Enhanced Multi Channel Alignment

Abstract

A imprint lithography system operable for imprinting a pattern into a material deposited between an imprint mold and a substrate, the system including, inter alia, a first set of imaging units positioned at a first angle relative to normal of the substrate; and a second set of imaging units positioned at a second angle relative to normal of the substrate, wherein the first and second angles are not equal to each other.

Description

BRIEF DESCRIPTION OF DRAWINGS

FIG. 1 is a simplified side view of a lithographic system having a template spaced-apart from a substrate;

FIG. 2 illustrates an inclined microscope unit having x-y and focusing motions;

FIG. 3 illustrates microscopes with different inclined angles depending on the 1^st order angle of the imaging grating;

FIG. 4 illustrates microscope configurations using beam re-directing optics such as prism and mirror;

FIG. 5 illustrates an exemplary 8-channel imaging system with four sets of the microscopes shown in FIG. 3;

FIG. 6 illustrates a 16-channel imaging system using a beam splitter and two sets of the systems shown in FIG. 5;

FIG. 7 illustrates relocated imaging channels corresponding to a change of imprinting field size for a case of partial field imprinting (left lower is being imprinted) where microscopes 1 through 6 are relocated;

FIG. 8A illustrates a top view of a more detailed depiction of system 500;

FIG. 8B illustrates a side view showing more detail of system 500;

FIG. 9 illustrates a more detailed depiction of system 600; and

FIG. 10 illustrates a side view of system 500.

Claims

1. An imprint lithography system operable for imprinting a pattern into a material deposited between an imprint mold and a substrate, the system comprising: a first set of imaging units positioned at a first angle relative to normal of the substrate; anda second set of imaging units positioned at a second angle relative to normal of the substrate, wherein the first and second angles are not equal to each other.

2. The system as recited in claim 1, wherein the imaging units are operable to view alignment marks on the substrate in order to properly align the system with an imprinting field on the substrate.

3. The system as recited in claim 2, wherein the first and second angles are defined by angles in degrees between the normal angle to the substrate and longitudinal axes of the imaging units.

4. The system as recited in claim 3, wherein each imaging unit comprises an imaging system that emits a light beam in parallel alignment with the imaging unit's longitudinal axis towards its respective alignment mark.

5. The system as recited in claim 1, wherein the first and second sets of imaging units each comprise four imaging units.

6. The system as recited in claim 5, wherein the eight imaging units comprise an N-channel imaging system, wherein N≧8, further comprising: first and second N-channel imaging systems positioned at an angle to each other; and a beam splitter operable for directing imaging light beams from both N-channel imaging systems towards alignment marks on the substrate.

7. The system as recited in claim 2, further comprising x-y actuators for re-aligning certain ones of the imaging units in order to align the system for imprinting of a portion of the imprinting field.

8. The system as recited in claim 7, wherein the portion of the imprinting field lies along an edge of the substrate.

9. The system as recited in claim 4, wherein certain ones of the imaging units further comprise a prism to re-direct the light beam.

10. The system as recited in claim 4, wherein certain ones of the imaging units further comprise a mirror to re-direct the light beam.