MANAGING MULTI-OBJECTIVE ALIGNMENTS FOR IMPRINTING

Abstract

Systems and methods for managing multi-objective alignments in imprinting (e.g., single-sided or double-sided) are provided. An example system includes rollers for moving a template roll, a stage for holding a substrate, a dispenser for dispensing resist on the substrate, a light source for curing the resist to form an imprint on the substrate when a template of the template roll is pressed into the resist on the substrate, a first inspection system for registering a fiducial mark of the template to determine a template offset, a second inspection system for registering the imprint on the substrate to determine a wafer registration offset between a target location and an actual location of the imprint, and a controller for controlling to move the substrate with the resist below the template based on the template offset, and determine an overlay bias of the imprint on the substrate based on the wafer registration offset.

Description

Claims

1-82. (canceled)

83. An imprinting method comprising: drawing a template roll along rollers, the template roll comprising a template field having a template and a template fiducial mark of the template;measuring the template fiducial mark of the template to determine a template offset;moving a substrate with resist on a stage to be below the template of the template roll based on an imprinting alignment offset, the imprinting alignment offset being at least partially determined based on the template offset, the resist being on a first side of the substrate;pressing the template of the template roll into the resist on the substrate;curing the resist to form an imprint on the substrate, the imprint having an imprinted feature corresponding to the template and an imprint fiducial mark corresponding to the template fiducial mark of the template;measuring the imprint fiducial mark of the imprint to determine a wafer registration offset between a target fiducial location and an actual fiducial location associated with the imprint fiducial mark; anddetermining an overlay bias of the imprint on the first side of the substrate at least partially based on the wafer registration offset.

84. The imprinting method of claim 83, wherein the imprinting alignment offset is at least partially determined based on at least one of a loading offset or an imprint nominal correction, and wherein the loading offset is determined at least partially based on a previous imprinting process on another substrate.

85. The imprinting method of claim 84, wherein determining an overlay bias of the imprint on the substrate comprises: determining the overlay bias to be the wafer registration offset minus the loading offset.

86. The imprinting method of claim 84, further comprising: moving the substrate on the stage to be below a resist dispenser according to a dispensing alignment offset that is at least partially determined based on at least one of the loading offset, or a dispense offset, or a dispense nominal correction,wherein the dispense offset provides a correction for imprint to resist centering from a nominal dispense location.

87. The imprinting method of claim 86, further comprising: measuring the image of the substrate with the imprint to determine at least one of an imprint to substrate image offset or an imprint to resist image offset;updating the dispensing alignment offset based on the at least one of the imprint to substrate image offset or the imprint to resist image offset;iteratively imprinting a second substrate with the template of the template roll using the updated dispensing alignment offset;updating the loading offset based on the imprint to substrate image offset; andupdating the dispense offset based on the imprint to resist image offset,wherein the dispensing alignment offset is updated based on at least one of the updated loading offset or the updated dispense offset.

88. The imprinting method of claim 87, wherein measuring the image of the substrate with the imprint to determine at least one of an imprint to substrate image offset or an imprint to resist image offset comprises: measuring the image of the substrate with the imprint by using an inspection system.

89. The imprinting method of claim 83, wherein the substrate is held on the stage via a chuck, wherein the chuck comprises a measurement area that has a better image contrast than other areas of the chuck, and wherein the substrate is held on the chuck with the imprint fiducial mark of the imprint on the substrate within the measurement area.

90. The imprinting method of claim 83, wherein measuring the template fiducial mark of the template to determine a template offset comprises: measuring the template fiducial mark of the template using an upward looking inspection system, wherein the upward looking inspection system is positioned on the stage,wherein the template field comprises a plurality of fiducial marks for one or more templates, andwherein the upward looking inspection system comprises a plurality of cameras, each of the plurality of cameras being configured to capture an image including a different corresponding fiducial mark of the plurality of fiducial marks for the one or more templates.

91. The imprinting method of claim 83, wherein measuring the imprint fiducial mark of the imprint to determine a wafer registration offset comprises: measuring the imprint fiducial mark of the imprint using a downward looking inspection system that is registered in a coordinate system based on the stage,wherein the stage is configured to hold one or more substrates with one or more imprints, andwherein the downward looking inspection system comprises a plurality of cameras, each of the plurality of cameras being configured to capture an image including a different corresponding fiducial mark of the one or more imprints on the one or more substrates.

92. The imprinting method of claim 83, wherein measuring the template fiducial mark of the template to determine a template offset comprises: registering the template fiducial mark of the template in a coordinate system, and wherein measuring the imprint fiducial mark of the imprint to determine a wafer registration offset comprises: registering the imprint fiducial mark in the coordinate system,wherein the coordinate system is based on the stage, and wherein the coordinate system is an XYT coordinate system that has an X direction, a Y direction, and a theta direction.

93. The imprinting method of claim 83, wherein moving a substrate with resist on a stage to be below the template of the template roll based on an imprinting alignment offset comprises: controlling a moving speed of the stage holding the substrate relative to a drawing speed of the template roll such that the template of the template roll is aligned with the substrate based on the imprinting alignment offset.

94. The imprinting method of claim 83, further comprising: flipping the substrate with the imprint and loading the flipped substrate on the stage with the first side facing towards the stage and a second side facing away from the stage, the second side being opposite to the first side;measuring a flipped imprint fiducial mark of the flipped imprint to determine a second wafer registration offset between a second target fiducial location and a second actual fiducial location associated with the flipped imprint fiducial mark;measuring a second template fiducial mark of a second template in the template field of the template roll to determine a second template offset;moving the flipped substrate with second resist on the second side to be below the second template in the template field of the template roll based on a second imprinting alignment offset, the second imprinting alignment offset being determined based on the second template offset, the second wafer registration offset, and the overlay bias;pressing the second template of the template roll into the second resist on the flipped substrate;curing the second resist to form a second imprint on the second side, the second imprint having a second imprinted feature corresponding to the second template and a second imprint fiducial mark corresponding to the second template fiducial mark of the second template;measuring the flipped imprint fiducial mark of the flipped imprint on the first side and the second imprint fiducial mark of the second imprint on the second side to determine a double-sided overlay error between a target fiducial offset and an actual fiducial offset associated with the flipped imprint fiducial mark and the second imprint fiducial mark; anddetermining a double-sided overlay bias between the flipped imprint on the first side and the second imprint on the second side based on the double-sided overlay error.

95. The imprinting method of claim 94, further comprising: updating the overlay bias to be the double-sided overlay bias; anditeratively imprinting a second substrate using the second template of the template roll based on the updated overlay bias,wherein the double-sided overlay bias is identical to a sum of a result of multiplying the double-sided overlay error by a constant and a previous double-sided overlay bias,wherein the second imprinting alignment offset is at least partially determined based on a second imprint nominal correction, andwherein the second imprinting alignment offset is a sum of the second template offset, the second wafer registration offset, the overlay bias, and the second imprint nominal correction.

96. The imprinting method of claim 94, further comprising: moving the flipped substrate on the stage to be below a resist dispenser according to a second dispensing alignment offset,wherein the second dispensing alignment offset is a sum of the overlay bias, the second wafer registration offset, a second dispense offset, and a second dispense nominal correction, wherein the second dispense offset provides a correction for imprint to resist centering from a second nominal dispense location.

97. The imprinting method of claim 96, further comprising: measuring an image of the flipped substrate with the flipped imprint and the second imprint to determine a second imprint to resist image offset;updating the second dispensing alignment offset based on the second imprint to resist image offset;updating the second dispense offset based on the second imprint to resist image offset, wherein the second dispensing alignment offset is updated based on the updated second dispense offset; anditeratively imprinting a second substrate using the second template of the template roll based on the updated second dispensing alignment offset.

98. The imprinting method of claim 94, wherein the flipped substrate is held on the stage via a chuck, the chuck comprising a measurement area that has a better image contrast than other areas of the chuck, and wherein the flipped substrate is held on the chuck with the flipped imprint fiducial mark of the flipped imprint and the second imprint fiducial mark of the second imprint within the measurement area.

99. The imprinting method of claim 83, wherein the stage holds a first substrate via a first chuck and a second substrate via a second chuck, the substrate being the first substrate, and wherein the template field of the template roll comprises a first template and the second template, the template being the first template, the imprint being a first imprint, wherein the imprinting method comprises: aligning the first substrate with the first template and the second substrate with the second template based on the imprinting alignment offset; andforming the first imprint on the first side of the first substrate and the second imprint on a first side of the second substrate.

100. The imprinting method of claim 99, comprising: flipping the first substrate and loading the flipped first substrate on the second chuck;flipping the second substrate and loading the flipped second substrate on the first chuck;aligning the flipped second substrate with the first template and the flipped first substrate with the second template based on the second imprinting alignment offset; andforming the first imprint on a second side of the second substrate and the second imprint on the second side of the first substrate.

101. An imprinting system comprising: rollers for moving a template roll, wherein the template roll comprises a template field having a template with a template fiducial mark;a movable stage for holding a substrate;a moving system for moving the stage together with the substrate;a resist dispenser for dispensing resist on a side of the substrate;a light source for curing the resist, wherein the light source is configured to cure the resist to form an imprint on the side of the substrate when the template of the template roll is pressed into the resist on the side of the substrate, the imprint having an imprinted feature corresponding to the template and an imprint fiducial mark corresponding to the template fiducial mark of the template;a first inspection system for registering the template fiducial mark of the template in a coordinate system to determine a template offset;a second inspection system for registering the imprint on the substrate in the coordinate system to determine a wafer registration offset between a target fiducial location and an actual fiducial location associated with the imprint fiducial mark; anda controller configured to: control the moving system to move the substrate with the resist to be below the template of the template roll based on an imprinting alignment offset, the imprinting alignment offset being at least partially determined based on the template offset, anddetermine an overlay bias of the imprint on the side of the substrate to be at least partially based on the wafer registration offset.

102. The imprinting system of claim 101, further comprising at least one of: a loading system for loading the substrate on the stage, ora third inspection system for measuring an image of the substrate with the imprint to update a loading offset by machine learning.

103. The imprinting system of claim 101, wherein the substrate is held on the stage via a chuck, wherein the chuck comprises a measurement area that has a better image contrast than other areas of the chuck, andwherein the substrate is loaded on the chuck with the substrate fiducial mark of the substrate within the measurement area.

104. The imprinting system of claim 101, wherein the first looking inspection system is positioned on the stage, wherein the template field comprises a plurality of fiducial marks for one or more templates, andwherein the first inspection system comprises a plurality of cameras, each of the plurality of cameras being configured to capture an image including a different corresponding fiducial mark of the plurality of fiducial marks for the one or more templates.

105. The imprinting system of claim 101, wherein the second inspection system is registered in the coordinate system with predetermined locations, wherein the stage is configured to hold one or more substrates with one or more imprints each having one more fiducial marks, andwherein the second inspection system comprises a plurality of cameras, each of the plurality of cameras being configured to capture an image including a different corresponding fiducial mark of the one or more fiducial marks of the one or more imprints on the one or more substrates.

106. The imprinting system of claim 101, further comprising: an unloading system for unloading the substrate from the stage;a flipping system for flipping the substrate with the imprint; anda loading system for loading the flipped substrate on the stage with a first side facing towards the stage and a second side facing away from the stage, the second side being opposite to the first side, the imprint being on the first side.

107. The imprinting system of claim 106, wherein the first inspection system is configured to register a second template fiducial mark of a second template in the template field of the template roll in the coordinate system to determine a second template offset, wherein the second inspection system is configured to register the flipped substrate with the flipped imprint in the coordinate system to determine a second wafer registration offset between a second target fiducial location and a second actual fiducial location associated with a flipped imprint fiducial mark of the flipped imprint, andwherein the controller is configured to control the moving system to move the flipped substrate with second resist on the second side to be below the second template in the template field of the template roll based on a second imprinting alignment offset, the second imprinting alignment offset being determined based on the second template offset, the second wafer registration offset, and the overlay bias.

108. The imprinting system of claim 107, wherein the light source is configured to cure the second resist, when the second template of the template roll is pressed into the second resist on the second side of the substrate, to form a second imprint on the second side, the second imprint having a second imprinted feature corresponding to the second template and a second imprint fiducial mark corresponding to the second template fiducial mark of the second template, wherein the second inspection system is configured to register the substrate with the flipped imprint on the first side and the second imprint on the second side in the coordinate system to determine a double-sided wafer registration offset between a target fiducial offset and an actual fiducial offset associated with the flipped imprint fiducial mark and the second imprint fiducial mark, andwherein the controller is configured to determine a double-sided overlay bias between the flipped imprint on the first side and the second imprint on the second side based on the double-sided wafer registration offset, and update the overlay bias to be the double-sided overlay bias for iteratively imprinting a second substrate using the second template of the template roll.

109. The imprinting system of claim 107, wherein the controller is configured to control the moving system to move the flipped substrate on the stage to be below the resist dispenser according to a second dispensing alignment offset that is determined at least partially based on the overlay bias and the second wafer registration offset, wherein the controller is configured to determine the second dispensing alignment offset to be a sum of the overlay bias, the second wafer registration offset, a second dispense offset, and a second dispense nominal correction, wherein the second dispense offset provides a correction for imprint to resist centering from a second nominal dispense location,wherein the third inspection system is configured to measure an image of the flipped substrate with the flipped imprint and the second imprint to determine a second imprint to resist image offset, andwherein the controller is configured to: update the second dispense offset based on the second imprint to resist image offset; andupdate the second dispensing alignment offset based on the updated second dispense offset for iteratively imprinting a second substrate using the second template of the template roll.

110. The imprinting system of claim 106, wherein the stage holds a first substrate via a first chuck and a second substrate via a second chuck, the substrate being the first substrate, and wherein the template field of the template roll comprises a first template and the second template, the template being the first template, the imprint being a first imprint, and wherein the imprinting system is configured to: align the first substrate with the first template and the second substrate with the second template based on the imprinting alignment offset;form the first imprint on the first side of the first substrate and the second imprint on a first side of the second substrate;flip the first substrate and load the flipped first substrate on the second chuck;flip the second substrate and load the flipped second substrate on the first chuck;align the flipped second substrate with the first template and the flipped first substrate with the second template based on the second imprinting alignment offset; andform the first imprint on a second side of the second substrate and the second imprint on the second side of the first substrate.