Immersion

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CPC
G03F7/70341

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/70341Immersion

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Imprint apparatus with movable stages
- Patent number 12,147,167
- Issue date Nov 19, 2024
- ASML Netherlands B.V.
- Junichi Kanehara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 12,117,721
- Issue date Oct 15, 2024
- ASML Netherlands B.V.
- Nicolaas Rudolf Kemper
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Wafer stage and method of using
- Patent number 12,092,958
- Issue date Sep 17, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yung-Yao Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Near-field lithography immersion system, immersion unit and interfa...
- Patent number 12,078,937
- Issue date Sep 3, 2024
- The Institute of Optics and Electronics, The Chinese Academy of Sciences
- Xiangang Luo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and a method of operating the apparatus
- Patent number 12,072,635
- Issue date Aug 27, 2024
- ASML Netherlands B.V.
- Christian Gerardus Norbertus Hendricus Marie Cloin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Fluid handling system and lithographic apparatus
- Patent number 12,072,636
- Issue date Aug 27, 2024
- ASML Netherlands B.V.
- Theodorus Wilhelmus Polet
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate holder, lithographic apparatus, device manufacturing meth...
- Patent number 12,055,862
- Issue date Aug 6, 2024
- ASML Netherlands B.V.
- Raymond Wilhelmus Louis Lafarre
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Fluid handling system, method and lithographic apparatus
- Patent number 12,032,296
- Issue date Jul 9, 2024
- ASML Netherlands B.V.
- Yang-Shan Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of operating semiconductor apparatus
- Patent number 11,994,805
- Issue date May 28, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Shih-Ming Chang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Immersion exposure tool
- Patent number 11,966,165
- Issue date Apr 23, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yung-Yao Lee
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate holder, lithographic apparatus, device manufacturing meth...
- Patent number 11,960,213
- Issue date Apr 16, 2024
- ASML Netherlands B.V.
- Raymond Wilhelmus Louis Lafarre
- B22 - CASTING POWDER METALLURGY
Information Patent Grant
Systems and methods for contact immersion lithography
- Patent number 11,892,777
- Issue date Feb 6, 2024
- Waymo LLC
- Hongqin Shi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Immersion liquid supply and recovery device with new-type pumping a...
- Patent number 11,868,052
- Issue date Jan 9, 2024
- ZHEJIANG CHEER TECHNOLOGY CO., LTD.
- Xin Fu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Fluid handling structure for lithographic apparatus
- Patent number 11,860,546
- Issue date Jan 2, 2024
- ASML Netherlands B.V.
- Pepijn Van Den Eijnden
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Extractor piping on outermost sidewall of immersion hood apparatus
- Patent number 11,860,547
- Issue date Jan 2, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yung-Yao Lee
- F28 - HEAT EXCHANGE IN GENERAL
Information Patent Grant
Fluid handling structure, a lithographic apparatus, a method of usi...
- Patent number 11,809,086
- Issue date Nov 7, 2023
- ASML Netherlands B.V.
- Raphael Nico Johan Stegen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 11,789,369
- Issue date Oct 17, 2023
- ASML Netherlands B.V.
- Martinus Hendrikus Antonius Leenders
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 11,789,365
- Issue date Oct 17, 2023
- Kioxia Corporation
- Ryu Komatsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lithography apparatus and device manufacturing method
- Patent number 11,774,857
- Issue date Oct 3, 2023
- ASML Netherlands B.V.
- Erik Henricus Egidius Catharina Eummelen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Image sensor for immersion lithography
- Patent number 11,774,868
- Issue date Oct 3, 2023
- ASML Netherlands B.V.
- Nirupam Banerjee
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate holder and method of manufacturing a substrate holder
- Patent number 11,754,929
- Issue date Sep 12, 2023
- ASML Netherlands B.V.
- Raymond Wilhelmus Louis Lafarre
- B22 - CASTING POWDER METALLURGY
Information Patent Grant
Substrate holder for use in a lithographic apparatus
- Patent number 11,749,556
- Issue date Sep 5, 2023
- ASML Netherlands B.V.
- Niek Jacobus Johannes Roset
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process tool and an inspection method
- Patent number 11,720,032
- Issue date Aug 8, 2023
- ASML Netherlands B.V.
- Raphael Nico Johan Stegen
- G01 - MEASURING TESTING
Information Patent Grant
Preparing a substrate with patterned regions for immersion based in...
- Patent number 11,687,005
- Issue date Jun 27, 2023
- Applied Materials Israel Ltd.
- Tai Kuzniz
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 11,669,021
- Issue date Jun 6, 2023
- ASML Netherlands B.V.
- Koen Jacobus Johannes Maria Zaal
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate holder, lithographic apparatus, device manufacturing meth...
- Patent number 11,628,498
- Issue date Apr 18, 2023
- ASML Netherlands B.V.
- Raymond Wilhelmus Louis Lafarre
- B22 - CASTING POWDER METALLURGY
Information Patent Grant
Fluid handling structure and lithographic apparatus
- Patent number 11,614,689
- Issue date Mar 28, 2023
- ASML Netherlands B.V.
- Erik Henricus Egidius Catharina Eummelen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 11,609,504
- Issue date Mar 21, 2023
- ASML Netherlands B.V.
- Johannes Catharinus Hubertus Mulkens
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of operating semiconductor apparatus
- Patent number 11,586,115
- Issue date Feb 21, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Shih-Ming Chang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate holder, a lithographic apparatus and method of manufactur...
- Patent number 11,579,533
- Issue date Feb 14, 2023
- ASML Netherlands B.V.
- Günes Nakiboglu
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
A FLUID EXTRACTION SYSTEM, METHOD AND LITHOGRAPHIC APPARATUS
- Publication number 20240411230
- Publication date Dec 12, 2024
- ASML NETHERLANDS B.V.
- Benjamin Cunnegonda Henricus SMEETS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEMS AND METHODS FOR PRODUCING ULTRAPURE WATER FOR SEMICONDUCTOR...
- Publication number 20240383789
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- En Tian Lin
- C02 - TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
Information Patent Application
AN OBJECT GRIPPER, A METHOD OF HOLDING AN OBJECT AND A LITHOGRAPHIC...
- Publication number 20240345490
- Publication date Oct 17, 2024
- ASML NETHERLANDS B.V.
- Paul VAN DONGEN
- B25 - HAND TOOLS PORTABLE POWER-DRIVEN TOOLS MANIPULATORS
Information Patent Application
LITHOGRAPHY SYSTEM AND METHOD OF DETECTING FLUID LEAKAGE IN LIQUID...
- Publication number 20240319611
- Publication date Sep 26, 2024
- United Microelectronics Corp.
- Zhi Fan Sun
- G01 - MEASURING TESTING
Information Patent Application
METHOD OF OPERATING SEMICONDUCTOR APPARATUS
- Publication number 20240280910
- Publication date Aug 22, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Shih-Ming Chang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
NEAR-FIELD LITHOGRAPHY IMMERSION SYSTEM, IMMERSION UNIT AND INTERFA...
- Publication number 20240272558
- Publication date Aug 15, 2024
- The Institute of Optics and Electronics, The Chinese Academy of Sciences
- Xiangang LUO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE HOLDER, LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METH...
- Publication number 20240264533
- Publication date Aug 8, 2024
- ASML NETHERLANDS B.V.
- Raymond Wilhelmus Louis Lafarre
- B22 - CASTING POWDER METALLURGY
Information Patent Application
A FLUID HANDLING SYSTEM, METHOD AND LITHOGRAPHIC APPARATUS
- Publication number 20240248411
- Publication date Jul 25, 2024
- ASML NETHERLANDS B.V.
- Cornelius Maria ROPS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IMMERSION EXPOSURE TOOL
- Publication number 20240231240
- Publication date Jul 11, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yung-Yao LEE
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
IMMERSION LIQUID SUPPLY SYSTEM AND IMMERSION LIQUID FLOW FIELD REMO...
- Publication number 20240219841
- Publication date Jul 4, 2024
- ZHEJIANG CHEER TECHNOLOGY CO., LTD.
- XIN FU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IMPRINT METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND M...
- Publication number 20240201600
- Publication date Jun 20, 2024
- KIOXIA Corporation
- Kasumi OKABE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FLUID HANDLING SYSTEM AND LITHOGRAPHIC APPARATUS
- Publication number 20240192607
- Publication date Jun 13, 2024
- ASML NETHERLANDS B.V.
- Theodorus Wilhelmus POLET
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
AN INSPECTION TOOL, METHOD AND LITHOGRAPHIC APPARATUS
- Publication number 20240192608
- Publication date Jun 13, 2024
- ASML NETHERLANDS B.V.
- Shikhar BHARDWAJ
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IMMERSION LITHOGRAPHIC SYSTEM
- Publication number 20240152058
- Publication date May 9, 2024
- Samsung Electronics Co., Ltd.
- Wonki LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ANALYZING METHOD, ANALYSIS APPARATUS, MEASURING METHOD, MEASUREMENT...
- Publication number 20240045348
- Publication date Feb 8, 2024
- Nikon Corporation
- Ayako SUGIMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHY APPARATUS AND A METHOD OF MANUFACTURING A DEVICE
- Publication number 20240036477
- Publication date Feb 1, 2024
- ASML NETHERLANDS B.V.
- Erik Henricus Egidius Catharina EUMMELEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE HOLDER AND METHOD OF MANUFACTURING A SUBSTRATE HOLDER
- Publication number 20240027915
- Publication date Jan 25, 2024
- ASML NETHERLANDS B.V.
- Raymond Wilhelmus Louis Lafarre
- B22 - CASTING POWDER METALLURGY
Information Patent Application
GRIPPER AND LITHOGRAPHIC APPARATUS COMPRISING THE GRIPPER
- Publication number 20240019790
- Publication date Jan 18, 2024
- ASML NETHERLANDS B.V.
- Paul VAN DONGEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
A FLUID HANDLING SYSTEM, METHOD AND LITHOGRAPHIC APPARATUS
- Publication number 20230418165
- Publication date Dec 28, 2023
- ASML NETHERLANDS B.V.
- Cornelius Maria ROPS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IMMERSION FLUID RECOVERY SYSTEM AND IMMERSION FLUID RECOVERY METHOD...
- Publication number 20230400774
- Publication date Dec 14, 2023
- ZHEJIANG CHEER TECHNOLOGY CO., LTD.
- XIN FU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF USING WAFER STAGE
- Publication number 20230400775
- Publication date Dec 14, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yung-Yao LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE HOLDER FOR USE IN A LITHOGRAPHIC APPARATUS
- Publication number 20230360954
- Publication date Nov 9, 2023
- ASML NETHERLANDS B.V.
- Niek Jacobus Johannes ROSET
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
A FLUID HANDLING SYSTEM, METHOD AND LITHOGRAPHIC APPARATUS
- Publication number 20230333480
- Publication date Oct 19, 2023
- ASML NETHERLANDS B.V.
- Christianus Wilhelmus Johannes BERENDSEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEMS AND METHODS FOR PRODUCING ULTRAPURE WATER FOR SEMICONDUCTOR...
- Publication number 20230295027
- Publication date Sep 21, 2023
- TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY
- En Tian Lin
- C02 - TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
Information Patent Application
A FLUID HANDLING SYSTEM, METHOD AND LITHOGRAPHIC APPARATUS
- Publication number 20230259037
- Publication date Aug 17, 2023
- ASML NETHERLANDS B.V.
- Cornelius Maria ROPS
- B06 - GENERATING OR TRANSMITTING MECHANICAL VIBRATIONS IN GENERAL
Information Patent Application
SUBSTRATE HOLDER, LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METH...
- Publication number 20230251579
- Publication date Aug 10, 2023
- ASML NETHERLANDS B.V.
- Raymond Wilhelmus Louis Lafarre
- B22 - CASTING POWDER METALLURGY
Information Patent Application
METHOD OF OPERATING SEMICONDUCTOR APPARATUS
- Publication number 20230152710
- Publication date May 18, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Shih-Ming Chang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
- Publication number 20230127070
- Publication date Apr 27, 2023
- ASML NETHERLANDS B.V.
- Nicolaas Rudolf KEMPER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXTRACTOR PIPING ON OUTERMOST SIDEWALL OF IMMERSION HOOD APPARATUS
- Publication number 20230097211
- Publication date Mar 30, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yung-Yao Lee
- F28 - HEAT EXCHANGE IN GENERAL
Information Patent Application
SUBSTRATE SUPPORT AND SUBSTRATE TABLE
- Publication number 20230075771
- Publication date Mar 9, 2023
- ASML NETHERLANDS B.V.
- Coen Hubertus Matheus BALTIS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Imprint apparatus with movable stages

Lithographic apparatus and device manufacturing method

Wafer stage and method of using

Near-field lithography immersion system, immersion unit and interfa...

Lithographic apparatus and a method of operating the apparatus

Fluid handling system and lithographic apparatus

Substrate holder, lithographic apparatus, device manufacturing meth...

Fluid handling system, method and lithographic apparatus

Method of operating semiconductor apparatus

Immersion exposure tool

Substrate holder, lithographic apparatus, device manufacturing meth...

Systems and methods for contact immersion lithography

Immersion liquid supply and recovery device with new-type pumping a...

Fluid handling structure for lithographic apparatus

Extractor piping on outermost sidewall of immersion hood apparatus

Fluid handling structure, a lithographic apparatus, a method of usi...

Lithographic apparatus and device manufacturing method

Substrate processing method and substrate processing apparatus

Lithography apparatus and device manufacturing method

Image sensor for immersion lithography

Substrate holder and method of manufacturing a substrate holder

Substrate holder for use in a lithographic apparatus

Process tool and an inspection method

Preparing a substrate with patterned regions for immersion based in...

Lithographic apparatus and device manufacturing method

Substrate holder, lithographic apparatus, device manufacturing meth...

Fluid handling structure and lithographic apparatus

Lithographic apparatus and device manufacturing method

Method of operating semiconductor apparatus

Substrate holder, a lithographic apparatus and method of manufactur...

Patents Applicationslast 30 patents

A FLUID EXTRACTION SYSTEM, METHOD AND LITHOGRAPHIC APPARATUS

SYSTEMS AND METHODS FOR PRODUCING ULTRAPURE WATER FOR SEMICONDUCTOR...

AN OBJECT GRIPPER, A METHOD OF HOLDING AN OBJECT AND A LITHOGRAPHIC...

LITHOGRAPHY SYSTEM AND METHOD OF DETECTING FLUID LEAKAGE IN LIQUID...

METHOD OF OPERATING SEMICONDUCTOR APPARATUS

NEAR-FIELD LITHOGRAPHY IMMERSION SYSTEM, IMMERSION UNIT AND INTERFA...

SUBSTRATE HOLDER, LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METH...

A FLUID HANDLING SYSTEM, METHOD AND LITHOGRAPHIC APPARATUS

IMMERSION EXPOSURE TOOL

IMMERSION LIQUID SUPPLY SYSTEM AND IMMERSION LIQUID FLOW FIELD REMO...

IMPRINT METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND M...

FLUID HANDLING SYSTEM AND LITHOGRAPHIC APPARATUS

AN INSPECTION TOOL, METHOD AND LITHOGRAPHIC APPARATUS

IMMERSION LITHOGRAPHIC SYSTEM

ANALYZING METHOD, ANALYSIS APPARATUS, MEASURING METHOD, MEASUREMENT...

LITHOGRAPHY APPARATUS AND A METHOD OF MANUFACTURING A DEVICE

SUBSTRATE HOLDER AND METHOD OF MANUFACTURING A SUBSTRATE HOLDER

GRIPPER AND LITHOGRAPHIC APPARATUS COMPRISING THE GRIPPER

A FLUID HANDLING SYSTEM, METHOD AND LITHOGRAPHIC APPARATUS

IMMERSION FLUID RECOVERY SYSTEM AND IMMERSION FLUID RECOVERY METHOD...

METHOD OF USING WAFER STAGE

SUBSTRATE HOLDER FOR USE IN A LITHOGRAPHIC APPARATUS

A FLUID HANDLING SYSTEM, METHOD AND LITHOGRAPHIC APPARATUS

SYSTEMS AND METHODS FOR PRODUCING ULTRAPURE WATER FOR SEMICONDUCTOR...

A FLUID HANDLING SYSTEM, METHOD AND LITHOGRAPHIC APPARATUS

SUBSTRATE HOLDER, LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METH...

METHOD OF OPERATING SEMICONDUCTOR APPARATUS

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

EXTRACTOR PIPING ON OUTERMOST SIDEWALL OF IMMERSION HOOD APPARATUS

SUBSTRATE SUPPORT AND SUBSTRATE TABLE