Claims
- 1. A method for forming a pattern on an object, which comprises:
- coating a composition on a resist film on the object to be coated, said composition comprising 100 parts by weight of a solvent and 0.01 to 30 parts by weight of a soluble aniline polymer comprising at least one of the repeating units: ##STR7## wherein R.sup.1, R.sup.2, R.sup.3 and R.sup.4 are each an electron-donating group; Y.sup.1, Y.sup.2, Y.sup.3 and Y.sup.4 are each --SO.sub.3 -- or --COO--; and M.sup.1, M.sup.2, M.sup.3 and M.sup.4 are each a hydrogen ion, an ammonium ion, a C.sub.1 -C.sub.8 alkyl ammonium ion, an aromatic ammonium ion or a quaternary ion of an aromatic heterocyclic ring; wherein,
- the polymer contains at least 80% of the repeating units, has a weight average molecular weight of not less than 10,000, is soluble in water or a water-containing organic solvent, and is solid at room temperature;
- exposing the coated object pattern-wise to ionizing radiation; and
- dissolving the coating and developing the resist film to form a pattern on the object.
- 2. A method according to claim 1, wherein the resist film is developed at the same time the coating is being dissolved.
- 3. The method according to claim 1 or 2, wherein R.sup.1, R.sup.2, R.sup.3 and R.sup.4 are independently a C.sub.1 -C.sub.8 alkyl group, a C.sub.1 -C.sub.8 alkoxy group or a halogen.
- 4. A method according to claim 1 or 2, wherein R.sup.1, R.sup.2, R.sup.3 and R.sup.4 are C.sub.1 -C.sub.8 alkoxy groups and Y.sup.1, Y.sub.2, Y.sub.3 and Y.sup.4 are --SO.sub.3 --.
- 5. A method according to claim 1 or 2, wherein the composition further comprises 0.01 to 15 parts by weight of ammonia, a C.sub.1 -C.sub.8 aliphatic amine, an aromatic amine, a heterocyclic compound or a quaternary salt thereof.
- 6. A method according to claim 1 or 2, wherein the composition further comprises 0.001 to 30 parts by weight of a compound or a polymer containing an acidic group.
- 7. A method according to claim 6, wherein the acidic group is a sulfone or a carboxyl group.
- 8. A method for forming a pattern on an object, which comprises:
- coating a composition on a resist film on the object to be coated, said composition comprising 100 parts by weight of a solvent and 0.01 to 30 parts by weight of a soluble aniline polymer comprising at least one of the repeating units: ##STR8## wherein R.sup.1, R.sup.2, R.sup.3 and R.sup.4 are each a C.sub.1 -C.sub.8 alkoxy group; Y.sup.1, Y.sup.2, Y.sup.3 and Y.sup.4 are each --SO.sub.3 --; and M.sup.1, M.sup.2, M.sup.3 and M.sup.4 are each a hydrogen ion, an ammonium ion, a C.sub.1 -C.sub.8 alkyl ammonium ion, an aromatic ammonium ion or a quaternary ion of an aromatic heterocyclic ring; wherein,
- the polymer contains 100% of the repeating units, has a weight average molecular weight of not less than 10,000, is soluble in water or a water-containing organic solvent, and is solid at room temperature;
- exposing the coated object pattern-wise to ionizing radiation; and
- dissolving the coating and developing the resist film to form a pattern on the object.
Priority Claims (1)
Number |
Date |
Country |
Kind |
6-246511 |
Oct 1994 |
JPX |
|
Parent Case Info
This application is a continuation of application Ser. No. 08/542,193 filed Oct. 12, 1995, now abandoned.
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Continuations (1)
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Number |
Date |
Country |
Parent |
542193 |
Oct 1995 |
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