Production of exposure light

Industry

CPC
G03F7/70008

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/70008Production of exposure light

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Charged particle beam writing apparatus, charged particle beam writ...
- Patent number 11,961,708
- Issue date Apr 16, 2024
- NuFlare Technology, Inc.
- Haruyuki Nomura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mask protective module, pellicle having the same, and lithography a...
- Patent number 11,940,726
- Issue date Mar 26, 2024
- Industry-University Cooperation Foundation Hanyang University
- Jinho Ahn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electro optical devices fabricated using deep ultraviolet radiation
- Patent number 11,899,293
- Issue date Feb 13, 2024
- HyperLight Corporation
- Mian Zhang
- G02 - OPTICS
Information Patent Grant
Photolithography system including selective light array
- Patent number 11,880,139
- Issue date Jan 23, 2024
- Honeywell Federal Manufacturing & Technologies, LLC
- Barbara Diane Young
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mounted hollow-core fiber arrangement
- Patent number 11,703,634
- Issue date Jul 18, 2023
- ASML Netherlands B.V.
- Sebastian Thomas Bauerschmidt
- G01 - MEASURING TESTING
Information Patent Grant
Reducing speckle in an excimer light source
- Patent number 11,686,951
- Issue date Jun 27, 2023
- Cymer, LLC
- Wilhelmus Patrick Elisabeth Maria op 't Root
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gamma ray generator and method of generating gamma ray
- Patent number 11,669,014
- Issue date Jun 6, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- You-Hua Chou
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Gamma ray generator and gamma ray lithography system
- Patent number 11,460,779
- Issue date Oct 4, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd
- You-Hua Chou
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Mask protective module, pellicle having the same, and lithography a...
- Patent number 11,402,746
- Issue date Aug 2, 2022
- Industry-University Cooperation Foundation Hanyang University
- Jinho Ahn
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mounted hollow-core fiber arrangement
- Patent number 11,385,402
- Issue date Jul 12, 2022
- ASML Netherlands B.V.
- Sebastian Thomas Bauerschmidt
- G01 - MEASURING TESTING
Information Patent Grant
Patterning method and method for manufacturing array substrate
- Patent number 11,347,148
- Issue date May 31, 2022
- BOE Technology Group Co., Ltd.
- Wei Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for overlay error reduction
- Patent number 11,287,746
- Issue date Mar 29, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Hung-Chung Chien
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure device
- Patent number 11,281,108
- Issue date Mar 22, 2022
- SCREEN Holdings Co., Ltd.
- You Arisawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection exposure apparatus for semiconductor lithography
- Patent number 11,281,114
- Issue date Mar 22, 2022
- Carl Zeiss SMT GmbH
- Jens Kugler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
High purity tin and method for manufacturing same
- Patent number 11,136,680
- Issue date Oct 5, 2021
- JX Nippon Mining & Metals Corporation
- Toru Imori
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Gamma ray generator, gamma ray lithography system and method of per...
- Patent number 11,067,898
- Issue date Jul 20, 2021
- Taiwan Semiconductor Manufacturing Company, Ltd
- You-Hua Chou
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Reducing speckle in an excimer light source
- Patent number 11,054,665
- Issue date Jul 6, 2021
- Cymer, LLC
- Wilhelmus Patrick Elisabeth Maria op 't Root
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate processing apparatus, substrate processing method and rec...
- Patent number 10,937,673
- Issue date Mar 2, 2021
- Tokyo Electron Limited
- Madoka Fujimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Half tone scheme for maskless lithography
- Patent number 10,935,890
- Issue date Mar 2, 2021
- Applied Materials, Inc.
- Christopher Dennis Bencher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Particle irradiation apparatus, beam modifier device, and semicondu...
- Patent number 10,915,029
- Issue date Feb 9, 2021
- Infineon Technologies AG
- Roland Rupp
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for light field correction of colored surfaces in...
- Patent number 10,892,166
- Issue date Jan 12, 2021
- L'Oreal
- Parham Aarabi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Lithographic method
- Patent number 10,884,339
- Issue date Jan 5, 2021
- ASML Netherlands B.V.
- Wouter Joep Engelen
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Temperature controlled heat transfer frame for pellicle
- Patent number 10,877,383
- Issue date Dec 29, 2020
- NIKON CORPORATION
- Paul Derek Coon
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for forming a chemical guiding structure on a substrate and...
- Patent number 10,845,705
- Issue date Nov 24, 2020
- Commissariat a l'Energie Atomique et Aux Energies Alternatives
- Raluca Tiron
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
High power broadband illumination source
- Patent number 10,806,016
- Issue date Oct 13, 2020
- KLA Corporation
- Oleg Khodykin
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Light source for lithography exposure process
- Patent number 10,795,264
- Issue date Oct 6, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd
- Hsin-Feng Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Spatial light modulator with variable intensity diodes
- Patent number 10,684,555
- Issue date Jun 16, 2020
- Applied Materials, Inc.
- Joseph R. Johnson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Exposure apparatus and article manufacturing method
- Patent number 10,663,867
- Issue date May 26, 2020
- Canon Kabushiki Kaisha
- Masaki Mizutani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical apparatus and vibration removing method
- Patent number 10,645,289
- Issue date May 5, 2020
- Lasertec Corporation
- Haruhiko Kusunose
- G02 - OPTICS
Information Patent Grant
Organic light emitting device
- Patent number 10,636,998
- Issue date Apr 28, 2020
- Canon Kabushiki Kaisha
- Satoru Shiobara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
RESIST UNDERLAYER FILM-FORMING COMPOSITION
- Publication number 20250085634
- Publication date Mar 13, 2025
- NISSAN CHEMICAL CORPORATION
- Masahisa ENDO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Dual-modal information storage and anti-counterfeiting material, an...
- Publication number 20250059385
- Publication date Feb 20, 2025
- HANGZHOU NORMAL UNIVERSITY
- Baiheng WU
- B82 - NANO-TECHNOLOGY
Information Patent Application
A CLEANING METHOD AND ASSOCIATED ILLUMINATION SOURCE METROLOGY APPA...
- Publication number 20240377765
- Publication date Nov 14, 2024
- ASML NETHERLANDS B.V.
- Petrus Wilhelmus SMORENBURG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
TEMPORARY CAPPING MATERIAL FOR OXIDE PREVENTION IN LOW TEMPERATURE...
- Publication number 20240312778
- Publication date Sep 19, 2024
- LAM RESEARCH CORPORATION
- Stephen J. BANIK
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE TREATMENT METHOD AND SUBSTRATE TREATMENT APPARATUS
- Publication number 20240248413
- Publication date Jul 25, 2024
- TOKYO ELECTRON LIMITED
- Takeshi SHIMOAOKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Lithographic Method for Imprinting Three-Dimensional Microstructure...
- Publication number 20240248395
- Publication date Jul 25, 2024
- JOANNEUM RESEARCH FORSCHUNGSGESELLSCHAFT MBH
- Ladislav KUNA
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
ELECTRO OPTICAL DEVICES FABRICATED USING DEEP ULTRAVIOLET RADIATION
- Publication number 20240142808
- Publication date May 2, 2024
- HyperLight Corporation
- Mian Zhang
- G02 - OPTICS
Information Patent Application
RESIN MEMBRANE FILTER AND MANUFACTURING METHOD OF RESIN MEMBRANE FI...
- Publication number 20240139686
- Publication date May 2, 2024
- FUJIFILM CORPORATION
- Hiroyuki YONEZAWA
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
ELECTRON BEAM LITHOGRAPHY APPARATUS, ELECTRON BEAM LITHOGRAPHY METH...
- Publication number 20240145212
- Publication date May 2, 2024
- NIPPON CONTROL SYSTEM CORPORATION
- Masakazu HAMAJI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OPTICAL COMPONENT FOR DEEP ULTRAVIOLET LIGHT SOURCE
- Publication number 20230375934
- Publication date Nov 23, 2023
- CYMER, LLC
- John Theodore Melchior
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR PREPARING JOSEPHSON JUNCTION AND PRODUCTION LINE DEVICE
- Publication number 20230320234
- Publication date Oct 5, 2023
- TENCENT TECHNOLOGY (SHENZHEN) COMPANY LIMITED
- Kunliang BU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
AN ILLUMINATION SOURCE AND ASSOCIATED METROLOGY APPARATUS
- Publication number 20230288818
- Publication date Sep 14, 2023
- ASML Netherlands B,V.
- Wenjie JIN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOLITHOGRAPHY SYSTEM INCLUDING SELECTIVE LIGHT ARRAY
- Publication number 20230092166
- Publication date Mar 23, 2023
- HONEYWELL FEDERAL MANUFACTURING & TECHNOLOGIES, LLC
- Barbara Diane Young
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND SYSTEMS FOR PHOTOPATTERNING AND MINIATURIZATION
- Publication number 20230084088
- Publication date Mar 16, 2023
- DUKE UNIVERSITY
- Xin Song
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
GAMMA RAY GENERATOR AND METHOD OF GENERATING GAMMA RAY
- Publication number 20220357663
- Publication date Nov 10, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- You-Hua Chou
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
MASK PROTECTIVE MODULE, PELLICLE HAVING THE SAME, AND LITHOGRAPHY A...
- Publication number 20220334467
- Publication date Oct 20, 2022
- Industry-University Cooperation Foundation Hanyang University
- Jinho AHN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MOUNTED HOLLOW-CORE FIBER ARRANGEMENT
- Publication number 20220317368
- Publication date Oct 6, 2022
- ASML NETHERLANDS B.V.
- Sebastian Thomas BAUERSCHMIDT
- G02 - OPTICS
Information Patent Application
DRAWING METHOD, MASTER PLATE MANUFACTURING METHOD, AND DRAWING APPA...
- Publication number 20220301816
- Publication date Sep 22, 2022
- KIOXIA Corporation
- Yoshinori KAGAWA
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
CONTROL SYSTEM FOR A PLURALITY OF DEEP ULTRAVIOLET OPTICAL OSCILLATORS
- Publication number 20220255286
- Publication date Aug 11, 2022
- CYMER, LLC
- Yingbo Zhao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEM AND METHOD FOR OVERLAY ERROR REDUCTION
- Publication number 20220100103
- Publication date Mar 31, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Hung-Chung CHIEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
GAMMA RAY GENERATOR? GAMMA RAY LITHOGRAPHY SYSTEM AND METHOD OF PER...
- Publication number 20210341845
- Publication date Nov 4, 2021
- Taiwan Semiconductor Manufacturing Company, Ltd.
- You-Hua Chou
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
APPARATUS FOR AND METHOD OF MANUFACTURING AN ARTICLE USING PHOTOLIT...
- Publication number 20210333713
- Publication date Oct 28, 2021
- CALLAGHAN INNOVATION
- Andrea Jocelyn Bubendorfer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ELECTRO OPTICAL DEVICES FABRICATED USING DEEP ULTRAVIOLET RADIATION
- Publication number 20210247570
- Publication date Aug 12, 2021
- HyperLight Corporation
- Mian Zhang
- G02 - OPTICS
Information Patent Application
CHARGED PARTICLE BEAM WRITING APPARATUS, CHARGED PARTICLE BEAM WRIT...
- Publication number 20210241995
- Publication date Aug 5, 2021
- NuFlare Technology, Inc.
- Haruyuki NOMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Artificial nerve conduit construction using tissue engineering methods
- Publication number 20210236696
- Publication date Aug 5, 2021
- JIANGNAN UNIVERSITY
- Naiyan LU
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Application
REDUCING SPECKLE IN AN EXCIMER LIGHT SOURCE
- Publication number 20210239998
- Publication date Aug 5, 2021
- CYMER, LLC
- Wilhelmus Patrick Elisabeth Maria op `t Root
- G01 - MEASURING TESTING
Information Patent Application
Patterning Method and Method for Manufacturing Array Substrate
- Publication number 20210200090
- Publication date Jul 1, 2021
- BOE TECHNOLOGY GROUP CO., LTD.
- Wei Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EXPOSURE DEVICE
- Publication number 20210088911
- Publication date Mar 25, 2021
- SCREEN Holdings Co., Ltd.
- You Arisawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROJECTION EXPOSURE APPARATUS FOR SEMICONDUCTOR LITHOGRAPHY
- Publication number 20210080841
- Publication date Mar 18, 2021
- Carl Zeiss SMT GMBH
- Jens Kugler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
GAMMA RAY GENERATOR, GAMMA RAY LITHOGRAPHY SYSTEM AND METHOD OF PER...
- Publication number 20210033980
- Publication date Feb 4, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd.
- You-Hua Chou
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Production of exposure light

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Charged particle beam writing apparatus, charged particle beam writ...

Mask protective module, pellicle having the same, and lithography a...

Electro optical devices fabricated using deep ultraviolet radiation

Photolithography system including selective light array

Mounted hollow-core fiber arrangement

Reducing speckle in an excimer light source

Gamma ray generator and method of generating gamma ray

Gamma ray generator and gamma ray lithography system

Mask protective module, pellicle having the same, and lithography a...

Mounted hollow-core fiber arrangement

Patterning method and method for manufacturing array substrate

System and method for overlay error reduction

Exposure device

Projection exposure apparatus for semiconductor lithography

High purity tin and method for manufacturing same

Gamma ray generator, gamma ray lithography system and method of per...

Reducing speckle in an excimer light source

Substrate processing apparatus, substrate processing method and rec...

Half tone scheme for maskless lithography

Particle irradiation apparatus, beam modifier device, and semicondu...

System and method for light field correction of colored surfaces in...

Lithographic method

Temperature controlled heat transfer frame for pellicle

Method for forming a chemical guiding structure on a substrate and...

High power broadband illumination source

Light source for lithography exposure process

Spatial light modulator with variable intensity diodes

Exposure apparatus and article manufacturing method

Optical apparatus and vibration removing method

Organic light emitting device

Patents Applicationslast 30 patents

RESIST UNDERLAYER FILM-FORMING COMPOSITION

Dual-modal information storage and anti-counterfeiting material, an...

A CLEANING METHOD AND ASSOCIATED ILLUMINATION SOURCE METROLOGY APPA...

TEMPORARY CAPPING MATERIAL FOR OXIDE PREVENTION IN LOW TEMPERATURE...

SUBSTRATE TREATMENT METHOD AND SUBSTRATE TREATMENT APPARATUS

Lithographic Method for Imprinting Three-Dimensional Microstructure...

ELECTRO OPTICAL DEVICES FABRICATED USING DEEP ULTRAVIOLET RADIATION

RESIN MEMBRANE FILTER AND MANUFACTURING METHOD OF RESIN MEMBRANE FI...

ELECTRON BEAM LITHOGRAPHY APPARATUS, ELECTRON BEAM LITHOGRAPHY METH...

OPTICAL COMPONENT FOR DEEP ULTRAVIOLET LIGHT SOURCE

METHOD FOR PREPARING JOSEPHSON JUNCTION AND PRODUCTION LINE DEVICE

AN ILLUMINATION SOURCE AND ASSOCIATED METROLOGY APPARATUS

PHOTOLITHOGRAPHY SYSTEM INCLUDING SELECTIVE LIGHT ARRAY

METHODS AND SYSTEMS FOR PHOTOPATTERNING AND MINIATURIZATION

GAMMA RAY GENERATOR AND METHOD OF GENERATING GAMMA RAY

MASK PROTECTIVE MODULE, PELLICLE HAVING THE SAME, AND LITHOGRAPHY A...

MOUNTED HOLLOW-CORE FIBER ARRANGEMENT

DRAWING METHOD, MASTER PLATE MANUFACTURING METHOD, AND DRAWING APPA...

CONTROL SYSTEM FOR A PLURALITY OF DEEP ULTRAVIOLET OPTICAL OSCILLATORS

SYSTEM AND METHOD FOR OVERLAY ERROR REDUCTION

GAMMA RAY GENERATOR? GAMMA RAY LITHOGRAPHY SYSTEM AND METHOD OF PER...

APPARATUS FOR AND METHOD OF MANUFACTURING AN ARTICLE USING PHOTOLIT...

ELECTRO OPTICAL DEVICES FABRICATED USING DEEP ULTRAVIOLET RADIATION

CHARGED PARTICLE BEAM WRITING APPARATUS, CHARGED PARTICLE BEAM WRIT...

Artificial nerve conduit construction using tissue engineering methods

REDUCING SPECKLE IN AN EXCIMER LIGHT SOURCE

Patterning Method and Method for Manufacturing Array Substrate

EXPOSURE DEVICE

PROJECTION EXPOSURE APPARATUS FOR SEMICONDUCTOR LITHOGRAPHY

GAMMA RAY GENERATOR, GAMMA RAY LITHOGRAPHY SYSTEM AND METHOD OF PER...