Number | Date | Country | Kind |
---|---|---|---|
196 16 922.4 | Apr 1996 | DEX |
Number | Name | Date | Kind |
---|---|---|---|
5212593 | Williamson et al. | May 1993 | |
5251070 | Hashimoto et al. | Oct 1993 | |
5402226 | Matthews et al. | Mar 1995 | |
5402267 | Furter et al. | Mar 1995 |
Number | Date | Country |
---|---|---|
0350955 | Jan 1990 | EPX |
0465882 | Jan 1992 | EPX |
0608572 | Aug 1994 | EPX |
4110296 | Oct 1991 | DEX |
4203464 | Aug 1992 | DEX |
Entry |
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"New Approach to Resolution Limit and Advanced Image Formation Techniques in Optical Lithography", H. Fukuda, A. Imai, T. Terasawa and S. Okazaki, IEEE Transaction on Electron Devices, vol. 38, No. 1, Jan. 1991, pp. 67-75. |