Preparation processes not covered by groups G03F1/20 - G03F1/50

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G03F1/68

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GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles Mask blanks or pellicles therefor Containers specially adapted therefor Preparation thereof

Current Industry

G03F1/68Preparation processes not covered by groups G03F1/20 - G03F1/50

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Devices and methods for examining and/or processing an element for...
- Patent number 12,135,540
- Issue date Nov 5, 2024
- Carl Zeiss SMT GmbH
- Michael Budach
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pellicle having vent hole
- Patent number 12,013,632
- Issue date Jun 18, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chue San Yoo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical element and a method of visually authenticating an object
- Patent number 12,001,011
- Issue date Jun 4, 2024
- SICPA Holding S.A.
- Yuliy Schwartzburg
- B42 - BOOKBINDING ALBUMS FILES SPECIAL PRINTED MATTER
Information Patent Grant
Photomask and method of fabricating a photomask
- Patent number 11,982,936
- Issue date May 14, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Hsin-Chang Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of fabricating reticle
- Patent number 11,940,737
- Issue date Mar 26, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Hsueh-Yi Chung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Imprinted method and patterned layer
- Patent number 11,874,599
- Issue date Jan 16, 2024
- Koninklijke Philips N.V.
- Marcus Antonius Verschuuren
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Interconnection structure fabrication using grayscale lithography
- Patent number 11,664,303
- Issue date May 30, 2023
- Intel Corporation
- Johanna Swan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for manufacturing template
- Patent number 11,467,487
- Issue date Oct 11, 2022
- BOE Technology Group Co., Ltd.
- Kang Guo
- B24 - GRINDING POLISHING
Information Patent Grant
Photomask and method of fabricating a photomask
- Patent number 11,435,660
- Issue date Sep 6, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Hsin-Chang Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of manufacturing chemical fluid for manufacturing electronic...
- Patent number 11,429,018
- Issue date Aug 30, 2022
- FUJIFILM Corporation
- Tetsuya Shimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern formation method using a photo mask for manufacturing a sem...
- Patent number 11,294,286
- Issue date Apr 5, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Ru-Gun Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reticle and method of detecting intactness of reticle stage using t...
- Patent number 11,221,562
- Issue date Jan 11, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chia-Yu Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Protection of photomasks from 193nm radiation damage using thin coa...
- Patent number 11,143,953
- Issue date Oct 12, 2021
- International Business Machines Corporation
- Robert L. Sandstrom
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pellicle removal method
- Patent number 11,143,952
- Issue date Oct 12, 2021
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chue San Yoo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods for forming a photo-mask and a semiconductor device
- Patent number 11,133,187
- Issue date Sep 28, 2021
- Winbond Electronics Corp.
- Chun-Hung Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Laser-ablatable mask film
- Patent number 11,106,136
- Issue date Aug 31, 2021
- Flint Group Germany GmbH
- Markus Mühlfeit
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Interconnection structure fabrication using grayscale lithography
- Patent number 11,101,205
- Issue date Aug 24, 2021
- Intel Corporation
- Johanna Swan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of fabricating reticle
- Patent number 11,003,091
- Issue date May 11, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd
- Hsueh-Yi Chung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mask frame assembly including both frame and mask plate fixed on fr...
- Patent number 10,996,555
- Issue date May 4, 2021
- BOE Technology Group Co., Ltd.
- Fengli Ji
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Real-time correction of template deformation in nanoimprint lithogr...
- Patent number 10,996,560
- Issue date May 4, 2021
- Canon Kabushiki Kaisha
- Anshuman Cherala
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System and method for producing an optical mask for surface microte...
- Patent number 10,969,679
- Issue date Apr 6, 2021
- H.E.F.
- Maxime Bichotte
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System and method for producing an optical mask for surface treatme...
- Patent number 10,969,678
- Issue date Apr 6, 2021
- H.E.F.
- Maxime Bichotte
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask and manufacturing method thereof
- Patent number 10,908,494
- Issue date Feb 2, 2021
- Taiwan Semiconductor Manufacturing Company, Ltd
- Cheng-Ming Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for fabricating semiconductor device, pattern writing appara...
- Patent number 10,884,336
- Issue date Jan 5, 2021
- NuFlare Technology, Inc.
- Takayuki Abe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-tone amplitude photomask
- Patent number 10,859,911
- Issue date Dec 8, 2020
- Marsupial Holdings, Inc.
- William P. Parker
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods and systems for parameter-sensitive and orthogonal gauge de...
- Patent number 10,846,442
- Issue date Nov 24, 2020
- ASML Netherlands B.V.
- Jun Ye
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Photomask and fabrication method therefor
- Patent number 10,838,295
- Issue date Nov 17, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd
- You-Hua Chou
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for preparing mask, mask and evaporation system
- Patent number 10,739,672
- Issue date Aug 11, 2020
- BOE Technology Group Co., Ltd.
- Zhiming Lin
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Method for producing flexographic printing plates using UV-LED irra...
- Patent number 10,730,283
- Issue date Aug 4, 2020
- Flint Group Germany GmbH
- Jens Schadebrodt
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Method for manufacturing a mask
- Patent number 10,720,336
- Issue date Jul 21, 2020
- Imec VZW
- Emily Gallagher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
PHOTOMASK SET, DESIGN METHOD THEREOF, AND MANUFACTURING METHOD OF P...
- Publication number 20240411221
- Publication date Dec 12, 2024
- United Microelectronics Corp.
- Chun-Yi Chang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PELLICLE HAVING VENT HOLE
- Publication number 20240329517
- Publication date Oct 3, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chue San YOO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
HARDMASK COMPOSITION, HARDMASK LAYER AND METHOD OF FORMING PATTERNS
- Publication number 20240255842
- Publication date Aug 1, 2024
- Samsung SDI Co., Ltd.
- Sangmi KIM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SELECTIVE HARDMASK ON HARDMASK
- Publication number 20240168371
- Publication date May 23, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Kuan-Da Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IMPRINTED METHOD AND PATTERNED LAYER
- Publication number 20240103363
- Publication date Mar 28, 2024
- Koninklijke Philips N.V.
- MARCUS ANTONIUS VERSCHUUREN
- B82 - NANO-TECHNOLOGY
Information Patent Application
SHADOW MASK AND METHOD OF MANUFACTURING BLANK MASK USING THE SAME
- Publication number 20230408903
- Publication date Dec 21, 2023
- SK enpulse Co., Ltd.
- Seong Yoon KIM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DESIGN OF AN INTEGRATED CIRCUIT USING MULTIPLE AND DIFFERENT PROCES...
- Publication number 20230334214
- Publication date Oct 19, 2023
- ADVANCED MICRO DEVICES, INC.
- Alexander W. Schaefer
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
LOW INTENSITY PHOTOMASK AND SYSTEM, METHOD AND PROGRAM PRODUCT FOR...
- Publication number 20230305384
- Publication date Sep 28, 2023
- PHOTRONICS, INC.
- Christopher Progler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
AN OPTICAL ELEMENT AND A METHOD OF VISUALLY AUTHENTICATING AN OBJECT
- Publication number 20230288697
- Publication date Sep 14, 2023
- SICPA HOLDING SA
- Yuliy SCHWARTZBURG
- B42 - BOOKBINDING ALBUMS FILES SPECIAL PRINTED MATTER
Information Patent Application
Mask, Manufacturing Method Thereof and Mask Assembly
- Publication number 20230255055
- Publication date Aug 10, 2023
- BOE TECHNOLOGY GROUP CO., LTD.
- Na BI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK, MASK ASSEMBLY HAVING THE SAME, AND SUBSTRATE TRANSFER APPARATUS
- Publication number 20230221642
- Publication date Jul 13, 2023
- SAMSUNG DISPLAY CO., LTD.
- CHEOLRAE JO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOCHEMICAL AND THERMAL RELEASE LAYER PROCESSES AND USES IN DEVIC...
- Publication number 20230144598
- Publication date May 11, 2023
- Terecircuits Corporation
- Jayna Sheats
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IMPRINTED METHOD AND PATTERNED LAYER
- Publication number 20230119298
- Publication date Apr 20, 2023
- Koninklijke Philips N.V.
- MARCUS ANTONIUS VERSCHUUREN
- B82 - NANO-TECHNOLOGY
Information Patent Application
METHOD OF MANUFACTURING DEPOSITION MASK FRAME ASSEMBLY FOR DISPLAY...
- Publication number 20230062020
- Publication date Mar 2, 2023
- KPS CORPORATION
- Jung Ho KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REFLECTIVE MASK BLANK AND METHOD FOR MANUFACTURING REFLECTIVE MASK
- Publication number 20220350234
- Publication date Nov 3, 2022
- Shin-Etsu Chemical Co., Ltd.
- Takuro Kosaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK AND METHOD OF FABRICATING A PHOTOMASK
- Publication number 20220334462
- Publication date Oct 20, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hsin-Chang LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF MANUFACTURING CHEMICAL FLUID FOR MANUFACTURING ELECTRONIC...
- Publication number 20220317563
- Publication date Oct 6, 2022
- FUJIFILM CORPORATION
- Tetsuya SHIMIZU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PREDICTION DATA SELECTION FOR MODEL CALIBRATION TO REDUCE MODEL PRE...
- Publication number 20220276563
- Publication date Sep 1, 2022
- ASML NETHERLANDS B.V.
- Lei WANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
THINNER COMPOSITION AND METHOD OF PROCESSING SURFACES OF SEMICONDUC...
- Publication number 20220243149
- Publication date Aug 4, 2022
- SK HYNIX INC.
- Kyung Hee OH
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
PELLICLE HAVING VENT HOLE
- Publication number 20220026797
- Publication date Jan 27, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chue San YOO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
INTERCONNECTION STRUCTURE FABRICATION USING GRAYSCALE LITHOGRAPHY
- Publication number 20210343635
- Publication date Nov 4, 2021
- Intel Corporation
- Johanna Swan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FABRICATING RETICLE
- Publication number 20210263425
- Publication date Aug 26, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Hsueh-Yi CHUNG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MANUFACTURING TEMPLATE
- Publication number 20210223685
- Publication date Jul 22, 2021
- BOE TECHNOLOGY GROUP CO., LTD.
- Kang GUO
- B24 - GRINDING POLISHING
Information Patent Application
INTERCONNECTION STRUCTURE FABRICATION USING GRAYSCALE LITHOGRAPHY
- Publication number 20210074620
- Publication date Mar 11, 2021
- Intel Corporation
- Johanna Swan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROTECTION OF PHOTOMASKS FROM 193nm RADIATION DAMAGE USING THIN COA...
- Publication number 20200301270
- Publication date Sep 24, 2020
- International Business Machines Corporation
- Robert L. Sandstrom
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK FRAME ASSEMBLY WITH ALIGNMENT MARKS IN BOTH FRAME AND MASK PLA...
- Publication number 20200209735
- Publication date Jul 2, 2020
- ORDOS YUANSHENG OPTOELECTRONICS CO., LTD.
- Fengli JI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF FABRICATING RETICLE
- Publication number 20200150546
- Publication date May 14, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Hsueh-Yi CHUNG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MULTI-TONE AMPLITUDE PHOTOMASK
- Publication number 20200117081
- Publication date Apr 16, 2020
- Marsupial Holdings, Inc.
- William P. Parker
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROCESS FOR IMPROVING THE CRITICAL DIMENSION UNIFORMITY OF ORDERED...
- Publication number 20200057368
- Publication date Feb 20, 2020
- Arkema France
- Xavier Chevalier
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
PATTERN WIDTH CORRECTION SYSTEM AND METHOD FOR MANUFACTURING A SEMI...
- Publication number 20200012186
- Publication date Jan 9, 2020
- Samsung Electronics Co., Ltd.
- Sung Min Ahn
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Preparation processes not covered by groups G03F1/20 - G03F1/50

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Devices and methods for examining and/or processing an element for...

Pellicle having vent hole

Optical element and a method of visually authenticating an object

Photomask and method of fabricating a photomask

Method of fabricating reticle

Imprinted method and patterned layer

Interconnection structure fabrication using grayscale lithography

Method for manufacturing template

Photomask and method of fabricating a photomask

Method of manufacturing chemical fluid for manufacturing electronic...

Pattern formation method using a photo mask for manufacturing a sem...

Reticle and method of detecting intactness of reticle stage using t...

Protection of photomasks from 193nm radiation damage using thin coa...

Pellicle removal method

Methods for forming a photo-mask and a semiconductor device

Laser-ablatable mask film

Interconnection structure fabrication using grayscale lithography

Method of fabricating reticle

Mask frame assembly including both frame and mask plate fixed on fr...

Real-time correction of template deformation in nanoimprint lithogr...

System and method for producing an optical mask for surface microte...

System and method for producing an optical mask for surface treatme...

Photomask and manufacturing method thereof

Method for fabricating semiconductor device, pattern writing appara...

Multi-tone amplitude photomask

Methods and systems for parameter-sensitive and orthogonal gauge de...

Photomask and fabrication method therefor

Method for preparing mask, mask and evaporation system

Method for producing flexographic printing plates using UV-LED irra...

Method for manufacturing a mask

Patents Applicationslast 30 patents

PHOTOMASK SET, DESIGN METHOD THEREOF, AND MANUFACTURING METHOD OF P...

PELLICLE HAVING VENT HOLE

HARDMASK COMPOSITION, HARDMASK LAYER AND METHOD OF FORMING PATTERNS

SELECTIVE HARDMASK ON HARDMASK

IMPRINTED METHOD AND PATTERNED LAYER

SHADOW MASK AND METHOD OF MANUFACTURING BLANK MASK USING THE SAME

DESIGN OF AN INTEGRATED CIRCUIT USING MULTIPLE AND DIFFERENT PROCES...

LOW INTENSITY PHOTOMASK AND SYSTEM, METHOD AND PROGRAM PRODUCT FOR...

AN OPTICAL ELEMENT AND A METHOD OF VISUALLY AUTHENTICATING AN OBJECT

Mask, Manufacturing Method Thereof and Mask Assembly

MASK, MASK ASSEMBLY HAVING THE SAME, AND SUBSTRATE TRANSFER APPARATUS

PHOTOCHEMICAL AND THERMAL RELEASE LAYER PROCESSES AND USES IN DEVIC...

IMPRINTED METHOD AND PATTERNED LAYER

METHOD OF MANUFACTURING DEPOSITION MASK FRAME ASSEMBLY FOR DISPLAY...

REFLECTIVE MASK BLANK AND METHOD FOR MANUFACTURING REFLECTIVE MASK

PHOTOMASK AND METHOD OF FABRICATING A PHOTOMASK

METHOD OF MANUFACTURING CHEMICAL FLUID FOR MANUFACTURING ELECTRONIC...

PREDICTION DATA SELECTION FOR MODEL CALIBRATION TO REDUCE MODEL PRE...

THINNER COMPOSITION AND METHOD OF PROCESSING SURFACES OF SEMICONDUC...

PELLICLE HAVING VENT HOLE

INTERCONNECTION STRUCTURE FABRICATION USING GRAYSCALE LITHOGRAPHY

METHOD OF FABRICATING RETICLE

METHOD FOR MANUFACTURING TEMPLATE

INTERCONNECTION STRUCTURE FABRICATION USING GRAYSCALE LITHOGRAPHY

PROTECTION OF PHOTOMASKS FROM 193nm RADIATION DAMAGE USING THIN COA...

MASK FRAME ASSEMBLY WITH ALIGNMENT MARKS IN BOTH FRAME AND MASK PLA...

METHOD OF FABRICATING RETICLE

MULTI-TONE AMPLITUDE PHOTOMASK

PROCESS FOR IMPROVING THE CRITICAL DIMENSION UNIFORMITY OF ORDERED...

PATTERN WIDTH CORRECTION SYSTEM AND METHOD FOR MANUFACTURING A SEMI...