Patent Application
20150284845
The present invention relates a film forming apparatus and a vaporizer installation method, specifically a film forming apparatus characterized in that a pipe for feeding vaporized gas of liquid raw material, which is connected from a vaporizer to film forming chamber, is formed spiral.
Conventionally, in a film forming apparatus forming a film on a surface of a semiconductor wafer by using a CVD apparatus etc. including a MOCVD apparatus, a technology, which supplies carrier gas including liquid material for film forming to a vaporizer and vaporizes raw material in the vaporizer, is known.
In this vaporizer, a heater is arranged on the circumference of the heater and a pipe, which supplies carrier gas in the heater, and raw material is vaporized by its heat.
Cited reference 1 shows a technology, in which liquid raw material is introduced to carrier gas, the refined liquid raw material is dispersed in the carrier gas (Below, carrier gas with dispersed liquid raw material is called as gaseous raw material), this gaseous raw material is introduced to a vaporizer for the raw material etc. to be vaporized, the gaseous raw material with vaporized raw material etc. is introduced in a film forming chamber by a pipe for feeding vaporized gas of liquid raw material, and film forming executed in the film forming chamber.
In this time, only solvent is vaporized. In order to prevent generation of blocking at an exit and other problems, cooling means is provided at the exit. Also, in order to disperse the liquid raw material in the carrier gas as smaller particles, flow velocity from 50 to 340 m/sec for the carrier gas is used as adequate condition.
But, when film forming is executed with above technology, ripples often occur on the surface of the film. And, particles exist in the film or on the surface of the film. Also, there is a case that composition of the film is deviated from target composition. Also, there is a case that carbon content becomes large.
Patent Literature 1: WO02/058141
The conventional film forming apparatus has a structure that the vaporizer is arranged on the upper side of the film forming chamber, and the vaporizer and the film forming chamber is connected with the linear pipe for feeding vaporized gas of liquid raw material.
The conventional film forming apparatus has a case that the liquid raw material gas, which is not completely vaporized in the vaporizer, is introduced to the film forming chamber through the pipe for feeding vaporized gas of liquid raw material.
The problem of the present invention is to provide a film forming apparatus, in which vaporized gas of liquid raw material, that is not completely vaporized in a vaporizer, is completely vaporized while passing through a pipe for feeding vaporized gas of liquid raw material arranged between the vaporizer and a film forming chamber, and applies in the film forming chamber.
The present invention 1 is a film forming apparatus comprised of a supplying system of liquid raw material for film forming; a vaporizer, which vaporizes the liquid raw material by mixing with carrier gas; a film forming chamber, which flows the vaporized gas of liquid raw material from the vaporizer on a base plate, and forms film; and a pipe for feeding vaporized gas of liquid raw material, which supplies gas from the vaporizer to the film forming chamber; wherein the pipe for feeding vaporized gas of liquid raw material is formed into a spiral shape.
The present invention 2 is the film forming apparatus according to the present invention 1, wherein the axis of the pipe for feeding vaporized gas of liquid raw material as the spiral shape is arranged vertical direction to a floor plane.
The present invention 3 is the film forming apparatus according to the present invention 1, wherein the axis of the pipe for feeding vaporized gas of liquid raw material as the spiral shape is arranged horizontal direction to a floor plane.
The present invention 4 is the film forming apparatus according to the present invention 1, wherein the axis of the pipe for feeding vaporized gas of liquid raw material as the spiral shape is comprised of directions vertically and horizontally arranged for a floor plane. The present invention 5 is the film forming apparatus according to any one of the present invention 1 to 4, wherein the pipe for feeding vaporized gas of liquid raw material is heated at a temperature 20% to 30% higher than the boiling point of the vaporized gas of liquid raw material.
According to the film forming apparatus of the present invention 1, the gaseous raw material, which is not completely vaporized in the vaporizer, can be completely vaporized while passing through the pipe for feeding vaporized gas of liquid raw material arranged between the vaporizer and the film forming chamber, and supplied in the film forming chamber.
According to the film forming apparatus of the present invention 2, air flow of the vaporized gas of liquid raw material occurs secondary flow by centrifugal force, which vertically works to the axis as the spiral shape, in the pipe for feeding vaporized gas of liquid raw material. This flow goes toward the centrifugal force direction in the section of the feed pipe, goes back against to the centrifugal force direction at the boundary surface of the fluid, and again goes toward the centrifugal force direction. Then, because strong fluid mixed action is occurred in the fluid, progression of smoother vaporization is expected.
According to the film forming apparatus of the present invention 3, air flow of the vaporized gas of liquid raw material occurs secondary flow by centrifugal force, which vertically works to the axis as the spiral shape, in the pipe for feeding vaporized gas of liquid raw material. This flow goes toward the centrifugal force direction in the section of the feed pipe, goes back against to the centrifugal force direction at the boundary surface of the fluid, and again goes toward the centrifugal force direction. Then, because strong fluid mixed action is occurred in the fluid, progression of smoother vaporization is expected.
According to the film forming apparatus of the present invention 4, air flow of the vaporized gas of liquid raw material occurs secondary flow by centrifugal force, which vertically works to the axis as the spiral shape, in the pipe for feeding vaporized gas of liquid raw material. This flow goes toward the centrifugal force direction in the section of the feed pipe, goes back against to the centrifugal force direction at the boundary surface of the fluid, and again goes toward the centrifugal force direction. Then, because strong fluid mixed action is occurred in the fluid, progression of smoother vaporization is expected.
According to the film forming apparatus of the present invention 5, because the pipe for feeding vaporized gas of liquid raw material is heated at a temperature 20% to 30% higher than the boiling point of the vaporized gas of liquid raw material, vaporization is definitely progressed.
According to the present invention, the film forming apparatus, in which vaporized gas of liquid raw material, that is not completely vaporized, is completely vaporized while passing through the pipe for feeding vaporized gas of liquid raw material arranged between the vaporizer and the film forming chamber, and applies in the film forming chamber, can be provided.
1: Dispersion unit body
2: Gas passage
3
a: Carrier gas
4, 4a, 4b, 4c, 4d: Carrier gas inlet
5
a
5
b,
5
c,
5
d: First raw material solution for film forming
6
a,
6
b,
6
c,
6
d: Second raw material solution for film forming
6: Raw material supply hole
7: Gas outlet
9
a,
9
b: Vis
10: Center rod
16: Stopper
17: Notch
18: Cooling water
20: Vaporization pipe
21: Heating means
22: Vaporization unit
23: Connection unit
8: Dispersion unit
24: Joint
30
a,
30
b,
30
c,
30
d: Vaporizer
40
a,
40
b,
40
c,
40
d: Film forming chamber
41
a,
41
b,
41
c,
41
d: Substrate
42
a,
42
b,
42
c,
42
d: Base plate
50
a,
50
b,
50
c,
50
d: Pipe for feeding vaporized gas of liquid raw material
60
a
60
b: Exhaust pipe
70: Floor
101, 102, 103, 104: Film forming apparatus
A film forming apparatus of the present application is comprised of a supplying system of liquid raw material for film forming; a vaporizer, which vaporizes the liquid raw material by mixing with carrier gas; a film forming chamber, which flows the vaporized gas of liquid raw material from the vaporizer on a base plate, and forms film; and a pipe for feeding vaporized gas of liquid raw material, which supplies gas from the vaporizer to the film forming chamber; wherein the pipe for feeding vaporized gas of liquid raw material is formed into a spiral shape.
Here, the spiral shape of the pipe for feeding vaporized gas of liquid raw material has several cases.
For example, there are a case, in which the axis of the pipe for feeding vaporized gas of liquid raw material as the spiral shape is arranged vertical direction to a floor plane, and a case, in which the axis is arranged horizontal direction to a floor plane.
Also, there is a case, in which the above axis is composed of directions vertically and horizontally arranged for a floor plane. Direction of the axis as the spiral shape is not restricted the above cases. For Example, the axis may be arranged obliquely i.e. having angle to the vertical direction to a floor plane.
As the pipe for feeding vaporized gas of liquid raw material, stainless steel material is mainly used. But, it is not restricted.
Embodiments of the film forming apparatus of the present invention will be described hereafter.
Here, the axis of the pipe 50a for feeding vaporized gas of liquid raw material as the spiral shape is arranged vertical direction to a floor plane.
Outside diameter of the pipe was, for example, set to 19 mm, and length was set to 2170 mm (Upstream side 200 mm of straight-line part of the spiral part, and downstream side 100 mm of straight-line part are respectively counted). Inside diameter of the spiral part of the pipe was 100 mm φ, and outside diameter was 138 mm φ. Revolution number of the spiral was set more than 5. And, in the case of pipe whose outside diameter is 34 mm (1 inch size pipe), length was set to 2410 mm (Upstream side 200 mm of straight-line part of the spiral part, and downstream side 100 mm of straight-line part are respectively counted). Inside diameter of the spiral part of the pipe was 100 mm φ, and outside diameter was 168 mm φ. Revolution number of the spiral was set more than 5.
By constructing as described above, air flow of the vaporized gas of liquid raw material occurs secondary flow by centrifugal force, which vertically works to the axis as the spiral shape. This flow goes toward the centrifugal force direction in the section of the feed pipe, goes back against to the centrifugal force direction at the boundary surface of the fluid, and again goes toward the centrifugal force direction. Then, because strong fluid mixed action is occurred in the fluid, progression of smoother vaporization is expected. Namely, the gaseous raw material, which is not adequately vaporized in the vaporizer 30a arranged at the previous stage, is certainly vaporized.
The film forming apparatus 102 is comprised of the supplying system of liquid raw material for film forming (Not shown); the vaporizer 30b, which vaporizes the liquid raw material by mixing with carrier gas; the film forming chamber 40b, which flows the liquid raw material vaporizes gas from the vaporizer on the base plate, and forms film; and the pipe 50b for feeding vaporized gas of liquid raw material, which supplies gas from the vaporizer to the film forming chamber 40b.
Here, the axis of the pipe 50b for feeding vaporized gas of liquid raw material as the spiral shape is arranged horizontal direction to a floor plane.
Outside diameter of the pipe was, for example, set to 19 mm, and length was set to 2170 mm (Upstream side 200 mm of straight-line part of the spiral part, and downstream side 100 mm of straight-line part are respectively counted). Inside diameter of the spiral part of the pipe was 100 mm φ, and outside diameter was 138 mm φ. Revolution number of the spiral was set more than 5. And, in the case of pipe whose outside diameter is 34 mm (1 inch size pipe), length was set to 2410 mm (Upstream side 200 mm of straight-line part of the spiral part, and downstream side 100 mm of straight-line part are respectively counted). Inside diameter of the spiral part of the pipe was 100 mm φ, and outside diameter was 168 mm φ. Revolution number of the spiral was set more than 5.
By constructing as described above, air flow of the vaporized gas of liquid raw material occurs secondary flow by centrifugal force, which vertically works to the axis as the spiral shape. This flow goes toward the centrifugal force direction in the section of the feed pipe, goes back against to the centrifugal force direction at the boundary surface of the fluid, and again goes toward the centrifugal force direction. Then, because strong fluid mixed action is occurred in the fluid, progression of smoother vaporization is expected. Namely, the gaseous raw material, which is not adequately vaporized in the vaporizer 30b arranged at the previous stage, is certainly vaporized.
The film forming apparatus 103 is comprised of the supplying system of liquid raw material for film forming (Not shown); the vaporizer 30c, which vaporizes the liquid raw material by mixing with carrier gas; the film forming chamber 40c, which flows the liquid raw material vaporizes gas from the vaporizer on the base plate, and forms film; and the pipe 50c for feeding vaporized gas of liquid raw material, which supplies gas from the vaporizer to the film forming chamber 40c.
Here, the axis of the pipe 50c for feeding vaporized gas of liquid raw material as the spiral shape is composed of vertical direction and horizontal direction to a floor plane.
Outside diameter of the pipe was, for example, set to 19 mm, and length was set to 4040 mm (Upstream side 200 mm of straight-line part of the first spiral part, and downstream side 100 mm of straight-line part of the second spiral part are respectively counted). Inside diameter of the spiral part of the pipe was 100 mm φ, and outside diameter was 138 mm φ. Revolution number of the spiral was set more than 5. And, in the case of pipe whose outside diameter is 34 mm (1 inch size pipe), length was set to 2410 mm (Upstream side 200 mm of straight-line part of the first spiral part, and downstream side 100 mm of straight-line part of the second spiral part are respectively counted). Inside diameter of the spiral part of the pipe was 100 mm φ, and outside diameter was 168 mm φ. Revolution number of the spiral was set more than 10.
By constructing as described above, air flow of vaporized gas of liquid raw material occurs secondary flow by centrifugal force, which vertically works to the axis as the spiral shape. This flow goes toward the centrifugal force direction in the section of the feed pipe, goes back against to the centrifugal force direction at the boundary surface of the fluid, and again goes toward the centrifugal force direction. Then, because strong fluid mixed action is occurred in the fluid, progression of smoother vaporization is expected. Namely, the gaseous raw material, which is not adequately vaporized in the vaporizer 30c arranged at the previous stage, is certainly vaporized.
According to the film forming apparatus of the present invention, it becomes possible to completely vaporize the liquid raw material, quality of film forming by semiconductor production apparatus can be improved.
| Number | Date | Country | Kind |
|---|---|---|---|
| 2012-128284 | Jun 2012 | JP | national |
| Filing Document | Filing Date | Country | Kind |
|---|---|---|---|
| PCT/JP2013/065551 | 6/5/2013 | WO | 00 |
