Patent Application
20220190033
The present disclosure relates in general to semiconductor manufacturing, and in particular it relates to memory structures and methods for forming the same.
As semiconductor devices are gradually miniaturized, the difficulty of manufacturing these semiconductor devices increases dramatically, and undesirable defects may occur during the manufacturing process, which may cause degradation or damage to the device. Therefore, semiconductor devices must be continuously improved to increase the yield and improve the process window.
In accordance with some embodiments of the present disclosure, a memory structure is provided. The memory structure includes a substrate, an electrical channel layer, a first electrode, a resistive switching layer, a second electrode, and a conductive structure. The electrical channel layer is disposed on the substrate. The first electrode is disposed on the substrate and extends into the electrical channel layer. The resistive switching layer is disposed between the first electrode and the electrical channel layer. The second electrode is disposed on the electrical channel layer. The conductive structure connects the electrical channel layer and the second electrode.
In accordance with some embodiments of the present disclosure, a memory structure is provided. The memory structure includes a substrate, an electrical channel layer, a first electrode, a resistive switching layer, a second electrode, and a conductive structure. The electrical channel layer is disposed on the substrate and extends along a first direction. The first electrode is disposed on the substrate and extends into the electrical channel layer along a second direction, and the second direction is different from the first direction. The resistive switching layer is disposed between the first electrode and the electrical channel layer. The second electrode is disposed on the electrical channel layer, wherein the substrate, the electrical channel layer and the second electrode are stacked along the second direction. The conductive structure connects the electrical channel layer and the second electrode and extends along the second direction.
In accordance with some embodiments of the present disclosure, a method of forming a memory structure is provided. The method includes forming an electrical channel layer on a substrate; forming a first electrode on the substrate and extending into the electrical channel layer; forming a resistive switching layer between the first electrode and the electrical channel layer; and forming a conductive structure on the electrical channel layer and connecting to a second electrode.
The present disclosure can be more fully understood from the following detailed description when read with the accompanying figures. It should be noted that, in accordance with standard practice in the industry, various features are not drawn to scale and are for illustrative purposes only. In fact, the dimensions of elements may be arbitrarily increased or reduced for clarity of the features of the embodiments of the present disclosure.
The following description provides several embodiments so that those skilled in the art may better understand the present disclosure. However, these embodiments are examples only and are not intended to limit the present disclosure. It is understandable that those skilled in the art may adjust the embodiments described below according to requirements, for example, changing the sequences of processes and/or including more or fewer steps than described herein, and these adjustments do not exceed the scope of the present disclosure.
Furthermore, other elements may be added on the basis of the embodiments described below. For example, the description of “forming a second element on a first element” may include embodiments in which the first element is in direct contact with the second element, and may also include embodiments in which additional elements are disposed between the first element and the second element such that the first element and the second element are not in direct contact. Spatially relative descriptors of the first element and the second element may change as the device is operated or used in different orientations.
In the following description, the description of “a first element passing through a second element” may include embodiments in which the first element is in the second element and extends from a side of the second element to an opposite side of the second element, wherein a surface of the first element may be leveled with a surface of the second element, or a surface of the first element may be outside a surface of the second element. In addition, the present disclosure may repeat reference numerals and/or letters in the various embodiments. This repetition is for simplicity and clarity and does not in itself dictate a relationship between the various embodiments discussed.
Memory structures and methods for forming the same are described below in accordance with some embodiments of the present disclosure, and they are particularly suitable for non-volatile memory (NVM), such as a resistive random-access memory (RRAM). In the present disclosure, a resistive switching layer is disposed to extend into an electrical channel layer, thereby increasing the number of conductive filaments without increasing the forming voltage, and improving data retention.
When a forward voltage is applied to the memory device 100, the oxygen ions in the resistive switching layer 106 migrate to the electrode above the resistive switching layer 106, and an oxygen vacancy filament (not illustrated) is formed in the resistive switching layer 106, so that the resistive switching layer 106 is converted into a low resistance state. Conversely, when a reverse voltage is applied to the memory device 100, the oxygen ions return to the resistive switching layer 106 and combine with the oxygen vacancies in the resistive switching layer 106, causing the oxygen vacancy filament to be cut, and the resistive switching layer 106 is converted into a high resistance state. The memory device 100 converts the resistance by this way to store or read data to achieve the memory function.
In some embodiments, the high temperature used during the manufacturing process of the memory structure may reduce the current in the low resistance state, making data retention worse. Since the current of the conductive filament is related to the oxygen vacancy concentration, some methods increase the thickness of the resistive switching layer 106 to provide more oxygen vacancies to increase the current in the low resistance state, thereby improving data retention. However, these methods also introduce some problems. For example, since the material of the resistive switching layer 106 is not easily etched, increasing the thickness of the resistive switching layer 106 also increases the difficulty of the etching process, for example, it may be difficult to form the resistive switching layer 106 into a desired shape. In addition, increasing the thickness of the resistive switching layer 106 also increases the forming voltage of the memory structure 100, which is unfavorable to mass production of the memory structure 100. Therefore, the present disclosure further provides the following embodiments to improve the above-mentioned problems.
In some embodiments, the memory structure 200 may include a contact 204 disposed in the substrate 202. The contact 204 may include conductive materials, such as doped or undoped polysilicon, metal, the like, or a combination thereof. For example, the metal includes gold, nickel, platinum, palladium, iridium, titanium, chromium, tungsten, aluminum, copper, tantalum, hafnium, the like, an alloy thereof, a multilayer thereof, or a combination thereof. According to some embodiments, the deposition process used for the conductive material may include a physical vapor deposition (PVD) process, a chemical vapor deposition (CVD) process, an atomic layer deposition (ALD) process, an evaporation process, an electroplating process, the like, or a combination thereof.
Then, according to some embodiments, a dielectric layer 205 is formed on the contact 204 and covers the contact 204. In some embodiments, the dielectric layer 205 and the substrate 202 include the same material, so the interface between the dielectric layer 205 and the substrate 202 is not illustrated. In other embodiments, the dielectric layer 205 and the substrate 202 include different materials, and there may be an interface between the dielectric layer 205 and the substrate 202. The dielectric layer 205 may be formed by CVD, ALD, the like, or a combination thereof.
Then, according to some embodiments, a pair of high-k layers 206 and an electrical channel layer 208 between the high-k layers 206 are formed on the dielectric layer 205. The high-k layers 206 and the electrical channel layer 208 may extend along the first direction D1. The high-k layers 206 may include a material with dielectric constant (k) greater than 3.9, such as tantalum oxide, hafnium oxide, aluminum oxide, the like, or a combination thereof. The electrical channel layer 208 may include titanium, titanium nitride, tantalum, tantalum nitride, hafnium, hafnium nitride, the like, or a combination thereof. The formation method of the high-k layer 206 and the electrical channel layer 208 may be similar to the formation method of the dielectric layer 205, and will not be repeated.
The number of electrical channel layers 208 is related to the amount of current. Although two electrical channel layers 208 are illustrated herein, the present disclosure is not limited thereto. More or fewer electrical channel layers 208 may be used according to the amount of current, and dielectric layers 205 may be provided between these electrical channel layers 208. Then, a dielectric layer 205 is deposited on the uppermost electrical channel layer 208.
Then, according to some embodiments, a trench 209 is etched in the memory device 200. As illustrated in
In some embodiments, the trench 209 may be formed by disposing a mask layer (not illustrated) on the dielectric layer 205, and then using the mask layer as an etching mask for an etching process. In some embodiments, the mask layer may include a hard mask, and may be formed of silicon oxide, silicon nitride, silicon oxynitride, silicon carbide, silicon carbonitride, the like, or a combination thereof. The mask layer may be a single layer or multilayers. The mask layer 104 may be formed by a deposition process, a photolithography process, other suitable processes, or a combination thereof. In some embodiments, the deposition process includes spin coating, CVD, ALD, the like, or a combination thereof. In some embodiments, the photolithography process includes photoresist coating (such as spin coating), soft baking, mask aligning, exposure, post-exposure baking, developing, rinsing, drying (such as hard baking), other suitable processes, or a combination thereof.
In some embodiments, the etching process of the trench 209 may include a dry etching process, a wet etching process, or a combination thereof. For example, the dry etching process may include reactive ion etch (RIE), inductively-coupled plasma (ICP) etching, neutral beam etch (NBE), electron cyclotron resonance (ERC) etching, the like, or a combination thereof. For example, the wet etching process may use hydrofluoric acid, ammonium hydroxide, or any suitable etchant.
Then, according to some embodiments, as illustrated in
Then, according to some embodiments, a first electrode 212 is formed in the remaining portion of the trench 209. The first electrode 212 may extend substantially along the second direction D2. The first electrode 212 may include metal or metal nitride, such as platinum, titanium nitride, gold, titanium, tantalum, tantalum nitride, tungsten, tungsten nitride, copper, the like, or a combination thereof. In some embodiments, the first electrode 212 includes copper. The first electrode 212 may be formed by an ALD process, a CVD process, a PVD process, the like, or a combination thereof.
As illustrated in
Although in the embodiment of
Then, according to some embodiments, as illustrated in
Although in the embodiment of
Then, according to some embodiments, as illustrated in
As illustrated in
The depths of the conductive structures 218A and 218B depends on the depths of the through holes 214A and 214B. Therefore, as discussed above regarding the through holes 214A and 218B, the conductive structures 218A and 218B may or may not pass through the electrical channel layer 208. Particularly, the bottom surfaces of the conductive structures 218A and 218B may be leveled with the top surface of the electrical channel layer 208, or the bottom surfaces of the conductive structures 218A and 218B may be in or below the electrical channel layer 208.
Then, according to some embodiments, as illustrated in
As illustrated in
Please refer to
As illustrated in
Referring to
In the top view, the first electrode 212 and the conductive structures 218A and 218B are circular, but may also be, for example, elliptical or other shapes. The barrier layers 216A and 216B may be disposed on the sidewalls of the conductive structures 218A and 218B, respectively, and may surround the conductive structures 218A and 218B. The resistive switching layer 210 may be disposed on the sidewalls of the first electrode 210 and surround the first electrode 210. By providing the resistive switching layer 210 which surrounds the first electrode 210, the embodiment of the present disclosure can use one resistive switching layer 210 to form a plurality of memory cells, instead of forming a plurality of resistive switching layers 210 for a plurality of memory cells. Therefore, the cost and the volume of the memory structure 200 can be reduced.
In some embodiments, the area of the top surface of the second electrode 222 may be greater than the area of the top surface of the electrical channel layer 208. The edges of the resistive switching layer 210 and the barrier layers 216A and 216B may be outside the sidewalls of the electrical channel layer 208 and inside the sidewalls of the second electrode 222. In addition, a plurality of memory structures 200 may be arranged in parallel, and these memory structures 200 may each include different numbers of components, such as different numbers of electrical channel layers 208 or conductive structures 218A, 218B. Therefore, the embodiments of the present disclosure can have good design flexibility.
In summary, the memory structure provided by the present disclosure can increase the number of conductive filaments by disposing the resistive switching layer to extend into the electrical channel layer, thereby improving data retention without increasing the thickness of the resistive switching layer. Therefore, problems associated with increasing the thickness, such as increasing the difficulty of the etching process and increasing the forming voltage of the memory structure, can be prevented.
In addition, in some embodiments, the number of electrical channel layers and/or conductive structures can be adjusted to generate the required number of conductive filaments, thus having good design flexibility. Furthermore, according to some embodiments, by increasing the number of electrical channel layers, a plurality of memory cells can be formed without increasing the resistive switching layer, so that the cost and volume can be reduced.
Although the present disclosure has been described above by various embodiments, these embodiments are not intended to limit the disclosure. Those skilled in the art should appreciate that they may make various changes, substitutions and alterations without departing from the spirit and scope of the disclosure. Therefore, the scope of protection of the present disclosure is defined as the subject matter set forth in the appended claims.
