METHOD OF F...
- Publication number 20250164876
- Publication date May 22, 2025
- FUJIFILM CORPORATION
- Masato SHIRAKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE COMPOSITION, METHOD FOR FORMING RESIST PATTERN,...
- Publication number 20250164877
- Publication date May 22, 2025
- JSR Corporation
- Ryuichi NEMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST MATERIAL AND METHOD FOR LITHOGRAPHY
- Publication number 20250155809
- Publication date May 15, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chun-Chih Ho
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

with organic non-macromolecular light-sensitive compounds not otherwise provided for

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

EUV metallic resist performance enhancement via additives

Resist underlayer film-forming composition

Resin, resist composition and method for producing resist pattern,...

Quantum dot light-emitting structure and manufacturing method there...

Methods of synthesizing a polynucleotide array using photoactivated...

Curable resin composition, cured film formed therefrom, and electro...

Resist underlayer composition, and method of forming patterns using...

Semiconductor photoresist composition and method of forming pattern...

Photoacid generator for chemically amplified photoresists for deep...

Resin composition and flow cells incorporating the same

Photosensitive resin composition

Photoresist compositions and pattern formation methods

Onium salt, chemically amplified resist composition and patterning...

Photoresist compositions and pattern formation methods

Stabilized matrix-filled liquid radiation curable resin composition...

Actinic ray-sensitive or radiation-sensitive resin composition, act...

Photosensitive, inorganic ligand-capped inorganic nanocrystals

Radiation-sensitive resin composition, method of forming resist pat...

EUV metallic resist performance enhancement via additives

Positive resist composition and pattern forming process

Silicon-containing resist underlayer film-forming composition inclu...

Photocurable composition including a reactive polymer

Photoacid generator for chemically amplified photoresists

Resist underlayer film-forming composition comprising epoxy adduct...

Onium salt, chemically amplified resist composition and patterning...

Compound, photosensitive fluorescent resin composition comprising s...

Photosensitive resin composition, method for producing the same, re...

Method for producing actinic ray-sensitive or radiation-sensitive r...

Resist composition and patterning process

Coating composition for forming resist underlayer film for EUV lith...

Patents Applicationslast 30 patents

RESIST COMPOSITION, METHOD FOR MANUFACTURING RESIST FILM, AND METHO...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...

RESIST COMPOSITION AND METHOD OF FORMING PATTERN USING THE SAME

PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN FILM, PHOTOS...

RESIST COMPOSITION AND PATTERN FORMING PROCESS

MANUFACTURE OF INTEGRATED CIRUIT USING POSITIVE TONE PHOTOPATTERNAB...

COMPOSITION FOR FORMING ORGANIC FILM, METHOD FOR FORMING ORGANIC FI...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...

RESIST COMPOSITION, RESIST PATTERN FORMING METHOD, AND COMPOUND

NEGATIVE TYPE PHOTOSENSITIVE RESIN COMPOSITION, DRY FILM, CURED PRO...

IN-RESIST PROCESS FOR HIGH DENSITY CONTACT FORMATION

RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN

FILM-FORMING COMPOSITION, METHOD FOR PRODUCING CURED FILM, CAGE-TYP...

FILM-FORMING COMPOSITION, METHOD FOR PRODUCING CURED FILM, AND CAGE...

CHEMICALLY AMPLIFIED POSITIVE PHOTORESIST COMPOSITION FOR IMPROVING...

CHEMICALLY-AMPLIFIED POSITIVE PHOTORESIST COMPOSITION FOR PATTERN P...

DISPLAY DEVICE AND PHOTOSENSITIVE COMPOSITION

RESIN COMPOSITION, CURED PRODUCT, ELECTRONIC COMPONENT, AND DISPLAY...

POLY-O-HYDROXYAMIDES COMPRISING NOVEL INDANE BIS-O-AMINOPHENOLS, PH...

RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN

RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD

CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTOSENSITIVE COMPOSITION, METH...

POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS

PHOTOSENSITIVE RESIN COMPOSITION, CURED ARTICLE, METHOD FOR MANUFAC...

RESIN COMPOSITION, RESIN COMPOSITION FILM AND SEMICONDUCTOR DEVICE...

METHOD FOR PRODUCING ACTIVE RAY-SENSITIVE OR RADIATION-SENSITIVE RE...

RESIST COMPOSITION, RESIST PATTERN FORMING METHOD, COMPOUND, AND AC...

FLEXOGRAPHIC PRINTING PLATE PRECURSOR AND MANUFACTURING METHOD OF F...

RADIATION-SENSITIVE COMPOSITION, METHOD FOR FORMING RESIST PATTERN,...

PHOTORESIST MATERIAL AND METHOD FOR LITHOGRAPHY