Claims
- 1. A laser-induced, thermal transfer process which comprises:
- (1) imagewise exposing to laser radiation a laserable assemblage comprising:
- (A) a donor element comprising in the order listed:
- (a) at least one flexible ejection layer comprising a first polymer;
- (b) at least one heating layer; and
- (c) at least one transfer layer having an outer surface and comprising (i) a second polymer having a decomposition temperature T less than 350.degree. C. and (ii) an imageable component; with the proviso that the donor element during the transfer process does not include a support; and
- (B) a receiver element in contact with the outer surface of the transfer layer (c) of the donor element,
- wherein the imagewise exposing to laser radiation is effected at a laser fluence of less than or equal to approximately 440 mJ/cm.sup.2, in which a substantial portion of the transfer layer is transferred to the receiver element; and
- (2) separating the donor element from the receiver element.
- 2. The process of claim 1, wherein the imagewise exposing to laser radiation is effected at a laser fluence of less than or equal to approximately 342 mJ/cm.sup.2.
- 3. The process of claim 2, wherein the imagewise exposing to laser radiation is effected at a laser fluence of less than or equal to approximately 280 mJ/cm.sup.2.
- 4. The process of claim 1, wherein the at least one flexible ejection layer of the donor element has a tensile modulus of less than or equal to 2.5 Gigapascals.
- 5. The process of claim 1, wherein the at least one flexible ejection layer of the donor element has characteristic glass transition temperatures T.sub.g1 and T.sub.g0, wherein .vertline.T.sub.g0 -T.sub.g1 .vertline. is at least 10.degree. C.
- 6. The process of claim 1, wherein the at least one flexible ejection layer of the donor element has characteristic glass transition temperatures T.sub.g1 and T.sub.g0, wherein .vertline.T.sub.g0 -T.sub.g1 .vertline. is at least 35.degree. C., and has a tensile modulus of less than or equal to 1.5 Gigapascals.
- 7. The process of claim 1, wherein the first polymer has a decomposition temperature less than 325.degree. C. and is selected from the group consisting of substituted polystyrenes, polyacrylate esters, polymethacrylate esters, cellulose acetate butyrate, nitrocellulose, poly(vinyl chloride), chlorinated poly(vinyl chloride), polycarbonates, copolymers thereof, and mixtures thereof.
- 8. The process of claim 1, wherein the heating layer comprises a thin metal layer selected from the group consisting of aluminum, chromium, nickel, zirconium, titanium, and titanium dioxide.
- 9. The process of claim 1, wherein the second polymer has a decomposition temperature less than 300.degree. C. and is selected from the group consisting of acrylic and methacrylic copolymers.
- 10. The process of claim 1, wherein the first polymer is selected from the group consisting of polyvinyl chloride, chlorinated poly(vinyl chloride), and nitrocellulose, the heating layer comprises a thin layer of metal selected from the group consisting of nickel and chromium, and the second polymer is selected from the group consisting of acrylic and methacrylic copolymers.
- 11. The process of claim 1, wherein:
- (a) the ejection layer has a thickness in the range of about 1 mil (25 micrometers) to about 8 mils (200 micrometers),
- (b) the heating layer has a thickness in the range of 20 .ANG. to 0.1 micrometer (um), and
- (c) the transfer layer has a thickness in the range of about 0.1 micrometer to about 5 micrometers (0.2 mil).
- 12. The process of claim 1, wherein the imageable component is a pigment.
- 13. The process of claim 1, wherein the decomposition temperature T.sub.2 of the second polymer is less than or equal to approximately 300.degree. C.
- 14. A durable, imaged laserable assemblage made in accordance with the process of claim 1.
- 15. The assemblage according to claim 14, wherein the binder of the photohardenable layer of the photosensitive receiver element is elastomeric.
- 16. The assemblage according to claim 14, wherein the binder of the photohardenable layer of the photosensitive receiver element contains acid or base functionality at a sufficient level, such that the photohardenable layer, following imagewise exposure to actinic radiation, is aqueous developable using aqueous developer solutions that are either basic or acidic.
- 17. A laser-induced, thermal transfer process which comprises:
- (1) imagewise exposing to laser radiation a laserable assemblage comprising:
- (A) a donor element comprising in the order listed:
- (a) a flexible bottom layer having a tensile modulus of less than or equal to 2.5 Gigapascals;
- (b) at least one ejection layer comprising a first polymer;
- (c) at least one heating layer; and
- (d) at least one transfer layer having an outer surface and comprising (i) a second polymer having a decomposition temperature T less than 350.degree. C. and (ii) an imageable component; with the proviso that the donor element during the transfer process does not include a support; and
- (B) a receiver element in contact with the outer surface of the transfer layer (d) of the donor element,
- wherein the imagewise exposing to laser radiation is effected at a laser fluence of less than or equal to approximately 440 mJ/cm.sup.2, in which a substantial portion of the transfer layer is transferred to the receiver element; and
- (2) separating the donor element from the receiver element.
- 18. The process of claim 14, wherein the imagewise exposing to laser radiation is effected at a laser fluence of less than or equal to approximately 342 mJ/cm.sup.2.
- 19. The process of claim 15, wherein the imagewise exposing to laser radiation is effected at a laser fluence of less than or equal to approximately 280 mJ/cm.sup.2.
- 20. A durable, imaged laserable assemblage made in accordance with the process of claim 14.
- 21. The assemblage according to claim 20, wherein the binder of the photohardenable layer of the photosensitive receiver element is elastomeric.
- 22. The assemblage according to claim 20, wherein the binder of the photohardenable layer of the photosensitive receiver element contains acid or base functionality at a sufficient level, such that the photohardenable layer, following imagewise exposure to actinic radiation, is aqueous developable using aqueous developer solutions that are either basic or acidic.
- 23. A laser-induced, thermal transfer process which comprises:
- (1) imagewise exposing to laser radiation a laserable assemblage comprising:
- (A) a donor element comprising in the order listed:
- (a) a support;
- (b) at least one flexible ejection layer comprising a first polymer;
- (c) at least one heating layer; and
- (d) at least one transfer layer having an outer surface and comprising (i) a second polymer having a decomposition temperature T less than 350.degree. C. and (ii) an imageable component; and
- (B) a receiver element in contact with the outer surface of the transfer layer (d) of the donor element,
- wherein the imagewise exposing to laser radiation is effected at a laser fluence of less than or equal to approximately 440 mJ/cm.sup.2, in which a substantial portion of the transfer layer is transferred to the receiver element; and
- (2) separating the donor element from the receiver element.
- 24. The process of claim 23, wherein the imagewise exposing to laser radiation is effected at a laser fluence of less than or equal to approximately 342 mJ/cm.sup.2.
- 25. The process of claim 24, wherein the imagewise exposing to laser radiation is effected at a laser fluence of less than or equal to approximately 280 mJ/cm.sup.2.
- 26. A durable, imaged laserable assemblage made in accordance with the process of claim 17.
- 27. The assemblage according to claim 26, wherein the binder of the photohardenable layer of the photosensitive receiver element is elastomeric.
- 28. The assemblage according to claim 26, wherein the binder of the photohardenable layer of the photosensitive receiver element contains acid or base functionality at a sufficient level, such that the photohardenable layer, following imagewise exposure to actinic radiation, is aqueous developable using aqueous developer solutions that are either basic or acidic.
- 29. A laser-induced, thermal transfer process which comprises:
- (1) imagewise exposing to laser radiation a laserable assemblage comprising:
- (A) a photosensitive receiver element comprising in order:
- (A1) a receiver support;
- (A2) a photohardenable layer comprising a binder, at least one photohardenable component, and an initiator;
- (A3) optionally a barrier layer; and
- (A4) optionally a cover sheet;
- (B) a donor element comprising in order:
- (B1) at least one flexible ejection layer comprising a first polymer;
- (B2) at least one heating layer;
- (B3) at least one transfer layer having an outer surface and comprising (i) a second polymer having a decomposition temperature T less than 350.degree. C. and (ii) an imageable component;
- wherein the outer surface of the transfer layer (B3) is adjacent to and in contact with a layer of the photosensitive receiver element selected from the group consisting of the photohardenable layer (A2), the optional barrier layer (A3), and the optional coversheet (A4);
- the imagewise exposure results in exposed areas of the transfer layer (B3) being transferred to the adjacent layer of the photosensitive receiver element; and
- wherein the imagewise exposing to laser radiation is effected at a laser fluence of less than or equal to approximately 440 mJ/cm.sup.2, in which a substantial portion of the transfer layer is transferred to the receiver element; and
- (2) separating the donor element from the receiver element, thereby forming a photomask on the photosensitive receiver element.
- 30. The process of claim 29, wherein the imagewise exposing to laser radiation is effected at a laser fluence of less than or equal to approximately 342 mJ/cm.sup.2.
- 31. The process of claim 30, wherein the imagewise exposing to laser radiation is effected at a laser fluence of less than or equal to approximately 280 mJ/cm.sup.2.
- 32. The process according to claim 29 further comprising:
- (3) overall exposing the receiver element formed in step (2) to actinic radiation through the photomask; and
- (4) treating the product of step (3) with at least one developer solution to at least remove the photomask and areas of the photohardenable layer (A2) which were not exposed to actinic radiation.
- 33. A durable, imaged laserable assemblage made in accordance with a process selected from the group consisting of the process of claim 29 and the process of claim 32.
- 34. The assemblage according to claim 33, wherein the binder of the photohardenable layer of the photosensitive receiver element is elastomeric.
- 35. The assemblage according to claim 33, wherein the binder of the photohardenable layer of the photosensitive receiver element contains acid or base functionality at a sufficient level, such that the photohardenable layer, following imagewise exposure to actinic radiation, is aqueous developable using aqueous developer solutions that are either basic or acidic.
- 36. A method for improving durability of a transferred image on a receiver laserable assemblage comprising (a) a donor element comprising at least one transfer layer having an outer surface and comprising a low decomposition temperature polymer having a decomposition temperature of less than about 350.degree. C., and (b) the receiver element in contact with the outer surface of the transfer layer,
- the method comprising the exposure step is performed at a laser fluence of at most approximately 440 mJ/cm.sup.2.
- 37. The method of claim 36, wherein the exposure step is performed at a laser fluence of at most approximately 342 mJ/cm.sup.2.
- 38. The method of claim 36, wherein the exposure step is performed at a laser fluence of at most approximately 280 mJ/cm.sup.2.
- 39. The method of claim 36, wherein the donor element further comprises a support, at least one ejection layer and at least one heating layer.
- 40. The method of claim 36, wherein the donor element further comprises at least one ejection layer and at least one heating layer, with the proviso that the donor element during the transfer process does not include a support, and wherein the exposure step is performed at a laser fluence of at most approximately 280 mJ/cm.sup.2.
- 41. The method of claim 39 or 40, wherein the at least one ejection layer is a flexible ejection layer.
- 42. A transfer process which comprises:
- an exposure step of imagewise exposing to laser radiation a laserable assemblage comprising:
- (A) a donor element comprising in the order listed:
- (a) at least one ejection layer;
- (b) at least one heating layer; and
- (c) at least one transfer layer having an outer surface and comprising a low decomposition temperature polymer having a decomposition temperature less than about 350.degree. C.; with the proviso that the donor element during the transfer process does not include a support; and
- (B) a receiver element in contact with the outer surface of the transfer layer
- (c) of the donor element,
- wherein the exposure step is effected at a laser fluence of less than or equal to approximately 280 mJ/cm.sup.2.
- 43. A transfer process which comprises:
- an exposure step of imagewise exposing to laser radiation a laserable assemblage comprising:
- (A) a donor element comprising in the order listed:
- (a) a support;
- (b) at least one ejection layer comprising a first polymer;
- (c) at least one heating layer; and
- (d) at least one transfer layer having an outer surface and comprising a second polymer having a decomposition temperature less than 350.degree. C.; and
- (B) a receiver element in contact with the outer surface of the transfer layer
- (c) of the donor element, wherein the exposure step is effected at a laser fluence of less than or equal to approximately 440 mJ/cm.sup.2.
- 44. The process of claim 42 or 43, wherein the transfer layer further includes an imageable component.
- 45. The process of claim 44, wherein the imageable component is a pigment.
- 46. The process of claim 43, wherein the imagewise exposing to laser radiation is effected at a laser fluence of less than or equal to approximately 342 mJ/cm.sup.2.
- 47. The process of claim 43, wherein the imagewise exposing to laser radiation is effected at a laser fluence of less than or equal to approximately 280 mJ/cm.sup.2.
- 48. The process of claim 42 or 43, wherein the at least one ejection layer is a flexible ejection layer.
- 49. The process of claim 48, wherein the at least one ejection layer of the donor element has characteristic glass transition temperatures T.sub.g1 and T.sub.g0, wherein .vertline.T.sub.g0 -T.sub.g1 .vertline. is at least about 35.degree. C., and has a tensile modulus of less than or equal to about 1.5 Gigapascals.
- 50. The process of claim 42 or 43, wherein the at least one ejection layer of the donor element has a tensile modulus of less than or equal to about 2.5 Gigapascals.
- 51. The process of claim 42 or 43, wherein the at least one flexible ejection layer of the donor element has characteristic glass transition temperatures T.sub.g1 and T.sub.g0, wherein .vertline.T.sub.g0 -T.sub.g1 .vertline. is at least about 10.degree. C.
- 52. The process of claim 42 or 43, wherein the ejection layer comprises a first polymer having a decomposition temperature less than 325.degree. C.
- 53. The process of claim 52, wherein:
- the first polymer is selected from polyvinyl chloride, chlorinated poly(vinyl chloride), nitrocellulose, and combinations thereof;
- the heating layer comprises a thin layer of metal selected from nickel and chromium; and
- the low decomposition temperature polymer is selected from acrylic copolymers, methacrylic copolymers, and combinations thereof.
- 54. The process of claim 52 wherein the first polymer is selected from substituted polystyrenes, polyacrylate esters, polymethacrylate esters, cellulose acetate butyrate, nitrocellulose, poly(vinyl chloride), chlorinated poly(vinyl chloride), polycarbonates, copolymers thereof, and combinations thereof.
- 55. The process of claim 42 or 43, wherein the heating layer comprises a thin metal layer selected from the group consisting of aluminum, chromium, nickel, zirconium, titanium, and titanium dioxide.
- 56. The process of claim 42 or 43, wherein the low decomposition temperature polymer has a decomposition temperature less than about 300.degree. C.
- 57. The process of claim 54 wherein the low decomposition temperature polymer is selected from acrylic copolymers, methacrylic copolymers and combinations thereof.
- 58. The process of claim 42 or 43, wherein:
- the ejection layer has a thickness in the range of about 25 micrometers to about 200 micrometers;
- the heating layer has a thickness in the range of 20 .ANG. to 0.1 micrometer; and
- the transfer layer has a thickness in the range of about 0.1 micrometer to about 5 micrometers.
Parent Case Info
This is a continuation-in-part application of Ser. No. 757,717, filed Nov. 26, 1996, now U.S. Pat. No. 5,766,819.
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Continuation in Parts (1)
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