Magnetoresistance device including diffusion barrier layer

Abstract

A magnetoresistance device that has a substrate, an underlayer, a magnetoresistance structure, and a diffusion barrier layer is provided. The underlayer is formed on top of the substrate. The magnetoresistance structure is formed on top of the underlayer. The diffusion barrier layer is formed between the underlayer and the magnetoresistance structure.

Description

BRIEF DESCRIPTION OF THE DRAWINGS

The above and other aspects of the present invention will become more apparent by describing in detail exemplary embodiments thereof with reference to the attached drawings, in which:

FIG. 1 is a schematic sectional view of a related art magnetoresistance device;

FIG. 2 is a schematic sectional view of a magnetoresistance device according to an exemplary embodiment of the present invention;

FIG. 3A is a sectional view of a magnetoresistance device applied to a GMR configuration according to an exemplary embodiment of the present invention;

FIG. 3B is a sectional view of a magnetoresistance device applied to a TMR configuration according to an exemplary embodiment of the present invention;

FIG. 4A is a graph illustrating an M-H characteristic when a magnetoresistance device without a diffusion barrier layer is in an as-depo state;

FIG. 4B is a graph illustrating an M-H characteristic when a magnetoresistance device without a diffusion barrier layer is formed and then heated at a temperature of 600° C. for 32.5 seconds;

FIG. 5A is a graph illustrating an M-H characteristic when a magnetoresistance device according to an exemplary embodiment of the present invention is in an as-depo stage;

FIG. 5B is a graph illustrating an M-H characteristic when a magnetoresistance device according to an exemplary embodiment of the present invention is heated at a temperature of 600° C. for 32.5 seconds;

FIG. 6A is a graph illustrating results of component distribution as measured by a Secondary Ion Mass Spectroscopy (SIMS) after a related art perpendicular magnetic recording medium without a diffusion barrier layer is formed and then heat-treated at a temperature of 600° C.; and

FIG. 6B is a graph illustrating results of component distribution as measured by an SIMS after a perpendicular magnetic recording medium including a diffusion barrier layer according to an exemplary embodiment of the present invention is formed and then heat-treated at a temperature of 600° C.

Claims

1. A magnetoresistance device comprising: a substrate;an underlayer formed on a top of the substrate; anda magnetoresistance structure formed on a top of the underlayer,wherein the magnetoresistance device comprises a diffusion barrier layer formed between the underlayer and the magnetoresistance structure.

2. The magnetoresistance device of claim 1, wherein the diffusion barrier layer is formed of Ru.

3. The magnetoresistance device of claim 2, wherein the magnetoresistance structure comprises: an anti-ferromagnetic layer;a first ferromagnetic layer formed on a top of the anti-ferromagnetic layer, and having a magnetization direction pinned by the anti-ferromagnetic layer;a non-magnetic spacer layer formed on a top of the first ferromagnetic layer; anda second ferromagnetic layer formed on a top of the spacer layer, and having a changeable magnetization direction.

4. The magnetoresistance device of claim 2, wherein the magnetoresistance structure comprises: an anti-ferromagnetic layer;a first ferromagnetic layer formed on a top of the anti-ferromagnetic layer, and having a magnetization direction pinned by the anti-ferromagnetic layer;a tunneling barrier layer formed on a top of the first ferromagnetic layer; anda second ferromagnetic layer formed on a top of the tunneling barrier layer, and having a changeable magnetization direction through an application of a magnetic field.

5. The magnetoresistance device of claim 2, wherein the underlayer comprises one of a seed layer and a multi-layer comprising a seed layer and a buffer layer.

6. The magnetoresistance device of claim 1, wherein the magnetoresistance device is one of a magnetic recording head and a memory device.

7. The magnetoresistance device of claim 6, wherein the magnetoresistance structure is one of a sensor and a memory where the magnetoresistance device is one of a magnetic recording head and a memory device, respectively.

8. The magnetoresistance device of claim 1, wherein the diffusion barrier layer is adapted to prevent diffusion of a transition metal forming one of the underlayer and the magnetoresistance structure.

9. The magnetoresistance device of claim 8, wherein the transition material is at least one of Mn, Fe, Co and Ni.

10. The magnetoresistance device of claim 1, wherein the magnetoresistance structure comprises: an anti-ferromagnetic layer;a first ferromagnetic layer formed on a top of the anti-ferromagnetic layer, and having a magnetization direction pinned by the anti-ferromagnetic layer;a non-magnetic spacer layer formed on a top of the first ferromagnetic layer; anda second ferromagnetic layer formed on a top of the spacer layer, and having a changeable magnetization direction.

11. The magnetoresistance device of claim 10, wherein the anti-ferromagnetic layer is formed of an alloy comprising Mn.

12. The magnetoresistance device of claim 1, wherein the magnetoresistance structure comprises: an anti-ferromagnetic layer;a first ferromagnetic layer formed on a top of the anti-ferromagnetic layer, and having a magnetization direction pinned by the anti-ferromagnetic layer;a tunneling barrier layer formed on a top of the first ferromagnetic layer; anda second ferromagnetic layer formed on a top of the tunneling barrier layer, and having a changeable magnetization direction through an application of a magnetic field.

13. The magnetoresistance device of claim 12, wherein the anti-ferromagnetic layer is formed of an alloy comprising Mn.

14. The magnetoresistance device of claim 1, wherein the underlayer is one of a seed layer and a multi-layer that comprises the seed layer and a buffer layer.

15. The magnetoresistance device of claim 14, wherein the seed layer is formed of one of Ta and an alloy comprising Ta.

16. The magnetoresistance device of claim 14, wherein the buffer layer is formed of one of a Ta/Ru compound and NiFeCr.