Claims
- 1. An exposure method, comprising the steps of:
- illuminating a predetermined exposure zone with illumination light having a non-uniform illuminance distribution substantially along a predetermined direction and with respect to the predetermined exposure zone;
- measuring a two-dimensional illuminance distribution upon the predetermined exposure zone;
- determining the direction of non-uniformness of the illuminance distribution of the illumination light on the basis of said measurement;
- adjusting a relative positional relationship between the illumination light and a shutter mechanism having an edge movable in a direction, so as to substantially register the determined direction of the non-uniformness of the illumination light with the direction of movement of the edge of the shutter mechanism; and
- adjusting, through the shutter mechanism, exposure time at each portion of the exposure zone so as to attain uniform exposure of the exposure zone.
- 2. A method according to claim 1, wherein the illumination light comprises X-rays.
- 3. A method according to claim 1, wherein said method is used with a mask having a pattern and with a wafer, and wherein the pattern of the mask is printed on the wafer through the exposure.
- 4. An exposure apparatus, comprising:
- a light source for providing illumination light for illuminating a predetermined exposure zone, said illumination light having a non-uniform illuminance distribution substantially along a predetermined direction and with respect to the predetermined exposure zone;
- a detector for measuring a two-dimensional illuminance distribution upon the predetermined exposure zone;
- computing means for determining the direction of non-uniformness of the illuminance distribution of the illumination light on the basis of the measurement through said detector;
- a shutter mechanism having an edge which is movable in a direction, for adjusting an exposure time at each portion of the predetermined exposure zone so as to attain uniform exposure of the predetermined exposure zone; and
- adjusting means for adjusting a relative positional relationship between the shutter mechanism and the illumination light so as to substantially register the direction of non-uniformness, as determined by said computing means, with the direction of movement of said edge of said shutter mechanism.
- 5. An apparatus according to claim 4, further comprising a stage, and wherein said detector is mounted on said stage which is movable two-dimensionally.
- 6. An apparatus according to claim 4, wherein said light source comprises a synchrotron radiation source adapted to produce X-rays, and wherein said detector comprises an X-ray detector.
- 7. An apparatus according to claim 4, wherein said shutter mechanism has a leading edge effective to start exposure of the exposure zone and a trailing edge effective to stop the exposure of the exposure zone.
- 8. An apparatus according to claim 4, wherein said apparatus is used with a mask having a pattern and with a wafer, and wherein said apparatus further comprises a mechanism for holding the mask and the wafer, and wherein the pattern of the mask is printed on the wafer through an exposure.
Priority Claims (2)
Number |
Date |
Country |
Kind |
2-056674 |
Mar 1990 |
JPX |
|
2-059904 |
Mar 1990 |
JPX |
|
Parent Case Info
This application is a continuation of application Ser. No. 07/904,255 filed Jun. 25, 1992, now abandoned, which is a division of application Ser. No. 07/666,649 filed Mar. 08, 1991 now U.S. Pat. No. 5,172,402.
Foreign Referenced Citations (5)
Number |
Date |
Country |
83394 |
Jul 1983 |
EPX |
0357425 |
Mar 1990 |
EPX |
56-104438 |
Aug 1981 |
JPX |
60-198726 |
Oct 1985 |
JPX |
01243519 |
Sep 1989 |
JPX |
Divisions (1)
|
Number |
Date |
Country |
Parent |
666649 |
Mar 1991 |
|
Continuations (1)
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Number |
Date |
Country |
Parent |
904255 |
Jun 1992 |
|