Focus drilling

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CPC
G03F7/70333

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GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/70333Focus drilling

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Method and apparatus for dynamic lithographic exposure
- Patent number 11,880,140
- Issue date Jan 23, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Jun-Yih Yu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Laser processing method and laser processing system
- Patent number 11,604,416
- Issue date Mar 14, 2023
- Gigaphoton Inc.
- Koji Kakizaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for dynamic lithographic exposure
- Patent number 11,520,237
- Issue date Dec 6, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd
- Jun-Yih Yu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System for direct writing on an uneven surface of a workpiece that...
- Patent number 11,284,517
- Issue date Mar 22, 2022
- Micronic Mydata AB
- Per Askebjer
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Laser processing method and laser processing system
- Patent number 11,194,255
- Issue date Dec 7, 2021
- Gigaphoton Inc.
- Koji Kakizaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for dynamic lithographic exposure
- Patent number 11,003,089
- Issue date May 11, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd
- Jun-Yih Yu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection exposure method and projection exposure apparatus for mi...
- Patent number 10,678,144
- Issue date Jun 9, 2020
- Carl Zeiss SMT GmbH
- Michael Patra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for dynamic lithographic exposure
- Patent number 10,663,868
- Issue date May 26, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Jun-Yih Yu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection exposure method and projection exposure apparatus for mi...
- Patent number 10,514,611
- Issue date Dec 24, 2019
- Carl Zeiss SMT GmbH
- Michael Patra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for dynamic lithographic exposure
- Patent number 10,274,830
- Issue date Apr 30, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Jun-Yih Yu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure apparatus, and device manufacturing method
- Patent number 10,191,388
- Issue date Jan 29, 2019
- Nikon Corporation
- Akimitsu Ebihara
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Maskless writing of a workpiece using a plurality of exposures havi...
- Patent number 10,149,390
- Issue date Dec 4, 2018
- Mycronic AB
- Per Askebjer
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Exposure apparatus and device manufacturing method
- Patent number 10,007,188
- Issue date Jun 26, 2018
- Nikon Corporation
- Akimitsu Ebihara
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Exposure apparatus and device manufacturing method
- Patent number 9,810,995
- Issue date Nov 7, 2017
- Nikon Corporation
- Akimitsu Ebihara
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 9,285,685
- Issue date Mar 15, 2016
- ASML NETHERLANDS B.V.
- Bob Streefkerk
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor device manufacturing method
- Patent number 9,281,191
- Issue date Mar 8, 2016
- Renesas Electronics Corporation
- Toshihiko Tanaka
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for monitoring focus on an integrated wafer
- Patent number 9,046,788
- Issue date Jun 2, 2015
- International Business Machines Corporation
- Allen H. Gabor
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Calculating a laser metric within a lithographic apparatus and meth...
- Patent number 8,717,540
- Issue date May 6, 2014
- ASML Netherlands B.V.
- Carsten Andreas Köhler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 8,711,330
- Issue date Apr 29, 2014
- ASML Netherlands B.V.
- Bob Streefkerk
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 7,961,293
- Issue date Jun 14, 2011
- ASML Netherlands B.V.
- Bob Streefkerk
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photo-focus modulation method for forming transistor gates and rela...
- Patent number 7,855,146
- Issue date Dec 21, 2010
- National Semiconductor Corporation
- Li-Heng Chou
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and system for providing a microelectronic device using a pl...
- Patent number 7,829,264
- Issue date Nov 9, 2010
- Western Digital (Fremont), LLC
- Yizhong Wang
- G11 - INFORMATION STORAGE
Information Patent Grant
Projection exposure method and projection exposure apparatus for mi...
- Patent number 7,800,732
- Issue date Sep 21, 2010
- Carl Zeiss SMT AG
- Joerg Zimmermann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for exposing a substrate and lithographic projection apparatus
- Patent number 7,732,110
- Issue date Jun 8, 2010
- ASML Netherlands B.V.
- Jozef Maria Finders
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System and method for photolithography in semiconductor manufacturing
- Patent number 7,723,014
- Issue date May 25, 2010
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Kuei Shun Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for exposing a substrate and lithographic projection apparatus
- Patent number 7,670,731
- Issue date Mar 2, 2010
- ASML Netherlands B.V.
- Jozef Maria Finders
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Multi-focus scanning with a tilted mask or wafer
- Patent number 7,667,821
- Issue date Feb 23, 2010
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Burn-J. Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection exposure apparatus with luminous flux distribution
- Patent number 7,656,504
- Issue date Feb 2, 2010
- Nikon Corporation
- Naomasa Shiraishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for exposing a substrate and lithographic projection apparatus
- Patent number 7,655,368
- Issue date Feb 2, 2010
- ASML Netherlands B.V.
- Jozef Maria Finders
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure apparatus and image plane detecting method
- Patent number 7,656,503
- Issue date Feb 2, 2010
- Canon Kabushiki Kaisha
- Seiya Miura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
METHOD AND APPARATUS FOR DYNAMIC LITHOGRAPHIC EXPOSURE
- Publication number 20230075146
- Publication date Mar 9, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jun-Yih Yu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND SYSTEM FOR ENHANCING TARGET FEATURES OF A PATTERN IMAGED...
- Publication number 20230010700
- Publication date Jan 12, 2023
- CYMER, LLC
- Willard Earl CONLEY
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LASER PROCESSING METHOD AND LASER PROCESSING SYSTEM
- Publication number 20220050382
- Publication date Feb 17, 2022
- Gigaphoton Inc.
- Koji KAKIZAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD TO CREATE THE IDEAL SOURCE SPECTRA WITH SOURCE AND MASK OPTI...
- Publication number 20210349404
- Publication date Nov 11, 2021
- ASML NETHERLANDS B.V.
- Willard Earl CONLEY
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR DYNAMIC LITHOGRAPHIC EXPOSURE
- Publication number 20210255549
- Publication date Aug 19, 2021
- Taiwan Semiconductor Manufacturing Co., LTD
- Jun-Yih Yu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR DYNAMIC LITHOGRAPHIC EXPOSURE
- Publication number 20200241427
- Publication date Jul 30, 2020
- Taiwan Semiconductor Manufacturing Co., LTD
- Jun-Yih Yu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROJECTION EXPOSURE METHOD AND PROJECTION EXPOSURE APPARATUS FOR MI...
- Publication number 20200096877
- Publication date Mar 26, 2020
- Carl Zeiss SMT GMBH
- Michael Patra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROJECTION EXPOSURE METHOD AND PROJECTION EXPOSURE APPARATUS FOR MI...
- Publication number 20190204756
- Publication date Jul 4, 2019
- Carl Zeiss SMT GMBH
- Michael Patra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEM FOR DIRECT WRITING ON AN UNEVEN SURFACE OF A WORKPIECE THAT...
- Publication number 20190116673
- Publication date Apr 18, 2019
- Mycronic AB
- Per Askebjer
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
METHOD AND APPARATUS FOR DYNAMIC LITHOGRAPHIC EXPOSURE
- Publication number 20190094706
- Publication date Mar 28, 2019
- Taiwan Semiconductor Manufacturing Co., LTD
- Jun-Yih Yu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD
- Publication number 20180299788
- Publication date Oct 18, 2018
- Nikon Corporation
- Akimitsu Ebihara
- B82 - NANO-TECHNOLOGY
Information Patent Application
EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD
- Publication number 20180039185
- Publication date Feb 8, 2018
- Nikon Corporation
- Akimitsu Ebihara
- B82 - NANO-TECHNOLOGY
Information Patent Application
EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD
- Publication number 20170123326
- Publication date May 4, 2017
- Nikon Corporation
- Akimitsu Ebihara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
- Publication number 20140293248
- Publication date Oct 2, 2014
- ASML NETHERLANDS B.V.
- Bob STREEFKERK
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEMICONDUCTOR DEVICE MANUFACTURING METHOD
- Publication number 20140206111
- Publication date Jul 24, 2014
- RENESAS ELECTRONICS CORPORATION
- Toshihiko TANAKA
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
MASKLESS WRITING OF A WORKPIECE USING A PLURALITY OF EXPOSURES HAVI...
- Publication number 20140053399
- Publication date Feb 27, 2014
- Micronic Mydata AB
- Per Askebjer
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Lithographic Apparatus and Method
- Publication number 20120044471
- Publication date Feb 23, 2012
- ASML NETHERLANDS B.V.
- Bob Streefkerk
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
- Publication number 20110211181
- Publication date Sep 1, 2011
- ASML NETHERLANDS B.V.
- Bob STREEFKERK
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic Apparatus and Method
- Publication number 20110200922
- Publication date Aug 18, 2011
- ASML NETHERLANDS B.V.
- Carsten Andreas Köhler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROJECTION EXPOSURE METHOD AND PROJECTION EXPOSURE APPARATUS FOR MI...
- Publication number 20100157266
- Publication date Jun 24, 2010
- Carl Zeiss SMT AG
- Joerg Zimmermann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR MONITORING FOCUS ON AN INTEGRATED WAFER
- Publication number 20090284722
- Publication date Nov 19, 2009
- International Business Machines Corporation
- Allen H. Gabor
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR EXPOSING A SUBSTRATE AND LITHOGRAPHIC PROJECTION APPARATUS
- Publication number 20090190115
- Publication date Jul 30, 2009
- ASML NETHERLANDS B.V.
- Jozef Maria FINDERS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD
- Publication number 20090170042
- Publication date Jul 2, 2009
- Canon Kabushiki Kaisha
- Tsuneo Kanda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus and device manufacturing method
- Publication number 20080170215
- Publication date Jul 17, 2008
- ASML NETHERLANDS B.V.
- Bob Streefkerk
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Spatial energy distribution by slit filter for step-and-scan system...
- Publication number 20080165339
- Publication date Jul 10, 2008
- MACRONIX INTERNATIONAL CO., LTD
- Jung Sunwook
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE APPARATUS AND DEVICE FABRICATION METHOD
- Publication number 20080143987
- Publication date Jun 19, 2008
- Canon Kabushiki Kaisha
- Takanori Uemura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus and device manufacturing method
- Publication number 20080085462
- Publication date Apr 10, 2008
- ASML NETHERLANDS B.V.
- Keith Frank Best
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE APPARATUS AND IMAGE PLANE DETECTING METHOD
- Publication number 20070296945
- Publication date Dec 27, 2007
- Canon Kabushiki Kaisha
- Seiya MIURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for exposing a substrate and lithographic projection apparatus
- Publication number 20070099100
- Publication date May 3, 2007
- ASML NETHERLANDS B.V.
- Jozef Maria Finders
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
System and method for photolithography in semiconductor manufacturing
- Publication number 20070092840
- Publication date Apr 26, 2007
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Kuei Shun Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Focus drilling

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Method and apparatus for dynamic lithographic exposure

Laser processing method and laser processing system

Method and apparatus for dynamic lithographic exposure

System for direct writing on an uneven surface of a workpiece that...

Laser processing method and laser processing system

Method and apparatus for dynamic lithographic exposure

Projection exposure method and projection exposure apparatus for mi...

Method and apparatus for dynamic lithographic exposure

Projection exposure method and projection exposure apparatus for mi...

Method and apparatus for dynamic lithographic exposure

Exposure apparatus, and device manufacturing method

Maskless writing of a workpiece using a plurality of exposures havi...

Exposure apparatus and device manufacturing method

Exposure apparatus and device manufacturing method

Lithographic apparatus and device manufacturing method

Semiconductor device manufacturing method

Method for monitoring focus on an integrated wafer

Calculating a laser metric within a lithographic apparatus and meth...

Lithographic apparatus and device manufacturing method

Lithographic apparatus and device manufacturing method

Photo-focus modulation method for forming transistor gates and rela...

Method and system for providing a microelectronic device using a pl...

Projection exposure method and projection exposure apparatus for mi...

Method for exposing a substrate and lithographic projection apparatus

System and method for photolithography in semiconductor manufacturing

Method for exposing a substrate and lithographic projection apparatus

Multi-focus scanning with a tilted mask or wafer

Projection exposure apparatus with luminous flux distribution

Method for exposing a substrate and lithographic projection apparatus

Exposure apparatus and image plane detecting method

Patents Applicationslast 30 patents

METHOD AND APPARATUS FOR DYNAMIC LITHOGRAPHIC EXPOSURE

METHOD AND SYSTEM FOR ENHANCING TARGET FEATURES OF A PATTERN IMAGED...

LASER PROCESSING METHOD AND LASER PROCESSING SYSTEM

METHOD TO CREATE THE IDEAL SOURCE SPECTRA WITH SOURCE AND MASK OPTI...

METHOD AND APPARATUS FOR DYNAMIC LITHOGRAPHIC EXPOSURE

METHOD AND APPARATUS FOR DYNAMIC LITHOGRAPHIC EXPOSURE

PROJECTION EXPOSURE METHOD AND PROJECTION EXPOSURE APPARATUS FOR MI...

PROJECTION EXPOSURE METHOD AND PROJECTION EXPOSURE APPARATUS FOR MI...

SYSTEM FOR DIRECT WRITING ON AN UNEVEN SURFACE OF A WORKPIECE THAT...

METHOD AND APPARATUS FOR DYNAMIC LITHOGRAPHIC EXPOSURE

EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD

EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD

EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

SEMICONDUCTOR DEVICE MANUFACTURING METHOD

MASKLESS WRITING OF A WORKPIECE USING A PLURALITY OF EXPOSURES HAVI...

Lithographic Apparatus and Method

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

Lithographic Apparatus and Method

PROJECTION EXPOSURE METHOD AND PROJECTION EXPOSURE APPARATUS FOR MI...

METHOD FOR MONITORING FOCUS ON AN INTEGRATED WAFER

METHOD FOR EXPOSING A SUBSTRATE AND LITHOGRAPHIC PROJECTION APPARATUS

EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD

Lithographic apparatus and device manufacturing method

Spatial energy distribution by slit filter for step-and-scan system...

EXPOSURE APPARATUS AND DEVICE FABRICATION METHOD

Lithographic apparatus and device manufacturing method

EXPOSURE APPARATUS AND IMAGE PLANE DETECTING METHOD

Method for exposing a substrate and lithographic projection apparatus

System and method for photolithography in semiconductor manufacturing