Although the conventional transducer 10 functions, there are drawbacks. In particular, the read sensor 20 may be subject to noise. For example, there may be instabilities in the orientation of the pinned layer magnetic moment with respect to the free layer magnetic moment. The conventional read sensor 20 may not thus adequately read high density media.
The read transducer 110 includes a read sensor 120 and may include soft magnetic shields 112 and 114. The shields 112 and 114 may be formed of NiFe or another soft magnetic material. The read transducer 110 may also include insulating layer 116 and magnetic bias structures 118. The insulating layer 116 separates the magnetic bias structures 118 from the read sensor 120 and, in the embodiment shown, from the shield 112. The magnetic bias structures 118 may be soft magnetic bias structures, hard magnetic bias structures and/or other magnetic bias structures. In other embodiments, other structures may be included and/or structures 112, 114, 116 and/or 118 may be omitted.
The read sensor 120 includes at least a pinning layer 130, a nonmagnetic insertion layer 140 and a pinned layer 150. In the embodiment shown, the read sensor 120 also includes a nonmagnetic spacer layer 160 and a free layer 170. The nonmagnetic spacer layer may be a conductor, such as Cu, or an insulating tunneling barrier layer, such as crystalline MgO. Thus, the sensor 120 may be a GMR sensor or a TMR sensor.
The pinning layer 130 is used to fix, or pin, the magnetic moment of the pinned layer 150. The pinning layer 130 may thus be an antiferromagnetic (AFM) layer 130. For example, the pinning layer 130 might be an IrMn layer, a PtMn layer, an FeMn layer or an analogous structure. The pinned layer 150 is ferromagnetic and may include sublayers that are magnetic and/or nonmagnetic. Note that in some embodiments, a nonmagnetic layer (not shown) and a ferromagnetic layer (not shown) may be between the pinned layer 150 and the nonmagnetic spacer layer 160. In some such embodiments, the magnetic moments of the pinned layer 150 and the additional ferromagnetic layer may be antiferromagnetically coupled through the nonmagnetic layer. Thus, the pinned layer 150 may be part of a structure such as a synthetic antiferromagnetic (SAF) structure.
The nonmagnetic insertion layer 140 has a location selected from a first location and a second location. The first location, shown in the embodiment depicted in
The nonmagnetic insertion layer 140 is configured to affect the magnetic coupling between the pinning layer 130 and the pinned layer 150. This effect may be seen in
As can be seen in
The ratio of the exchange field to the coercivity (Hex/Hcp) may be considered both a measure of the strength and stability of the magnetic coupling between the pinning layer 130 and the pinned layer 150 and a measure of the fraction of unstable grains in the pinning layer 130. As can be seen in the graph 210 of
It is believed that the nonmagnetic insertion layer 140 operates in the following manner. However, the benefits and use of the magnetic devices described herein are independent of a particular physical mechanism. Because the nonmagnetic insertion layer 140 is thin and may be made of particular materials, it is believed that the materials in the nonmagnetic insertion layer 140 migrate to the grain boundaries of the grains of the pinning layer 140 during fabrication. Thus, although depicted as a single layer, the nonmagnetic insertion layer 140 may be discontinuous or reside only in certain areas (e.g. grain boundaries at and near the interface of the pinning layer 130. The presence of the nonmagnetic insertion layer 140 at the grain boundaries of smaller, less stable grains may decouple these grains from the pinned layer 150. Thus, if the magnetic moment of the pinned layer 150 switches direction, the less stable grains of the pinning layer 130 may be less likely to change direction. Thus, these less stable grains are thus less likely to provide a magnetic bias in a direction opposite to the desired direction of magnetization. The pinned layer 150 magnetic moment may more readily return to the desired direction. The coercivity of the pinned layer 150 may thus be reduced. The stability of the magnetic moment of the pinned layer 150 may be enhanced. Stated differently, the coupling between the pinning layer 130 and the pinned layer 150 that pins the magnetic moment of the pinned layer 150 in the desired direction may be improved.
Regardless of the physical mechanism, the ratio of the exchange field and the coercivity may be improved. Consequently, the stability of the coupling between the pinned layer 150 and the pinning layer 130 may be enhanced. Noise due to instabilities in the magnetic moment of the pinned layer 130 may thus be removed. Performance of the magnetic device may thereby be improved.
In the embodiment shown in
The read sensor 120′ shares the benefits of the read sensor 120. The use of the nonmagnetic insertion layer 140′ may allow for a maximum in the Hex/Hcp for nonzero thicknesses of the nonmagnetic insertion layer 140′. Thus, the coupling between the pinning layer 130 and pinned layer 150 may be improved. The improved stability in the coupling between the pinned layer 150 and the pinning layer 130 may reduce noise during operation of the read sensor 120′.
In the embodiment shown in
The read sensor 120″ shares the benefits of the read sensor(s) 120/120′. The use of the nonmagnetic insertion layer 140/140′ may allow for a maximum in the Hex/Hcp for nonzero thicknesses of the nonmagnetic insertion layer 140/140′. Thus, the coupling between the pinning layer 130 and pinned layer 150 may be improved. The improved stability in the coupling between the pinned layer 150 and the pinning layer 130 may reduce noise during operation of the read sensor 120″.
Thus, the components 120′″, 130′, 140/140′, 150, 160, 170, 180, and 170 have a similar structure and function to the components 120/120′/120″, 130, 140/140′, 150, 160 and 170, respectively, depicted in
In the embodiment shown in
The read sensor 120′″ shares the benefits of the read sensor(s) 120/120′/120′. The use of the nonmagnetic insertion layer 140/140′ may allow for a maximum in the Hex/Hcp for nonzero thicknesses of the nonmagnetic insertion layer 140/140′. Thus, the coupling between the pinning layer 130′ and pinned layer 150 may be improved. The improved stability in the coupling between the pinned layer 150 and the pinning layer 130′ may reduce noise during operation of the read sensor 120″.
The read sensors 120, 120′, 120″ and 120′″ have been shown in various configurations to highlight particular features, such as differences in geometries. One of ordinary skill in the art will readily recognize that two or more of these features may be combined in various manners consistent with the method and system described herein that are not explicitly depicted in the drawings.
The bottom shield 112 is provided, via step 302. Step 302 may include depositing a magnetic material, such as NiFe and patterning the shield.
The read sensor 120 is provided, via step 304. Step 304 may include depositing a stack of layers for the read sensor 120 and defining the read sensor in the cross-track and stripe height directions. Further, the nonmagnetic insertion layer 140 is provided in the first or second location. Thus, the nonmagnetic insertion layer 140 may be placed between the pinned layer 150 and the pinning layer 140 or may be placed within the AFM. Thus, the read sensor 120, 120′, 120″ or 120′″ may be provided.
The side bias structures 118 are provided, via step 306. Step 306 is performed after the read sensor 120 is defined in the cross-track direction. Thus, at least part of step 304 is performed before step 306. Step 306 may include depositing the insulating layer 116, depositing the material(s) for the magnetic bias structures 118 and depositing a top nonmagnetic layer. A mill step and planarization, such as a chemical mechanical planarization (CMP) may also be performed.
The top shield 114 is provided, via step 308. Step 208 may include depositing, planarizing and patterning soft magnetic layer, such as a NiFe layer.
Using the method 300, the transducer 110 and the read sensor 120, 120′, 120″ and/or 120′″ may be fabricated. Thus, the benefits of one or more of the read sensor 120, 120′, 120″ and/or 120′″ may be achieved. Consequently, performance of the magnetic recording apparatus may be improved.
The pinning layer 130/130′ is deposited, via step 312. Step 312 may include heating the substrate such that the materials for the pinning layer are deposited above the ambient temperature. For example, the IrMn or other AFM used for the pinning layer 130/130′ may be deposited above room temperature.
The nonmagnetic insertion layer 140/140′ is provided via step 314. Step 314 may include controlling the temperature of the substrate. Thus, the substrate may be heated such that the material(s) for the nonmagnetic insertion layer are deposited at a temperature above the ambient temperature. For example, the nonmagnetic insertion layer 140/140′ may be sputtered above room temperature. In such embodiments, the atoms for the nonmagnetic insertion layer 140/140′ may be more mobile. These atoms may more readily migrate, for example to grain boundaries of the pinning layer 130/130′. In other embodiments, step 314 may include cooling the substrate such that the nonmagnetic insertion layer 140/140′ is deposited at temperatures below the ambient temperature. For example, the substrate may be cooled (e.g. via water cooling, liquid nitrogen cooling or physical connection to another heat sink) below the ambient temperature during deposition. For example, the material(s) for the nonmagnetic insertion layer 140/140′ may be sputtered below room temperature. In such embodiments, the atoms for the nonmagnetic insertion layer may be less likely to migrate. In other embodiments, no attempt may be made to control the temperature of the substrate during deposition. Further, if the pinning layer 130′ is used, then steps 312 and 314 are interleaved such that the nonmagnetic insertion layer 140/140′ is deposited within the pinning layer 130′.
The pinned layer 150 is deposited, via step 316. Step 316 may include depositing multiple ferromagnetic layers. Nonmagnetic layer(s) may also be provided within the pinned layer. In some embodiments, the nonmagnetic layer 180 and reference layer 190 are deposited in steps 320 and 322, respectively.
The nonmagnetic spacer layer 160 is deposited, via step 322. For example, a conductive layer or tunneling barrier layer may be provided in step 322. The free layer 170 is deposited, via step 324. Step 324 may include depositing multiple ferromagnetic layers. Nonmagnetic layer(s) may also be provided within the free layer 170.
The edges of the read sensor 120, 120′, 120″ and/or 120′″ are defined, via step 324. Step 324 may include providing a mask on the read sensor stack deposited in the previous steps and ion milling the exposed regions. The read sensor 120, 120′, 120″ and/or 120′″ may be defined in the cross-track and stripe height (perpendicular to the ABS) directions. Fabrication of the read sensor may then be completed. For example, anneals, capping layer depositing, and/or other processing steps may be performed.
Using the method 310, the read sensor(s) 120, 120′, 120″ and/or 120′″ may be fabricated. Thus, the benefits of one or more of the read sensor(s) 120, 120′, 120″ and/or 120′″ may be achieved.
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