Claims
- 1. A spectrometer comprisinga light source of a selected wavelength, an echelle-grating for dispersing radiation incident thereon in a dispersion plane, means for directing a light beam from said light source in an incident path of rays onto said echelle-grating to be dispersed thereby, means for moving said echelle-grating into a first position and a second position, said first position being selected to return said light beam after one single dispersing passage over said echelle-grating as a single-dispersion light beam into said incident path of rays, reflecting means for receiving a dispersed light beam from said echelle-grating, when said echelle-grating is in its second position, and for directing said dispersed light beam onto said echelle-grating for a selected number of further dispersing passages to provide a multiple-dispersion light beam, said echelle-grating, in its second position, being arranged to return said multiple-dispersion light beam into a direction the projection of which on said dispersion plane lays in the reverse direction of said incident path of rays, and further comprising means for deviating at least one of said beams from said dispersion plane, whereby said returned light beams extend in different planes.
- 2. Spectrometer according to claim 1, wherein the means for deviating one of said beams is a mirror which is inclined about an axis which is parallel to the dispersion plane and perpendicular to the incident beam.
- 3. Spectrometer according to claim 1, wherein said echelle-grating has a Blaze angle (θB), said Blaze angle being at least 45°.
- 4. Spectrometer according to claim 1, wherein said reflecting means is a mirror.
- 5. Spectrometer according to claim 4, wherein said mirror for receiving a dispersed light beam also forms the means for deviating said beam from the dispersion plane.
- 6. Spectrometer according to claim 5, wherein said mirror is a plane mirror.
- 7. Spectrometer according to claim 1, wherein the normal of the echelle-grating and the dispersed beam form a first angle β, and wherein the normal of the echelle-grating and said incident path form a second angle α, said first angle β being smaller than said second angle α.
- 8. Spectrometer according to claim 1, wherein the normal of the echelle-grating and the dispersed beam form a first angle β, and wherein the normal of the echelle-grating and said incident path form a second angle α, said first angle β being larger than said second angle α.
- 9. Spectrometer according to claim 1, wherein a step motor and a lever are provided, said lever being connected to said echelle-grating, said step motor moving said lever and thereby effecting a rotation of said echelle-grating for controlling the angle between said radiation on said incident path and said echelle-grating.
- 10. Spectrometer according to claim 9, wherein a computer is provided and means for controlling the positions of said echelle-grating with said computer.
- 11. Spectrometer according to claim 1, comprising an entrance slit and imaging means for forming a primary image of said entrance slit and further comprising means by which said radiation is deflectable in such way that the primary image at said selected wavelength is shifted sideways relative to the entrance slit in said dispersion plane.
- 12. Spectrometer according to claim 11, wherein an optical arrangement is provided for the magnification of said primary image.
- 13. Spectrometer according to claim 12, wherein said optical arrangement is formed by two cylinder lenses or cylinder mirrors.
- 14. Spectrometer according to claim 1, wherein in the spectrometer only reflecting optical components are provided apart from said echelle-grating.
- 15. Method for measuring the radiation from a spectral range with different spectral resolutions with a spectrometer comprising an echelle-grating, an imaging optical system, reflecting means and a detector wherein a light beam is generated which is directed onto said echelle-grating by said imaging optical system and from said echelle-grating back to said imaging optical system, and wherein the light beam is directed to said reflecting means by a change of the position of the echelle-grating, from which reflecting element is directed back to said echelle-grating.
- 16. Method according to claim 15, wherein the change of position of the echelle-grating is effected by a rotation.
- 17. Method according to claim 15, comprising the steps:(a) generating of a incident light path, (b) positioning of said echelle-grating (c) generating of a dispersed light beam of a selected wavelength and reflecting said light beam into the incident light path (d) measuring of the signal at the detector, (e) positioning of the echelle-grating such that the dispersed light beam of the selected wavelength is reflected towards the reflecting means, and (f) measuring of the signal at the detector.
- 18. Method according to claim 17, wherein a reference light source is provided and after the second positioning the light of a reference light source is coupled into the spectrometer.
- 19. Use of a spectrometer according to claim 1 for the determining of the spectral characteristics of an excimer laser used for the photolitography.
- 20. Use of a spectrometer according to claim 19, wherein the spectral characteristics of the excimer laser are used for its adjustment and automatic control.
Priority Claims (1)
Number |
Date |
Country |
Kind |
199 61 908 |
Dec 1999 |
DE |
|
Parent Case Info
This application claims the benefit of German Application No. 199 61 908.5 filed Dec. 20, 1999 and PCT/EP00/12969 filed Dec. 19, 2000.
PCT Information
Filing Document |
Filing Date |
Country |
Kind |
PCT/EP00/12969 |
|
WO |
00 |
Publishing Document |
Publishing Date |
Country |
Kind |
WO01/46658 |
6/28/2001 |
WO |
A |
US Referenced Citations (3)
Number |
Name |
Date |
Kind |
2922331 |
Fastie et al. |
Jan 1960 |
A |
3472595 |
Hashizume |
Oct 1969 |
A |
4398823 |
Brown et al. |
Aug 1983 |
A |
Foreign Referenced Citations (1)
Number |
Date |
Country |
08-145795 |
Jun 1996 |
JP |