Patent Application
20080029853
In the following description, numerous specific details are given to provide a thorough understanding of the invention. However, it will be apparent that the invention may be practiced without these specific details. In order to avoid obscuring the present invention, some well-known system configurations and process steps are not disclosed in detail. Likewise, the drawings showing embodiments of the apparatus are semi-diagrammatic and not to scale and, particularly, some of the dimensions are for the clarity of presentation and are shown greatly exaggerated in the figures. In addition, where multiple embodiments are disclosed and described having some features in common, for clarity and ease of illustration, description, and comprehension thereof, similar and like features one to another will ordinarily be described with like reference numerals.
The term “horizontal” as used herein is defined as a plane parallel to the conventional plane or surface of the invention, regardless of its orientation. The term “vertical” refers to a direction perpendicular to the horizontal as just defined. Terms, such as “on”, “above”, “below”, “bottom”, “top”, “side” (as in “sidewall”), “higher”, “lower”, “upper”, “over”, and “under”, are defined with respect to the horizontal plane.
The term “processing” as used herein includes deposition of material or photoresist, patterning, exposure, development, etching, cleaning, and/or removal of the material or photoresist as required in forming a described structure.
Referring now to
Reducing unvaporized dopant flow reduces the formation of a higher than expected dopant level in the lightly doped thin insulating layer 104. The expected dopant level in the dielectric 102 provides controlled preparation, such as cleaning, of a recess (not shown) etched in the dielectric 102 for the contact 106. The controlled preparation provides reliability and electrical isolation of the contact 106 by reducing wet clean lateral etch that may cause a lateral penetration of the contact 106. The lateral penetration may result in shorting with other semiconductors or another of the contact 106.
The contact 106 connects an interconnect layer 110, such as metal, with a semiconductor layer 108, such as an active layer, a polysilicon layer or another metal layer. The semiconductor layer 108 may be part of an integrated circuit device 112 formed over a substrate 114. The contact 106 is deposited, such as CVD (chemical vapor deposition), into the recess etched in the dielectric 102, wherein the recess extends to the semiconductor layer 108. A barrier layer (not shown) or a conductive layer (not shown) may be partly applied to the recess. The interconnect layer 110 is applied, such as sputtering, over the contact 106, wherein the interconnect layer 110 electrically connects to the contact 106. The interconnect layer 110 may be further processed, such as etching, to form connection traces.
Referring now to
The lightly doped thin insulating layer 104 is deposited between an undoped insulating layer 202 and a doped insulating layer 204. The doped insulating layer 204 is doped with a bulk flow of TEPO (triethylphosphine oxide, triethylphoshate or similar based material) or TEP (triethylphosphine or similar based material) for phosphorous. For boron, the doped insulating layer 204 is doped with a bulk flow of TEB (triethylborate) or TMB (trimethoxyborane or trimethylborate).
The lightly doped thin insulating layer 104 is less than 1000 angstroms in thickness and doped with 30% to 50% of the bulk flow of dopant, TEPO, TEP, TEB or TMB. The lower dopant flow setpoint for the lightly doped thin insulating layer 104 minimizes non-vaporization volume and maximizes vaporization rates to reduce the effects of precursor flow overshoot, poor vaporization of dopant precursors and dopant precursor condensation. The lower dopant flow setpoint thereby reduces the formation of a higher than expected dopant level in the lightly doped thin insulating layer 104.
Referring now to
An aggressive preparation process, including a 200 second clean time instead of a 130 second clean time, was applied to the recess. Performance of the integrated circuit device 112 including the integrated circuit system with contact film 100 were substantially unchanged from integrated circuit devices (not shown) without the integrated circuit system with contact film 100 based on electrical test and sort yield.
Referring now to
An aggressive preparation process, including a 200 second clean time instead of a 130 second clean time, was applied to the recess. Performance of the integrated circuit device 112 including the integrated circuit system with contact film 100 were substantially unchanged from integrated circuit devices (not shown) without the integrated circuit system with contact film 100 based on electrical test and sort yield.
Referring now to
The undoped thin insulating layer 502 is less than 1000 angstroms in thickness. The initial elimination of TEPO or TEP flow for the undoped thin insulating layer 502 minimizes non-vaporization volume and maximizes vaporization rates to reduce the effects of precursor flow overshoot, poor vaporization of dopant precursors and dopant precursor condensation during the bulk flow of TEPO or TEP. The initial elimination of TEPO or TEP flow thereby reduces the formation of a higher than expected dopant level in the dielectric 500.
Referring now to
The controlled preparation provides reliability and electrical isolation of the contact 106 by reducing wet clean lateral etch that may cause a lateral penetration of the contact 106. The lateral penetration may result in shorting with other semiconductors or another of the contact 106. The contact 106 is deposited into the recess and forms the graduated profile 602 providing electrical connectivity between the interconnect layer 110 of
Referring now to
In greater detail, a method to fabricate the integrated circuit system with contact film 100, in an embodiment of the present invention, is performed as follows:
It has been discovered that the present invention thus has numerous aspects.
An aspect is that the present invention improves the quality of the dielectric. Control of the dopant flow and concentration is significantly improved. The control provides improved consistency in the dopant levels or richness of the dielectric insulating layers.
It has been discovered that the disclosed structure provides compensation for variations in the deposition delivery system. The lower dopant precursor flow setpoint compensates for overshoot, poor vaporization and condensation, all of which affect the deposition delivery system's performance particularly with respect to consistency.
It has also been discovered that the disclosed structure improves the chemical bond at the interface of the undoped and doped regions. This improves the consistency of the dopant levels or richness, providing graduated doping and reduced weakening of the chemical bond between the dielectric insulating layers.
Yet another discovery of the disclosed structure is improved integrity during cleaning, such a wet etching. The improved chemical bond between the dielectric insulating layers provides more consistent surfaces for the etching process. The cleaning process removes material at a more consistent rate across the multi-surface dielectric, leaving a more planar surface.
Yet another discovery of the disclosed structure is improved yield from the reduction in contact shorting. The improved integrity during cleaning has eliminated lateral penetration of the dielectric, particularly at the insulating layer interfaces. The more planar surface of the recess and the resultant more planar surface of the contact eliminate the lateral extrusion of the contact causing shorting to adjacent contacts.
These and other valuable aspects of the present invention consequently further the state of the technology to at least the next level.
Thus, it has been discovered that the integrated circuit system with contact film method and apparatus of the present invention furnish important and heretofore unknown and unavailable solutions, capabilities, and functional aspects for deposition systems. The resulting processes and configurations are straightforward, cost-effective, uncomplicated, highly versatile, accurate, sensitive, and effective, and can be implemented by adapting known components for ready, efficient, and economical manufacturing, application, and utilization.
While the invention has been described in conjunction with a specific best mode, it is to be understood that many alternatives, modifications, and variations will be apparent to those skilled in the art in light of the aforegoing description. Accordingly, it is intended to embrace all such alternatives, modifications, and variations, which fall within the scope of the included claims. All matters hithertofore set forth herein or shown in the accompanying drawings are to be interpreted in an illustrative and non-limiting sense.
