The disclosure of Japanese Patent Application No. 2022-62763 filed on Apr. 5, 2022 including specification, drawings and claims is incorporated herein by reference in its entirety.
This invention relates to an imaging device for imaging a peripheral edge part of an object to be imaged such as a semiconductor wafer, an inspection technique for inspecting the object to be imaged based on a peripheral edge part image captured by the imaging device and a substrate processing apparatus equipped with the imaging device.
A processing system is known which applies various types of processing to a peripheral edge part of an object to be imaged such as a semiconductor wafer. For example, in JP 2017-139492A, a bevel part of a substrate is washed after a coating agent is spread on the substrate. Further, after a bevel washing step, an inspection step is performed in which a surface state of the bevel part is inspected to determine the presence or absence of the coating agent on the bevel part. This inspection step is performed by a device different from a device for performing the bevel washing step.
In the system described in JP 2017-139492A, a substrate processing apparatus for performing the bevel washing step and an inspection device for performing the inspection step are separated from each other. Thus, there is a time difference between the occurrence of a failure in the substrate processing apparatus and the finding of the failure in the inspection device. This became a factor of yield reduction in some cases.
Accordingly, to solve the above problem, it is considered to incorporate an inspection device into a substrate processing apparatus. However, in the inspection device, a CMOS (Complementary Metal Oxide Semiconductor) camera is arranged on a peripheral edge part of a substrate and the peripheral edge part of the substrate is imaged by this camera. Further, in the case of inspecting a surface state of a bevel part, a camera for observing the bevel part from various directions and a light source for illuminating the bevel part from various directions to be compatible with the camera are necessary. That is, in the conventional inspection device, constituent elements arranged near the peripheral edge part of the substrate are relatively large and the incorporation of the inspection device into the substrate processing apparatus has been difficult.
This invention was developed in view of the above problem and aims to provide an imaging device excellent in versatility and capable of satisfactorily imaging a peripheral edge part of an object to be imaged such as a semiconductor wafer, an inspection technique capable of inspecting the peripheral edge part of the object to be imaged using the imaging device and a substrate processing apparatus equipped with the imaging device.
A first aspect of the invention is an imaging device for imaging a peripheral edge part of an object to be imaged. The imaging device comprises: a light source configured to irradiate illumination light toward an imaging position for imaging the peripheral edge part of the object to be imaged from a position distant from the object to be imaged; a head unit including a diffusing illuminator and a guide unit, the diffusing illuminator being configured to illuminate the peripheral edge part with diffused light generated by diffusing and reflecting the illumination light from the light source at the imaging position, the guide unit being configured to guide reflected light reflected by the peripheral edge part illuminated with the diffused light to the position distant from the object to be imaged; and an imager configured to obtain an image of the peripheral edge part by receiving the reflected light guided by the guide unit at the position distant from the object to be imaged.
A second aspect of the invention is an inspection device for inspecting a peripheral edge part of an object to be imaged. The inspection device comprises: the imaging device; a mover configured to move the object to be imaged in a given direction with respect to the head unit while the head unit is positioned at the imaging position; an image acquirer configured to obtain a peripheral edge part image of the object to be imaged along the given direction from a plurality of images of the peripheral edge part obtained by the imager while the object to be imaged is relatively moved with respect to the head unit by the mover; and an inspector configured to inspect the peripheral edge part based on the peripheral edge part image.
A third aspect of the invention is an inspection method for inspecting a peripheral edge part of an object to be imaged. The inspection method comprises: relatively moving the object to be imaged in a given direction with respect to the head unit of the imaging device according to claim 1 while positioning the head unit to the imaging position; obtaining a peripheral edge part image of the object to be imaged along the given direction by synthesizing a plurality of images obtained by the imager while the object to be imaged is relatively moved with respect to the head unit; and inspecting the peripheral edge part based on the peripheral edge part image.
A fourth aspect of the invention is a substrate processing apparatus. The substrate processing apparatus comprises: a rotating mechanism configured to hold and rotate a substrate; a processing mechanism configured to process a peripheral edge part of the substrate by supplying a processing liquid to the peripheral edge part of the substrate rotated by the rotating mechanism; and an imaging device configured to image the peripheral edge part before or after the peripheral edge part is processed, wherein the imaging device includes: a light source configured to irradiate illumination light toward an imaging position for imaging the peripheral edge part of the substrate from a position distant from the peripheral edge part of the substrate; a head unit including a diffusing illuminator and a guide unit, the diffusing illuminator being configured to illuminate the peripheral edge part with diffused light generated by diffusing and reflecting the illumination light from the light source at the imaging position, the guide unit being configured to guide reflected light reflected by the peripheral edge part illuminated with the diffused light to the position distant from the substrate; and an imager configured to obtain an image of the peripheral edge part by receiving the reflected light guided by the guide unit at the position distant from the peripheral edge part of the substrate.
In the invention thus configured, the light source and the imager are arranged at the position distant from the object to be imaged such as a substrate, whereas the head unit is arranged at the imaging position. The diffused light generated by diffusing and reflecting the illumination light from the light source by the diffusing illuminator illuminates the peripheral edge part. Further, the reflected light reflected by the peripheral edge part illuminated by the diffused light is guided to the imager by the guide unit. In this way, the peripheral edge part is imaged by the imager.
According to this invention, a peripheral edge part of an object to be imaged such as a semiconductor wafer can be satisfactorily imaged and, moreover, the imaging device excellent in versatility is obtained. Further, the inspection device can be reduced in size and is easily incorporated into a substrate processing apparatus by using this imaging device.
All of a plurality of constituent elements of each aspect of the invention described above are not essential and some of the plurality of constituent elements can be appropriately changed, deleted, replaced by other new constituent elements or have limited contents partially deleted in order to solve some or all of the aforementioned problems or to achieve some or all of effects described in this specification. Further, some or all of technical features included in one aspect of the invention described above can be combined with some or all of technical features included in another aspect of the invention described above to obtain one independent form of the invention in order to solve some or all of the aforementioned problems or to achieve some or all of the effects described in this specification.
The indexer robot 222 includes a base 222a fixed to an apparatus housing, an articulated arm 222b provided rotatably about a vertical axis with respect to the base 222a, and a hand 222c mounted on the tip of the articulated arm 222b. The hand 222c is structured such that the substrate W can be placed and held on the upper surface thereof. Such an indexer robot including the articulated arm and the hand for holding the substrate is not described in detail since being known.
The substrate processing station 210 includes a substrate conveyor robot 211 arranged substantially in a center in a plan view and a plurality of processing units 1 arranged to surround this substrate conveyor robot 11. Specifically, the plurality of processing units 1 are arranged to face a space where the substrate conveyor robot 111 is arranged. The substrate conveyor robot 211 randomly accesses these processing units 1 and transfers the substrates W. On the other hand, each processing unit 1 performs a predetermined processing to the substrate W.
In this embodiment, these processing units 1 have the same function.
A substrate processing apparatus (processing unit) 1 is provided with a rotating mechanism 2, a scattering preventing mechanism 3, a processing mechanism 4, a peripheral edge heating mechanism 5 and an imaging mechanism 6. Each of these mechanisms 2 to 6 is electrically connected to a control unit 9 for controlling the entire apparatus while being housed in an internal space 101 of a processing chamber 100. Each mechanism 2 to 6 operates in response to an instruction from the control unit 9.
A unit similar to a general computer can be, for example, adopted as the control unit 9. That is, in the control unit 9, a CPU serving as a main controller performs an arithmetic processing in accordance with a procedure described in a program, thereby controlling each component of the substrate processing apparatus 1. In this way, the substrate processing apparatus 1 performs a bevel etching processing as an example of a “processing” of the invention by supplying a processing liquid to a peripheral edge part of the upper surface of the substrate S in the processing chamber. Note that the detailed configuration and operation of the control unit 9 are described in detail later. Further, although the control unit 9 is provided for each substrate processing apparatus 1 in this embodiment, a plurality of the substrate processing apparatuses 1 may be controlled by one control unit. Further, the substrate processing apparatus 1 may be controlled by a control unit (not shown) for controlling the entire substrate processing system 200.
The rotating mechanism 2 rotates the substrate S in a rotational direction AR1 (
An unillustrated through hole is provided in a central part of the spin chuck 21 and communicates with an internal space of the rotary shaft 22. A pump 24 (
The scattering preventing mechanism 3 includes a substantially tubular cup 31 provided to surround the outer periphery of the substrate S held on the spin chuck 21 as shown in
When the cup 31 is at the lower position, the substrate S held on the spin chuck 21 is exposed to the outside of the cup 31 as shown in
On the other hand, when the cup 31 is at the upper position, the inner peripheral surface of the cup 31 surrounds the outer periphery of the substrate S held on the spin chuck 21. In this way, droplets of the processing liquid shaken off from the peripheral edge part Ss of the substrate S during the bevel etching processing to be described later can be prevented from being scattered in the processing chamber 100. Further, the processing liquid can be reliably collected. That is, the droplets of the processing liquid shaken off from the peripheral edge part Ss of the substrate S by the rotation of the substrate S adhere to the inner peripheral surface of the cup 31, flow down and are gathered and collected by the liquid receiver 32 arranged below the cup 31.
The processing mechanism 4 includes a base 41, a pivot shaft 42, an arm 43 and a processing liquid nozzle 44. The base 41 is fixed to the processing chamber 100. The pivot shaft 42 is freely rotatably provided on this base 41. The arm 43 horizontally extends from the pivot shaft 42, and the processing liquid nozzle 44 is attached to the tip of the arm 43. The pivot shaft 42 turns in response to a control command from the control unit 9, whereby the arm 43 swings and the processing liquid nozzle 44 on the tip of the arm 43 moves between a retracted position (two-dot chain line position in
The processing liquid nozzle 44 is connected to a processing liquid supplier 45 (
The peripheral edge heating mechanism 5 is constituted by an annular heater 51. The heater 51 includes a built-in heating element extending in a circumferential direction of the substrate S along a peripheral edge part of the lower surface of the substrate S. If a heating command is given to this heater 51 from the control unit 9, the peripheral edge part Ss of the substrate S is heated from below by heat released from the heating element. In that way, the temperature of the peripheral edge part Ss increases to a value suitable for the bevel etching processing.
The imaging mechanism 6 corresponds to a first embodiment of an “imaging device” of the invention. The imaging mechanism 6 includes a base 6A, a pivot shaft 6B, an arm 6C, a head driver 6D, a light source 6E, an imager 6F and a head unit 6G. The base 6A is fixed to the processing chamber 100. The pivot shaft 6B is freely rotatably provided on this base 6A. The arm 6C horizontally extends from the pivot shaft 6B, and the head unit 6G is attached to the tip of the arm 6C. If a control command is given to the head driver 6D (
As shown in
As described above, the head unit 6G has both a diffusing/illuminating function of receiving the illumination light L1 from the light source 6E, generating the diffused light and illuminating the peripheral edge part Ss of the substrate by the diffused light and a guiding function of guiding the reflected light L2 reflected by the peripheral edge part Ss to the imager 6F. The configuration and operation of the head unit 6G are described below with reference to
The holder 63 is, for example, made of PEEK (polyetheretherketone) and includes, as shown in
On the other hand, in the projecting section 632, an inclined surface inclined toward the mirror member 62a is formed in the region vertically above the cut 636, and this inclined surface functions as the diffusing surface 63a. That is, the diffusing surface 63a generates upper surface diffused light propagating toward the upper surface Ssu of the peripheral edge part Ss of the substrate S by diffusing and reflecting part of the illumination light L1, and corresponds to an example of a “second upper diffusing surface” of the invention. Note that the diffused light generated on the diffusing surface 63a is described later together with diffused light generated on the diffusing surface 61a functioning as a “first upper diffusing surface” of the invention with reference to
Further, an inclined surface inclined toward the mirror member 62c is formed in the region vertically below the cut 636, and this inclined surface functions as the diffusing surface 63b. That is, the diffusing surface 63b generates lower surface diffused light propagating toward the lower surface Ssd of the peripheral edge part Ss of the substrate S by diffusing and reflecting part of the illumination light L1, and corresponds to an example of a “second lower diffusing surface” of the invention. Note that the diffused light generated on the diffusing surface 63b is described later together with diffused light generated on the diffusing surface 61c functioning as a “first lower diffusing surface” of the invention with reference to
As just described, the holder 63 having the mirror members 62a to 62c mounted thereon is integrated with the diffusing illuminator 61 arranged on a (+X) direction side and the support 64 arranged on a (−X) direction side while being sandwiched by the diffusing illuminator 61 and the support 64.
The diffusing illuminator 61 is, for example, made of PTFE (polytetrafluoroethylene). The diffusing illuminator 61 has a plate shape extending in the horizontal direction Y and is formed with a cut 611 in an end part on the (+Y) direction side as shown in
The imager 6F includes an observation lens system constituted by an object-side telecentric lens and a CMOS camera. Accordingly, only beams parallel to an optical axis of the observation lens system, out of the above reflected light L2, are incident on a sensor surface of the CMOS camera, and images of the peripheral edge part Ss and the adjacent region of the substrate S are formed on the sensor surface. In this way, the imager 6F images the peripheral edge part Ss and the adjacent region of the substrate S and obtains, for example, an image (=upper surface image Ma+side surface image Mb+lower surface image Mc) shown in
Accordingly, in the substrate processing apparatus 1 equipped with the imaging mechanism 6 configured as described above, the control unit 9 performs (A) a substrate inspection before the bevel etching processing, (B) an alignment processing, (C) a bevel etching processing after the alignment processing and (D) a substrate inspection after the bevel etching processing by controlling each component of the apparatus. This control unit 9 includes, as shown in
Note that reference numeral 7 in
If the loading of the substrate S is completed, the substrate conveyor robot 211 is retracted from the substrate processing apparatus 1. Following that, the arithmetic processor 91 obtains an entire peripheral edge image of the substrate S (Step S2).
The arithmetic processor 91 positions the substrate S to a reference position (position where an angle of rotation is zero) by rotating the spin chuck 21 sucking and holding the substrate S (Step S201). The arithmetic processor 91 causes the head driver 6D to move and position the head unit 6G from the retracted position P1 to the imaging position P2 (Step S202). In this way, as shown in
In next Step S203, the arithmetic processor 91 turns on the light source 6E to start diffused illumination of the peripheral edge part Ss and the adjacent region of the substrate S by the head unit 6G. Following that, the arithmetic processor 91 gives a rotation command to the rotation driver 23 to start the rotation of the substrate S held on the spin chuck 21 (Step S204). Thereafter, every time the substrate S is rotated by a predetermined angle, Steps S205 to S207 are performed. That is, the image shown in
The arithmetic processor 91 gives a rotation stop command to the rotation driver 23 in parallel with the storage of the entire peripheral edge image IM (Step S209), thereby stopping the rotation of the substrate S held on the spin chuck 21, and turns off the light source 6E to stop illumination (Step S210). Following this, the arithmetic processor 91 causes the head driver 6D to move and position the head unit 6G from the imaging position P2 to the retracted position P1 (Step S211).
Information reflecting the eccentricity of the substrate S with respect to the axis of rotation AX is included in the upper surface entire peripheral edge image IMa or lower surface entire peripheral edge image IMc, out of the thus obtained entire peripheral edge image IM. Further, information reflecting the warp of the substrate S is included in the side surface entire peripheral edge image IMb.
Accordingly, in this embodiment, the arithmetic processor 91 calculates the eccentricity amount and the warp amount of the substrate S from the entire peripheral edge image IM (Step S3) and determines whether or not at least one of calculated values of those (=eccentricity amount and warp amount) is equal to or less than an allowable value (Step S4). Note that since conventionally frequently used methods can be used as calculation methods for the eccentricity amount and the warp amount, these calculation methods are not described here.
If it is determined that the calculated value exceeds the allowable value in Step S4 (“NO” in Step S4), the arithmetic processor 91 displays a message that the substrate S is a defective product on the input/display unit 93 (Step S5) and stops the bevel etching processing for the substrate S. On the other hand, if the eccentricity amount and the warp amount are equal to or less than the allowable value and the substrate S is confirmed as a good product, the arithmetic processor 91 performs the so-called alignment processing to correct the eccentricity amount of the substrate S (Step S6). More specifically, the arithmetic processor 91 stops the suction of the pump 24 and makes the substrate S horizontally movable on the upper surface of the spin chuck 21 after positioning the substrate S at a rotation position where an alignment correction can be performed by the eccentricity correcting mechanism 7 by rotating the spin chuck 21. Then, after performing the alignment correction by the eccentricity correcting mechanism 7, the arithmetic processor 91 resumes the suction of the pump 24 and sucks and holds the alignment-corrected substrate S on the spin chuck 21. In this way, the center of the principal surface of the substrate S is located on the axis of rotation AX to solve the eccentricity.
Subsequently, the arithmetic processor 91 causes the guard driver 33 to raise the cup 31 to the upper position. In this way, the inner peripheral surface of the cup 31 surrounds the outer periphery of the substrate S held on the spin chuck 21. If preparation for the supply of the processing liquid to the substrate S is completed in this way, the arithmetic processor 91 gives a rotation command to the rotation driver 23 to start the rotation of the spin chuck 21 holding the substrate S. Further, the arithmetic processor 91 actuates the heater 51 of the peripheral edge heating mechanism 5. Following this, the arithmetic processor 91 controls the processing liquid supplier 45 to supply the processing liquid after positioning the processing liquid nozzle 44 to the processing start position Ps. In this way, each part of the peripheral edge part Ss of the substrate S receives the supply of the processing liquid while passing through the processing start position Ps. As a result, the bevel etching processing by the processing liquid is performed for the entire peripheral edge part Ss of the substrate S (Step S7). Then, upon detecting the elapse of a processing liquid time required for the bevel etching processing of the substrate S or the like, the arithmetic processor 91 gives a supply stop command to the processing liquid supplier 45 to stop the discharge of the processing liquid. Following that, the arithmetic processor 91 gives a rotation stop command to the rotation driver 23 to stop the rotation of the spin chuck 21 and also stops heating by the heater 51.
If the bevel etching processing is completed in this way, the arithmetic processor 91 obtains the entire peripheral edge image IM after the bevel etching processing, for example, as shown in
After the inspection, the arithmetic processor 91 requests the substrate conveyor robot 211 to unload the substrate S and the processed substrate S is carried out from the substrate processing apparatus 1 (Step S10). Note that a series of these steps is repeatedly performed.
As described above, according to this embodiment, the light source 6E and the imager 6F are arranged at the separated position P3 separated from each component of the apparatus for performing the bevel etching processing, whereas only the head unit 6G is arranged at the imaging position P2. The light source 6E irradiates the illumination light L1 toward the illumination region of the head unit 6G and the reflected light L2 reflected by the peripheral edge part Ss and the adjacent region of the substrate S is guided to the imager 6F, whereby the image of the peripheral edge part Ss is captured. Therefore, the peripheral edge part Ss can be satisfactorily imaged.
Further, it is possible to arrange only the head unit 6G at the imaging position P2 and arrange the light source 6E and the imager 6F other than the head unit 6G away from the respective components (=rotating mechanism 2+scattering preventing mechanism 3+processing mechanism 4+peripheral edge heating mechanism 5) of the apparatus for performing the bevel etching processing. Therefore, the imaging mechanism 6 can be incorporated in a narrow region while avoiding interference with each component of the apparatus, and excellent versatility can be obtained.
Further, the imaging position P2 is under an environment of the processing liquid for performing the bevel etching processing and under a heated environment by the heater 51. In view of this point, the head unit 6G is made of the chemical resistant and heat resistant material such as PEEK, PTFE and Si. Therefore, the image of the peripheral edge part Ss of the substrate S can be stably captured in the substrate processing apparatus 1. As a result, the eccentricity amount, the warp amount and the etching width of the substrate S can be detected with high accuracy, and excellent inspection accuracy is obtained. Further, the residue analysis can be performed with high accuracy.
Further, by using the head unit 6G, the diffused illumination of the upper surface Ssu, the side surface Sse and the lower surface Ssd of the peripheral edge part Ss of the substrate S is possible and the upper surface image, the side surface image and the lower surface image can be collectively captured. Therefore, the peripheral edge part Ss of the substrate S can be imaged with excellent efficiency from many sides.
In the second embodiment, as shown in
According to such consolidation of the diffusing surfaces, the projecting section 632 is removed from the holder 63. Further, the holder 63 is finished into a shape fittable to the diffusing illuminator 61. That is, the diffusing illuminator 61 and the holder 63 are fitted to each other, thereby being integrated while holding mirror members 62a to 62c. In this way, a head unit 6G is composed of a smaller number of components than in the first embodiment. This head unit 6G is positioned at an imaging position P2 with an end part on the (−Y) direction side attached to an arm 6C as shown in
As described above, also in the second embodiment, functions and effects similar to those of the first embodiment are achieved. Further, in the second embodiment, the head unit 6G is composed of a smaller number of components than in the first embodiment. Therefore, the manufacturing cost of an imaging mechanism 6 can be reduced.
Further, since the diffusing surfaces 61a, 61d respectively corresponding to the “first upper diffusing surface” and the “second upper diffusing surface” of the invention are present on the same tapered surface, more advantageous functions and effects than in the first embodiment are achieved. That is, in the first embodiment, the diffusing surfaces 61a, 63a respectively correspond to the “first upper diffusing surface” and the “second upper diffusing surface” of the invention and are made of mutually different materials (PTFE and PEEK) and provided on the mutually independent components (diffusing illuminator 61, holder 63). Therefore, a relatively large illuminance distribution may be produced on the upper surface Ssu of the peripheral edge part Ss of the substrate S. In contrast, since the diffusing surfaces are made of the same material (PTFE) and provided on the continuous tapered surface, an illuminance distribution can be suppressed and an upper surface entire peripheral edge image IMa can be more satisfactorily obtained. This point is similar also on the lower surface side.
In the above embodiments, the substrate S such as a semiconductor wafer corresponds to an example of an “object to be imaged” of the invention. The separated position P3 corresponds to an example of a “position distant from the object to be imaged” of the invention. The rotational direction AR1 corresponds to an example of a “given direction” of the invention. The rotating mechanism 2 corresponds to an example of a “mover” of the invention. The entire peripheral edge image acquirer functions as an “image acquirer” of the invention. The eccentricity amount deriver, the warp amount deriver, the etching width deriver and the residue analyzer function as an “inspector” of the invention. As just described, in these embodiments, a combination of the rotating mechanism 2, the imaging mechanism 6 and the arithmetic processor 91 functions as an “inspection device” of the invention.
Note that the invention is not limited to the embodiments described above and various changes other than the aforementioned ones can be made without departing from the gist of the invention. For example, although lengths of the upper diffusing surfaces 61a, 61d and 63a, the lower diffusing surfaces 61c, 61e, 63b and the mirror members 62a, 62c in the Y direction are set to correspond to the etching width of the substrate S in the embodiments, the lengths of the respective parts may be changed according to a range to be imaged by the imaging mechanism 6, for example, as shown in
Further, although the observation lens system of the imager 6F is constituted by the object-side telecentric lens in the above embodiments, the configuration of the observation lens system of the imager 6F is not limited to this. The observation lens system of the imager 6F may be constituted by another lens.
Further, since being under the environment of the processing liquid for performing the bevel etching processing and under the heated environment by the heater 51 in the above embodiments, the diffusing illuminator 61 and the holder 63 are made of chemical resistant and heat resistant materials. Although the diffusing illuminator 61 and the holder 63 are respectively made of PTFE and PEEK, the constituent materials are not limited to these. The diffusing illuminator 61 may be made of a chemical resistant and heat resistant material other than PTFE. The holder may be made of a chemical resistant and heat resistant material other than PEEK. The diffusing illuminator 61 and the holder 63 may be made of a metal material, a resin material or a material obtained by coating the surface of a ceramic material or the like with a fluororesin material. Further, although the diffusing illuminator 61 and the holder 63 are made of mutually different materials, those may be made of the same material. Further, in the case of being used under an environment not requiring chemical resistance and heat resistance, the constituent materials of the diffusing illuminator 61 and the holder 63 are not limited. The diffusing illuminator 61 and the holder 63 may be made of a material, which is neither chemical resistant nor heat resistant.
Further, the configurations of the diffusing surfaces 61a to 61c and the diffusing surfaces 61d, 61e of the diffusing illuminator 61 and the diffusing surfaces 63a, 63b of the holder 63 are not limited. For example, if the diffusing illuminator 61 and the holder 63 are at least partially made of a metal material, the diffusing surfaces 61a to 61c, the diffusing surfaces 61d, 61e or the diffusing surfaces 63a, 63b may be obtained by applying shot blasting to the surface of the metal material.
Further, the material of the mirror members 62a to 62c is also not limited to Si (silicon). That is, another material may be used if this material is chemical resistant against the processing liquid and heat resistant against the processing temperature. The mirror members 62a to 62c may be, for example, made of a material obtained by depositing a metal material on the surface of a chemical resistant and heat resistant material. Further, in the case of being used under an environment not requiring chemical resistance and heat resistance, the constituent material of the mirror members 62a to 62c is not limited. The mirror members 62a to 62c may be made of a material, which is neither chemical resistant nor heat resistant. The mirror members 62a to 62c may be, for example, made of a material obtained by depositing a metal material on the surface of a material, which is neither chemical resistant nor heat resistant.
Further, although the entire peripheral edge image IM (
Further, although the peripheral edge part is imaged by moving the substrate S as an object to be imaged while fixedly arranging the imaging mechanism 6 in the above embodiments, the imaging mechanism 6 may be moved while the substrate S is fixed. Further, both the substrate S and the imaging mechanism 6 may be moved. That is, the peripheral edge part of the object to be imaged may be imaged by the imaging device while the object to be imaged (substrate S) is relatively moved with respect to the imaging device (imaging mechanism 6).
Further, although the imaging mechanism 6 equivalent to the imaging device according to the invention is incorporated into the substrate processing apparatus 1 for bevel-etching the peripheral edge part Ss of the substrate S in the above embodiments, an application object of the imaging device (imaging mechanism 6) is not limited to this. The invention is applicable also to an imaging device for imaging a peripheral edge part of an object to be imaged, an inspection technique for inspecting an object to be imaged based on a peripheral edge part image captured by this imaging device and the like. Further, the imaging mechanism 6 equivalent to the imaging device according to the invention and the inspection device are, for example, applicable also to a substrate processing apparatus for removing a coating film on the peripheral edge part of the substrate S by supplying a removing liquid for the coating film to the peripheral edge part of the substrate S formed with the coating film.
Although the invention has been described by way of the specific embodiments above, this description is not intended to be interpreted in a limited sense. By referring to the description of the invention, various modifications of the disclosed embodiments will become apparent to a person skilled in this art similarly to other embodiments of the invention. Hence, appended claims are thought to include these modifications and embodiments without departing from the true scope of the invention.
This invention can be applied to imaging devices in general for imaging a peripheral edge part of an object to be imaged such as a semiconductor wafer, inspection techniques in general for inspecting an object to be imaged based on a peripheral edge part image captured by the imaging device and substrate processing apparatuses in general equipped with the imaging device.
Number | Date | Country | Kind |
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2022-062763 | Apr 2022 | JP | national |