Claims
- 1. The combination of a substrate having a surface and an anti-reflective layer on said substrate surface, said anti-reflective layer including therein a polymer binder comprising recurring monomers according to the formula:
- 2. The combination of claim 1, wherein said anti-reflective layer has an etch selectivity to resist of at least about 1.2 when CF4 is used as an etchant.
- 3. The combination of claim 1, wherein said anti-reflective layer has a k value of at least about 0.3 at about 248 nm.
- 4. The combination of claim 1, wherein said anti-reflective layer has an n value of at least about 1.4 at about 248 mn.
- 5. A moiety having the formula:
- 6. A polymer comprising recurring monomers having the formula:
- 7. A moiety having the formula:
- 8. A polymer comprising recurring monomers of the formula:
- 9. The combination of a substrate having a surface and an anti-reflective layer on said substrate surface, said anti-reflective layer including therein a polymer binder comprising recurring monomers according to the formula:
- 10. A moiety having the formula:
- 11. A polymer comprising recurring monomers having the formula:
- 12. A moiety having the formula:
- 13. A polymer comprising recurring monomers of the formula:
Related Application
[0001] This application is a continuation of U.S. patent application Ser. No. 09/679,661, filed Oct. 4, 2000, incorporated by reference herein.
Continuations (1)
|
Number |
Date |
Country |
Parent |
09679661 |
Oct 2000 |
US |
Child |
10185624 |
Jun 2002 |
US |