This is a divisional of application of application Ser. No. 08/303,276 filed on Sep. 8, 1994, which is a continuation of application Ser. No. 08/004,023 filed on Jan. 15, 1993, now abandoned, in the name of J. D. Westwood.
Number | Name | Date | Kind |
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4639806 | Kira et al. | Jan 1987 | |
4671828 | Yamauchi et al. | Jun 1987 | |
4683012 | Yamauchi et al. | Jul 1987 | |
4707417 | Hayakawa et al. | Nov 1987 | |
4780779 | Pisharody et al. | Oct 1988 | |
4897318 | Sakakima et al. | Jan 1990 | |
4918554 | Bajorek et al. | Apr 1990 | |
4945397 | Schuetz | Jul 1990 | |
5020212 | Michijima et al. | Jun 1991 | |
5103553 | Mallary | Apr 1992 | |
5147732 | Shiroishi et al. | Sep 1992 | |
5231555 | Itoh et al. | Jul 1993 |
Number | Date | Country |
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3203008 | Sep 1991 | JPX |
Entry |
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M. Takahashi et al., "Magnetostriction of Fe-Al-Si Alloy Sputtered Films", IEEE Trans. on Magnetics, vol. MAG-23, No. 5, Sep. 1987, pp. 3068-3070. |
M. Takahashi, et al., "Magnetic Properties of Fe-Si-Al Sputtered Films", IEEE Trans. Journal on Magnetics In Japan, vol. 3, No. 2, Feb. 1988, pp. 180-186. |
M. Takahashi et al., "Local Anistropy Fluctuation on the Permeability of Sputtered Sendust Alloy Films", IEEE Trans. Journal On Magnetics in Japan, vol. 4, No. 10, Oct. 1989, pp. 598-607. |
T. Kumura et al., "Properties of Fe-Ai-Si-N thin films prepared by N2 reactive sputtering", J. App. Physics, vol. 61, No. 8, Apr. 1987, pp. 3844-3846. |
Number | Date | Country | |
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Parent | 303276 | Sep 1994 |
Number | Date | Country | |
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Parent | 04023 | Jan 1993 |