with organic non-macromolecular light-sensitive compounds not otherwise provided for

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G03F7/0045

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GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/0045with organic non-macromolecular light-sensitive compounds not otherwise provided for

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Methods of synthesizing a polynucleotide array using photoactivated...
- Patent number 12,319,712
- Issue date Jun 3, 2025
- Vibrant Holdings, LLC
- John J. Rajasekaran
- C12 - BIOCHEMISTRY BEER SPIRITS WINE VINEGAR MICROBIOLOGY ENZYMOLOGY MUTATION...
Information Patent Grant
Curable resin composition, cured film formed therefrom, and electro...
- Patent number 12,321,096
- Issue date Jun 3, 2025
- Samsung SDI Co., Ltd.
- Seungeun Lee
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Resist underlayer composition, and method of forming patterns using...
- Patent number 12,313,974
- Issue date May 27, 2025
- Samsung SDI Co., Ltd.
- Jaeyeol Baek
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Semiconductor photoresist composition and method of forming pattern...
- Patent number 12,306,534
- Issue date May 20, 2025
- Samsung SDI Co., Ltd.
- Seung Han
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photoacid generator for chemically amplified photoresists for deep...
- Patent number 12,306,535
- Issue date May 20, 2025
- International Business Machines Corporation
- Gerhard Ingmar Meijer
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resin composition and flow cells incorporating the same
- Patent number 12,287,574
- Issue date Apr 29, 2025
- Illumina, Inc.
- Yekaterina Rokhlenko
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Photosensitive resin composition
- Patent number 12,282,253
- Issue date Apr 22, 2025
- JSR Corporation
- Kimiyuki Kanno
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist compositions and pattern formation methods
- Patent number 12,282,254
- Issue date Apr 22, 2025
- DuPont Electronic Materials International, LLC
- Irvinder Kaur
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Onium salt, chemically amplified resist composition and patterning...
- Patent number 12,275,693
- Issue date Apr 15, 2025
- Shin-Etsu Chemical Co., Ltd.
- Masayoshi Sagehashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist compositions and pattern formation methods
- Patent number 12,276,910
- Issue date Apr 15, 2025
- DuPont Electronic Materials International, LLC
- Emad Aqad
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Stabilized matrix-filled liquid radiation curable resin composition...
- Patent number 12,269,933
- Issue date Apr 8, 2025
- Stratasys, Inc.
- Mingbo He
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, act...
- Patent number 12,265,329
- Issue date Apr 1, 2025
- FUJIFILM Corporation
- Kotaro Takahashi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photosensitive, inorganic ligand-capped inorganic nanocrystals
- Patent number 12,259,651
- Issue date Mar 25, 2025
- The University of Chicago
- Dmitri V. Talapin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive resin composition, method of forming resist pat...
- Patent number 12,259,653
- Issue date Mar 25, 2025
- JSR Corporation
- Katsuaki Nishikori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUV metallic resist performance enhancement via additives
- Patent number 12,253,800
- Issue date Mar 18, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- An-Ren Zi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition and pattern forming process
- Patent number 12,253,802
- Issue date Mar 18, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photocurable composition including a reactive polymer
- Patent number 12,247,133
- Issue date Mar 11, 2025
- Canon Kabushiki Kaisha
- Fen Wan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Silicon-containing resist underlayer film-forming composition inclu...
- Patent number 12,248,251
- Issue date Mar 11, 2025
- NISSAN CHEMICAL CORPORATION
- Wataru Shibayama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoacid generator for chemically amplified photoresists
- Patent number 12,242,190
- Issue date Mar 4, 2025
- International Business Machines Corporation
- Gerhard Ingmar Meijer
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist underlayer film-forming composition comprising epoxy adduct...
- Patent number 12,242,194
- Issue date Mar 4, 2025
- Nissan Chemical Industries, Ltd.
- Takafumi Endo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Onium salt, chemically amplified resist composition and patterning...
- Patent number 12,240,804
- Issue date Mar 4, 2025
- Shin-Etsu Chemical Co., Ltd.
- Takayuki Fujiwara
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Compound, photosensitive fluorescent resin composition comprising s...
- Patent number 12,242,191
- Issue date Mar 4, 2025
- LG Chem, Ltd.
- Hanbit Jang
- G02 - OPTICS
Information Patent Grant
Photosensitive resin composition, method for producing the same, re...
- Patent number 12,242,192
- Issue date Mar 4, 2025
- FUJIFILM Corporation
- Kei Yamamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for producing actinic ray-sensitive or radiation-sensitive r...
- Patent number 12,235,579
- Issue date Feb 25, 2025
- FUJIFILM Corporation
- Keiyu Ou
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition and patterning process
- Patent number 12,228,856
- Issue date Feb 18, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Coating composition for forming resist underlayer film for EUV lith...
- Patent number 12,228,858
- Issue date Feb 18, 2025
- DuPont Specialty Materials Korea Ltd.
- Jae Hwan Sim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic printing plate precursor and method of use
- Patent number 12,222,645
- Issue date Feb 11, 2025
- Eastman Kodak Company
- Christopher D. Simpson
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Salt, acid generator, resist composition and method for producing r...
- Patent number 12,222,648
- Issue date Feb 11, 2025
- Sumitomo Chemical Company, Limited
- Masahiko Shimada
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Positive resist composition and pattern forming process
- Patent number 12,222,649
- Issue date Feb 11, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoacid generator
- Patent number 12,216,402
- Issue date Feb 4, 2025
- International Business Machines Corporation
- Gerhard Ingmar Meijer
- C07 - ORGANIC CHEMISTRY

Patents Applicationslast 30 patents

Information Patent Application
CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTOSENSITIVE COMPOSITION, METH...
- Publication number 20250172872
- Publication date May 29, 2025
- Tokyo Ohka Kogyo Co., Ltd.
- Daisuke Ojima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20250172870
- Publication date May 29, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, CURED ARTICLE, METHOD FOR MANUFAC...
- Publication number 20250172873
- Publication date May 29, 2025
- TORAY INDUSTRIES, INC.
- Yusuke KOMORI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIN COMPOSITION, RESIN COMPOSITION FILM AND SEMICONDUCTOR DEVICE...
- Publication number 20250164880
- Publication date May 22, 2025
- TORAY INDUSTRIES, INC.
- Keigo Kato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR PRODUCING ACTIVE RAY-SENSITIVE OR RADIATION-SENSITIVE RE...
- Publication number 20250164884
- Publication date May 22, 2025
- FUJIFILM CORPORATION
- Akihiro Kaneko
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION, RESIST PATTERN FORMING METHOD, COMPOUND, AND AC...
- Publication number 20250164875
- Publication date May 22, 2025
- Tokyo Ohka Kogyo Co., Ltd.
- KhanhTin NGUYEN
- C07 - ORGANIC CHEMISTRY
Information Patent Application
FLEXOGRAPHIC PRINTING PLATE PRECURSOR AND MANUFACTURING METHOD OF F...
- Publication number 20250164876
- Publication date May 22, 2025
- FUJIFILM CORPORATION
- Masato SHIRAKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE COMPOSITION, METHOD FOR FORMING RESIST PATTERN,...
- Publication number 20250164877
- Publication date May 22, 2025
- JSR Corporation
- Ryuichi NEMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST MATERIAL AND METHOD FOR LITHOGRAPHY
- Publication number 20250155809
- Publication date May 15, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chun-Chih Ho
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN FILM, PHOTOS...
- Publication number 20250155812
- Publication date May 15, 2025
- Shin-Etsu Chemical Co., Ltd.
- Hitoshi Maruyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, COMPOUND, AN...
- Publication number 20250155806
- Publication date May 15, 2025
- Tokyo Ohka Kogyo Co., Ltd.
- Makoto SATO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Radiation-Sensitive Composition and Method for Forming Resist Pattern
- Publication number 20250155802
- Publication date May 15, 2025
- JSR Corporation
- Ken MARUYAMA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
CURABLE COMPOSITION, CURED FILM, AND DISPLAY DEVICE
- Publication number 20250155803
- Publication date May 15, 2025
- SUMITOMO CHEMICAL COMPANY, LIMITED
- Masayoshi TOKUDA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN
- Publication number 20250155805
- Publication date May 15, 2025
- Tokyo Ohka Kogyo Co., Ltd.
- Issei SUZUKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING RESIST PATTE...
- Publication number 20250147418
- Publication date May 8, 2025
- JSR Corporation
- Naoki NISHIGUCHI
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20250138425
- Publication date May 1, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20250138418
- Publication date May 1, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ENHANCED EUV PHOTORESISTS AND METHODS OF THEIR USE
- Publication number 20250138420
- Publication date May 1, 2025
- Irresistible Materials LTD
- Alex Phillip Graham Robinson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POLYIMIDE POLYMER AND COMPOSITION THEREFROM
- Publication number 20250129214
- Publication date Apr 24, 2025
- DUK SAN NEOLUX CO., LTD.
- Yeon Joon CHUNG
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POSITIVE TYPE PHOTOSENSITIVE RESIN COMPOSITION AND METHODS OF MAKIN...
- Publication number 20250130494
- Publication date Apr 24, 2025
- AKRON POLYMER SYSTEMS, INC.
- Yufeng Zhu
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POLYBENZOXAZOL PRECURSOR OR POLYIMIDE PRECURSOR OR THE COPOLYMER TH...
- Publication number 20250130495
- Publication date Apr 24, 2025
- DUK SAN NEOLUX CO., LTD.
- Gwang Sik SONG
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POSITIVE TYPE LIFT-OFF RESIST COMPOSITION AND METHOD FOR MANUFACTUR...
- Publication number 20250130496
- Publication date Apr 24, 2025
- Merck Patent GmbH
- YANO TOMOTSUGU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ENHANCED FIELD STITCHING WITH CORRECTIVE CHEMISTRY
- Publication number 20250130501
- Publication date Apr 24, 2025
- Geminatio, Inc.
- Brennan Peterson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Composition For Forming Resist Underlayer Film, Resist Underlayer F...
- Publication number 20250129209
- Publication date Apr 24, 2025
- Shin-Etsu Chemical Co., Ltd.
- Shohei IWAMORI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTOACID GENERATOR, PHOTORESIST COMPOSITION COMPRISING THE SAME, R...
- Publication number 20250123557
- Publication date Apr 17, 2025
- University-Industry Cooperation Group of Kyung Hee University
- Jongwook PARK
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING...
- Publication number 20250122165
- Publication date Apr 17, 2025
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- C07 - ORGANIC CHEMISTRY
Information Patent Application
PHOTOSENSITIVE COMPOSITION, TRANSFER FILM, LAMINATE AND MANUFACTURI...
- Publication number 20250123558
- Publication date Apr 17, 2025
- FUJIFILM CORPORATION
- Masaya SUZUKI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
LITHOGRAPHIC PRINTING PLATE PRECURSOR AND METHOD OF USE
- Publication number 20250123560
- Publication date Apr 17, 2025
- Christopher D. Simpson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Resist Material And Patterning Process
- Publication number 20250123559
- Publication date Apr 17, 2025
- Shin-Etsu Chemical Co., Ltd.
- Yutaro OTOMO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOACID GENERATORS, PHOTORESIST COMPOSITIONS, AND PATTERN FORMATI...
- Publication number 20250116927
- Publication date Apr 10, 2025
- DuPont Electronic Materials International, LLC
- Emad Aqad
- C07 - ORGANIC CHEMISTRY

with organic non-macromolecular light-sensitive compounds not otherwise provided for

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Methods of synthesizing a polynucleotide array using photoactivated...

Curable resin composition, cured film formed therefrom, and electro...

Resist underlayer composition, and method of forming patterns using...

Semiconductor photoresist composition and method of forming pattern...

Photoacid generator for chemically amplified photoresists for deep...

Resin composition and flow cells incorporating the same

Photosensitive resin composition

Photoresist compositions and pattern formation methods

Onium salt, chemically amplified resist composition and patterning...

Photoresist compositions and pattern formation methods

Stabilized matrix-filled liquid radiation curable resin composition...

Actinic ray-sensitive or radiation-sensitive resin composition, act...

Photosensitive, inorganic ligand-capped inorganic nanocrystals

Radiation-sensitive resin composition, method of forming resist pat...

EUV metallic resist performance enhancement via additives

Positive resist composition and pattern forming process

Photocurable composition including a reactive polymer

Silicon-containing resist underlayer film-forming composition inclu...

Photoacid generator for chemically amplified photoresists

Resist underlayer film-forming composition comprising epoxy adduct...

Onium salt, chemically amplified resist composition and patterning...

Compound, photosensitive fluorescent resin composition comprising s...

Photosensitive resin composition, method for producing the same, re...

Method for producing actinic ray-sensitive or radiation-sensitive r...

Resist composition and patterning process

Coating composition for forming resist underlayer film for EUV lith...

Lithographic printing plate precursor and method of use

Salt, acid generator, resist composition and method for producing r...

Positive resist composition and pattern forming process

Photoacid generator

Patents Applicationslast 30 patents

CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTOSENSITIVE COMPOSITION, METH...

POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS

PHOTOSENSITIVE RESIN COMPOSITION, CURED ARTICLE, METHOD FOR MANUFAC...

RESIN COMPOSITION, RESIN COMPOSITION FILM AND SEMICONDUCTOR DEVICE...

METHOD FOR PRODUCING ACTIVE RAY-SENSITIVE OR RADIATION-SENSITIVE RE...

RESIST COMPOSITION, RESIST PATTERN FORMING METHOD, COMPOUND, AND AC...

FLEXOGRAPHIC PRINTING PLATE PRECURSOR AND MANUFACTURING METHOD OF F...

RADIATION-SENSITIVE COMPOSITION, METHOD FOR FORMING RESIST PATTERN,...

PHOTORESIST MATERIAL AND METHOD FOR LITHOGRAPHY

PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN FILM, PHOTOS...

RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, COMPOUND, AN...

Radiation-Sensitive Composition and Method for Forming Resist Pattern

CURABLE COMPOSITION, CURED FILM, AND DISPLAY DEVICE

RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN

PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING RESIST PATTE...

POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS

RESIST COMPOSITION AND PATTERN FORMING PROCESS

ENHANCED EUV PHOTORESISTS AND METHODS OF THEIR USE

POLYIMIDE POLYMER AND COMPOSITION THEREFROM

POSITIVE TYPE PHOTOSENSITIVE RESIN COMPOSITION AND METHODS OF MAKIN...

POLYBENZOXAZOL PRECURSOR OR POLYIMIDE PRECURSOR OR THE COPOLYMER TH...

POSITIVE TYPE LIFT-OFF RESIST COMPOSITION AND METHOD FOR MANUFACTUR...

ENHANCED FIELD STITCHING WITH CORRECTIVE CHEMISTRY

Composition For Forming Resist Underlayer Film, Resist Underlayer F...

PHOTOACID GENERATOR, PHOTORESIST COMPOSITION COMPRISING THE SAME, R...

ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING...

PHOTOSENSITIVE COMPOSITION, TRANSFER FILM, LAMINATE AND MANUFACTURI...

LITHOGRAPHIC PRINTING PLATE PRECURSOR AND METHOD OF USE

Resist Material And Patterning Process

PHOTOACID GENERATORS, PHOTORESIST COMPOSITIONS, AND PATTERN FORMATI...