Patent Grant
7723142
1. Field of the Invention
The present invention relates to a growth method of a GaN crystal, and a GaN crystal substrate, conveniently employed for the substrate and the like of a semiconductor device such as a light emitting element, an electronic element and a semiconductor sensor.
2. Description of the Background Art
A GaN crystal substrate is extremely useful for the substrate of a semiconductor device such as a light emitting element, an electronic element and a semiconductor sensor. It is required to grow a GaN crystal of great thickness in order to produce such a GaN crystal substrate efficiently.
When a GaN crystal is grown on a substrate of a type differing in the chemical composition from the GaN crystal (for example, sapphire substrate, SiC substrate, and the like) (such growth is referred to as hetero growth), the mismatch in the lattice constant between the different-type substrate and GaN crystal will cause higher dislocation density of the GaN crystal to reduce the crystallinity. In addition, complicated steps such as formation of a buffer layer, formation of a mask layer and the like were required in order to reduce the dislocation density and improve the crystallinity of the GaN crystal to be grown. It was therefore difficult to grow a GaN crystal efficiently.
When a GaN crystal is grown on a GaN substrate that is identical in type with the chemical composition of the GaN crystal (such growth is referred to as homo growth), there was a problem that a crack may be generated in the GaN crystal. The generation of a crack is noticeable particularly in the case where the thickness of the homo-growing GaN crystal is 1 mm or more.
Japanese Patent Laying-Open No. 2005-200250 (hereinafter, referred to as Patent Document 1) discloses a method of growing a nitride semiconductor crystal that is uniform in quality and of high crystallinity by surrounding the growth face edge portion and side face portion of the growing crystal with a cover located apart by a predetermined distance, when a nitride semiconductor crystal is to be grown on a nitride semiconductor substrate, to prevent abnormal growth that occurs partially at the edge region of the growth face and side face of the growing crystal. However, it was difficult to suppress generation of a crack during the growth of a GaN crystal even by the method disclosed in Patent Document 1.
In view of the foregoing, an object of the present invention is to provide a growth method of a GaN crystal that can suppress generation of a crack and grow a thick GaN crystal, and a GaN crystal substrate.
The present invention is directed to a method of growing a GaN crystal on a GaN seed crystal substrate. The growth method of a GaN crystal includes the steps of preparing a GaN seed crystal substrate including a first dopant such that a thermal expansion coefficient of the GaN seed crystal substrate becomes greater than the thermal expansion coefficient of the GaN crystal, and growing a GaN crystal to a thickness of at least 1 mm on the GaN seed crystal substrate. The first dopant can include at least one type of element selected from the group consisting of In, P, Al, As, Sb, O and Si. The concentration of the first dopant can be set to at least 5×1015 cm−3 and not more than 5×1019 cm−3.
In the step of growing a GaN crystal in the growth method of a GaN crystal of the present invention, a second dopant can be added to the GaN crystal such that the thermal expansion coefficient of the GaN seed crystal substrate becomes greater than the thermal expansion coefficient of the GaN crystal. The second dopant can include at least one type of element selected from the group consisting of In, P, Al, As, Sb, O and Si. The first and second dopant can include the same type of element.
The present invention is also directed to a GaN crystal substrate obtained by processing the GaN crystal obtained by the growth method set forth above.
According to the present invention, a growth method of a GaN crystal that can suppress generation of a crack and grow a thick GaN crystal, and a GaN seed crystal substrate can be provided.
The foregoing and other objects, features, aspects and advantages of the present invention will become more apparent from the following detailed description of the present invention when taken in conjunction with the accompanying drawings.
Referring to
By the inclusion of the first dopant in GaN seed crystal substrate 10p according to a growth method of a GaN crystal of the present embodiment, the thermal expansion coefficient of GaN seed crystal substrate 10p becomes greater than that of GaN crystal 20. Therefore, in the cooling process subsequent to the growth of GaN crystal 20, the shrinkage of GaN seed crystal substrate 10p will become greater than that of GaN crystal 20, causing compression stress on GaN crystal 20. Thus, the generation of a crack is suppressed.
The first dopant in GaN seed crystal substrate 10p is not particularly limited, as long as the thermal expansion coefficient of GaN seed crystal substrate 10p becomes greater than that of GaN crystal 20. However, in view of the great increase in the thermal expansion coefficient, at least one type of element selected from the group consisting of In, P, Al, As, Sb, O and Si is preferable. A compound crystal formed of such dopant and Ga or N (nitrogen) has a thermal expansion coefficient greater than that of the GaN crystal. For example, the thermal expansion coefficient of a GaN crystal is 3.17×10−6° C.−1; whereas the thermal expansion coefficient of an InN crystal is 3.80×10−6° C.−1; the thermal expansion coefficient of a GaP crystal is 4.65×10−6° C.−1; the thermal expansion coefficient of an AlN crystal is 5.27×10−6° C.−1; the thermal expansion coefficient of an Si3N4 crystal is 3.20×10−6° C.−1; the thermal expansion coefficient of a GaAs crystal is 5.73×10−6° C.−1; the thermal expansion coefficient of a GaSb crystal is 7.75×10−6° C.−1; and the thermal expansion coefficient of a Ga2O3 crystal is 4.60×10−6° C.−1.
The concentration of the first dopant in GaN seed crystal substrate 10p is preferably, though not particularly limited to, at least 5×1015 cm−3 and not more than 5×1019 cm−3. If the concentration of the dopant is lower than 5×1015 cm−3, the effect of increasing the thermal expansion coefficient of the GaN seed crystal substrate is reduced. If this concentration is higher than 5×1019 cm−3, the GaN seed crystal substrate will become brittle due to the solid solution hardening caused by the dopant. In this context, the concentration of the dopant is more preferably at least 1×1017 cm−3 and not more than 3×1019 cm−3.
As used herein, in order to facilitate comparison of the level of the thermal expansion coefficient, all references to the thermal expansion coefficient of each of GaN seed crystal substrate 10p and GaN crystal 20 corresponds to the increased amount with respect to the thermal expansion coefficient of a GaN crystal to which a dopant is not added (hereinafter, referred to as “increased thermal expansion coefficient”; the value of an increased amount that is lower than 0, i.e. −, implies decrease).
Since the density of a GaN crystal is 3.04 g·cm−3, the number of Ga atoms and N atoms included in the volume of 1 cm3 thereof is 2.19×1022 each. An increased thermal expansion coefficient ΔλGaN(A) of an A-containing GaN crystal when Xcm−3 of A atoms, serving as the dopant, are added to the GaN crystal is calculated, using a thermal expansion coefficient λA of the A crystal (a crystal having all the Ga atoms or N atoms of the GaN crystal substituted with the dopant of A atoms; the same applies hereinafter), and a thermal expansion coefficient λGaN of the GaN crystal, by the following equation (1).
ΔλGaN(A)=(λA−λGaN)×X/(2.19×1022) (1)
For example, in the case where Xcm−3 of A atoms, serving as the dopant, are added to the GaN seed crystal substrate, and a dopant is not added to the GaN crystal, the difference Δλ of the increased thermal expansion coefficient ΔλGaN(A) of the GaN seed crystal substrate with respect to the thermal expansion coefficient ΔλGaN of the GaN crystal is calculated by the following equation (2), since the increased thermal expansion coefficient ΔλGaN(A) of the GaN crystal is 0.
Δλ=(ΔλGaN(A)−ΔλGaN)=ΔλGaN(A) (2)
In the step of growing a GaN crystal in the growth method of a GaN crystal of the present embodiment, a second dopant can be added to the GaN crystal such that the thermal expansion coefficient of the GaN seed crystal substrate becomes greater than that of the GaN crystal. A GaN crystal having a physical property newly added by the addition of various dopants can be grown while suppressing crack generation.
The second dopant in the GaN crystal 20 is preferably, although not particularly limited to, at least one type of element selected from the group consisting of In, P, Al, As, Sb, O and Si in view of the great increase in the thermal expansion coefficient and feasible adjustment with respect to the thermal expansion coefficient of the GaN seed crystal substrate. The first and second dopants set forth above preferably include the same type of element from the standpoint of preventing mixture of different-type dopants into the GaN crystal.
In the case where X1cm−3 of A1 atoms are added as the first dopant to the GaN seed crystal substrate and X2cm−3 of A2 atoms are added as the second dopant to the GaN crystal, an increased thermal expansion coefficient ΔλGaN(A1) of the GaN seed crystal substrate is calculated, using a thermal expansion coefficient λA1 of the A1 crystal (a crystal having all the Ga atoms or N atoms of the GaN crystal substituted with the dopant of A1 atoms; the same applies hereinafter), and the thermal expansion coefficient λGaN of the GaN crystal, is calculated by the following equation (3).
ΔλGaN(A1)=(λA1−λGaN)×X1/(2.19×1022) (3)
The increased thermal expansion coefficient ΔλGaN(A2) of the GaN crystal is calculated, using a thermal expansion coefficient λA2 of the A2 crystal (a crystal having all the Ga atoms or N atoms of the GaN crystal substituted with the dopant of A2 atoms; the same applies hereinafter), and the thermal expansion coefficient λGaN of the GaN crystal, is calculated by the following equation (4).
ΔλGaN(A2)=(λA2−λGaN)×X2/(2.19×1022) (4)
The difference Δλ of the increased thermal expansion coefficient ΔλGaN(A1) of the GaN seed crystal substrate with respect to the increased thermal expansion coefficient ΔλGaN(A2) of the GaN crystal is calculated by the following equation (5).
Δλ=ΔλGaN(A1)−ΔλGaN(A2) (5)
In the growth method of a GaN crystal of the present embodiment, a GaN seed crystal substrate including a first dopant such that the thermal expansion coefficient of the GaN seed crystal substrate becomes greater than that of the GaN crystal (for example, a dopant including at least one type of element selected from the group consisting of In, P, Al, As, Sb, O and Si) is prepared, as one example, as set forth below.
A growth method of GaN seed crystal 10 including the first dopant employs, but is not particularly limited to, vapor phase deposition such as HVPE (Hydride Vapor Phase Epitaxy), MOC (Metal Organic Chloride Vapor Phase Epitaxy), and MOVPE (Metal Organic Vapor Phase Epitaxy), as well as the liquid phase deposition method such as the high pressure fusion method, flux method, and the like. In view of the high crystal growth rate and favorable efficiency in obtaining a thick crystal, the HVPE method is preferably employed.
A GaN seed crystal 10 including at least one type of element selected from the group consisting of In, P, Al, As, Sb, O and Si as the first dopant can be grown, using a crystal growth apparatus 50 shown in
Referring to
With an underlying substrate 90 identified as substrate 100 heated to the temperature of at least 900° C. and not more than 1200° C., and Ga boat 53 heated to the temperature of at least 600° C. and not more than 1200° C., HCl gas 4 and carrier gas are introduced via HCl gas introduction pipe 51a, NH3 gas 6 and carrier gas are introduced via NH3 gas introduction pipe 51b, and a mixture gas of organic metal gas and HCl gas, qualified as dopant gas 7, is introduced via dopant gas introduction pipe 51c, into crystal growth vessel 51. HCl gas 4 reacts with Ga 3 in Ga boat 3 to be introduced into crystal growth vessel 51 as Ga chloride gas 5 (for example, GaCl gas and/or GaCl3 gas). When a different-type substrate is employed, a GaAs substrate, a SiC substrate, a sapphire substrate or the like that has a lattice constant of low mismatch with that of the grown GaN crystal, is preferably employed for underlying substrate 90, though not to be taken by way of limitation.
In the case where mixture gas of organic metal gas and HCl gas is employed for dopant gas 7, the organic metal gas reacts with HCl gas to be introduced into crystal growth vessel 51 as metal chloride gas. For the carrier gas, gas that does not react with the Ga chloride gas, the NH3 gas and the dopant gas such as H2 gas, N2 gas, and the like is preferably employed. The partial pressure of the Ga chloride gas is preferably at least 1.01 kPa (0.01 atm) and not more than 10.1 kPa (0.1 atm). The partial pressure of the NH3 gas is preferably at least 10.1 kPa (0.1 atm) and not more than 60.8 kPa (0.6 atm). The total pressure including the carrier gas is preferably at least 53.69 kPa (0.53 atm) and not more than 105.35 kPa (1.04 atm).
By the reaction of Ga chloride gas 5, NH3 gas 6 and dopant gas 7 introduced into crystal growth vessel 51 set forth above, GaN seed crystal 10 including at least one type of element selected from the group consisting of In, P, Al, As, Sb, O and Si, as the first dopant, is grown on underlying substrate 90.
A dopant can be added into GaN seed crystal 10 by the exemplified method set forth below. For doping In, mixture gas of TMI (trimethyl indium) gas and HCl gas, qualified as dopant gas 7, is introduced into dopant gas introduction pipe 51c to cause reaction between the TMI gas and HCl gas in the pipe. The produced In chloride gas (for example, InCl gas and/or InCl3 gas) reacts with Ga chloride gas 5 and NH3 gas 6. Thus, In doping is effected.
For doping Al, mixture gas of TMA (trimethyl aluminium) gas and HCl gas, qualified as dopant gas 7, is introduced into dopant gas introduction pipe 51c to cause reaction between the TMA gas and HCl gas in the pipe. The produced Al chloride gas (for example, AlCl3 gas) reacts with Ga chloride gas 5 and NH3 gas 6. Thus, Al doping is effected.
For doping P, mixture gas of organic metal gas and HCl is not introduced into dopant gas introduction pipe 51c as dopant gas 7. GaP is mixed with Ga 3 in Ga boat 53, and this GaP reacts with HCl gas 4 introduced via HCl gas introduction pipe 51a to produce phosphorus chloride gas (for example, PCl3 gas). The produced phosphorus chloride gas reacts with Ga chloride gas 5 and NH3 gas 6. Thus, P doping is effected.
For doping As, mixture gas of organic metal gas and HCl is not introduced into dopant gas introduction pipe 51c as dopant gas 7. GaAs is mixed with Ga 3 in Ga boat 53, and this GaAs reacts with HCl gas 4 introduced via HCl gas introduction pipe 51a to produce arsenic chloride gas (for example, AsCl3 gas). The produced arsenic chloride gas reacts with Ga chloride gas 5 and NH3 gas 6. Thus, As doping is effected.
For doping Sb, mixture gas of organic metal gas and HCl is not introduced into dopant gas introduction pipe 51c as dopant gas 7. GaSb is mixed with Ga 3 in Ga boat 53, and this GaSb reacts with HCl gas 4 introduced via HCl gas introduction pipe 51a to produce antimony chloride gas (for example, SbCl3 gas). The produced antimony chloride gas reacts with Ga chloride gas 5 and NH3 gas 6. Thus, Sb doping is effected.
For doping O, O2 gas qualified as dopant gas 7 is introduced into crystal growth vessel 51 via dopant gas introduction pipe 51c to cause reaction with Ga chloride gas 5 and NH3 gas 6. Thus, O doping is effected.
For doping Si, gas including Si such as SiH2 gas, SiCl2H2 gas or SiCl4 gas, qualified as dopant gas 7, is introduced into crystal growth vessel 51 via dopant gas introduction pipe 51c to cause reaction with Ga chloride gas 5 and NH3 gas 6. Thus, Si doping is effected.
Referring to
Referring to
Referring to
This step of removing the work-affected layer can be carried out by dry-etching the surface of the GaN seed crystal substrate using HCl or Cl2 gas. This removal can also be effected by wet-etching the surface of the GaN seed crystal substrate using phosphoric acid, sulfuric acid, KOH, NaOH, and the like. In addition, the removal can be effected by grinding and/or polishing the surface of the GaN seed crystal substrate.
The process of removing the work-affected layer is preferably carried out in a nitrogen gas or hydrogen gas atmosphere, establishing contact between the GaN seed crystal substrate heated to at least 700° C. and not more that 1200° C. and the HCl gas. Specifically, referring to
The reason why N2 gas is employed as the carrier gas is to set the atmosphere in crystal growth vessel 51 to a nitrogen gas atmosphere. By the work-affecting layer removal step on the GaN seed crystal substrate by the HCl gas in the nitrogen gas atmosphere, a flat GaN seed crystal substrate having a surface roughness Ra of 10 μm or below at the surface can be obtained. The partial pressure of the HCl gas is preferably at least 0.304 kPa (0.003 atm) and not more than 11.12 kPa (0.11 atm). The total pressure including N2 gas or H2 gas is preferably at least 53.69 kPa (0.53 atm) and not more than 105.35 kPa (1.04 atm). If the partial pressure of the HCl gas is lower than 0.304 kPa (0.003 atm), the time required to remove the work-affected layer will become longer, leading to higher cost. If the partial pressure is higher than 11.12 kPa, the surface of the GaN seed crystal substrate will be roughened, which is not preferable since it may become the cause of a defect in the growing GaN crystal.
If H2 gas is employed as the carrier gas, the dropping of nitrogen atoms from the GaN seed crystal substrate will be increased to cause dropping of Ga. As a result, the planarity of the surface of the substrate will be degraded. Thus, N2 gas is preferable than H2 gas as the carrier gas. In view of preventing dropping of nitrogen atoms from the GaN seed crystal substrate, NH3 gas may be mixed at a partial pressure of at least 0.304 kPa (0.003 atm) and not more than 11.14 kPa (0.11 atm).
The step of growing GaN crystal 20 to a thickness of at least 1 mm on GaN seed crystal substrate 10p in a growth method of a GaN crystal of the present embodiment will be described hereinafter with reference to
GaN crystal 20 of at least 1 mm in thickness can be grown on GaN seed crystal substrate 10p as set forth below. Referring to
As a second dopant, at least one type of element selected from the group consisting of In, P, Al, As, Sb, O and Si can be added to GaN crystal 20. The GaN crystal growth method, growth condition, dopant adding method, and adding conditions are similar to those set forth above of the growth of GaN seed crystal. In view of suppressing a crack in GaN crystal 20, the first and second dopants are preferably added such that the thermal expansion coefficient of GaN seed crystal substrate 10p becomes greater than that of GaN crystal 20, i.e. increased thermal expansion coefficient ΔλGaN(A1) of the GaN seed crystal substrate become greater than the increased thermal expansion coefficient ΔλGaN(A2) of the GaN crystal.
Another embodiment of a growth method of a GaN crystal of the present invention is directed to a method of growing GaN crystal 20 on GaN seed crystal substrate 10p with reference to
By the growth method of a GaN crystal of the present embodiment, a GaN crystal of polycrystalline structure (polycrystalline region 20b of GaN crystal) is grown on polycrystalline region 10b of GaN seed crystal substrate 10p, and a GaN crystal of monocrystalline structure (monocrystalline region 20a of GaN crystal) is grown on a monocrystalline region 10a (the region excluding the outer circumferential polycrystalline region 20b from the entire GaN seed crystal substrate 10p) of GaN seed crystal substrate 10p.
Referring to
Referring to GaN crystal 20 in
It is considered that polycrystalline region 10b located at the outer circumferential side of GaN seed crystal substrate 10p with reference to
A growth method of a GaN crystal preferably employs, but is not particularly limited to, vapor phase deposition such as HVPE, MOC, and MOVPE, as well as the liquid phase deposition method such as the high pressure fusion method, flux method, and the like. In view of the high crystal growth rate and favorable efficiency in obtaining a thick crystal, the HVPE method is preferably employed.
Referring to
The diameter D1 of monocrystalline region 10a at the center area of GaN seed crystal substrate 10p is preferably at least 25 mm, and more preferably at least 50 mm, though not to be taken by way of limitation. If this diameter D1 is smaller than 25 mm, the obtained GaN single crystal will become smaller.
The thickness of the GaN crystal to be grown on the GaN seed substrate is preferably at least 1 mm, more preferably at least 2 mm. If the thickness of the GaN crystal is lower than 1 mm, the fabrication cost will become higher if slicing is implemented since the number of substrates obtained by slicing is lower. A GaN crystal of at least 1 mm in thickness is advantageous in that, by virtue of the increased number of substrates obtained by slicing, the increase in the fabrication cost by the thicker crystal film and the processing cost by slicing can be absorbed by the advantage of the larger number of substrates obtained.
Referring to
Holes (not shown) may be provided in polycrystalline region 10b of GaN seed crystal substrate 10p and polycrystalline region 20b of GaN crystal 20. Holes in these polycrystalline regions 10b and 20b are advantageous in that the stress generated at the interface between C-plane and A- or M-plane of the GaN crystal, or the externally applied impact during handling, processing, and the like, may be further alleviated to further suppress generation of a crack.
GaN seed crystal substrate 10p having polycrystalline region 10b at the outer circumference can be obtained by any method, as long as the method does not infringe the object of the present invention. An exemplified method will be described hereinafter.
Referring to
Referring to
The different-type substrate employed as underlying substrate 90 is, but not particularly limited to, a sapphire substrate, an SiC substrate, a GaAs substrate, and the like in view of the low mismatch in the lattice constant with the growing GaN crystal. For polycrystallization material 91 that is not particularly limited as long as it promotes polycrystallization of GaN seed crystal 10, alumina, mullite, solid carbon, or the like is preferably employed. By growing GaN seed crystal 10 on underlying substrate 90 and polycrystallization material 91, monocrystalline region 10a is formed on underlying substrate 90, and polycrystalline region 10b is formed on polycrystallization material 91. Thus, GaN seed crystal 10 having polycrystalline region 10b at the outer circumference is grown.
Referring to
The method of growing a polycrystalline region on the other circumference of underlying substrate 90 is not particularly limited. In addition to forming a work-affected layer 90t at the outer circumference of underlying substrate 90, an underlying substrate 90 may be formed such that the surface at the outer circumference of underlying region 90 has a plane direction that does not cause growth of a GaN single crystal.
With regards to the growth of GaN seed crystal 10 shown in
The growth method of GaN seed crystal 10 employs, but is not particularly limited to, the vapor phase method such as HVPE, MOC and MOVPE. By adjusting the growing condition of GaN seed crystal 10, the width W1 of polycrystalline region 10b of GaN seed crystal 10 can be set equal to or different from the width W0 of polycrystallization material 91, and the diameter D1 of monocrystalline region 10a of GaN seed crystal 10 can be set equal to or different from the diameter D0 of underlying substrate 90.
A GaN seed crystal 10 including at least one type of element selected from the group consisting of In, P, Al, As, Sb, O and Si as the first dopant can be grown, using crystal growth apparatus 50 shown in
Referring to
Referring to
With underlying substrate 90 and polycrystallization material 91 heated to the temperature of at least 900° C. and not more than 1200° C., and Ga boat 53 heated to the temperature of at least 600° C. and not more than 1200° C., HCl gas 4 and carrier gas are introduced via HCl gas introduction pipe 51a, NH3 gas 6 and carrier gas are introduced via NH3 gas introduction pipe 51b, and a mixture gas of organic metal gas and HCl gas, qualified as dopant gas 7, is introduced via dopant gas introduction pipe 51c, into crystal growth vessel 51. HCl gas 4 reacts with Ga 3 in Ga boat 3 to be introduced into crystal growth vessel 51 as Ga chloride gas 5 (for example, GaCl gas and/or GaCl3 gas).
In the case where mixture gas of organic metal gas and HCl gas is employed for dopant gas 7, the organic metal gas reacts with HCl gas to be introduced into crystal growth vessel 51 as metal chloride gas. For the carrier gas, gas that does not react with the Ga chloride gas, the NH3 gas and the dopant gas such as H2 gas, N2 gas, and the like is preferably employed. The partial pressure of the Ga chloride gas is preferably at least 1.01 kPa (0.1 atm) and not more than 10.1 kPa (0.1 atm). The partial pressure of the NH3 gas is preferably at least 10.1 kPa (0.1 atm) and not more than 60.8 kPa (0.6 atm). The total pressure including the carrier gas is preferably at least 53.69 kPa (0.53 atm) and not more than 105.35 kPa (1.04 atm).
By the reaction of Ga chloride gas 5, NH3 gas 6 and dopant gas 7 introduced into crystal growth vessel 51 set forth above, GaN seed crystal 10 including at least one type of element selected from the group consisting of In, P, Al, As, Sb, O and Si, as the dopant, is grown on underlying substrate 90 and polycrystallization material 91.
A dopant can be added into GaN seed crystal 10 by the exemplified method set forth below. For doping In, mixture gas of TMI (trimethyl indium) gas and HCl gas, qualified as dopant gas 7, is introduced into dopant gas introduction pipe 51c to cause reaction between the TMI gas and HCl gas in the pipe. The produced In chloride gas (for example, InCl gas and/or InCl3 gas) reacts with Ga chloride gas 5 and NH3 gas 6. Thus, In doping is effected.
For doping Al, mixture gas of TMA (trimethyl aluminium) gas and HCl gas, qualified as dopant gas 7, is introduced into dopant gas introduction pipe 51c to cause reaction between the TMA gas and HCl gas in the pipe. The produced Al chloride gas (for example, AlCl3 gas) reacts with Ga chloride gas 5 and NH3 gas 6. Thus, Al doping is effected.
For doping P, mixture gas of organic metal gas and HCl is not introduced into dopant gas introduction pipe 51c as dopant gas 7. GaP is mixed with Ga 3 in Ga boat 53, and this GaP reacts with HCl gas 4 introduced via HCl gas introduction pipe 51a to produce phosphorus chloride gas (for example, PCl3 gas). The produced phosphorus chloride gas reacts with Ga chloride gas 5 and NH3 gas 6. Thus, P doping is effected.
For doping As, mixture gas of organic metal gas and HCl is not introduced into dopant gas introduction pipe 51c as dopant gas 7. GaAs is mixed with Ga 3 in Ga boat 53, and this GaAs reacts with HCl gas 4 introduced via HCl gas introduction pipe 51a to produce arsenic chloride gas (for example, AsCl3 gas). The produced arsenic chloride gas reacts with Ga chloride gas 5 and NH3 gas 6. Thus, As doping is effected.
For doping Sb, mixture gas of organic metal gas and HCl is not introduced into dopant gas introduction pipe 51c as dopant gas 7. GaSb is mixed with Ga 3 in Ga boat 53, and this GaSb reacts with HCl gas 4 introduced via HCl gas introduction pipe 51a to produce antimony chloride gas (for example, SbCl3 gas). The produced antimony chloride gas reacts with Ga chloride gas 5 and NH3 gas 6. Thus, Sb doping is effected.
For doping O, O2 gas qualified as dopant gas 7 is introduced into crystal growth vessel 51 via dopant gas introduction pipe 51c to cause reaction between Ga chloride gas 5 and NH3 gas 6. For doping Si, SiH2 gas, qualified as dopant gas 7, is introduced into crystal growth vessel 51 via dopant gas introduction pipe 51c to cause reaction between Ga chloride gas 5 and NH3 gas 6. Thus, Si doping is effected.
In addition, Si doping can be effected by introducing gas including Si such as SiH2 gas, SiCl2H2 gas, and SiCl4 gas, qualified as dopant gas 7, into crystal growth vessel 51 via dopant gas introduction pipe 51c to cause reaction between Ga chloride gas 5 and NH3 gas 6.
GaN seed crystal 10 with polycrystalline region 10b at the outer circumference, obtained as set forth above, has the width W1 of polycrystalline region 10b adjusted by an outer circumference processing method set forth below. For this outer circumference processing method, three methods, i.e. the peripheral grinding method grinding the polycrystalline region at the outer circumference with a grindstone, the crystal hollowing method of hollowing the GaN seed crystal such that the width of the polycrystalline region attains a predetermined width, and the discharge processing method grinding the polycrystalline region at the outer circumference by electric discharging, are preferably cited, though not to be taken by way of limitation
Referring to
Referring to
This step of removing the work-affected layer can be carried out by dry-etching the surface of the GaN seed crystal substrate using HCl or Cl2 gas. This removal can also be effected by wet-etching the surface of the GaN seed crystal substrate using phosphoric acid, sulfuric acid, KOH, NaOH, and the like. In addition, the removal can be effected by grinding and/or polishing the surface of the GaN seed crystal substrate.
The process of removing the work-affected layer is preferably carried out in a nitrogen gas or hydrogen gas atmosphere, establishing contact between the GaN seed crystal substrate heated to at least 700° C. and not more that 1200° C. and the HCl gas. Specifically, referring to
The reason why N2 gas is employed as the carrier gas is to set the atmosphere in crystal growth vessel 51 to a nitrogen gas atmosphere. By the work-affecting layer removal step on the GaN seed crystal substrate by the HCl gas in the nitrogen gas atmosphere, a flat GaN seed crystal substrate having a surface roughness Ra of 10 μm or below at the surface can be obtained. The partial pressure of the HCl gas is preferably at least 0.304 kPa (0.003 atm) and not more than 11.12 kPa (0.11 atm). The total pressure including N2 gas or H2 gas is preferably at least 53.69 kPa (0.53 atm) and not more than 105.35 kPa (1.04 atm). If the partial pressure of the HCl gas is lower than 0.304 kPa (0.003 atm), the time required to remove the work-affected layer will become longer, leading to higher cost. If the partial pressure is higher than 11.12 kPa, the surface of the GaN seed crystal substrate will be roughened, which is not preferable since it may become the cause of a defect of the growing GaN crystal.
If H2 gas is employed as the carrier gas, the dropping of nitrogen atoms from the GaN seed crystal substrate will be increased to cause dropping of Ga. As a result, the planarity of the surface of the substrate will be degraded. Thus, N2 gas is preferable than H2 gas as the carrier gas. In view of preventing dropping of nitrogen atoms from the GaN seed crystal substrate, NH3 gas may be mixed at a partial pressure of at least 0.304 kPa (0.003 atm) and not more than 11.14 kPa (0.11 atm).
The step of growing GaN crystal 20 to a thickness of at least 1 mm, having polycrystalline region 20b at the circumference, on GaN seed crystal substrate 10p, having polycrystalline region 10b at the circumference, in a growth method of a GaN crystal of the present embodiment will be described hereinafter with reference to
GaN crystal 20 of at least 1 mm in thickness, having polycrystalline region 20b at the circumference, can be grown on GaN seed crystal substrate 10p as set forth below. Referring to
As a second dopant, at least one type of element selected from the group consisting of In, P, Al, As, Sb, O and Si can be added to GaN crystal 20. The GaN crystal growth method, growth condition, dopant adding method, and adding conditions are similar to those set forth above of the growth of GaN seed crystal. In view of suppressing a crack in the GaN crystal, the first and second dopants are preferably added such that the thermal expansion coefficient of GaN seed crystal substrate 10p becomes greater than that of GaN crystal 20, i.e. increased thermal expansion coefficient ΔλGaN(A1) of the GaN seed crystal substrate become greater than the increased thermal expansion coefficient ΔλGaN(A2) of the GaN crystal.
By adjusting the growing condition of GaN crystal 20, the width W2 of polycrystalline region 20b of GaN crystal 20 can be set equal to or different from the width W1 of GaN seed crystal substrate 10p, and the diameter D2 of monocrystalline region 20a of GaN crystal 20 can be set equal to or different from the diameter D1 of monocrystalline region 10a of GaN seed crystal substrate 10p.
A further embodiment of a growth method of a GaN crystal according to the present invention includes the steps of processing the outer circumference of GaN crystal 20 and GaN seed crystal substrate 10p to adjust widths W2 and W1 of polycrystalline region 20b and 10b, respectively, with reference to
The method of adjusting widths W2 and W1 of polycrystalline regions 20b and 10b, respectively, by processing the outer circumference of GaN crystal 20 and GaN seed crystal substrate 10p can be carried out by employing a method similar to that of the second embodiment. The separation of GaN crystal 20 from GaN seed crystal substrate 10p can be effected by a slicing method similar to that of the first and second embodiments. Removal of a work-affected layer of GaN seed crystal 10 from which GaN crystal 20 is separated can be carried out by a method similar to that of the first and second embodiments. By adjusting the growth conditions of second GaN crystal 30, the width W3 of polycrystalline region 30b of second GaN crystal 30 can be set equal to or different from the width W1 of GaN seed crystal substrate 10p, and the diameter D3 of monocrystalline region 30a of second GaN crystal 30 can be set equal to or different from the diameter D1 of monocrystalline region 10a of GaN seed crystal substrate 10p. The first dopant and the second dopant can be applied to GaN seed crystal substrate 10p and second GaN crystal 30, respectively, such that the thermal expansion coefficient of GaN seed crystal substrate 10p becomes greater than that of second GaN crystal 30.
Still another embodiment of a growth method of a GaN crystal according to the present invention includes the steps set forth below. Referring to
Specifically, GaN crystal 20 obtained by the growth method of the first embodiment is sliced at planes 20sp and 20tp parallel to main surface 10s of GaN seed crystal substrate 10p. Using this GaN crystal substrate 20p having main surfaces 20s and 20t as the second GaN seed crystal substrate, third GaN crystal 40 is grown. Thus, the growth efficiency of the GaN crystal can be further improved.
The method of adjusting widths W2 and W1 of polycrystalline regions 20b and 10b by processing the outer circumference of GaN crystal 20 and GaN seed crystal substrate 10p is similar to that described with reference to the second embodiment. Slicing GaN crystal substrate 20p from GaN crystal 20 can be effected by a method similar to that of the first and second embodiments. Also, removal of the work-affected layer of GaN crystal substrate 20p can be carried out by a method similar to that of the first and second embodiments. By adjusting the growing conditions of third GaN crystal 40, the width W4 of polycrystalline region 40b of third GaN crystal 40 can be set equal to or different from the width W2 of GaN crystal substrate 20p, and the diameter D4 of monocrystalline region 40a of second GaN crystal 40 can be set equal to or different from the diameter D2 of monocrystalline region 20a of GaN crystal substrate 20p. The first and second dopants can be added to GaN crystal substrate 20p and third GaN crystal 40, respectively, so that the thermal expansion coefficient of GaN crystal substrate 20p becomes greater than that of third GaN crystal 40.
An embodiment of a GaN crystal substrate of the present invention corresponds to GaN crystal substrates 20p, 30p and 40p obtained by processing GaN crystal 20 (refer to
Some of monocrystalline regions 10a, 20a, 30a, and 40a in GaN seed crystal 10 and GaN crystals 20, 30 and 40 of the present invention may include a crystal that has the <0001> direction opposite to that of the adjacent crystal.
Referring to
Each dopant for the GaN seed crystal was added in a manner similar to that of the first embodiment. Referring to
Although monocrystalline GaN seed crystal 10 was grown on underlying substrate 90, GaN particles of approximately 0.1 μm to 1 mm in diameter were partially attached to the circumference thereof (not shown).
The GaN particles (not shown) adhering to the outer circumference of GaN seed crystal 10 were carefully removed using tweezers or file. Then, the crystal was sliced at planes 10sp and 10tp parallel to main surface 90s of underlying substrate 90. The surface was rinsed with hydrochloric acid (acid), KOH, NaOH (alkali) and ethanol (organic solvent). Seven GaN seed crystal substrates 10p, each having a thickness of 350 μm and a diameter 38 mm, were obtained. The generation of a crack in the obtained GaN seed crystal substrates 10p was evaluated. The crack generation rate was 43% for seed crystal substrate Ap (substrate obtained from seed crystal A, the same applies hereinafter), 57% for seed crystal substrate Bp (substrate obtained by seed crystal B; the same applies hereinafter), 57% for seed crystal substrate Cp (substrate obtained from seed crystal C; the same applies hereinafter), 71% for seed crystal substrate Dp (substrate obtained from seed crystal D; the same applies hereinafter), 57% for seed crystal substrate Ep (substrate obtained from seed crystal E; the same applies hereinafter), 57% for seed crystal substrate Fp (substrate obtained from seed crystal F; the same applies hereinafter), 43% for seed crystal substrate Gp (substrate obtained from seed crystal G; the same applies hereinafter), and 57% for seed crystal substrate Hp (substrate obtained from seed crystal H; the same applies hereinafter). The results are indicated in Table 1. As used herein, the crack generation rate (unit: %) refers to the percentage of the number of GaN crystal substrates Sc that has at least one crack of at least 50 μm in length among the obtained number of GaN crystal substrates So, and is defined by the equation of:
Crack generation rate(%)=100×Sc/So (6)
The crack was measured by a differential interference microscope.
The dopant concentration of each obtained GaN seed crystal substrate 10p was analyzed by SIMS (Secondary Ion Mass Spectroscopy). The concentration of In, P, Al, As, Sb, O and Si dopants were all at most 1×1016 cm−3 for seed crystal substrate Ap. For seed crystal substrate Bp, the In concentration was 2.4×1018 cm−3. For seed crystal substrate Cp, the Al concentration was 5.3×1017 cm−3. For seed crystal substrate Dp, the P concentration was 1.4×1018 cm−3. For seed crystal substrate Ep, the As concentration was 7.5×1016 cm−3. For seed crystal substrate Fp, the Sb concentration was 3.7×1016 cm−3. For seed crystal substrate Gp, the O concentration was 7.2×1018 cm−3. For seed crystal substrate Hp, the Si concentration was 4.3×1018 cm−3.
The increased thermal expansion coefficient ΔλGaN(A1) of each obtained GaN seed crystal substrate 10p was calculated using equation (3). Specifically, the increased thermal expansion coefficient ΔλGaN(A1) for seed crystal substrate Ap was 0° C.−1, for seed crystal substrate Bp 6.9×10−11° C.−1, for seed crystal substrate Cp 5.1×10−11° C.−1, for seed crystal substrate Dp 9.5×10−11° C.−1, for seed crystal substrate Ep 8.8×10−12° C.−1, for seed crystal substrate Fp 7.7×10−12° C.−1, for seed crystal substrate Gp 4.7×10−10° C.−1, and for seed crystal substrate Hp 5.9×10−12° C.−1. The results are indicated in Table 1.
Comparative Example 1 will be described with reference to
For Comparative Example 1 with reference to
Respective GaN crystals were grown in a manner similar to that of Comparative Example 1, provided that seed crystal substrate Bp (Example 1), seed crystal substrate Cp (Example 2), seed crystal substrate Dp (Example 3), seed crystal substrate Ep (Example 4), seed crystal substrate Fp (Example 5), seed crystal substrate Gp (Example 6) and seed crystal substrate Hp (Example 7) were employed, instead of seed crystal substrate Ap (Comparative Example 1), for the GaN seed crystal substrate. Likewise with Comparative Example 1, the crystal growth rate was 100 μm/hr for all Examples 1-7. A GaN crystal of approximately 10 mm in thickness was obtained by conducting crystal growth for 100 hours. Polycrystalline GaN of approximately 0.2 μm to 1 mm adhered partially to the outer circumference of the obtained GaN crystal. In a manner similar to that described above, the GaN crystal was subjected to the processes of removing the crystal adhering to the outer circumference, slicing, and rinsing. Seven GaN crystal substrates, each of 350 μm in thickness, were obtained. The crack generation rate of the GaN crystal substrates was 29% for Examples 1-5 and 7, and 14% for Example 6.
Since the increased thermal expansion coefficient ΔλGaN(A2) of each GaN crystal obtained in Examples 1-7 were 0, the difference Δλ of increased thermal expansion coefficient ΔλGaN(A1) of each GaN seed crystal substrate to increased thermal expansion coefficient ΔλGaN(A2) of each GaN crystal was, from equation (5), calculated as 6.9×10−11° C.−1 for Example 1, 5.1×10−11° C.−1 for Example 2, 9.5×10−11° C.−1 for Example 3, 8.8×10−12° C.−1 for Example 4, 7.7×10−12° C.−1 for Example 5, 4.7×10−10° C.−1 for Example 6, and 5.9×10−12° C.−1 for Example 7. The results are shown in Table 2.
In addition, for Examples 8-12, GaN crystals having various dopants added were grown under growth conditions similar to those of Comparative Example 1 on a GaN seed crystal substrate of respective types. A GaN crystal doped with As of 2.0×1016 cm−3 was grown on seed crystal substrate Ep in Example 8. A GaN crystal doped with O of 4.5×1018 cm−3 was grown on seed crystal substrate Gp in Example 9. A GaN crystal doped with Si of 2.0×1018 cm−3 was grown on seed crystal substrate Hp in Example 10. A GaN crystal doped with O of 7.5×1016 cm−3 was grown on seed crystal substrate Ep in Example 11. A GaN crystal doped with Si of 7.2×1018 cm−3 was grown on seed crystal substrate Gp in Example 12. The concentration of each type of dopant in the GaN crystal of each example is as shown in Table 3.
Likewise with Comparative Example 1, the crystal growth rate was 100 μm/hr for all Examples 8-12. A GaN crystal of approximately 10 mm in thickness was obtained by conducting crystal growth for 100 hours. Polycrystalline GaN of approximately 0.2 μm to 1 mm adhered partially to the outer circumference of the obtained GaN crystal. In a manner similar to that described above, the GaN crystal was subjected to the processes of removing the crystal adhering to the outer circumference, slicing, and rinsing. Seven GaN crystal substrates, each of 350 μm in thickness, were obtained.
The crack generation rate at the GaN crystal substrate calculated from equation (6) was 43% for Examples 8 and 10, and 29% for Examples 9, 11 and 12. Further, the increased thermal expansion coefficient ΔλGaN(A2) of each GaN crystal obtained for Examples 8-12 was, from equation (4), calculated as 2.3×10−12° C.−1 (Example 8), 2.9×10−10° C.−1 (Example 9), 2.7×10−12° C.−1 (Example 10), 4.9×10−12° C.−1 (Example 11), and 9.9×10−12° C.−1 (Example 12). Therefore, the difference Δλ of increased thermal expansion coefficient ΔλGaN(A1) of each GaN seed crystal substrate to increased thermal expansion coefficient ΔλGaN(A2) of each GaN crystal was, from equation (5), calculated as 6.5×10−12° C.−1 for Example 8, 1.8×10−10° C.−1 for Example 9, 3.2×10−12° C.−1 for Example 10, 3.9×10−12° C.−1 for Example 11, and 4.6×10−10° C.−1 for Example 12. The results are shown in Table 3.
Referring to Table 2, it is appreciated from Comparative Example 1 and Examples 1-7 that a thick GaN crystal can be grown with the generation of a crack suppressed by growing a GaN crystal on a GaN seed crystal substrate having the first dopant added such that the thermal expansion coefficient of the GaN seed crystal substrate is greater than that of the GaN crystal. Referring to Tables 2 and 3, it is apparent from Comparative Example 1 and Examples 8-12 that a thick GaN crystal can be grown with the generation of a crack suppressed by growing a GaN crystal added with the second dopant on a GaN seed crystal substrate added with the first dopant such that the thermal expansion coefficient of the GaN seed crystal substrate is greater than that of the GaN crystal.
Referring to
Each dopant of the GaN seed crystal was added in a manner similar to that of the first embodiment. For doping As (seed crystal J), powder of GaAs were mixed with Ga 5. For doping Al (seed crystal K), the mixture gas of TMA gas and HCl gas, qualified as dopant gas 7, was introduced. For doping O (seed crystal L) and Si (seed crystal M), O2 gas and SiH4 gas, respectively, qualified as dopant gas 7, were introduced. The employed powder of GaAs had the average grain size of 0.5 μm and below.
Referring to
Referring to
Following the growth of GaN seed crystal 10, the width W1 of polycrystalline region 10b was adjusted by working on the outer circumference of GaN seed crystal 10. GaN seed crystal 10 having the width W1 of polycrystalline region 10b adjusted was sliced at planes 10sp and 10tp parallel to main surface 90s of underlying substrate 90 (refer to
Referring to
Referring to
The processing conditions of the three outer circumference processing methods are set forth below. In a cylindrical grinding method, a diamond cup wheel having diamond abrasive grains of 20 μm in size embedded was used as the grindstone. The table forwarding rate was 0.5-1 mm/min; the work revolution speed was 10±2 rpm, and the crystal clamp pressure was 490 kPa (5 kgf/cm2). In the substrate hollowing method, a diamond electrolytic-deposited drill having diamond abrasive grains of 15 μm in grain size embedded was employed as a drill. Using a soluble coolant, the crystal was secured at a holder by wax. The grindstone rotation speed was 5000-8000 rpm, and the working rate was 0.5-30 mm/min. In the electric discharging method, the wire diameter was 20 mm, the wire material was brass, the wire tension was 7N, the average working voltage was 40V, and the working rate was 1.0 to 2.0 mm/min.
The In, P, Al, As, Sb, O and Si dopant concentrations of each obtained GaN seed crystal substrate 10p were all at most 1×1016 cm−3 for seed crystal substrate Ip (substrate obtained from seed crystal I, the same applies hereinafter). For seed crystal substrate Jp (substrate obtained from seed crystal J, the same applies hereinafter), the As concentration was 7.5×1016 cm−3. For seed crystal substrate Kp (substrate obtained from seed crystal K, the same applies hereinafter), the Al concentration was 5.3×1017 cm−3. For seed crystal substrate Lp (substrate obtained from seed crystal L, the same applies hereinafter), the O concentration was 7.2×1018 cm−3. For seed crystal substrate Mp (substrate obtained from seed crystal M, the same applies hereinafter), the Si concentration was 4.3×1018 cm−3. For seed crystal substrate Np (substrate obtained from seed crystal N, the same applies hereinafter), the O concentration was 7.2×1018 cm−3. For seed crystal substrate Op (substrate obtained from seed crystal O, the same applies hereinafter), the O concentration was 7.2×1018 cm−3.
The increased thermal expansion coefficient ΔλGaN(A1) of each obtained GaN seed crystal substrate 10p was calculated using equation (3). The increased thermal expansion coefficient ΔλGaN(A1) for seed crystal substrate Ip was 0° C.−1, for seed crystal substrate Jp 8.8×10−12° C.−1, for seed crystal substrate Kp 5.1×10−11° C.−1, for seed crystal substrate Lp 4.7×10−10° C.−1, for seed crystal substrate Mp 5.9×10−12° C.−1, for seed crystal substrate Np 4.7×10−10° C.−1, and for seed crystal substrate Op 4.7×10−10° C.−1. The results are indicated in Table 4.
Referring to
For Example 13 with reference to
Referring to
The increased thermal expansion coefficient ΔλGaN(A2) of the GaN crystal obtained in Example 13 was 0 from equation (4). The difference Δλ of increased thermal expansion coefficient ΔλGaN(A1) of seed crystal substrate Ap (GaN seed crystal substrate 10p) with respect to the increased thermal expansion coefficient ΔλGaN(A2) of GaN crystal 20 was 0 from equation (5). The results are shown in Table 5.
Respective GaN crystals were grown in a manner similar to that of Example 13, provided that seed crystal substrate Ip (Example 14), seed crystal substrate Kp (Example 15), seed crystal substrate Lp (Example 16), seed crystal substrate Mp (Example 17), seed crystal substrate Jp (Example 18), seed crystal substrate Kp (Example 19), seed crystal substrate Lp (Example 20), seed crystal substrate Np (Example 21), and seed crystal substrate Op (Example 22) were employed, instead of seed crystal substrate Ip (Example 13), for the GaN seed crystal substrate. In addition, the added dopant was As of 2.0×1016 cm−3 (Example 14), Al of 8.0×1016 cm−3 (Example 15), O of 4.5×1018 cm−3 (Example 16), Si of 2.0×1018 cm−3 (Example 17), O of 7.5×1016 cm−3(Example 18), P of 5.3×1017 cm−3 (Example 19), Si of 7.2×1018 cm−3 (Example 20), Si of 7.2×1018 cm−3 (Example 21), and Si of 7.2×1018 cm−3 (Example 22).
In a manner similar to that described above, the GaN crystal was subjected to the processes of removing the crystal adhering to the outer circumference, slicing, and rinsing. Seven GaN crystal substrates, each of 350 μm in thickness, were obtained. The crack generation rate of the GaN crystal substrates was 14% for Examples 14, 15, 17 and 19-22, and 0% for Examples 16 and 18.
In addition, the increased thermal expansion coefficient ΔλGaN(A2) of each GaN crystal obtained in Examples 14-22 was, from equation (4), calculated as 2.3×10−12° C.−1 (Example 14), 7.7×10−12° C.−1 (Example 15), 2.9×10−10° C.−1 (Example 16), 2.7×10−12° C.−1 (Example 17), 4.9×10−12° C.−1 (Example 18), 3.6×10−11° C.−1 (Example 19), 9.9×10−12° C.−1 (Example 20), 9.9×10−12° C.−1 (Example 21), and 9.9×10−12° C.−1 (Example 22). Therefore, the difference Δλ of increased thermal expansion coefficient ΔλGaN(A1) of each GaN seed crystal substrate to increased thermal expansion coefficient ΔλGaN(A2) to each GaN crystal was, by equation (5), calculated as 6.5×10−12° C.−1 for Example 14, 4.3×10−11° C.−1 for Example 15, 1.8×10−11° ° C.−1 for Example 16, 3.2×10−12° C.−1 for Example 17, 3.9×10−12° C.−1 for Example 18, 1.5×10−11° C.−1 for Example 19, 4.6×10−10° C.−1 for Example 20, 4.6×10−10° C.−1 for Example 21, and 4.6×10−10° C.−1 for Example 22. The results are shown in Table 5.
Referring to Tables 1 and 5, it is appreciated from Comparative Example 1 and Example 13 that a thick GaN crystal can be grown with the generation of a crack suppressed by growing a GaN crystal on a GaN seed crystal substrate having a polycrystalline region at the outer circumference. In addition, referring to Table 5, it is appreciated from Examples 13-22 that a thick GaN crystal can be grown with the generation of a crack further suppressed by growing a GaN crystal having the second dopant added on a GaN seed crystal substrate with a polycrystalline region at the outer circumferential region, and having the first dopant added so that the thermal expansion coefficient of the GaN seed crystal substrate is greater than that of the GaN crystal.
The outer circumference of GaN seed crystal 10 employed in Example 20, containing the O dopant at the concentration of 7.2×1018 cm−3, and including a monocrystalline region of 50 mm in diameter D1 and a polycrystalline region 10b of 10 mm in width W1 at the outer circumference, was worked by an outer circumference processing method similar to that of Example 20 to adjust width W1 of the polycrystalline region. The crystal was sliced at planes 10sp and 10tp parallel to main surface 90s of underlying substrate 90. The surface was rinsed with hydrochloric acid (acid) KOH, NaOH (alkali) and ethanol (organic solvent). Thus, a GaN seed crystal substrate 10p of 1000 μm in thickness, including a polycrystalline region of respective width W1 at the outer circumference was obtained. The width W1 was 0.03 mm (Example 23), 0.05 mm (Example 24), 0.1 mm (Example 25), 1.0 mm (Example 20A), 2.0 mm (Example 26), 5.0 mm (Example 27), and 10.0 mm (Example 28).
In a manner similar to that of Example 20, the work-affected layer at GaN seed crystal substrate 10p was removed.
A GaN crystal was grown on GaN seed crystal substrate 10p to obtain a GaN crystal of approximately 10 mm in thickness, in a manner similar to that of Example 20, provided that the applied amount of Si was 4.3×1018 cm−3. The GaN crystal was subjected to the processes of removing the crystal adhering to the outer circumference, slicing, and rinsing in a manner similar to that described above. Seven GaN crystal substrates, each of 350 μm in thickness, were obtained. The crack generation rate of the GaN crystal substrates was 29% for Examples 23, 24, and 28, 14% for Examples 25 and 20A, and 0% for Examples 26 and 27. The increased thermal expansion coefficient ΔλGaN(A2) of each GaN crystal obtained in Examples 23-28 was calculated as 5.9×10−12° C.−1 from equation (4). Therefore, the difference Δλ of increased thermal expansion coefficient ΔλGaN(A1) of each GaN seed crystal substrate with respect to the increased thermal expansion coefficient ΔλGaN(A2) of each GaN crystal was calculated as 4.6×10−10° C.−1 from equation (5). The results are shown in Table 6.
Referring to Table 6, it is appreciated from Examples 20 and 23-28 that the crack generation rate of the GaN crystal was reduced to 29% and below by growing a GaN crystal on a GaN seed crystal substrate having a polycrystalline region of at least 0.03 mm and not more than 10 mm in width W1 at the outer circumference. Furthermore, by growing a GaN crystal on a GaN seed crystal substrate having a polycrystalline region of at least 0.1 mm and not more than 5 mm in width W1 at the outer circumference, the crack generation rate of the GaN crystal was reduced to 14% and below.
GaN seed crystal substrates having the O dopant concentration and increased thermal expansion coefficient ΔλGaN(A1) of 5.2×1015 cm−3 and 3.4×10−13° C.−1, respectively (Example 29), 9.0×1016 cm−3 and 5.9×10−12° C.−1, respectively (Example 30), 6.0×1017 cm−3 and 3.9×10−11° C.−1, respectively (Example 31), 3.0×1019 cm−3 and 2.0×10−9° C.−1, respectively (Example 32), 5.5×1019 cm−3 and 3.6×10−9° C.−1, respectively (Example 33), and including a monocrystalline region of 50 mm in diameter and a polycrystalline region of 1 mm in width W1 adjacent to the outer circumference, were prepared.
Following the removal of a work-affected layer from the surface of the GaN seed crystal substrate, a GaN crystal having the Si dopant of 2.0×1015 cm−3 (Example 29), 6.0×1016 cm−3 (Example 30), 3.0×1017 cm−3 (Example 31), 6.0×1018 cm−3 (Example 32), and 8.0×1018 cm−3 (Example 33) added was grown thereon to obtain a GaN crystal of approximately 10 mm in thickness. The crack generation rate of the GaN crystal was 14% for Examples 29-32 and 29% for Example 33.
In addition, the increased thermal expansion coefficient ΔλGaN(A2) of each GaN crystal obtained in Examples 29-33 was, from equation (4), calculated as 1.3×10−13° C.−1 (Example 29), 3.9×10−12° C.−1 (Example 30), 2.0×10−11° C.−1 (Example 31), 3.9×10−10° C.−1 (Example 32), and 5.2×10−10° C.−1 (Example 33). Therefore, the difference Δλ of increased thermal expansion coefficient ΔλGaN(A1) of each GaN seed crystal substrate with respect to increased thermal expansion coefficient ΔλGaN(A2) of each GaN crystal was, from equation (5), calculated as 2.1×10−13° C.−1 Example 29), 2.0×10−12° C.−1 (Example 30), 2.0×10−11° C.−1 (Example 31), 1.6×10−9° C.−1 (Example 32) and 3.1×10−9° C.−1 (Example 33). The results are shown in Table 7.
Referring to Table 7, it is appreciated from Examples 29-33 that the crack generation rate of the GaN crystal was reduced significantly by growing a GaN crystal on the GaN seed crystal substrate whose dopant concentration at the GaN seed crystal substrate is at least 5×1015 cm−3 and not more than 3×1019 cm−3.
Although the present invention has been described and illustrated in detail, it is clearly understood that the same is by way of illustration and example only and is not to be taken by way of limitation, the scope of the present invention being interpreted by the terms of the appended claims.
| Number | Date | Country | Kind |
|---|---|---|---|
| 2007-147095 | Jun 2007 | JP | national |
| Number | Name | Date | Kind |
|---|---|---|---|
| 6413627 | Motoki et al. | Jul 2002 | B1 |
| Number | Date | Country |
|---|---|---|
| 1 088 914 | Apr 2001 | EP |
| 2005-200250 | Jul 2005 | JP |
| 2006-143581 | Jun 2006 | JP |
| 2006-290676 | Oct 2006 | JP |
| Number | Date | Country | |
|---|---|---|---|
| 20080296585 A1 | Dec 2008 | US |
