Claims
- 1. For use in a cryogenic test station receiving wafers having a pluality of integrated circuit devices to be tested and testing the same at any setpoint temperature over a range of setpoint temperatures and having a wafer-receiving chuck having a temperature that is cooled by a flow of a heat transfer liquid at a rate of flow and that is heated by electrical resistance heaters generating heat at a corresponding electrical power, apparatus operative to minimize both heat transfer liquid and electrical power usage in establishing and maintaining testing at any setpoint temperature, comprising:
- heater controller means for varying the amount of power dissipated by the electrical resistance heaters to cause chuck tempeature to stabilize at and around any selected setpoint temperature; and
- heat transfer liquid flow controller means coupled to said heater controller means and operative in correspondence to the level of power dissipated by the electrical resistance heaters for increasing the rate of flow whenever, the power falls outside a preselected upper bound and for decreasing the rate of flow whenever the power falls outside a preselected lower bound.
- 2. The invention of claim 1, wherein the heater controller means includes a temperature sensor.
- 3. The invention of claim 1, wherein the heater controller means includes a low-noise D.C. amplifier.
- 4. The invention of claim 1, wherein the liquid nitrogen flow controller means includes a variable orifice valve positioned in an input fluid flow path the variable orifices of which correspond to different flow rates of heat transfer liquid being supplied to the chuck.
- 5. The invention of claim 1, wherein the preselected lower bound is selected to correspond to that load which smooths out chuck temperature fluctuations associated with uncontrolled heat transfer liquid boiling.
- 6. The invention of claim 1, wherein the upper bound is selected such that the deadband defined between it and the lower bound is just sufficient to give temperature stability at any selected temperature setpoint and corresponding rate of heat transfer liquid flow.
- 7. The invention of claim 1, wherein said heat transfer liquid is liquid nitrogen.
- 8. A cryogenic test station receiving wafers having a plurality of integrated circuit devices to be tested and testing the same at any set point temperature over a range of setpoint temperatures, comprising:
- a wafer-receiving chuck having a temperature that is lowered by a flow of a heat transfer liquid at a rate of flow and that is raised by electrical resistance heaters generating heat at a corresponding electrical power;
- heater controller means for varying the amount of power dissipated by the electrical resistance heaters to cause chuck temperature to stabilize at and around any selected setpoint temperature; and
- heat transfer liquid flow controller means coupled to the heater controller means operative in correspondence to the level of power dissipated by the electrical resistance heaters for increasing the rate of flow whenever the power fall outside a preselected upper bound and for decreasing the rate of flow whenever the power falls outside a preselected lower bound.
- 9. The invention of claim 8, wherein the heater controller means includes a temperature sensor.
- 10. The invention of claim 8, wherein the heater controller means includes a low-noise D.C. amplifier.
- 11. The invention of claim 8, wherein the heat transfer liquid flow controller means includes a variable orifice valve positioned in an input fluid flow path the variable orifices of which correspond to different flow rates of heat transfer liquid being supplied to the chuck.
- 12. The invention of claim 8, wherein the preselected lower bound is selected to correspond to that load which smooths out chuck temperature fluctuations associated with uncontrolled heat transfer liquid boiling.
- 13. The invention of claim 8, wherein said heat transfer liquid is liquid nitrogen.
FIELD OF THE INVENTION
This application is a division of application Ser. No. 07/431,572 filed Nov. 3, 1989, now U.S. Pat. No. 5,097,207.
US Referenced Citations (47)
Non-Patent Literature Citations (3)
Entry |
Bergles, A. E.; "Two-Piece Cold Plate With Corrugated Heat Transfer Surface", IBM Tech Dis. Bull.; vol. 22, No. 8A, Jan. 1980, pp. 3318-3319. |
Christensen, R. G.; "Water-Cooled Heat Transfer Plate"; IBM Tech. Dis. Bull.; vol. 23, No. 4; Sep. 1980, pp. 1445-1446. |
"Fluid Cooled Spiral Vortex Cold Plate"; Research Disclosure; Apr. 1985, No. 252; one page. |
Divisions (1)
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Number |
Date |
Country |
Parent |
431572 |
Nov 1989 |
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