Reflective illumination

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G03F7/702

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/702Reflective illumination

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Stop, optical system and lithography apparatus
- Patent number 12,222,655
- Issue date Feb 11, 2025
- Carl Zeiss SMT GmbH
- Benjahman Julius Modeste
- G02 - OPTICS
Information Patent Grant
System and method for submicron additive manufacturing
- Patent number 12,208,569
- Issue date Jan 28, 2025
- Lawrence Livermore National Security, LLC
- Sourabh Kumar Saha
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Methods and apparatuses for aligning and diagnosing a laser beam
- Patent number 12,204,161
- Issue date Jan 21, 2025
- Cymer, LLC
- Donald Harrison Barnhart
- G01 - MEASURING TESTING
Information Patent Grant
Non-telecentric light guide elements
- Patent number 12,174,547
- Issue date Dec 24, 2024
- Waymo LLC
- James Dunphy
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Formation of three-dimensional structures using grey-scale photolit...
- Patent number 12,174,548
- Issue date Dec 24, 2024
- ams AG
- Gerhard Eilmsteiner
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Actuator device and method for aligning an optical element, optical...
- Patent number 12,164,234
- Issue date Dec 10, 2024
- Carl Zeiss SMT GmbH
- Boaz Pnini-Mittler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for reproducing a target wavefront of an imaging optical pro...
- Patent number 12,158,703
- Issue date Dec 3, 2024
- Carl Zeiss SMT GmbH
- Lukas Fischer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Drive device, optical system and lithography apparatus
- Patent number 12,153,353
- Issue date Nov 26, 2024
- Carl Zeiss SMT GmbH
- Oliver Herbst
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods of tuning a model for a lithographic process and associated...
- Patent number 12,147,161
- Issue date Nov 19, 2024
- ASML Netherlands B.V.
- Mhamed Akhssay
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Spectrometric metrology systems based on multimode interference and...
- Patent number 12,135,505
- Issue date Nov 5, 2024
- ASML Holding N.V.
- Mohamed Swillam
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System and method for parallel two-photon lithography using a metal...
- Patent number 12,130,407
- Issue date Oct 29, 2024
- Lawrence Livermore National Security, LLC
- Xiaoxing Xia
- G02 - OPTICS
Information Patent Grant
Optical system and lithography apparatus
- Patent number 12,130,557
- Issue date Oct 29, 2024
- Carl Zeiss SMT GmbH
- Matthias Manger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask structure for deposition device, deposition device, and operat...
- Patent number 12,123,087
- Issue date Oct 22, 2024
- United Semiconductor Japan Co., Ltd.
- Satoshi Inagaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
EUV lithography apparatus
- Patent number 12,119,129
- Issue date Oct 15, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Cheng Hung Tsai
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Thermo-mechanical actuator
- Patent number 12,117,739
- Issue date Oct 15, 2024
- ASML Netherlands B.V.
- Bas Jansen
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Grant
Method for producing a mirror of a microlithographic projection exp...
- Patent number 12,117,731
- Issue date Oct 15, 2024
- Carl Zeiss SMT GmbH
- Christoph Zaczek
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Image stabilization for digital lithography
- Patent number 12,117,732
- Issue date Oct 15, 2024
- Applied Materials, Inc.
- Thomas L. Laidig
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mirror for an illumination optical unit of a projection exposure ap...
- Patent number 12,111,578
- Issue date Oct 8, 2024
- Carl Zeiss SMT GmbH
- Christof Jalics
- G02 - OPTICS
Information Patent Grant
Image-forming optical system, exposure apparatus, and device produc...
- Patent number 12,105,428
- Issue date Oct 1, 2024
- Nikon Corporation
- Hideki Komatsuda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and device for correcting a telecentricity error of an imagi...
- Patent number 12,105,427
- Issue date Oct 1, 2024
- Carl Zeiss SMT GmbH
- Susanne Toepfer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical system with an aperture stop
- Patent number 12,105,429
- Issue date Oct 1, 2024
- Carl Zeiss SMT GmbH
- Tanja Mueller
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Actuator unit for positioning an optical element
- Patent number 12,099,307
- Issue date Sep 24, 2024
- ASML Netherlands B.V.
- Sjoerd Martijn Huiberts
- G02 - OPTICS
Information Patent Grant
Laser system for source material conditioning in an EUV light source
- Patent number 12,085,862
- Issue date Sep 10, 2024
- ASML Netherlands B.V.
- Matthew Ryan Graham
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Phase-shift reticle for use in photolithography
- Patent number 12,078,921
- Issue date Sep 3, 2024
- Entegris, Inc.
- Tse-An Yeh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Magnification adjustable projection system using deformable lens pl...
- Patent number 12,078,936
- Issue date Sep 3, 2024
- Corning Incorporated
- Robert Dennis Grejda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask inspection method and apparatus thereof
- Patent number 12,072,621
- Issue date Aug 27, 2024
- Taiwan Semiconductor Manufacturing Company Ltd.
- Chih-Wei Wen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Sensitivity improvement of optical and SEM defection inspection
- Patent number 12,066,763
- Issue date Aug 20, 2024
- KLA Corporation
- Kaushik Sah
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for preparing holographic pattern-expressing organogel using...
- Patent number 12,038,719
- Issue date Jul 16, 2024
- UNIST (ULSAN NATIONAL INSTITUTE OF SCIENCE AND TECHNOLOGY)
- Jiseok Lee
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Composition for forming organic film, patterning process, and polymer
- Patent number 12,032,293
- Issue date Jul 9, 2024
- Shin-Etsu Chemical Co., Ltd.
- Daisuke Kori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Optical element having a coating for influencing heating radiation...
- Patent number 12,025,818
- Issue date Jul 2, 2024
- Carl Zeiss SMT GmbH
- Boris Bittner
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING

Patents Applicationslast 30 patents

Information Patent Application
SYSTEMS AND METHODS FOR MONITORING SPATIAL LIGHT MODULATOR (SLM) FLARE
- Publication number 20250053105
- Publication date Feb 13, 2025
- Nikon Corporation
- Donis G. FLAGELLO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF REDUCING CYCLIC ERROR EFFECTS IN A LITHOGRAPHIC PROCESS,...
- Publication number 20250053102
- Publication date Feb 13, 2025
- ASML NETHERLANDS B.V.
- Hans BUTLER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR MEASURING AN ILLUMINATION ANGLE DISTRIBUTION ON AN OBJEC...
- Publication number 20250044703
- Publication date Feb 6, 2025
- Carl Zeiss SMT GMBH
- Robert BUSCHLINGER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
TEMPERATURE-INSENSITIVE ACTUATOR AND DEFORMATION MIRROR
- Publication number 20250044711
- Publication date Feb 6, 2025
- Carl Zeiss SMT GMBH
- Andreas Raba
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR MEASURING THE ILLUMINATION PUPIL IN A SCANNER TAKING INT...
- Publication number 20250044705
- Publication date Feb 6, 2025
- Carl Zeiss SMT GMBH
- Robert BUSCHLINGER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF FORMING PATTERNS
- Publication number 20250044686
- Publication date Feb 6, 2025
- Samsung SDI Co., Ltd.
- Yaeun SEO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ILLUMINATION OPTICAL UNIT FOR PROJECTION LITHOGRAPHY
- Publication number 20250044702
- Publication date Feb 6, 2025
- Carl Zeiss SMT GMBH
- Michael Patra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL COMPONENT FOR A LITHOGRAPHY APPARATUS
- Publication number 20250044712
- Publication date Feb 6, 2025
- Carl Zeiss SMT GMBH
- Thomas IRTENKAUF
- G02 - OPTICS
Information Patent Application
ARRANGEMENT, METHOD AND COMPUTER PROGRAM PRODUCT FOR CALIBRATING FA...
- Publication number 20250028250
- Publication date Jan 23, 2025
- Carl Zeiss SMT GMBH
- Florian Baumer
- G01 - MEASURING TESTING
Information Patent Application
SEMICONDUCTOR PROCESS APPARATUS
- Publication number 20250028257
- Publication date Jan 23, 2025
- Samsung Electronics Co., Ltd.
- Kyoungwhan Oh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
AN ASSEMBLY FOR A LASER-OPERATED LIGHT SOURCE AND METHOD OF USE
- Publication number 20250021009
- Publication date Jan 16, 2025
- ASML NETHERLANDS B.V.
- Ferry ZIJP
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR REDUCING PATTERN SHIFT IN A LITHOGRAPHIC AP...
- Publication number 20250021018
- Publication date Jan 16, 2025
- ASML NETHERLANDS B.V.
- Joost Cyrillus Lambert HAGEMAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CONTROL DEVICE, OPTICAL SYSTEM, LITHOGRAPHY INSTALLATION AND METHOD
- Publication number 20250021011
- Publication date Jan 16, 2025
- Carl Zeiss SMT GMBH
- Cornelius Richt
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IMAGE STABILIZATION FOR DIGITAL LITHOGRAPHY
- Publication number 20250021016
- Publication date Jan 16, 2025
- Applied Materials, Inc.
- Thomas L. LAIDIG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEMS AND METHODS FOR LITHOGRAPHIC TOOLS WITH INCREASED TOLERANCES
- Publication number 20250021012
- Publication date Jan 16, 2025
- ASML NETHERLANDS B.V.
- Jasper WINTERS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DEVICE AND METHOD FOR ALIGNING TWO COMPONENTS
- Publication number 20250021010
- Publication date Jan 16, 2025
- Carl Zeiss SMT GMBH
- Eduard Schweigert
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IMAGE-FORMING OPTICAL SYSTEM, EXPOSURE APPARATUS, AND DEVICE PRODUC...
- Publication number 20250013156
- Publication date Jan 9, 2025
- Nikon Corporation
- Hideki Komatsuda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DRIVE DEVICE, OPTICAL SYSTEM AND LITHOGRAPHY APPARATUS
- Publication number 20250015772
- Publication date Jan 9, 2025
- Carl Zeiss SMT GMBH
- Cornelius Richt
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROJECTION LENS, PROJECTION EXPOSURE APPARATUS AND PROJECTION EXPOS...
- Publication number 20250004382
- Publication date Jan 2, 2025
- Carl Zeiss SMT GMBH
- Alexander Epple
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL SYSTEM AND METHOD FOR A RADIATION SOURCE
- Publication number 20250008634
- Publication date Jan 2, 2025
- ASML NETHERLANDS B.V.
- Andrey Sergeevich TYCHKOV
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
INSPECTION APPARATUS, POLARIZATION-MAINTAINING ROTATABLE BEAM DISPL...
- Publication number 20240427251
- Publication date Dec 26, 2024
- ASML NETHERLANDS B.V.
- Douglas C. CAPPELLI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD FOR MANUFACTURING S...
- Publication number 20240419085
- Publication date Dec 19, 2024
- KIOXIA Corporation
- Yoshio MIZUTA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
HIGH RESOLUTION PHOTOLITHOGRAPHY
- Publication number 20240411229
- Publication date Dec 12, 2024
- TERA-PRINT LLC
- Andrey IVANKIN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR CALCULATING REPARATION DOSE FOR A DIE OF A...
- Publication number 20240411232
- Publication date Dec 12, 2024
- ASML NETHERLANDS B.V.
- Jingshi LI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS AND ASSOCIATED METHODS
- Publication number 20240411233
- Publication date Dec 12, 2024
- ASML NETHERLANDS B.V.
- Gosse Charles DE VRIES
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTUATOR UNIT FOR POSITIONING AN OPTICAL ELEMENT
- Publication number 20240402611
- Publication date Dec 5, 2024
- ASML NETHERLANDS B.V.
- Sjoerd Martijn HUIBERTS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK, LITHOGRAPHING APPARATUS, METHOD OF MANUFACTURING MASK AND LIT...
- Publication number 20240402612
- Publication date Dec 5, 2024
- WESTLAKE UNIVERSITY
- Xijun LI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
AUTOSTEREOSCOPIC CAMPFIRE DISPLAY
- Publication number 20240402483
- Publication date Dec 5, 2024
- GM GLOBAL TECHNOLOGY OPERATIONS LLC
- Thomas A. Seder
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
THERMO-MECHANICAL ACTUATOR
- Publication number 20240402621
- Publication date Dec 5, 2024
- ASML NETHERLANDS B.V.
- Bas JANSEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
INFORMATION PROCESSING APPARATUS, EXPOSURE APPARATUS, AND ARTICLE M...
- Publication number 20240393700
- Publication date Nov 28, 2024
- Canon Kabushiki Kaisha
- JUN KITAGAWA
- G05 - CONTROLLING REGULATING

Reflective illumination

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Stop, optical system and lithography apparatus

System and method for submicron additive manufacturing

Methods and apparatuses for aligning and diagnosing a laser beam

Non-telecentric light guide elements

Formation of three-dimensional structures using grey-scale photolit...

Actuator device and method for aligning an optical element, optical...

Method for reproducing a target wavefront of an imaging optical pro...

Drive device, optical system and lithography apparatus

Methods of tuning a model for a lithographic process and associated...

Spectrometric metrology systems based on multimode interference and...

System and method for parallel two-photon lithography using a metal...

Optical system and lithography apparatus

Mask structure for deposition device, deposition device, and operat...

EUV lithography apparatus

Thermo-mechanical actuator

Method for producing a mirror of a microlithographic projection exp...

Image stabilization for digital lithography

Mirror for an illumination optical unit of a projection exposure ap...

Image-forming optical system, exposure apparatus, and device produc...

Method and device for correcting a telecentricity error of an imagi...

Optical system with an aperture stop

Actuator unit for positioning an optical element

Laser system for source material conditioning in an EUV light source

Phase-shift reticle for use in photolithography

Magnification adjustable projection system using deformable lens pl...

Photomask inspection method and apparatus thereof

Sensitivity improvement of optical and SEM defection inspection

Method for preparing holographic pattern-expressing organogel using...

Composition for forming organic film, patterning process, and polymer

Optical element having a coating for influencing heating radiation...

Patents Applicationslast 30 patents

SYSTEMS AND METHODS FOR MONITORING SPATIAL LIGHT MODULATOR (SLM) FLARE

METHOD OF REDUCING CYCLIC ERROR EFFECTS IN A LITHOGRAPHIC PROCESS,...

METHOD FOR MEASURING AN ILLUMINATION ANGLE DISTRIBUTION ON AN OBJEC...

TEMPERATURE-INSENSITIVE ACTUATOR AND DEFORMATION MIRROR

METHOD FOR MEASURING THE ILLUMINATION PUPIL IN A SCANNER TAKING INT...

METHOD OF FORMING PATTERNS

ILLUMINATION OPTICAL UNIT FOR PROJECTION LITHOGRAPHY

OPTICAL COMPONENT FOR A LITHOGRAPHY APPARATUS

ARRANGEMENT, METHOD AND COMPUTER PROGRAM PRODUCT FOR CALIBRATING FA...

SEMICONDUCTOR PROCESS APPARATUS

AN ASSEMBLY FOR A LASER-OPERATED LIGHT SOURCE AND METHOD OF USE

SYSTEMS AND METHODS FOR REDUCING PATTERN SHIFT IN A LITHOGRAPHIC AP...

CONTROL DEVICE, OPTICAL SYSTEM, LITHOGRAPHY INSTALLATION AND METHOD

IMAGE STABILIZATION FOR DIGITAL LITHOGRAPHY

SYSTEMS AND METHODS FOR LITHOGRAPHIC TOOLS WITH INCREASED TOLERANCES

DEVICE AND METHOD FOR ALIGNING TWO COMPONENTS

IMAGE-FORMING OPTICAL SYSTEM, EXPOSURE APPARATUS, AND DEVICE PRODUC...

DRIVE DEVICE, OPTICAL SYSTEM AND LITHOGRAPHY APPARATUS

PROJECTION LENS, PROJECTION EXPOSURE APPARATUS AND PROJECTION EXPOS...

OPTICAL SYSTEM AND METHOD FOR A RADIATION SOURCE

INSPECTION APPARATUS, POLARIZATION-MAINTAINING ROTATABLE BEAM DISPL...

EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD FOR MANUFACTURING S...

HIGH RESOLUTION PHOTOLITHOGRAPHY

METHOD AND APPARATUS FOR CALCULATING REPARATION DOSE FOR A DIE OF A...

LITHOGRAPHIC APPARATUS AND ASSOCIATED METHODS

ACTUATOR UNIT FOR POSITIONING AN OPTICAL ELEMENT

MASK, LITHOGRAPHING APPARATUS, METHOD OF MANUFACTURING MASK AND LIT...

AUTOSTEREOSCOPIC CAMPFIRE DISPLAY

THERMO-MECHANICAL ACTUATOR

INFORMATION PROCESSING APPARATUS, EXPOSURE APPARATUS, AND ARTICLE M...