EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD

Abstract

An exposure apparatus for exposing a substrate via liquid includes a supply nozzle configured to supply the liquid, and a recovery nozzle configured to recover the liquid, wherein at least one of the supply nozzle and the recovery nozzle includes porous ceramic with an oxide film.

Description

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is a schematic sectional view showing a structure of an exposure apparatus according to one aspect of the present invention.

FIG. 2 is a schematic sectional view of heat-treated porous SiC.

FIG. 3 is a schematic sectional view of porous SiC having an oxide film on its surface layer.

FIG. 4 is a schematic sectional view around a final lens of a projection optical system when the exposure apparatus shown in FIG. 1 exposes peripheral or edge areas on a substrate.

FIG. 5 is a flowchart for explaining a fabrication of a device.

FIG. 6 is a flowchart for a wafer process of step 4 shown in FIG. 5.

Claims

1. An exposure apparatus for exposing a substrate via liquid, the exposure apparatus comprising: a supply nozzle configured to supply the liquid; anda recovery nozzle configured to recover the liquid, wherein at least one of the supply nozzle and the recovery nozzle includes porous ceramic with an oxide film.

2. An exposure apparatus according to claim 1, wherein a supply port of the supply nozzle or a recovery port of the recovery nozzle is made of porous ceramic with the oxide film.

3. An exposure apparatus according to claim 1, wherein the oxide film is made through a heat treatment or a film formation.

4. An exposure apparatus according to claim 1, wherein porous ceramic arranges the oxide film on a surface of a particle.

5. An exposure apparatus according to claim 1, wherein the oxide film has a thickness between 10 μm and 500 μm.

6. An exposure apparatus according to claim 1, wherein ceramic porous is made of Si or Al2O3.

7. An exposure apparatus according to claim 1, wherein the oxide film is made of SiO2, SiCO or AlO.

8. An exposure apparatus for exposing a substrate via liquid, the exposure apparatus comprising a liquid holding plate configured to hold the liquid, the liquid holding plate being arranged around the substrate, and including porous ceramic with an oxide film.

9. An exposure apparatus according to claim 8, wherein the liquid holding plate has a recovery port configured to recover the liquid, the recovery port including porous ceramic with an oxide film.

10. A device manufacturing method comprising: exposing a substrate using an exposure apparatus; anddeveloping the substrate that has been exposed,wherein the exposure apparatus includes:a supply nozzle configured to supply the liquid; anda recovery nozzle configured to recover the liquid, wherein at least one of the supply nozzle and the recovery nozzle includes porous ceramic with an oxide film.