Reflective illumination

Industry

CPC
G03F7/702

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/702Reflective illumination

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Exposure device and method
- Patent number 12,366,807
- Issue date Jul 22, 2025
- Chun-Jung Chiu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical assembly, method for deforming an optical element, and proj...
- Patent number 12,360,459
- Issue date Jul 15, 2025
- Carl Zeiss SMT GmbH
- Tim Hoffmann
- G02 - OPTICS
Information Patent Grant
Dynamic generation of layout adaptive packaging
- Patent number 12,360,467
- Issue date Jul 15, 2025
- Applied Materials, Inc.
- Uwe Hollerbach
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High-speed nanopatterning method and apparatus of two-color super-r...
- Patent number 12,353,138
- Issue date Jul 8, 2025
- Foundation of Soongsil University-Industry Cooperation
- Dong-Ryoung Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for heating an optical element in a microlithographic projec...
- Patent number 12,353,141
- Issue date Jul 8, 2025
- Carl Zeiss SMT GmbH
- Dirk Hellweg
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical system
- Patent number 12,346,033
- Issue date Jul 1, 2025
- Carl Zeiss SMT GmbH
- Rolf Freimann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Device and method for regulating and controlling incident angle of...
- Patent number 12,346,030
- Issue date Jul 1, 2025
- Tsinghua University
- Leijie Wang
- G01 - MEASURING TESTING
Information Patent Grant
Digital micromirror device for an illumination optical component of...
- Patent number 12,339,589
- Issue date Jun 24, 2025
- Carl Zeiss SMT GmbH
- Michael Patra
- G02 - OPTICS
Information Patent Grant
Apparatus and methods for applying fiducial markings
- Patent number 12,322,148
- Issue date Jun 3, 2025
- The United States of America, as represented by the Secretary of the Navy
- Eric R. Walzer
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for generating EUV radiation
- Patent number 12,321,099
- Issue date Jun 3, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Sheng-Min Wang
- G02 - OPTICS
Information Patent Grant
Mask structure for deposition device, deposition device, and operat...
- Patent number 12,312,671
- Issue date May 27, 2025
- United Semiconductor Japan Co., Ltd.
- Satoshi Inagaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Optical assembly, projection exposure apparatus and method
- Patent number 12,313,978
- Issue date May 27, 2025
- Carl Zeiss SMT GmbH
- Andreas Raba
- G02 - OPTICS
Information Patent Grant
Two-dimensional (2D) patterns using multiple exposures of one-dimen...
- Patent number 12,306,540
- Issue date May 20, 2025
- Google LLC
- Lu Tian
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus, metrology systems, illumination switches an...
- Patent number 12,306,541
- Issue date May 20, 2025
- ASML Holding N.V. & ASML Netherlands B.V.
- Mohamed Swillam
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination correction apparatus
- Patent number 12,298,671
- Issue date May 13, 2025
- Samsung Electronics Co., Ltd.
- Donghyeong Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion exposure method and apparatus
- Patent number 12,293,924
- Issue date May 6, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chia-Cheng Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Data inspection for digital lithography for HVM using offline and i...
- Patent number 12,292,693
- Issue date May 6, 2025
- Applied Materials, Inc.
- Chung-Shin Kang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
High-performance EUV microscope device with free-form illumination...
- Patent number 12,287,579
- Issue date Apr 29, 2025
- ESOL Inc.
- Dong Gun Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for calculating a spatial map associated with...
- Patent number 12,276,918
- Issue date Apr 15, 2025
- ASML Netherlands B.V.
- Mauritius Gerardus Elisabeth Schneiders
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Mirror, in particular for microlithography
- Patent number 12,276,917
- Issue date Apr 15, 2025
- Carl Zeiss SMT GmbH
- Jan Horn
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Drive device, optical system and lithography apparatus
- Patent number 12,276,916
- Issue date Apr 15, 2025
- Carl Zeiss SMT GmbH
- Michel Aliman
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Grant
Transmissive diffusor
- Patent number 12,271,008
- Issue date Apr 8, 2025
- ASML Netherlands B.V.
- Andrey Nikipelov
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Methods for manufacturing semiconductor devices using MOIRÉ patterns
- Patent number 12,259,662
- Issue date Mar 25, 2025
- Samsung Electronics Co., Ltd.
- Woohyeok Jeong
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Universal metrology file, protocol, and process for maskless lithog...
- Patent number 12,248,254
- Issue date Mar 11, 2025
- Applied Materials, Inc.
- Tamer Coskun
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Stop, optical system and lithography apparatus
- Patent number 12,222,655
- Issue date Feb 11, 2025
- Carl Zeiss SMT GmbH
- Benjahman Julius Modeste
- G02 - OPTICS
Information Patent Grant
System and method for submicron additive manufacturing
- Patent number 12,208,569
- Issue date Jan 28, 2025
- Lawrence Livermore National Security, LLC
- Sourabh Kumar Saha
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Methods and apparatuses for aligning and diagnosing a laser beam
- Patent number 12,204,161
- Issue date Jan 21, 2025
- Cymer, LLC
- Donald Harrison Barnhart
- G01 - MEASURING TESTING
Information Patent Grant
Non-telecentric light guide elements
- Patent number 12,174,547
- Issue date Dec 24, 2024
- Waymo LLC
- James Dunphy
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Formation of three-dimensional structures using grey-scale photolit...
- Patent number 12,174,548
- Issue date Dec 24, 2024
- ams AG
- Gerhard Eilmsteiner
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Actuator device and method for aligning an optical element, optical...
- Patent number 12,164,234
- Issue date Dec 10, 2024
- Carl Zeiss SMT GmbH
- Boaz Pnini-Mittler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
SETUP AND CONTROL METHODS FOR A LITHOGRAPHIC PROCESS AND ASSOCIATED...
- Publication number 20250237965
- Publication date Jul 24, 2025
- ASML NETHERLANDS B.V.
- Marc HAUPTMANN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEMICONDUCTOR PROCESS APPARATUS
- Publication number 20250237963
- Publication date Jul 24, 2025
- Samsung Electronics Co., Ltd.
- Kyoungwhan Oh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR LASER LITHOGRAPHIC FABRICATION OF SURFACE...
- Publication number 20250237964
- Publication date Jul 24, 2025
- David John McGee
- G02 - OPTICS
Information Patent Application
ION EXPOSURE METHOD AND APPARATUS
- Publication number 20250232985
- Publication date Jul 17, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chia-Cheng Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR OPERATING AN OPTICAL COMPONENT, AND OPTICAL COMPONENT
- Publication number 20250231493
- Publication date Jul 17, 2025
- Carl Zeiss SMT GMBH
- Ralf NOLTEMEYER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COOLING DEVICE FOR COOLING A POSITION-SENSITIVE COMPONENT OF A LITH...
- Publication number 20250224681
- Publication date Jul 10, 2025
- Carl Zeiss SMT GMBH
- Matthias FETZER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF CONFIGURING EXTREME ULTRAVIOLET ILLUMINATION SYSTEM AND E...
- Publication number 20250216793
- Publication date Jul 3, 2025
- Samsung Electronics Co., Ltd.
- Soojung KIM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MIRROR DEVICE, FOR EXAMPLE FOR A MICROLITHOGRAPHIC PROJECTION EXPOS...
- Publication number 20250216794
- Publication date Jul 3, 2025
- Carl Zeiss SMT GMBH
- Johannes LIPPERT
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL ELEMENT FOR A PROJECTION EXPOSURE SYSTEM, OPTICAL SYSTEM CO...
- Publication number 20250216797
- Publication date Jul 3, 2025
- Carl Zeiss SMT GMBH
- Sonia Anaelle BISSIE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR OPERATING A PROJECTION EXPOSURE SYSTEM
- Publication number 20250216792
- Publication date Jul 3, 2025
- Carl Zeiss SMT GMBH
- Joerg ZIMMERMANN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF USING LITHOGRAPHY APPARATUS
- Publication number 20250216795
- Publication date Jul 3, 2025
- Samsung Electronics Co., Ltd.
- Ahyun Park
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Facet Mirror, Illumination Optical Unit, Arrangement of a Facet Mir...
- Publication number 20250216796
- Publication date Jul 3, 2025
- Carl Zeiss SMT GMBH
- Martin Endres
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ASSEMBLY OF AN OPTICAL SYSTEM
- Publication number 20250208376
- Publication date Jun 26, 2025
- Carl Zeiss SMT GMBH
- Christoph Mueller
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR OPERATING AN OPTICAL COMPONENT, AND OPTICAL COMPONENT
- Publication number 20250199293
- Publication date Jun 19, 2025
- Carl Zeiss SMT GMBH
- Ralf NOLTEMEYER
- G02 - OPTICS
Information Patent Application
MICROELECTROMECHANICAL DEVICE
- Publication number 20250199414
- Publication date Jun 19, 2025
- ROBERT BOSCH GmbH
- Ralf NOLTEMEYER
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
Diffraction-Based Illumination Sampling
- Publication number 20250198836
- Publication date Jun 19, 2025
- KLA Corporation
- Florian Melsheimer
- G02 - OPTICS
Information Patent Application
INTERMEDIATE PRODUCT FOR PRODUCING AN OPTICAL ELEMENT FOR A PROJECT...
- Publication number 20250189900
- Publication date Jun 12, 2025
- Carl Zeiss SMT GMBH
- Sandro HOFFMANN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DRIVE DEVICE, OPTICAL SYSTEM AND LITHOGRAPHY APPARATUS
- Publication number 20250180998
- Publication date Jun 5, 2025
- Carl Zeiss SMT GMBH
- Oliver HERBST
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIDUAL GAS ANALYSER, PROJECTION EXPOSURE APPARATUS COMPRISING A R...
- Publication number 20250174452
- Publication date May 29, 2025
- Carl Zeiss SMT GMBH
- Achim SCHOELL
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD FOR PROVIDING SENSOR DATA OF AN OPTICAL SYSTEM...
- Publication number 20250164893
- Publication date May 22, 2025
- Carl Zeiss SMT GMBH
- Steffen VAAS
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Application
EUV LIGHT GENERATION APPARATUS AND ELECTRONIC DEVICE MANUFACTURING...
- Publication number 20250164889
- Publication date May 22, 2025
- Gigaphoton Inc.
- Kotaro MIYASHITA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LENS ELEMENT FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS...
- Publication number 20250164890
- Publication date May 22, 2025
- Carl Zeiss SMT GMBH
- Stephan Six
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
GENERATE 3D PHOTORESIST PROFILES USING DIGITAL LITHOGRAPHY
- Publication number 20250155797
- Publication date May 15, 2025
- Applied Materials, Inc.
- Chi-Ming TSAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL APPARATUS AND CONTROL METHOD OF OPTICAL APPARATUS
- Publication number 20250155823
- Publication date May 15, 2025
- Lasertec Corporation
- Ko GONDAIRA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS OF METROLOGY
- Publication number 20250147436
- Publication date May 8, 2025
- ASML NETHERLANDS B.V.
- Chrysostomos BATISTAKIS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FACET MIRROR ASSEMBLY
- Publication number 20250147426
- Publication date May 8, 2025
- Carl Zeiss SMT GMBH
- Ralf Ameling
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEM AND METHOD FOR SUBMICRON ADDITIVE MANUFACTURING
- Publication number 20250144873
- Publication date May 8, 2025
- LAWRENCE LIVERMORE NATIONAL SECURITY, LLC
- Sourabh Kumar SAHA
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
PROJECTION EXPOSURE APPARATUS FOR SEMICONDUCTOR LITHOGRAPHY
- Publication number 20250147427
- Publication date May 8, 2025
- Carl Zeiss SMT GMBH
- Carlos Alberto JANSEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL ASSEMBLY, PROJECTION EXPOSURE SYSTEM FOR SEMICONDUCTOR LITH...
- Publication number 20250138302
- Publication date May 1, 2025
- Carl Zeiss SMT GMBH
- Thilo Pollak
- G02 - OPTICS
Information Patent Application
MIRROR FOR A PROJECTION EXPOSURE APPARATUS
- Publication number 20250138228
- Publication date May 1, 2025
- Carl Zeiss SMT GMBH
- Valentin Jonatan Bolsinger
- G02 - OPTICS

Reflective illumination

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Exposure device and method

Optical assembly, method for deforming an optical element, and proj...

Dynamic generation of layout adaptive packaging

High-speed nanopatterning method and apparatus of two-color super-r...

Method for heating an optical element in a microlithographic projec...

Optical system

Device and method for regulating and controlling incident angle of...

Digital micromirror device for an illumination optical component of...

Apparatus and methods for applying fiducial markings

Method for generating EUV radiation

Mask structure for deposition device, deposition device, and operat...

Optical assembly, projection exposure apparatus and method

Two-dimensional (2D) patterns using multiple exposures of one-dimen...

Lithographic apparatus, metrology systems, illumination switches an...

Illumination correction apparatus

Ion exposure method and apparatus

Data inspection for digital lithography for HVM using offline and i...

High-performance EUV microscope device with free-form illumination...

Method and apparatus for calculating a spatial map associated with...

Mirror, in particular for microlithography

Drive device, optical system and lithography apparatus

Transmissive diffusor

Methods for manufacturing semiconductor devices using MOIRÉ patterns

Universal metrology file, protocol, and process for maskless lithog...

Stop, optical system and lithography apparatus

System and method for submicron additive manufacturing

Methods and apparatuses for aligning and diagnosing a laser beam

Non-telecentric light guide elements

Formation of three-dimensional structures using grey-scale photolit...

Actuator device and method for aligning an optical element, optical...

Patents Applicationslast 30 patents

SETUP AND CONTROL METHODS FOR A LITHOGRAPHIC PROCESS AND ASSOCIATED...

SEMICONDUCTOR PROCESS APPARATUS

METHOD AND APPARATUS FOR LASER LITHOGRAPHIC FABRICATION OF SURFACE...

ION EXPOSURE METHOD AND APPARATUS

METHOD FOR OPERATING AN OPTICAL COMPONENT, AND OPTICAL COMPONENT

COOLING DEVICE FOR COOLING A POSITION-SENSITIVE COMPONENT OF A LITH...

METHOD OF CONFIGURING EXTREME ULTRAVIOLET ILLUMINATION SYSTEM AND E...

MIRROR DEVICE, FOR EXAMPLE FOR A MICROLITHOGRAPHIC PROJECTION EXPOS...

OPTICAL ELEMENT FOR A PROJECTION EXPOSURE SYSTEM, OPTICAL SYSTEM CO...

METHOD FOR OPERATING A PROJECTION EXPOSURE SYSTEM

METHOD OF USING LITHOGRAPHY APPARATUS

Facet Mirror, Illumination Optical Unit, Arrangement of a Facet Mir...

ASSEMBLY OF AN OPTICAL SYSTEM

METHOD FOR OPERATING AN OPTICAL COMPONENT, AND OPTICAL COMPONENT

MICROELECTROMECHANICAL DEVICE

Diffraction-Based Illumination Sampling

INTERMEDIATE PRODUCT FOR PRODUCING AN OPTICAL ELEMENT FOR A PROJECT...

DRIVE DEVICE, OPTICAL SYSTEM AND LITHOGRAPHY APPARATUS

RESIDUAL GAS ANALYSER, PROJECTION EXPOSURE APPARATUS COMPRISING A R...

APPARATUS AND METHOD FOR PROVIDING SENSOR DATA OF AN OPTICAL SYSTEM...

EUV LIGHT GENERATION APPARATUS AND ELECTRONIC DEVICE MANUFACTURING...

LENS ELEMENT FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS...

GENERATE 3D PHOTORESIST PROFILES USING DIGITAL LITHOGRAPHY

OPTICAL APPARATUS AND CONTROL METHOD OF OPTICAL APPARATUS

METHODS OF METROLOGY

FACET MIRROR ASSEMBLY

SYSTEM AND METHOD FOR SUBMICRON ADDITIVE MANUFACTURING

PROJECTION EXPOSURE APPARATUS FOR SEMICONDUCTOR LITHOGRAPHY

OPTICAL ASSEMBLY, PROJECTION EXPOSURE SYSTEM FOR SEMICONDUCTOR LITH...

MIRROR FOR A PROJECTION EXPOSURE APPARATUS