Claims
- 1. A heat-peelable pressure-sensitive adhesive sheet comprising a substrate, a heat-expandable layer which contains heat-expandable microspheres and expands upon heating, formed on at least one side of the substrate, and a non-heat-expandable pressure-sensitive adhesive layer formed on the heat-expandable layer, wherein when the heat-peelable pressure-sensitive sheet is adhered to a semiconductor silicon wafer and then peeled from the wafer by heating, an amount of organic contamination on the surface of the semiconductor silicon wafer Δc is 50 or less.
- 2. A heat-peelable pressure-sensitive adhesive sheet comprising a substrate, a heat-expandable layer which contains heat-expandable microspheres and expands upon heating, formed on at least one side of the substrate, and a non-heat-expandable pressure-sensitive adhesive layer formed on the heat-expandable layer, wherein when the heat-peelable pressure-sensitive sheet is adhered to a semiconductor silicon wafer and then peeled from the wafer by heating, amount of organic contamination on the surface of the semiconductor silicon wafer C/Si is 2.5 or less.
- 3. A heat-peelable pressure-sensitive adhesive sheet comprising a substrate, a heat-expandable layer which contains heat-expandable microspheres and expands upon heating, formed on at least one side of the substrate, and a non-heat-expandable pressure-sensitive adhesive layer formed on the heat-expandable layer, wherein the heat-expandable layer exhibits adhesive properties and is supported by the substrate, the non-heat-expandable pressure-sensitive adhesive is a contamination-preventive and radiation-curing pressure-sensitive adhesive, and when the heat-peelable pressure-sensitive sheet is adhered to a semiconductor silicon wafer and then peeled from the wafer by heating, an amount of organic contamination on the surface of the semiconductor silicon wafer Δc is 50 or less.
- 4. A heat-peelable pressure-sensitive adhesive sheet comprising a substrate, a heat-expandable layer which contains heat-expandable microspheres and expands upon heating, formed on at least one side of the substrate, and a non-heat-expandable pressure-sensitive adhesive layer formed on the heat-expandable layer, wherein the heat-expandable layer exhibits adhesive properties and is supported by the substrate, the non-heat-expandable pressure-sensitive adhesive is a contamination-preventive and radiation-curing pressure-sensitive adhesive, and when the heat-peelable pressure-sensitive sheet is adhered to a semiconductor silicon wafer and then peeled from the wafer by heating, amount of organic contamination on the surface of the semiconductor silicon wafer C/Si is 2.5 or less.
- 5. The heat-peelable pressure-sensitive adhesive sheet as claimed in claim 1, wherein the pressure-sensitive adhesive in the non-heat-expandable pressure-sensitive adhesive sheet comprises a polymer containing a low molecular weight component having a molecular weight of 100,000 or less in an amount of 15% by weight based on the weight of the polymer.
- 6. The heat-peelable pressure-sensitive adhesive sheet as claimed in claim 2, wherein the pressure-sensitive adhesive in the non-heat-expandable pressure-sensitive adhesive sheet comprises a polymer containing a low molecular weight component having a molecular weight of 100,000 or less in an amount of 15% by weight based on the weight of the polymer.
- 7. The heat-peelable pressure-sensitive adhesive sheet as claimed in claim 3, wherein the pressure-sensitive adhesive in the non-heat -expandable, radiation-curing pressure-sensitive adhesive sheet after radiation irradiation comprises a polymer containing a low molecular weight component having a molecular weight of 100,000 or less in an amount of 15% by weight based on the weight of the polymer.
- 8. The heat-peelable pressure-sensitive adhesive sheet as claimed in claim 4, wherein the pressure-sensitive adhesive in the non-heat-expandable, radiation-curing pressure-sensitive adhesive sheet after radiation irradiation comprises a polymer containing a low molecular weight component having a molecular weight of 100,000 or less in an amount of 15% by weight based on the weight of the polymer.
- 9. The heat-peelable pressure-sensitive adhesive sheet as claimed in claim 1, which has a pressure-sensitive adhesive formed on the surface of the substrate opposite the surface thereof on which the heat-expandable layer is formed.
- 10. The heat-peelable pressure-sensitive adhesive sheet as claimed in claim 2, which has a pressure-sensitive adhesive formed on the surface of the substrate opposite the surface thereof on which the heat-expandable layer is formed.
- 11. A step of producing electronic parts, wherein the heat-peelable pressure-sensitive adhesive sheet as claimed in claim 1 is adhered to electronic parts to protect the electronic parts when processing the same, or to conduct dicing processing or fine processing.
- 12. A step of producing electronic parts, wherein the heat-peelable pressure-sensitive adhesive sheet as claimed in claim 2 is adhered to electronic parts to protect the electronic parts when processing the same, or to conduct dicing processing or fine processing.
- 13. Electronic parts obtained by the step as claimed in claim 1.
- 14. Electronic parts obtained by the step as claimed in claim 2.
Priority Claims (1)
Number |
Date |
Country |
Kind |
P. HEI. 11-52996 |
Mar 1999 |
JP |
|
CROSS-REFERENCE TO THE RELATED APPLICATION
[0001] This application is a continuation-in-part application of U.S. application Ser. No. 09/516,148, filed Mar. 1, 2000, entitled “HEAT-PEELABLE PRESSURE-SENSITIVE ADHESIVE SHEET”, now pending.
Continuation in Parts (1)
|
Number |
Date |
Country |
Parent |
09516148 |
Mar 2000 |
US |
Child |
10123113 |
Apr 2002 |
US |