The present disclosure relates generally to plasma equipment and methods, and more specifically to a magnetic field enhanced plasma.
U.S. Patent Publication No. 2016/0322174, entitled “Method for Plasma Activation of Biochar Material” and co-invented by the present inventor Q. Fan, discloses a method to activate biochar by use of radio frequency (“RF”) power to create a plasma. This patent publication is incorporated by reference herein. While this '174 Fan patent publication is a significant advance in the industry, further processing efficiencies are now desirable.
Plasma arc torches using a magnetic field are also known although entirely unrelated to activating biochar; for example, U.S. Patent Publication No. 2015/0041454, entitled “Plasma Whirl Reactor Apparatus and Methods of Use” which published to Foret on Feb. 12, 2015, and is incorporated by reference herein. This '454 Foret patent publication relates to use of a plasma torch to treat water flowback produced from hydraulic fracturing in oil fields. It is noteworthy that this conventional plasma arc torch operates at an extremely high temperature. While this conventional whirl reactor could theoretically be used for pyrolysis or making biochar from a biomass, it is unlikely suitable for activating biochar in large-scale mass production.
In accordance with the present invention, a method, system and equipment for activating biochar includes flowing a reactive gas into a chamber, using an electrical field to create a plasma in the chamber, using a magnetic field to increase density of the plasma and activating biochar with the plasma in the chamber. Use of inductive magnetic coil(s) with an essentially closed loop magnetic field, and/or a permanent magnet(s) are also provided in a further aspect of the present method and apparatus. Another aspect causes magnetic densification of one or multiple plasma(s) in a chamber to treat a previously produced layer of a thin film.
The present method and system are advantageous over prior devices. For example and not by way of limitation, the present method and system are capable of much faster biochar activation and therefore, require less expensive vacuum systems and manufacturing costs. It is expected that at least twice and more preferably, at least six times more dense and intense plasma will be created with the present method, system and equipment as compared to that in the '174 Fan patent publication, which leads to significantly greater ion energy, which allows for doping biochar to promote electrical conductivity or activation in a smaller longitudinal space, the use of larger but lower cost vacuum systems, and/or more efficient production throughput for biochar activation and film treatment.
The present method and system advantageously achieve greater plasma density at a lower pressure. Plasma pressure is preferably less than or equal to 100 milliTorr for a permanent magnet construction which is less than in prior devices not employing a magnetic field. The present lower pressure is advantageous since reactive ions in the plasma will have less collision interaction with other particles before activating biochar, thereby reducing energy loss and preserving their kinetic energy, and enabling better control of the properties and microstructures of the processed materials. Additional advantages and features will be disclosed in the following description and claims as well as in the appended drawings.
Referring to
A first embodiment of a magnetic field enhanced plasma equipment system 31 is illustrated in
A gas supply cylinder or tank 55 is coupled to an end of vacuum chamber 33, a vacuum meter 57 is coupled adjacent thereto, and a vacuum pump 59 is coupled to an opposite end of vacuum chamber 33. A reactive gas or mixture of such reactive gases flows from gas tank 55 into vacuum chamber 33 at a vacuum pressure lower than nominal ambient atmospheric pressure at sea level. Examples of such reactive gasses include oxygen, hydrogen, nitrogen, argon or other inert gases, or mixtures thereof, optionally including carbon, silane or metalorganic gases. Oxygen is preferably employed. It is noteworthy that low gas pressures are employed, preferably one milliTorr to one Torr, by way of nonlimiting example. Preferably a primary or majority direction of an RF field 71 generated between cathode 51 and anode 53 of electrodes 37, is oriented in a lateral or transverse direction (also denoted as 71) which is generally perpendicular to a longitudinal direction 73 (which is also a movement direction of conveyor 54). Plasma 75 is generated between the electrodes by the RF electrical field acting upon the reactive gas using an excitation power of at least 50 watts, with a radio frequency of preferably 13.56 MHz.
A pre-heater 77 is optionally employed to heat biochar 29 above room temperature but less than 500° C. Pre-heater 77 may be adjacent vacuum chamber 33 or remote therefrom. The creation of plasma 75 creates highly reactive ions 79 that directly contact against the workpiece specimen for etching, surface treatment and/or activation thereof, especially for biochar specimen 29. Furthermore, increasing ion energy can lead to doping to enhance electrical conductivity of the biochar.
A set of static and permanent magnets 101 are coupled or mounted adjacent to an external surface of vacuum chamber 33 in a longitudinally spaced apart manner. Alternately, magnets 101 may be mounted outside of the internal vacuum cavity but inside an optional protective exterior housing defining the chamber equipment. Each permanent magnet 101 is preferably of a large ring or annular shape with a central opening 103 therethrough. An exemplary permanent magnet material is NdFeB, grade MGO 42, with a central axial direction essentially aligned with longitudinal direction 73. Magnetic field 105 flows from one magnet to the other, a majority of which is generally aligned with longitudinal direction 73, albeit in a slightly curved or arcuate path therebetween. In this embodiment, magnetic field 105 primarily flows in a direction perpendicular to a primary majority direction of RF electrical field 71, and certainly in an offset angular direction therefrom. This magnetic field beneficially confines high energy electrons 79 from escaping to electrodes 37. With this magnetic field enhanced plasma process and equipment, the plasma density is advantageously increased at least six times greater than without use of magnetic fields. Furthermore, the magnetic field strength with permanent magnets 101 is preferably 50-4,000 Gauss, and more preferably 100-2,000 Gauss, and even more preferably 200-2,000 Gauss. The present magnetically densified plasma beneficially speeds up the biochar activation process and therefore allows for use of a smaller sized and less expensive production vacuum chamber as compared to without use of the permanent magnets.
Reference should now be made to
The present specific induction coil configuration provides a closed loop magnetic field directional path between ends 133 of each set of coils 131. Distal ends 133 of coils 131 are connected to an AC or DC power supply via lines 134. Coils 131 are also preferably grounded such that there is essentially no potential difference at the ends of coils 131 which assists in avoiding plasma etching of window 121. This closed loop magnetic field functionality advantageously reduces magnetic field leakage and subsequent eddy currents in the metallic chamber wall. The present induction magnetic field plasma system and method create much higher density plasma at lower vacuum pressures but also allow for vacuum chamber scalability to larger internal working areas (e.g., one meter wide) which are otherwise difficult to achieve in a cost effective manner. For example, this induction magnetically enhanced plasma embodiment is expected to achieve a plasma density in the vacuum chamber of at least 1012 cm−3, which is more than two orders of magnitude greater than the system of FIG. 2b in U.S. Patent Publication No. 2016/0322174. The induction magnetic coils generate a magnetic field strength of approximately 20-4000 Gauss.
The permanent magnet and induction coil magnet embodiments of the present magnetic field enhanced plasma discussed herein modify the specimen (e.g., biochar) by the plasma that is excited by combined electric and magnetic fields, which are primarily perpendicular to each other in the reaction area inside the vacuum chamber. The plasma of both of these embodiments is generated using at least one reactive or process gas under pressures below one Torr that leads to a mean or average free path of the plasma species equivalent or comparable to a distance between the specimen and the closest interior point of the vacuum chamber.
Various exemplary uses of activated biochar 29 will now be discussed with regard to either embodiment of the magnetic field enhanced plasma equipment previously discussed herein.
Referring now to
Brackish or salt water flows in through inlet 183, travels through a central internal opening 185 of the biochar coated electrodes, and out of a potable and desalinated water outlet 185. Water desalination can be driven by a low voltage, preferably less than 2 volts, generated from power source or cell 179, such as solar panels. The stored charge can be released as electrical energy from collectors 177. Furthermore, it is expected that the magnetic field enhanced plasma-treated biochar should provide at least two times greater electro-sorption capacity as compared to conventional devices that do not employ plasma treatment of biochar.
Reference should now be made to
An example of thin film 303 is zinc oxide which is a suitable material for various optoelectronic components since it is a direct and wide band gap semi-conductor. These optoelectronic applications, however, require tuning and controlling of the electrical and optical properties of zinc oxide films 303. The exemplary zinc oxide thin film is prepared by a solution method that leads to oriented crystal growth along its elongated longitudinal plane. The zinc oxide film is sequentially treated with oxygen, hydrogen and then nitrogen plasmas 351 by electrodes 309 creating the plasmas within vacuum chamber 305 by the RF electrical interaction with the reactive gases from tanks 337, 339 and 341, which are advantageously simultaneously densified by the magnetic field from magnets 317. The oxygen plasma treatment improves the crystallinity of the film without affecting the film's transmittance. The hydrogen plasma treatment is effective in improving the electrical conductivity but sacrificing the film's transmittance. Furthermore, the nitrogen plasma treatment improves electrical conductivity without compromising the optical transmittance of the film. It is envisioned that sequential oxygen, hydrogen and nitrogen plasma treatments will significantly reduce the resistivity of zinc oxide thin films by over two orders of magnitude and maintain the transmittance close to the as-deposited initially manufactured films in the invisible wavelength range.
Zinc oxide thin film is initially grown or manufactured by chemical vapor deposition, RF magnetron sputtering, epitaxy, pulse laser deposition, sol-gel method, or metal organic chemical vapor deposition. The film is initially manufactured on a glass substrate. Without subsequent treatment, however, it suffers from relatively poor electrical conductivity due to the high density of carrier traps and potential barriers at the grain boundaries. It is noteworthy that the use of oxygen in the magnetic field enhanced plasma process not only improves the crystallinity but also repairs dangling bonds at grain boundaries in the film. The film thickness is preferably greater than 5 nm and less than 1,000 nm upon the glass substrate.
The RF power source frequency is preferably maintained at 13.56 MHz. More specifically, tank 337 contains oxygen, tank 339 contains hydrogen and tank 341 contains nitrogen, and the gases are introduced into vacuum chamber 305 at no more than two Torr. The oxygen and nitrogen plasmas interact with or modify the film within the vacuum chamber for approximately 20 minutes or less, each, and the hydrogen plasma interacts or modifies the film for a range between 30 seconds and 2 minutes, inclusive. Thus, the total plasma treating time is no more than 60 minutes. The pressures and densities of the three types of plasmas are preferably the same. Optionally, the film is heated prior to introduction of the plasmas. Use of the three different reactive gases and associated plasmas are advantageous as contrasted to use of only one or two of the noted gases and advantageous over a different ordering of such. Again, the present magnetic field enhanced plasma is employed in a post-manufacturing film process or subsequent tuning/modification of the already formed film which is longitudinally moved through the vacuum chamber.
Various embodiments of the present magnetic field enhanced plasma process, system and method have been described although other variations may be made. For example, the induction magnetic construction can be employed with the film treatment process. Furthermore, it is alternately envisioned that multiple reactive gas and plasmas, such as three used with the film treatment process, can be employed with any of the biochar embodiments although such may not be as advantageous. Moreover, other films or specimens can be activated or treated within the magnetic field enhanced plasma processes and equipment disclosed herein, although certain of the present advantages may not be fully realized. Moreover, specimen etching and doping may be performed with the present magnetic field enhanced plasma process or equipment. Specific permanent and inductive magnetic members have been described and shown but other shapes and types may be provided although certain benefits may not be achieved. Another alternate construction places the biochar or other specimen at a bottom of the vacuum chamber, the gas is vertically entering the chamber, and the plasma flows in a downward direction before it is magnetically enhanced while modifying the specimen. Moreover, an air purification electrode is essentially of the same construction as that shown for the water desalination electrodes. Any and/or all of the structural components or functions of any of the previously described embodiments may be mixed and matched and interchanged with any of the other embodiments. Any and/or all of the claims may be multiply dependent upon each other in any combination. It is intended by the following claims to cover these and any other departures from the disclosed embodiments which fall within the true spirit of this invention.
This application claims the benefit of U.S. Provisional Application No. 62/448,009, filed on Jan. 19, 2017. The entire disclosure of the above application is incorporated by reference herein.
This invention was made with government support under 1536209 awarded by the National Science Foundation. The government has certain rights in the invention.
Filing Document | Filing Date | Country | Kind |
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PCT/US2018/014034 | 1/17/2018 | WO | 00 |
Number | Date | Country | |
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62448009 | Jan 2017 | US |