| Beringer, F.M. et al., J. Am. Chem. Soc., 60, 141 (1956). |
| Berry et al., Chemically Amplified Resists for I-line and G-line Applications, SPIE 1262, 575 (1990). |
| Bi, Y. et al., J. Photochem. Photobiol. A: Chem, 74, 221 (1993). |
| Bou et al., Tetrahedron Letters, 23(3), 361 (1982). |
| Cohen S. and Cohen, S. G., J. Am. Chem. Soc., 88, 1533 (1966). |
| Crivello et al., J. Polym. Sci., Polym. Chem. Ed., 16, 2441 (1978). |
| Dehmlow et al., Chem. Ber. 113(1), 1-8 (1979). |
| Dehmlow et al., Chem. Ber. 121(3), 569-71 (1988). |
| Devoe et al., Can. J. Chem., 66, 319 (1988). |
| Fouassier et al., J. Imag. Sci. Tech., 37(2), 208 (1993). |
| Islam, N. et al., Tetrahedron 43, 959-970 (1987). |
| Ito et al., Polymer Sci. Eng., 23(18), 1012 (1983). |
| Krohnke, Synthesis, 1976, 1. |
| Mitchell, R.D. et al., J. Imag. Sci., 30(5), 215 (1986). |
| Ohe, Y. et al., J. Imag. Sci. Tech., 37(3), 250 (1993). |
| Pappas, S.P. et al., Progress in Organic Coatings, 13, 35 (1964). |
| Reichmanis et al., Chemical Amplification Mechanism for Microlithography, Chem. Mater., 3(3), 394 (1991). |
| Pericas et al., Tetrahedron Letters, (1977), 4437-38. |
| Sabongi, G.J. Chemical Triggering--Reactions of Potential Utility in Industrial Processes, Plenum Press, New York, New York (1987), pp. 68-71 and 97-101. |
| Wallraff, G.M. et al., J. Imag. Sci. Tech., 36(5), 468 (1992). |
| Weiss, J. Am. Chem. Soc., 74, 200 (1952). |