characterised by antireflection means or light filtering or absorbing means

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G03F7/091

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GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/091characterised by antireflection means or light filtering or absorbing means

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Chemical amplification methods and techniques for developable botto...
- Patent number 12,165,870
- Issue date Dec 10, 2024
- Tokyo Electron Limited
- Steven Scheer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Tuning threshold voltage through meta stable plasma treatment
- Patent number 12,148,620
- Issue date Nov 19, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shao-Jyun Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Composition for resist underlayer, and pattern forming method using...
- Patent number 12,130,552
- Issue date Oct 29, 2024
- Samsung SDI Co., Ltd.
- Yoojeong Choi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Film processing method
- Patent number 12,119,242
- Issue date Oct 15, 2024
- SCREEN Holdings Co., Ltd.
- Yuji Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Aromatic underlayer
- Patent number 12,099,300
- Issue date Sep 24, 2024
- Rohm and Haas Electronic Materials LLC
- Sheng Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of patterning a substrate using a sidewall spacer etch mask
- Patent number 12,099,299
- Issue date Sep 24, 2024
- Tokyo Electron Limited
- Jodi Grzeskowiak
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resist underlayer film-forming composition containing novolac resin...
- Patent number 12,072,629
- Issue date Aug 27, 2024
- Nissan Chemical Industries, Ltd.
- Takafumi Endo
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Underlayer of multilayer structure and methods of use thereof
- Patent number 12,074,027
- Issue date Aug 27, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Jing-Hong Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Amorphous boron nitride film and anti-reflection coating structure...
- Patent number 12,061,312
- Issue date Aug 13, 2024
- Samsung Electronics Co., Ltd.
- Taejin Choi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photosensitive material and method of lithography
- Patent number 12,019,375
- Issue date Jun 25, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- An-Ren Zi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Underlayer for photoresist adhesion and dose reduction
- Patent number 11,988,965
- Issue date May 21, 2024
- Lam Research Corporation
- Samantha S. H. Tan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor devices and methods of manufacturing
- Patent number 11,977,333
- Issue date May 7, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Hung-Jui Kuo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for creating highly-functional meta-materials...
- Patent number 11,971,616
- Issue date Apr 30, 2024
- PIXELDISPLAY INC.
- David Wyatt
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Photoresist composition, coated substrate including the photoresist...
- Patent number 11,960,206
- Issue date Apr 16, 2024
- Rohm and Hass Electronic Materials LLC
- Emad Aqad
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photosensitive element, resin composition for forming barrier layer...
- Patent number 11,960,208
- Issue date Apr 16, 2024
- Resonac Corporation
- Masakazu Kume
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Coating compositions and methods of forming electronic devices
- Patent number 11,940,732
- Issue date Mar 26, 2024
- Rohm and Haas Electronic Materials LLC
- Sheng Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Monomers, polymers and lithographic compositions comprising same
- Patent number 11,932,713
- Issue date Mar 19, 2024
- Rohm and Haas Electronic Materials LLC
- Emad Aqad
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Thermosetting iodine- and silicon-containing material, composition...
- Patent number 11,914,295
- Issue date Feb 27, 2024
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Composition, pattern-forming method, and compound-producing method
- Patent number 11,880,138
- Issue date Jan 23, 2024
- JSR Corporation
- Shin-ya Nakafuji
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Prepolymer composition intended to form a contrast layer and method...
- Patent number 11,868,044
- Issue date Jan 9, 2024
- Arkema France
- Xavier Chevalier
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Material for forming organic film, patterning process, and polymer
- Patent number 11,851,530
- Issue date Dec 26, 2023
- Shin-Etsu Chemical Co., Ltd.
- Daisuke Kori
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Patterning method and structures resulting therefrom
- Patent number 11,848,239
- Issue date Dec 19, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chieh-Wei Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor devices and methods of manufacturing
- Patent number 11,842,896
- Issue date Dec 12, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Hung-Jui Kuo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-layer photo etching mask including organic and inorganic mate...
- Patent number 11,830,736
- Issue date Nov 28, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chung-Ting Ko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Coating compositions for use with an overcoated photoresist
- Patent number 11,822,248
- Issue date Nov 21, 2023
- Rohm and Haas Electronic Materials Korea Ltd.
- Eui-Hyun Ryu
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Composition for forming silicon-containing resist underlayer film r...
- Patent number 11,815,815
- Issue date Nov 14, 2023
- Nissan Chemical Industries, Ltd.
- Hiroyuki Wakayama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Coating compositions and methods of forming electronic devices
- Patent number 11,817,316
- Issue date Nov 14, 2023
- Rohm and Haas Electronic Materials LLC
- Sheng Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photosensitive resin structure for printing plate, and method for p...
- Patent number 11,796,914
- Issue date Oct 24, 2023
- Asahi Kasei Kabushiki Kaisha
- Shusaku Tabata
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Underlayer material for photoresist
- Patent number 11,796,918
- Issue date Oct 24, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- An-Ren Zi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Bottom antireflective coating materials
- Patent number 11,782,345
- Issue date Oct 10, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chien-Chih Chen
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...

Patents Applicationslast 30 patents

Information Patent Application
Material For Forming Organic Film, Patterning Process, And Organic...
- Publication number 20240402605
- Publication date Dec 5, 2024
- Shin-Etsu Chemical Co., Ltd.
- Daisuke KORI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
TUNING THRESHOLD VOLTAGE THROUGH META STABLE PLASMA TREATMENT
- Publication number 20240387178
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Shao-Jyun Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BOTTOM ANTIREFLECTIVE COATING MATERIALS
- Publication number 20240377743
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chien-Chih Chen
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
IMPLANT INTO EUV METAL OXIDE PHOTORESIST MODULE TO REDUCE EUV DOSE
- Publication number 20240379376
- Publication date Nov 14, 2024
- Applied Materials, Inc.
- Rajesh Prasad
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
UNDERLAYER OF MULTILAYER STRUCTURE AND METHODS OF USE THEREOF
- Publication number 20240371640
- Publication date Nov 7, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Jing-Hong HUANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITION AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20240369929
- Publication date Nov 7, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jing Hong HUANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Material For Forming Organic Film, Substrate For Manufacturing Semi...
- Publication number 20240363335
- Publication date Oct 31, 2024
- Shin-Etsu Chemical Co., Ltd.
- Daisuke KORI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DOSE REDUCTION BOTTOM ANTI-REFLECTIVE COATING FOR METALLIC PHOTORESIST
- Publication number 20240329535
- Publication date Oct 3, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yen-Yu KUO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Optical Device and Method of Manufacture
- Publication number 20240319590
- Publication date Sep 26, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yu-Hung Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ANTI-REFLECTIVE COATING COMPOSITION AND CROSSLINKABLE POLYMER
- Publication number 20240294771
- Publication date Sep 5, 2024
- TAN KAH KEE INNOVATION LABORATORY
- Aiqiang Zhang
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
APPARATUS AND METHOD FOR CREATING HIGHLY-FUNCTIONAL META-MATERIALS...
- Publication number 20240282274
- Publication date Aug 22, 2024
- PixelDisplay, Inc.
- David Wyatt
- B82 - NANO-TECHNOLOGY
Information Patent Application
UNDERLAYER FOR PHOTORESIST ADHESION AND DOSE REDUCTION
- Publication number 20240255850
- Publication date Aug 1, 2024
- LAM RESEARCH CORPORATION
- Samantha S.H. Tan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
COMPOSITION FOR PREPARING TOP ANTIREFLECTION FILM, TOP ANTIREFLECTI...
- Publication number 20240231229
- Publication date Jul 11, 2024
- GANSU HUALONG SEMICONDUCTOR MATERIAL TECHNOLOGY CO., LTD.
- Yongbin LI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
SWITCHABLE SUBSTRATE FOR EXTREME ULTRAVIOLET OR E-BEAM METALLIC RESIST
- Publication number 20240210822
- Publication date Jun 27, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- An-Ren Zi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTORESIST TOP COATING MATERIAL FOR ETCHING RATE CONTROL
- Publication number 20240192601
- Publication date Jun 13, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Tzu-Yang LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITION FOR PREPARING TOP ANTIREFLECTION FILM, TOP ANTIREFLECTI...
- Publication number 20240134282
- Publication date Apr 25, 2024
- GANSU HUALONG SEMICONDUCTOR MATERIAL TECHNOLOGY CO., LTD.
- Yongbin LI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
HARDMASK STRUCTURE AND METHOD OF FORMING SEMICONDUCTOR STRUCTURE
- Publication number 20240096625
- Publication date Mar 21, 2024
- NANYA TECHNOLOGY CORPORATION
- WEI-CHUAN FANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HARDMASK STRUCTURE AND METHOD OF FORMING SEMICONDUCTOR STRUCTURE
- Publication number 20240096624
- Publication date Mar 21, 2024
- NANYA TECHNOLOGY CORPORATION
- WEI-CHUAN FANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICES AND METHODS OF MANUFACTURING
- Publication number 20240079235
- Publication date Mar 7, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Hung-Jui Kuo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERNING METHOD AND STRUCTURES RESULTING THEREFROM
- Publication number 20240063060
- Publication date Feb 22, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chieh-Wei Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTOMASK PROCESSING APPARATUS AND METHOD OF PROCESSING PHOTOMASK
- Publication number 20240053685
- Publication date Feb 15, 2024
- SEMES CO., LTD.
- Youngdae Chung
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK AND METHOD OF MANUFACTURING DISPLAY PANEL USING THE SAME
- Publication number 20240045339
- Publication date Feb 8, 2024
- SAMSUNG DISPLAY CO., LTD.
- Soon-Hwan So
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DETECTION DEVICE, LITHOGRAPHY APPARATUS, AND ARTICLE MANUFACTURING...
- Publication number 20240027921
- Publication date Jan 25, 2024
- Canon Kabushiki Kaisha
- TOSHIKI IWAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR FORMING A LIFT-OFF MASK STRUCTURE
- Publication number 20240012327
- Publication date Jan 11, 2024
- ams-Osram AG
- Patrik Pertl
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF PROCESSING A SUBSTRATE
- Publication number 20240004300
- Publication date Jan 4, 2024
- NANYA TECHNOLOGY CORPORATION
- CHIH-YING TSAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COATING COMPOSITIONS FOR USE WITH AN OVERCOATED PHOTORESIST
- Publication number 20230418161
- Publication date Dec 28, 2023
- Rohm and Haas Electronic Materials Korea Ltd.
- Eui-Hyun Ryu
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
METALLIC PHOTORESIST PATTERNING AND DEFECT IMPROVEMENT
- Publication number 20230393475
- Publication date Dec 7, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chien-Chih CHEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Semiconductor manufacturing method
- Publication number 20230384678
- Publication date Nov 30, 2023
- United Semiconductor (Xiamen) Co., Ltd.
- Chien-Chung Tsai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Anti-reflective hard mask composition
- Publication number 20230375929
- Publication date Nov 23, 2023
- CHEMPOLE CO., LTD.
- Sangjun CHOI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF PATTERNING A SUBSTRATE USING A SIDEWALL SPACER ETCH MASK
- Publication number 20230367217
- Publication date Nov 16, 2023
- TOKYO ELECTRON LIMITED
- Jodi GRZESKOWIAK
- H01 - BASIC ELECTRIC ELEMENTS

characterised by antireflection means or light filtering or absorbing means

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Chemical amplification methods and techniques for developable botto...

Tuning threshold voltage through meta stable plasma treatment

Composition for resist underlayer, and pattern forming method using...

Film processing method

Aromatic underlayer

Method of patterning a substrate using a sidewall spacer etch mask

Resist underlayer film-forming composition containing novolac resin...

Underlayer of multilayer structure and methods of use thereof

Amorphous boron nitride film and anti-reflection coating structure...

Photosensitive material and method of lithography

Underlayer for photoresist adhesion and dose reduction

Semiconductor devices and methods of manufacturing

Apparatus and method for creating highly-functional meta-materials...

Photoresist composition, coated substrate including the photoresist...

Photosensitive element, resin composition for forming barrier layer...

Coating compositions and methods of forming electronic devices

Monomers, polymers and lithographic compositions comprising same

Thermosetting iodine- and silicon-containing material, composition...

Composition, pattern-forming method, and compound-producing method

Prepolymer composition intended to form a contrast layer and method...

Material for forming organic film, patterning process, and polymer

Patterning method and structures resulting therefrom

Semiconductor devices and methods of manufacturing

Multi-layer photo etching mask including organic and inorganic mate...

Coating compositions for use with an overcoated photoresist

Composition for forming silicon-containing resist underlayer film r...

Coating compositions and methods of forming electronic devices

Photosensitive resin structure for printing plate, and method for p...

Underlayer material for photoresist

Bottom antireflective coating materials

Patents Applicationslast 30 patents

Material For Forming Organic Film, Patterning Process, And Organic...

TUNING THRESHOLD VOLTAGE THROUGH META STABLE PLASMA TREATMENT

BOTTOM ANTIREFLECTIVE COATING MATERIALS

IMPLANT INTO EUV METAL OXIDE PHOTORESIST MODULE TO REDUCE EUV DOSE

UNDERLAYER OF MULTILAYER STRUCTURE AND METHODS OF USE THEREOF

COMPOSITION AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

Material For Forming Organic Film, Substrate For Manufacturing Semi...

DOSE REDUCTION BOTTOM ANTI-REFLECTIVE COATING FOR METALLIC PHOTORESIST

Optical Device and Method of Manufacture

ANTI-REFLECTIVE COATING COMPOSITION AND CROSSLINKABLE POLYMER

APPARATUS AND METHOD FOR CREATING HIGHLY-FUNCTIONAL META-MATERIALS...

UNDERLAYER FOR PHOTORESIST ADHESION AND DOSE REDUCTION

COMPOSITION FOR PREPARING TOP ANTIREFLECTION FILM, TOP ANTIREFLECTI...

SWITCHABLE SUBSTRATE FOR EXTREME ULTRAVIOLET OR E-BEAM METALLIC RESIST

PHOTORESIST TOP COATING MATERIAL FOR ETCHING RATE CONTROL

COMPOSITION FOR PREPARING TOP ANTIREFLECTION FILM, TOP ANTIREFLECTI...

HARDMASK STRUCTURE AND METHOD OF FORMING SEMICONDUCTOR STRUCTURE

HARDMASK STRUCTURE AND METHOD OF FORMING SEMICONDUCTOR STRUCTURE

SEMICONDUCTOR DEVICES AND METHODS OF MANUFACTURING

PATTERNING METHOD AND STRUCTURES RESULTING THEREFROM

PHOTOMASK PROCESSING APPARATUS AND METHOD OF PROCESSING PHOTOMASK

PHOTOMASK AND METHOD OF MANUFACTURING DISPLAY PANEL USING THE SAME

DETECTION DEVICE, LITHOGRAPHY APPARATUS, AND ARTICLE MANUFACTURING...

METHOD FOR FORMING A LIFT-OFF MASK STRUCTURE

METHOD OF PROCESSING A SUBSTRATE

COATING COMPOSITIONS FOR USE WITH AN OVERCOATED PHOTORESIST

METALLIC PHOTORESIST PATTERNING AND DEFECT IMPROVEMENT

Semiconductor manufacturing method

Anti-reflective hard mask composition

METHOD OF PATTERNING A SUBSTRATE USING A SIDEWALL SPACER ETCH MASK