Patent Application
20230261062
The disclosure relates to semiconductor device and integrated circuit fabrication and, in particular, to structures with an isolation region and fabrication methods for a structure having an isolation region.
Charge generation caused by a particle, such as a heavy ion, a high energy proton, or a high energy photon, may manifest itself as a single event transient or a single event upset in the electrical terminals of devices and integrated circuits operating under extreme radiation environments. A single event transient may produce a transient voltage glitch. A single event upset may cause a sequential state element to store the wrong state. The transient interaction results in the generation of electron-hole pairs along the track of the transiting particle through ionization processes.
Improved structures with an isolation region and fabrication methods for a structure having an isolation region are needed.
In an embodiment of the invention, a structure includes a semiconductor substrate, a first isolation region surrounding a portion of the semiconductor substrate, a device in the portion of the semiconductor substrate, and a second isolation region surrounding the first isolation region and the portion of the semiconductor substrate.
In an embodiment of the invention, a structure includes a semiconductor substrate having a first surface and a second surface opposite to the first surface, a first isolation region surrounding a portion of the semiconductor substrate, and a device in the portion of the semiconductor substrate. The first isolation region extends from the first surface into the semiconductor substrate. The structure further includes a second isolation region including a plurality of conductive fingers extending from the second surface into the semiconductor substrate.
In an embodiment of the invention, a method includes forming a first isolation region surrounding a portion of a semiconductor substrate, forming a device in the portion of the semiconductor substrate, and forming a second isolation region surrounding the first isolation region and the portion of the semiconductor substrate.
The accompanying drawings, which are incorporated in and constitute a part of this specification, illustrate various embodiments of the invention and, together with a general description of the invention given above and the detailed description of the embodiments given below, serve to explain the embodiments of the invention. In the drawings, like reference numerals refer to like features in the various views.
With reference to
A trench 18 is formed as an opening with a sidewall that penetrates into the semiconductor substrate 10 to a bottom at a given depth D1 relative to a front surface 11 of the semiconductor substrate 10. In an embodiment, the depth D1 of the trench 18 may be within a range of about two (2) microns to about six (6) microns. The trench 18 fully surrounds a portion of the semiconductor substrate 10 in which a device is subsequently formed.
The trench 18 may be patterned by lithography and etching processes. To that end, an etch mask may be formed by a lithography process over the semiconductor substrate 10. The etch mask may include a layer of photoresist that is applied by a spin-coating process, pre-baked, exposed to light projected through a photomask, baked after exposure, and developed with a chemical developer to define an opening at the intended location for the subsequently-etched trench 18. An etching process is used to form the trench 18 at the location of the opening in the etch mask, and the etch mask may be stripped by, for example, ashing after the trench 18 is formed.
A dielectric liner 20 is formed on the sidewall and bottom of the trench 18. The dielectric liner 20 may be comprised of a dielectric material, such as silicon dioxide, and the dielectric liner 20 may have a conformal thickness. A conductor layer 22 is formed inside the trench 18 as a core that is interior of the dielectric liner 20. The conductor layer 22 may be comprised of a metal, such as tungsten or copper, that is deposited and planarized by chemical-mechanical polishing. The conductor layer 22 is electrically isolated by the dielectric liner 20 from the semiconductor substrate 10. The dielectric liner 20 and conductor layer 22 that are positioned in the trench 18 collectively define a deep trench isolation region 24.
A trench 26 is formed as an opening with a sidewall that penetrates into the semiconductor substrate 10 to a bottom at a given depth D2 relative to the front surface 11 of the semiconductor substrate 10. In an embodiment, the depth D2 of the trench 26 is greater than the depth D1 of the trench 18. In an embodiment, the depth D2 of the trench 26 may be within a range of about four (4) microns to about ten (10) microns. The trench 26 fully surrounds the deep trench isolation region 24, as well as the portion of the semiconductor substrate 10 surrounded by the deep trench isolation region 24.
The trench 26 may be patterned by lithography and etching processes. To that end, an etch mask may be formed by a lithography process over the semiconductor substrate 10. The etch mask may include a layer of photoresist that is applied by a spin-coating process, pre-baked, exposed to light projected through a photomask, baked after exposure, and developed with a chemical developer to define an opening at the intended location for the subsequently-etched trench 26. An etching process is used to form the trench 26 at the location of the opening in the etch mask, and the etch mask may be stripped by, for example, ashing after the trench 26 is formed.
A conductor layer 28 is formed inside the trench 26. In an embodiment, the conductor layer 28 may be comprised of a doped semiconductor material that is deposited and planarized by chemical-mechanical polishing. In an embodiment, the conductor layer 28 may be comprised of polycrystalline silicon (i.e., polysilicon) doped with an n-type dopant, such as phosphorus and/or arsenic, to provide n-type conductivity. In an embodiment, the conductor layer 28 may be comprised of polycrystalline silicon that is heavily doped (e.g., a dopant concentration greater than or equal to 1×1018 cm−3) with an n-type dopant. In an embodiment, an n-type dopant may be favored over a p-type dopant because of an ability to apply a higher voltage if the conductor layer 28 is biased. In an alternative embodiment, the conductor layer 28 may be comprised of a metal, such as tungsten or copper.
The conductor layer 28 positioned in the trench 26 defines an isolation region 30. In contrast to the deep trench isolation region 24, the isolation region 30 lacks a dielectric liner between the semiconductor substrate 10 surrounding the trench 26 and the conductor layer 28. Instead, the conductor layer 28 is in direct contact with the semiconductor substrate 10 at the sidewall and bottom of the trench 26.
With reference to
Middle-of-line processing and back-end-of-line processing follow, which includes formation of contacts, vias, and wiring for an interconnect structure coupled with the device 32. The interconnect structure may include a dielectric layer 42 comprised of a dielectric material, such as silicon dioxide, deposited by chemical vapor deposition and planarized. Contacts 44 are physically and electrically connected to a collector contact region that is coupled by the subcollector 40 with the collector 38, the base layer 36, and the emitter 34. Contacts 46 are physically and electrically connected to the conductor layer 28 of the isolation region 30. The connection to the isolation region 30 is provided at the front surface 11 of the semiconductor substrate 10. Contacts 44, 46 may be formed by patterning contact openings formed in the dielectric layer 42 with a lithography and etching process, followed by filling the contact openings with a conductor, such as tungsten.
The conductor layer 28 of the isolation region 30 may be coupled to a power supply and biased via the contacts 46. In that situation, the conductor layer 28 and the semiconductor substrate 10 of opposite conductivity type may define a reverse-biased p-n junction. Alternatively, the conductor layer 28 of the isolation region 30 may be coupled to ground and thereby grounded via the contacts 46. The deep trench isolation region 24 is not contacted by the contacts 44, 46. The isolation region 30 is also not contacted from the back surface 13 of the semiconductor substrate 10.
The isolation region 30 is capable of mitigating the adverse effects of charge generation in the semiconductor substate 10 caused by a particle, such as a heavy ion or a high energy photon, upon the device 32. As a result, the isolation region 30 may be effective to alleviate the occurrence of a single event transient or a single event upset. The isolation region 30 may collect and remove electron-hole pairs generated along the track of the particle by ionization processes.
With reference to
With reference to
With reference to
The fingers 52 may terminate in the semiconductor substrate 10 between the device 32 and the back surface 13. The fingers 52 may be fully positioned in a vertical direction between the deep trench isolation region 24 and the back surface 13. The portion of the semiconductor substrate 10 that includes the device 32 overlaps with at least some of the fingers 52. The fingers 52 extend longitudinally from the back surface 13 and the connector 58 at the back surface 13 toward the front surface 11.
The fingers 52 may be formed in openings 54 extending from the back surface 13 into the semiconductor substrate 10. The openings 54 may be patterned by deep reactive ion etching or laser drilling, and then filled by a conductor to form the fingers 52. In an embodiment, the conductor structure 50 may be comprised of polycrystalline silicon (i.e., polysilicon) doped with an n-type dopant, such as phosphorus and/or arsenic, that provides n-type conductivity. In an embodiment, the conductor structure 50 may be comprised of polycrystalline silicon (i.e., polysilicon) that is heavily doped (e.g., a dopant concentration greater than or equal to 1×1018 cm−3) with an n-type dopant. In an alternative embodiment, the fingers 52 may be comprised of a metal, such as tungsten or copper.
With reference to
The methods as described above are used in the fabrication of integrated circuit chips. The resulting integrated circuit chips can be distributed by the fabricator in raw wafer form (e.g., as a single wafer that has multiple unpackaged chips), as a bare die, or in a packaged form. The chip may be integrated with other chips, discrete circuit elements, and/or other signal processing devices as part of either an intermediate product or an end product. The end product can be any product that includes integrated circuit chips, such as computer products having a central processor or smartphones.
References herein to terms modified by language of approximation, such as “about”, “approximately”, and “substantially”, are not to be limited to the precise value specified. The language of approximation may correspond to the precision of an instrument used to measure the value and, unless otherwise dependent on the precision of the instrument, may indicate a range of +/−10% of the stated value(s).
References herein to terms such as “vertical”, “horizontal”, etc. are made by way of example, and not by way of limitation, to establish a frame of reference. The term “horizontal” as used herein is defined as a plane parallel to a conventional plane of a semiconductor substrate, regardless of its actual three-dimensional spatial orientation. The terms “vertical” and “normal” refer to a direction perpendicular to the horizontal, as just defined. The term “lateral” refers to a direction within the horizontal plane.
A feature “connected” or “coupled” to or with another feature may be directly connected or coupled to or with the other feature or, instead, one or more intervening features may be present. A feature may be “directly connected” or “directly coupled” to or with another feature if intervening features are absent. A feature may be “indirectly connected” or “indirectly coupled” to or with another feature if at least one intervening feature is present. A feature “on” or “contacting” another feature may be directly on or in direct contact with the other feature or, instead, one or more intervening features may be present. A feature may be “directly on” or in “direct contact” with another feature if intervening features are absent. A feature may be “indirectly on” or in “indirect contact” with another feature if at least one intervening feature is present. Different features may “overlap” if a feature extends over, and covers a part of, another feature with either direct contact or indirect contact.
The descriptions of the various embodiments of the present invention have been presented for purposes of illustration but are not intended to be exhaustive or limited to the embodiments disclosed. Many modifications and variations will be apparent to those of ordinary skill in the art without departing from the scope and spirit of the described embodiments. The terminology used herein was chosen to best explain the principles of the embodiments, the practical application or technical improvement over technologies found in the marketplace, or to enable others of ordinary skill in the art to understand the embodiments disclosed herein.
