Claims
- 1. A ≧4 kHz repetition rate argon fluoride excimer laser system for producing an UV wavelength 193 nm output, said laser system comprising:
an argon fluoride excimer laser chamber, said excimer laser chamber for producing a 193 nm discharge at a pulse repetition rate ≧4 kHz, said excimer laser chamber including at least one magnesium fluoride crystal optic window for outputting said 193 nm discharge as a ≧4 kHz repetition rate excimer laser 193 nm output, said magnesium fluoride crystal optic window having a 255 nm induced absorption less than 0.08 Abs/42 mm when exposed to 5 million pulses of 193 nm light at a fluence ≧40 mj/cm2/pulse and a 42 mm crystal 120 nm transmission of at least 30%.
- 2. A laser system as claimed in claim 1 wherein said 42 mm crystal 120 nm transmission is at least 35%.
- 3. A laser system as claimed in claim 1 wherein said 42 mm crystal 120 nm transmission is at least 40% .
- 4. A laser system as claimed in claim 1 wherein said magnesium fluoride crystal optic window has a Fe contamination level less than 0.15 ppm Fe by weight.
- 5. A laser system as claimed in claim 1 wherein said magnesium fluoride crystal optic window has a chrome contamination level less than 0.06 ppm chrome by weight.
- 6. A laser system as claimed in claim 1 wherein said magnesium fluoride crystal optic window has a copper contamination level less than 0.02 ppm copper by weight.
- 7. A laser system as claimed in claim 1 wherein said magnesium fluoride crystal optic window has a cobalt contamination level less than 0.02 ppm cobalt by weight.
- 8. A laser system as claimed in claim 1 wherein said magnesium fluoride crystal optic window has an Al contamination level less than 0.7 ppm Al by weight.
- 9. A laser system as claimed in claim 1 wherein said magnesium fluoride crystal optic window has a nickel contamination level less than 0.02 ppm nickel by weight.
- 10. A laser system as claimed in claim 1 wherein said magnesium fluoride crystal optic window has a vanadium contamination level less than 0.02 ppm vanadium by weight.
- 11. A laser system as claimed in claim 1 wherein said magnesium fluoride crystal optic window has a lead contamination level less than 0.02 ppm lead by weight.
- 12. A laser system as claimed in claim 1 wherein said laser system includes a magnesium fluoride crystal optic prism, said magnesium fluoride crystal optic prism external from said excimer laser chamber wherein said ≧4 kHz repetition rate excimer laser 193 nm output is transmitted through said magnesium fluoride crystal optic prism with said magnesium fluoride crystal optic prism having a 255 nm induced absorption less than 0.08 Abs/42 mm when exposed to 5 million pulses of 193 nm light at a fluence ≧40 mj/cm2/pulse and a 42 mm crystal 120 nm transmission of at least 30%.
- 13. A laser system as claimed in claim 1 wherein said magnesium fluoride crystal optic window has an 200 to 210 nm range absorption coefficient <0.0017 cm−1.
- 14. A laser system as claimed in claim 12 wherein said magnesium fluoride crystal optic prism has an 200 to 210 nm range absorption coefficient <0.0017 cm−1
- 15. A ≧4 kHz repetition rate fluoride excimer laser system for producing an UV wavelength λ<200 nm output, said laser system comprising: an excimer laser chamber, said excimer laser chamber for producing an UV wavelength λ<200 nm discharge at a pulse repetition rate ≧4 kHz, said excimer laser chamber including at least one magnesium fluoride crystal optic window for outputting said λ<200 nm discharge as a ≧4 kHz repetition rate excimer laser λ<200 nm output, said magnesium fluoride crystal optic window having a 255 nm induced absorption less than 00.08 Abs/42 mm when exposed to 5 million pulses of 193 nm light at a fluence ≧40 mj/cm2/pulse and a 42 mm crystal 120 nm transmission of at least 30% and a 200 to 210 nm range absorption coefficient <0.0017 cm−1.
- 16. A laser system as claimed in claim 15 wherein λ is centered about 193 nm.
- 17. A laser system as claimed in claim 15 wherein said 42 mm crystal 120 nm transmission is at least 35%.
- 18. A laser system as claimed in claim 15 wherein said 42 mm crystal 120 nm transmission is at least 40%.
- 19. A laser system as claimed in claim 15 wherein said magnesium fluoride crystal optic window has a Fe contamination level less than 0.15 ppm Fe by weight.
- 20. A laser system as claimed in claim 15 wherein said magnesium fluoride crystal optic window has a chrome contamination level less than 0.06 ppm chrome by weight.
- 21. A laser system as claimed in claim 15 wherein said magnesium fluoride crystal optic window has a copper contamination level less than 0.02 ppm copper by weight.
- 22. A laser system as claimed in claim 15 wherein said magnesium fluoride crystal optic window has a cobalt contamination level less than 0.02 ppm cobalt by weight.
- 23. A laser system as claimed in claim 15 wherein said magnesium fluoride crystal optic window has an Al contamination level less than 0.7 ppm Al by weight.
- 24. A laser system as claimed in claim 15 wherein said magnesium fluoride crystal optic window has a nickel contamination level less than 0.02 ppm nickel by weight.
- 25. A laser system as claimed in claim 15 wherein said magnesium fluoride crystal optic window has a vanadium contamination level less than 0.02 ppm vanadium by weight.
- 26. A laser system as claimed in claim 15 wherein said magnesium fluoride crystal optic window has a lead contamination level less than 0.02 ppm lead by weight.
- 27. A laser system as claimed in claim 15 wherein said laser system includes a magnesium fluoride crystal optic prism, said magnesium fluoride crystal optic prism external from said excimer laser chamber wherein said ≧4 kHz repetition rate excimer laser λ<200 nm output is transmitted through said magnesium fluoride crystal optic prism with said magnesium fluoride crystal optic prism having a 255 nm induced absorption less than 0.08 Abs/42 mm when exposed to 5 million pulses of 193 nm light at a fluence ≧40 mj/cm2/pulse and a 42 mm crystal 120 nm transmission of at least 30% .
- 28. A laser system as claimed in claim 15 wherein said magnesium fluoride crystal optic window has a 203 to 207 nm range absorption coefficient <0.0017 cm−1
- 29. A laser system as claimed in claim 27 wherein said magnesium fluoride crystal optic prism has an 200 to 210 nm range absorption coefficient <0.0017 cm−1
- 30. A ≧4 kHz repetition rate fluoride excimer laser crystal optic for transmitting a ≧4 kHz repetition rate fluoride excimer UV wavelength λ<200 nm output, said laser crystal optic comprising a magnesium fluoride crystal with a 255 nm induced absorption less than 0.08 Abs/42 mm when exposed to 5 million pulses of 193 nm light at a fluence ≧40 mj/cm2/pulse and a 42 mm crystal 120 nm transmission of at least 30%.
- 31. A ≧4 kHz repetition rate fluoride excimer laser crystal optic as claimed in 30 wherein λ is centered about 193 nm.
- 32. A ≧4 kHz repetition rate fluoride excimer laser crystal optic as claimed in 30 wherein said 42 mm crystal 120 nm transmission is at least 35%.
- 33. A ≧4 kHz repetition rate fluoride excimer laser crystal optic as claimed in 30 wherein said magnesium fluoride crystal has a Fe contamination level less than 0.15 ppm Fe by weight.
- 34. A ≧4 kHz repetition rate fluoride excimer laser crystal optic as claimed in 30 wherein said magnesium fluoride crystal has a chrome contamination level less than 0.06 ppm chrome by weight.
- 35. A ≧4 kHz repetition rate fluoride excimer laser crystal optic as claimed in 30 wherein said magnesium fluoride crystal has a copper contamination level less than 0.02 ppm copper by weight.
- 36. A ≧4 kHz repetition rate fluoride excimer laser crystal optic as claimed in 30 wherein said magnesium fluoride crystal has a cobalt contamination level less than 0.02 ppm cobalt by weight.
- 37. A ≧4 kHz repetition rate fluoride excimer laser crystal optic as claimed in 30 wherein said magnesium fluoride crystal has an Al contamination level less than 0.7 ppm Al by weight.
- 38. A ≧4 kHz repetition rate fluoride excimer laser crystal optic as claimed in 30 wherein said magnesium fluoride crystal has a nickel contamination level less than 0.02 ppm nickel by weight.
- 39. A ≧4 kHz repetition rate fluoride excimer laser crystal optic as claimed in 30 wherein said magnesium fluoride crystal has a vanadium contamination level less than 0.02 ppm vanadium by weight.
- 40. A ≧4 kHz repetition rate fluoride excimer laser crystal optic as claimed in 30 wherein said magnesium fluoride crystal has a lead contamination level less than 0.02 ppm lead by weight.
- 41. A ≧4 kHz repetition rate fluoride excimer laser crystal optic as claimed in 30 wherein said magnesium fluoride crystal optic has a flat planar face oriented normal to a c axis of said magnesium fluoride crystal.
- 42. A ≧4 kHz repetition rate fluoride excimer laser crystal optic as claimed in 30 wherein said magnesium fluoride crystal optic has a flat planar face oriented normormal to a c axis of said magnesium fluoride crystal.
- 43. A ≧4 kHz repetition rate fluoride excimer laser crystal optic as claimed in 30 wherein said magnesium fluoride crystal has a c axis grown magnesium fluoride crystallographic orientation.
- 44. A ≧4 kHz repetition rate fluoride excimer laser crystal optic as claimed in 30 wherein said magnesium fluoride crystal has an 200 to 210 nm range absorption coefficient <0.0017 cm−1.
- 45. A >4 kHz repetition rate fluoride excimer laser crystal optic window for transmitting a ≧4 kHz repetition rate fluoride excimer UV wavelength λ<200 nm output, said laser crystal optic window comprising a magnesium fluoride crystal with a 255 nm induced absorption less than 0.08 Abs/42 mm when exposed to 5 million pulses of 193 nm light at a fluence ≧40 mj/cm2/pulse and a 42 mm crystal 120 nm transmission of at least 30% and a 200 to 210 nm range absorption coefficient <0.0017 cm−1.
- 46. A ≧4 kHz repetition rate argon fluoride excimer laser crystal optic for transmitting an UV wavelength 193 nm argon fluoride excimer laser ≧4 kHz repetition rate output, said laser crystal optic comprising a magnesium fluoride crystal with a 255 nm induced absorption less than 0.08 Abs/42 mm when exposed to 5 million pulses of 193 nm light at a fluence >40 mj/cm2/pulse and a 42 mm crystal 120 nm transmission of at least 30% .
- 47. A λ<200 nm optical fluoride crystal for transmitting a UV wavelength <200 nm, said λ<200 nm optical fluoride crystal comprising a magnesium fluoride crystal with a 255 nm induced absorption less than 0.08 Abs/42 mm when exposed to 5 million pulses of 193 nm light at a fluence ≧40 mj/cm2/pulse and a 42 mm crystal 120 nm transmission of at least 30% and a Fe contamination level less than 0.17 ppm Fe by weight, a chrome contamination level less than 00.08 ppm chrome by weight, a copper contamination level less than 0.04 ppm copper by weight, a cobalt contamination level less than 0.04 ppm cobalt by weight, an Al contamination level less than 0.9 ppm Al by weight, a nickel contamination level less than 0.04 ppm nickel by weight, a vanadium contamination level less than 0.04 ppm vanadium by weight, and a lead contamination level less than 0.04 ppm lead by weight and a 200 to 210 nm range absorption coefficient <0.0017 cm−1.
- 48. A λ<200 nm optical fluoride crystal as claimed in claim 47, said magnesium fluoride crystal having a Fe contamination level less than 0.15 ppm Fe by weight, a chrome contamination level less than 0.06 ppm chrome by weight, a copper contamination level less than 0.02 ppm copper by weight, a cobalt contamination level less than 0.02 ppm cobalt by weight, an Al contamination level less than 0.7 ppm Al by weight, a nickel contamination level less than 0.02 ppm nickel by weight, a vanadium contamination level less than 0.02 ppm vanadium by weight, and a lead contamination level less than 0.02 ppm lead by weight.
- 49. A ≧4 kHz repetition rate argon fluoride excimer laser crystal for transmitting an UV wavelength 193 nm argon fluoride excimer laser ≧4 kHz repetition rate output, said laser crystal comprising a magnesium fluoride crystal with a 255 nm induced absorption less than 0.08 Abs/42 mm when exposed to 5 million pulses of 193 nm light at a fluence ≧40 mj/cm2/pulse and a 42 mm crystal 120 nm transmission of at least 30% and a Fe contamination level less than 0.17 ppm Fe by weight, a chrome contamination level less than 00.08 ppm chrome by weight, a copper contamination level less than 0.04 ppm copper by weight, a cobalt contamination level less than 0.04 ppm cobalt by weight, an Al contamination level less than 0.9 ppm Al by weight, a nickel contamination level less than 0.04 ppm nickel by weight, a vanadium contamination level less than 0.04 ppm vanadium by weight, and a lead contamination level less than 0.04 ppm lead by weight.
- 50. A ≧4 kHz repetition rate argon fluoride excimer laser crystal as claimed in claim 47, said magnesium fluoride crystal having a Fe contamination level less than 0.15 ppm Fe by weight, a chrome contamination level less than 0.06 ppm chrome by weight, a copper contamination level less than 0.02 ppm copper by weight, a cobalt contamination level less than 0.02 ppm cobalt by weight, an Al contamination level less than 0.7 ppm Al by weight, a nickel contamination level less than 0.02 ppm nickel by weight, a vanadium contamination level less than 0.02 ppm vanadium by weight, and a lead contamination level less than 0.02 ppm lead by weight.
RELATED APPLICATIONS
[0001] This application claims the benefit of, and incorporates by reference, U.S. Provisional Application, Attorney Docket No. SP02-030P (Ser No. to be determined), filed Feb. 13, 2002 entitled HIGH REPETITION RATE EXCIMER LASER SYSTEM, by M. Pell, C. M. Smith, R. W. Sparrow and P. M. Then.
[0002] It also claims the benefit of, and incorporates by reference, U.S. Provisional Application Serial No. 60/272,814, filed Mar. 2, 2001 entitled HIGH REPETITION RATE UV EXCIMER LASER MAGNESIUM FLUORIDE OPTICS, by R. W. Sparrow.
[0003] It also claims the benefit of, and incorporates by reference, co-filed U. S. Non-Provisional Application, Attorney Docket No. SP01-033B, entitled METHOD OF MAKING HIGH REPETITION RATE EXCIMER LASER CRYSTAL OPTICS AND UV<200NM TRANSMITTING OPTICAL FLUORIDE CRYSTAL, by S. L. Gray, M. Pell, C. M. Smith, R. W. Sparrow and P. M. Then.
Provisional Applications (2)
|
Number |
Date |
Country |
|
60272814 |
Mar 2001 |
US |
|
60356987 |
Feb 2002 |
US |