Patent Application
20250174292
With development of semiconductor technologies, an integration level requirement and a performance standard for a memory are gradually becoming high. Therefore, an internal circuit structure is gradually optimized. Providing a matching test method for an optimized internal circuit structure is also a problem to be resolved.
The present disclosure relates to the field of semiconductors, and in particular, to a memory.
Embodiments of the present disclosure provide a memory.
The technical solutions of the present disclosure are implemented as follows.
According to a first aspect, the present disclosure provides a memory. The memory includes N memory array tiles sequentially arranged in a first direction. N is a natural number. Each of the memory array tiles includes multiple first bit lines and multiple second bit lines, and the first bit lines and the second bit lines are alternately arranged in a second direction. The first bit line is electrically isolated from an adjacent second bit line for a non-edge memory array tile. The first bit line is electrically connected to an adjacent second bit line on a first side and the first bit line is electrically isolated from an adjacent second bit line on a second side for an edge memory array tile. The first side and the second side are two opposite sides in the second direction. The memory array tiles are numbered in the first direction. In each of the memory array tiles, the first bit lines are numbered in the second direction and the second bit lines are numbered in the second direction. Each bit line in the non-edge memory array tile is coupled to a corresponding stress test power supply, and a stress test power supply corresponding to the first bit line is different from a stress test power supply corresponding to the adjacent second bit line. The first bit line in the edge memory array tile is coupled to a corresponding stress test power supply, and a stress test power supply corresponding to an odd-numbered first bit line is different from a stress test power supply corresponding to an even-numbered first bit line.
In some embodiments, a first one of bit lines in the odd-numbered memory array tile is a second bit line, and a first one of bit lines in the even-numbered memory array tile is a first bit line. Readout amplifier modules are distributed between every two memory array tiles, and each of the readout amplifier modules includes multiple sense amplifiers sequentially arranged in the second direction. A first terminal of each of the sense amplifiers is connected to one of the second bit lines on a third side through a first offset cancellation switch. A second terminal of the sense amplifier is connected to one of the second bit lines on the third side through a first isolation switch. The second terminal of the sense amplifier is further connected to one of the first bit lines on a fourth side through a second offset cancellation switch. The first terminal of the sense amplifier is further connected to one of the first bit lines on the fourth side through a second isolation switch. The third side and the fourth side are two opposite sides in the first direction. The first terminal or the second terminal of each sense amplifier is further connected to a precharge power supply through a corresponding precharge switch, so that each bit line is coupled to a precharge power supply.
In some embodiments, the precharge power supply coupled to the bit line in the non-edge memory array tile is adopted as the stress test power supply. The first bit line in the edge memory array tile is further coupled to a respective edge test power supply through a first test switch, and the edge test power supply coupled to the first bit line is adopted as the stress test power supply.
In some embodiments, the bit line in the non-edge memory array tile is further coupled to a respective precharge power supply through a column gating switch and a second test switch. The first bit line in the edge memory array tile is further coupled to a respective precharge power supply through a column gating switch and a second test switch. The precharge power supply coupled to each bit line in each memory array tile is adopted as the stress test power supply.
In some embodiments, the bit line in the non-edge memory array tile is further coupled to a respective preset test power supply through a column gating switch and a second test switch. The first bit line in the edge memory array tile is further coupled to a respective preset test power supply through a column gating switch and a second test switch. The preset test power supply coupled to each bit line in each memory array tile is adopted as the stress test power supply.
In some embodiments, the readout amplifier modules are numbered in the first direction. The first terminal or the second terminal of the sense amplifier in an odd-numbered readout amplifier module is connected to a first precharge power supply through a corresponding precharge switch, and the first terminal or the second terminal of the sense amplifier in an even-numbered readout amplifier module is connected to a second precharge power supply through a corresponding precharge switch, so that the stress test power supply corresponding to the first bit line is different from the stress test power supply corresponding to the adjacent second bit line.
In some embodiments, for the edge memory array tile, the odd-numbered first bit line is connected to a first edge test power supply through a respective first test switch, and the even-numbered first bit line is connected to a second edge test power supply through a respective first test switch. Alternatively, for a first memory array tile, the odd-numbered first bit line is connected to a first edge test power supply through a respective first test switch and the even-numbered first bit line is connected to a second edge test power supply through a respective first test switch, and for a last memory array tile, the odd-numbered first bit line is connected to a second edge test power supply through a respective first test switch and the even-numbered first bit line is connected to a first edge test power supply through a respective first test switch.
In some embodiments, the memory is configured to: control the first edge test power supply to be at a first voltage value, the second edge test power supply to be at a second voltage value, the first precharge power supply to be at a third voltage value, and the second precharge power supply to be at a fourth voltage value, and perform a bit line stress test operation; and control the first edge test power supply to be at the second voltage value, the second edge test power supply to be at the first voltage value, the first precharge power supply to be at the fourth voltage value, and the second precharge power supply to be at the third voltage value, and perform the bit line stress test operation. The first voltage value is different from the second voltage value, and the third voltage value is different from the fourth voltage value. In the bit line stress test operation, all first test switches are in an on state, isolation switches and offset cancellation switches between the edge memory array tile and an adjacent readout amplifier module are all in an off state, and other isolation switches, other offset cancellation switches, and all precharge switches are all in an on state.
In some embodiments, the bit line in the edge memory array tile is electrically connected to an adjacent sense amplifier through the first offset cancellation switch or the first isolation switch. The memory further includes: a command control circuit, configured to generate a test enable signal, an initial isolation signal, and an initial offset cancellation signal, the test enable signal, the initial isolation signal, and the initial offset cancellation signal all being in a valid state when the memory is indicated to perform the bit line stress test operation; a first preprocessing circuit, configured to generate a first edge isolation signal and a second edge isolation signal based on an edge test parameter group and the initial isolation signal, and generate a first edge offset cancellation signal and a second edge offset cancellation signal based on the edge test parameter group and the initial offset cancellation signal; and a second preprocessing circuit, configured to generate a first internal isolation signal and a second internal isolation signal based on an internal test parameter group and the initial isolation signal, and generate a first internal offset cancellation signal and a second internal offset cancellation signal based on the internal test parameter group and the initial offset cancellation signal. All the first test switches are controlled by the test enable signal. The first isolation switch, the second isolation switch, the first offset cancellation switch, and the second offset cancellation switch between an edge readout amplifier module and an adjacent memory array tile are controlled by the first edge isolation signal, the second edge isolation signal, the first edge offset cancellation signal, and the second edge offset cancellation signal in a one-to-one correspondence. The first isolation switch, the second isolation switch, the first offset cancellation switch, and the second offset cancellation switch between a non-edge readout amplifier module and an adjacent memory array tile are correspondingly controlled by the first internal isolation signal, the second internal isolation signal, the first internal offset cancellation signal, and the second internal offset cancellation signal.
In some embodiments, the edge test parameter group includes a first test parameter and a second test parameter. The internal test parameter group includes a third test parameter and a fourth test parameter. The second edge isolation signal and the second edge offset cancellation signal have the same levels as the initial isolation signal and the initial offset cancellation signal in a one-to-one correspondence if the first test parameter is in a first state, or both the second edge isolation signal and the second edge offset cancellation signal are invalid if the first test parameter is in a second state. The first edge isolation signal and the first edge offset cancellation signal have the same levels as the initial isolation signal and the initial offset cancellation signal in a one-to-one correspondence if the second test parameter is in a first state, or both the first edge isolation signal and the first edge offset cancellation signal are invalid if the second test parameter is in a second state. The first internal isolation signal and the first internal offset cancellation signal have the same levels as the initial isolation signal and the initial offset cancellation signal in a one-to-one correspondence if the fourth test parameter is in a first state, or both the first internal isolation signal and the first internal offset cancellation signal are invalid if the fourth test parameter is in a second state. The second internal isolation signal and the second internal offset cancellation signal have the same levels as the initial isolation signal and the initial offset cancellation signal in a one-to-one correspondence if the third test parameter is in a first state, or both the second internal isolation signal and the second internal offset cancellation signal are invalid if the third test parameter is in a second state. In a process in which the memory is indicated to perform the bit line stress test operation, the second test parameter is in a second state, and the first test parameter, the third test parameter, and the fourth test parameter are each in a first state.
In some embodiments, the first state is a high level, and the second state is a low level. The first preprocessing circuit includes: a first AND gate, two input terminals thereof respectively receiving the first test parameter and the initial isolation signal, and an output terminal thereof outputting the second edge isolation signal; a second AND gate, two input terminals thereof respectively receiving the second test parameter and the initial isolation signal, and an output terminal thereof outputting the first edge isolation signal; a third AND gate, two input terminals thereof respectively receiving the first test parameter and the initial offset cancellation signal, and an output terminal thereof outputting the second edge offset cancellation signal; and a fourth AND gate, two input terminals thereof respectively receiving the second test parameter and the initial offset cancellation signal, and an output terminal thereof outputting the first edge offset cancellation signal.
In some embodiments, the bit line in the first memory array tile is electrically connected to an adjacent sense amplifier through the first offset cancellation switch or the first isolation switch. The bit line in the last memory array tile is electrically connected to an edge sense amplifier through the second offset cancellation switch or the second isolation switch. The memory further includes: a command control circuit, configured to generate a test enable signal, an initial isolation signal, and an initial offset cancellation signal, the test enable signal, the initial isolation signal, and the initial offset cancellation signal all being in a valid state when the memory is indicated to perform the bit line stress test operation; a second preprocessing circuit, configured to generate a first internal isolation signal and a second internal isolation signal based on an internal test parameter group and the initial isolation signal, and generate a first internal offset cancellation signal and a second internal offset cancellation signal based on the internal test parameter group and the initial offset cancellation signal; a third preprocessing circuit, configured to generate a first head terminal isolation signal and a second head terminal isolation signal based on a head terminal test parameter group and the initial isolation signal, and generate a first head terminal offset cancellation signal and a second head terminal offset cancellation signal based on the head terminal test parameter group and the initial offset cancellation signal; and a fourth preprocessing circuit, configured to generate a first tail terminal isolation signal and a second tail terminal isolation signal based on a tail terminal test parameter group and the initial isolation signal, and generate a first tail terminal offset cancellation signal and a second tail terminal offset cancellation signal based on the tail terminal test parameter group and the initial offset cancellation signal. All the first test switches are controlled by the test enable signal. The first isolation switch, the second isolation switch, the first offset cancellation switch, and the second offset cancellation switch between a first readout amplifier module and an adjacent memory array tile are controlled by the first head terminal isolation signal, the second head terminal isolation signal, the first head terminal offset cancellation signal, and the second head terminal offset cancellation signal in a one-to-one correspondence. The first isolation switch, the second isolation switch, the first offset cancellation switch, and the second offset cancellation switch between a last readout amplifier module and an adjacent memory array tile are controlled by the first tail terminal isolation signal, the second tail terminal isolation signal, the first tail terminal offset cancellation signal, and the second tail terminal offset cancellation signal in a one-to-one correspondence. The first isolation switch, the second isolation switch, the first offset cancellation switch, and the second offset cancellation switch between a non-edge readout amplifier module and an adjacent memory array tile are controlled by the first internal isolation signal, the second internal isolation signal, the first internal offset cancellation signal, and the second internal offset cancellation signal in a one-to-one correspondence.
In some embodiments, the internal test parameter group includes at least a third test parameter and a fourth test parameter. The head terminal test parameter group includes a fifth test parameter and a sixth test parameter. The tail terminal test parameter group includes a seventh test parameter and an eighth test parameter. The second internal isolation signal and the second internal offset cancellation signal have the same levels as the initial isolation signal and the initial offset cancellation signal in a one-to-one correspondence if the third test parameter is in a first state, or both the second internal isolation signal and the second internal offset cancellation signal are invalid if the third test parameter is in a second state. The first internal isolation signal and the first internal offset cancellation signal have the same levels as the initial isolation signal and the initial offset cancellation signal in a one-to-one correspondence if the fourth test parameter is in a first state, or both the first internal isolation signal and the first internal offset cancellation signal are invalid if the fourth test parameter is in a second state. The second head terminal isolation signal and the second head terminal offset cancellation signal have the same levels as the initial isolation signal and the initial offset cancellation signal in a one-to-one correspondence if the fifth test parameter is in a first state, or both the second head terminal isolation signal and the second head terminal offset cancellation signal are invalid if the fifth test parameter is in a second state. The first head terminal isolation signal and the first head terminal offset cancellation signal have the same levels as the initial isolation signal and the initial offset cancellation signal in a one-to-one correspondence if the sixth test parameter is in a first state, or both the first head terminal isolation signal and the first head terminal offset cancellation signal are invalid if the sixth test parameter is in a second state. The second tail terminal isolation signal and the second tail terminal offset cancellation signal have the same levels as the initial isolation signal and the initial offset cancellation signal in a one-to-one correspondence if the seventh test parameter is in a first state, or both the second tail terminal isolation signal and the second tail terminal offset cancellation signal are invalid if the seventh test parameter is in a second state. The first tail terminal isolation signal and the first tail terminal offset cancellation signal have the same levels as the initial isolation signal and the initial offset cancellation signal in a one-to-one correspondence if the eighth test parameter is in a first state, or both the first tail terminal isolation signal and the first tail terminal offset cancellation signal are invalid if the eighth test parameter is in a second state. In a process in which the memory is indicated to perform the bit line stress test operation, the sixth test parameter and the seventh test parameter are each in a second state, and the third test parameter, the fourth test parameter, the fifth test parameter, and the eighth test parameter are each in a first state.
In some embodiments, the first state is a high level, and the second state is a low level. The second preprocessing circuit includes: a fifth AND gate, two input terminals thereof respectively receiving the third test parameter and the initial isolation signal, and an output terminal thereof outputting the second internal isolation signal; a sixth AND gate, two input terminals thereof respectively receiving the fourth test parameter and the initial isolation signal, and an output terminal thereof outputting the first internal isolation signal; a seventh AND gate, two input terminals thereof respectively receiving the third test parameter and the initial offset cancellation signal, and an output terminal thereof outputting the second internal offset cancellation signal; and an eighth AND gate, two input terminals thereof respectively receiving the fourth test parameter and the initial offset cancellation signal, and an output terminal thereof outputting the first internal offset cancellation signal.
In some embodiments, the first state is a high level, and the second state is a low level. The third preprocessing circuit includes: a ninth AND gate, two input terminals thereof respectively receiving the fifth test parameter and the initial isolation signal, and an output terminal thereof outputting the second head terminal isolation signal; a tenth AND gate, two input terminals thereof respectively receiving the sixth test parameter and the initial isolation signal, and an output terminal thereof outputting the first head terminal isolation signal; an eleventh AND gate, two input terminals thereof respectively receiving the fifth test parameter and the initial offset cancellation signal, and an output terminal thereof outputting the second head terminal offset cancellation signal; and a twelfth AND gate, two input terminals thereof respectively receiving the sixth test parameter and the initial offset cancellation signal, and an output terminal thereof outputting the first head terminal offset cancellation signal; The fourth preprocessing circuit includes: a thirteenth AND gate, two input terminals thereof respectively receiving the seventh test parameter and the initial isolation signal, and an output terminal thereof outputting the second tail terminal isolation signal; a fourteenth AND gate, two input terminals thereof respectively receiving the eighth test parameter and the initial isolation signal, and an output terminal thereof outputting the first tail terminal isolation signal; a fifteenth AND gate, two input terminals thereof respectively receiving the seventh test parameter and the initial offset cancellation signal, and an output terminal thereof outputting the second tail terminal offset cancellation signal; and a sixteenth AND gate, two input terminals thereof respectively receiving the eighth test parameter and the initial offset cancellation signal, and an output terminal thereof outputting the first tail terminal offset cancellation signal.
In some embodiments, the bit line in the non-edge memory array tile is coupled to a respective local data line through a respective column gating switch. Local data lines coupled to the second bit line in a non-edge odd-numbered memory array tile and the first bit line in a non-edge even-numbered memory array tile are further connected to a first precharge power supply through respective second test switches. Local data lines coupled to the first bit line in the non-edge odd-numbered memory array tile and the second bit line in the non-edge even-numbered memory array tile are further connected to a second precharge power supply through respective second test switches.
In some embodiments, the first bit line in the edge memory array tile is coupled to a respective local data line through a respective column gating switch. For the edge memory array tile, a local data line coupled to the odd-numbered first bit line is coupled to a second precharge power supply through the second test switch, and a local data line coupled to the even-numbered first bit line is coupled to a first precharge power supply through the second test switch. Alternatively, for a first memory array tile, a local data line coupled to the odd-numbered first bit line is coupled to a second precharge power supply through the second test switch, and a local data line coupled to the even-numbered first bit line is coupled to a first precharge power supply through the second test switch; and for a last memory array tile, a local data line coupled to the odd-numbered first bit line is coupled to a first precharge power supply through the second test switch, and a local data line coupled to the even-numbered second bit line is coupled to a first precharge power supply through the second test switch.
In some embodiments, the memory is configured to control all isolation switches, offset cancellation switches, and precharge switches to be in an off state, control all column gating switches and second test switches to be in an on state, and control the first precharge power supply to be at a first voltage value and the second precharge power supply to be at a second voltage value, to perform one time of bit line stress test; or control all isolation switches, offset cancellation switches, and precharge switches to be in an off state, control all column gating switches and second test switches to be in an on state, and control the first precharge power supply to be at a second voltage value and the second precharge power supply to be at a first voltage value, to perform another time of bit line stress test.
In some embodiments, each bit line in the non-edge memory array tile is coupled to a respective local data line through a respective column gating switch. Local data lines coupled to the second bit line in a non-edge odd-numbered memory array tile and the first bit line in a non-edge even-numbered memory array tile are coupled to a first preset test power supply through the second test switches. Local data lines coupled to the first bit line in the non-edge odd-numbered memory array tile and the second bit line in the non-edge even-numbered memory array tile are coupled to a second preset test power supply through the second test switches.
In some embodiments, the first bit line in the edge memory array tile is coupled to a respective local data line through a respective column gating switch. For the edge memory array tile, a local data line corresponding to the odd-numbered first bit line is coupled to a second preset test power supply through the second test switch, and a local data line corresponding to the even-numbered first bit line is coupled to a first preset test power supply through the second test switch. Alternatively, for a first memory array tile, a local data line corresponding to the odd-numbered first bit line is coupled to a second preset test power supply through the second test switch, and a local data line corresponding to the even-numbered first bit line is coupled to a first preset test power supply through the second test switch; and for a last memory array tile, a local data line corresponding to the odd-numbered first bit line is coupled to a first preset test power supply through the second test switch, and a local data line corresponding to the even-numbered first bit line is coupled to a second preset test power supply through the second test switch.
In some embodiments, the memory is configured to: control all isolation switches and offset cancellation switches to be in an off state, control all precharge switches to be in an on state, and control the precharge power supply to be at a fifth voltage value; and control all column gating switches and second test switches to be in an on state, and control the first preset test power supply to be at a first voltage value and the second preset test power supply to be at a second voltage value, to perform one time of bit line stress test; or control all isolation switches and offset cancellation switches to be in an off state, control all precharge switches to be in an on state, and control the precharge power supply to be at a fifth voltage value; and control all column gating switches and second test switches to be in an on state, and control the first preset test power supply to be at a second voltage value and the second preset test power supply to be at a first voltage value, to perform another time of bit line stress test. A voltage of the fifth voltage value is located between a voltage of the first voltage value and a voltage of the second voltage value.
In the memory provided in the embodiments of the present disclosure, the area of the edge memory array tile is reduced to half of the area of another memory array tile, so that the area of a chip can be reduced, and an integration level can be improved. In addition, for the memory, each bit line in the non-edge memory array tile is coupled to the stress test power supply and the first bit line in the edge memory array tile is coupled to the stress test power supply, so that two adjacent bit lines in the non-edge memory array tile are at different voltages and the odd-numbered first bit line and the even-numbered first bit line in the edge memory array tile are at different voltages, thereby efficiently implementing the bit line stress test, improving a test procedure of the memory of this structure, and ensuring as-shipped performance.
To make the objectives, technical solutions, and advantages of the present disclosure clearer, the technical solutions of the present disclosure are further described in detail below with reference to the accompanying drawings and the embodiments. The described embodiments should not be considered as limitations to the present disclosure. All other embodiments obtained by a person of ordinary skill in the art without creative efforts fall within the scope of the present disclosure.
The following descriptions relate to “some embodiments” describing a subset of all possible embodiments. However, it may be understood that “some embodiments” may be the same subset or different subsets of all the possible embodiments, and may be combined with each other when there is no conflict.
The following descriptions are added if descriptions such as “first/second” appear in the application document. In the following descriptions, involved terms “first/second/third” are merely for distinguishing between similar objects and do not represent specific rankings of the objects. It may be understood that “first/second/third” may be interchanged for a specific sequence or order if allowed, so that the embodiments of the present disclosure described herein can be implemented in a sequence other than those shown or described herein.
Unless otherwise defined, all technical and scientific terms employed in this specification have meanings the same as those commonly understood by a person skilled in the technical field of the present disclosure. The terms employed in this specification are merely intended to describe the embodiments of the present disclosure, but are not intended to limit the present disclosure.
A dynamic random access memory (DRAM) is adopted as an example.
The memory array tile includes a large quantity of memory cells (or referred to as cells), and data reading, data writing, or data refreshing processing can be performed on a selected memory cell through a word line (WL) and a bit line (BL).
Usually, 65 memory array tiles in a first direction may be adopted as repeatable structures in the memory (for example, half banks)
A readout amplifier module (for example, 12_1, 12_2, . . . , 12_64) is disposed between every two memory array tiles. Each readout amplifier module includes multiple sense amplifiers (Sa). One terminal of each Sa is connected to a bit line in a memory array tile on one side (for example, an upper side), and the other terminal of the Sa is connected to a bit line in a memory array tile on the other side (for example, a lower side).
Refer to
As shown in
The following describes the embodiments of the present disclosure in detail with reference to the accompanying drawings.
In an embodiment of the present disclosure,
Refer to
Herein, the readout amplifier module in this embodiment of the present disclosure is applied to multiple signal amplification scenarios, such as a DRAM, a synchronous dynamic random access memory (SDRAM), a double data rate DRAM, and a low-power DRAM, and may be flexibly applied by a person skilled in the art.
It should be noted that the length of each bit line in the edge memory array tile (11_1 and 11_N) may be shortened by nearly half because two bit lines are essentially connected into one integrated bit line. Specifically, for the non-edge memory array tile, the distance between one end that is of each bit line and that is connected to the Sa and the other end of the bit line is denoted as L1. For the edge memory array tile, the distance between one end that is of the integrated bit line (the first bit line+the second bit line) and that is connected to the Sa and the other end of the integrated bit line is denoted as L2. L1=L2.
Therefore, the area of the edge memory array tile (11_1 and 11_N) is reduced by nearly half compared with the area of the non-edge memory array tile (11_2, . . . , 11_N−1). Therefore, an integration level of the memory 10 is improved, and the overall area occupied by memory cells is reduced.
It should be noted that each memory array tile in
Subsequently, N=65 is adopted for illustration and description. Adaptive understanding may be made when N is an even number or another value.
In particular, a bit line stress (BL stress) test is an important performance test item of the memory 10. A test method is that different voltages are applied to adjacent bit lines and whether memory cells can operate normally is observed subsequently. For the memory 10 shown in
Therefore, this embodiment of the present disclosure further provides a BL stress test method for the memory 10 shown in
For ease of description, for
For example, an odd number is adopted as a start point for numbering. Refer to
In the memory 10 provided in this embodiment of the present disclosure, each bit line in the non-edge memory array tile (11_2, 11_3, . . . , 11_64) is coupled to a corresponding stress test power supply TXo/TXe, and a stress test power supply corresponding to the first bit line BLa is different from a stress test power supply corresponding to an adjacent second bit line BLb. Refer to
The first bit line in the edge memory array tile (11_1 and 11_65) is coupled to a corresponding stress test power supply, and a stress test power supply corresponding to an odd-numbered first bit line BLao is different from a stress test power supply corresponding to an even-numbered first bit line BLae. It should be understood that, in
In particular,
Refer to
The readout amplifier module includes multiple sense amplifiers Sa sequentially arranged in the second direction. The sense amplifiers of each readout amplifier module are numbered in the second direction. An odd-numbered sense amplifier Sa is represented as 400. An even-numbered sense amplifier Sa is represented as 40e. For a structure of each sense amplifier Sa, refer to
Refer to
For example, the first offset cancellation switch 31, the second offset cancellation switch 33, the first isolation switch 32, and the second isolation switch 34 are all transistors.
The first terminal or the second terminal of each sense amplifier Sa is further connected to a precharge power supply VAD through a corresponding precharge switch 35. It should be understood that in
In this way, in the memory provided in this embodiment of the present disclosure, the area of the edge memory array tile is reduced to half of the area of another memory array tile. In addition, each bit line in the memory array tile has a respective stress test power supply, thereby efficiently implementing the bit line stress test.
In a first specific embodiment, the precharge power supply coupled to the bit line in the non-edge memory array tile (11_2, 11_3, . . . , 11_64) is adopted as the stress test power supply. However, the first bit line in the edge memory array tile (11_1 and 11_65) is further coupled to a respective edge test power supply through a first test switch, and the edge test power supply coupled to the first bit line is adopted as the stress test power supply.
The following provides specific description.
Refer to
On the one hand, as shown in
It should be understood that, in
On the other hand, the memory 10 further includes two groups of edge test power supplies. One group of edge test power supplies is referred to as first edge test power supplies VAD2Eedge, and the other group of edge test power supplies is referred to as second edge test power supplies VAD2Oedge. For the edge memory array tile (11_1 and 11_65), the first edge test power supply VAD2Eedge is adopted as the stress test power supply TXe, and the second edge test power supply VAD2Oedge is adopted as the stress test power supply TXo.
In one case, refer to
In another case, for a first memory array tile 11_1, the odd-numbered first bit line BLao is connected to the first edge test power supply VAD2Eedge through a respective test switch, and the even-numbered first bit line BLae is connected to the second edge test power supply VAD2Oedge through a respective test switch. For a last memory array tile 11_65, the odd-numbered first bit line BLao is connected to the second edge test power supply VAD2Oedge through a respective test switch, and the even-numbered first bit line BLae is connected to the first edge test power supply VAD2Eedge through a respective test switch. Therefore, a test power supply corresponding to the odd-numbered first bit line BLao is different from a test power supply corresponding to the even-numbered first bit line BLae.
In this way, adjacent bit lines in the non-edge memory array tile are connected to different precharge power supplies, and the odd-numbered first bit line BLao and the even-numbered first bit line BLae in the edge memory array tile are connected to different edge test power supplies, thereby facilitating implementation of the bit line stress test BL stress, and ensuring product performance of the memory.
Based on the structure in
First, the memory 10 is specifically configured to control the first edge test power supply VAD2Eedge to be at a first voltage value, the second edge test power supply VAD2Oedge to be at a second voltage value, the first precharge power supply VAD2O to be at a third voltage value, and the second precharge power supply VAD2E to be at a fourth voltage value, and perform a bit line stress test operation. The first voltage value is different from the second voltage value, and the third voltage value is different from the fourth voltage value. For example, the first voltage value is a high level and the second voltage value is a low level, and vice versa; and the third voltage value is a high level and the fourth voltage value is a low level, and vice versa.
In addition, in the bit line stress test operation, all first test switches 13 are in an on state, isolation switches and offset cancellation switches between the edge memory array tile and an adjacent readout amplifier module are all in an off state, and other isolation switches, other offset cancellation switches, and all precharge switches are all in an on state.
It is assumed that the first voltage value=the third voltage value=a high level, the second voltage value=the fourth voltage value=a low level, and a memory structure shown in
In this way, on the one hand, isolation switches and offset cancellation switches between the non-edge memory array tile and the adjacent readout amplifier module are all in an on state. Therefore, the bit line therein is electrically communicated with a respective precharge power supply through a corresponding sense amplifier. To be specific:
On the other hand, because the isolation switches and the offset cancellation switches between the edge memory array tile and the adjacent readout amplifier module are all in the off state, the first bit line BLa in the edge memory array tile is not communicated with a corresponding precharge power supply. However, because all the first test switches 13 are turned on, the first bit line BLa in the edge memory array tile is communicated with a corresponding test power supply. To be specific:
(3) For the memory array tiles 11_1 and 11_65, both the odd-numbered first bit line BLao and the second bit line BLbo electrically connected thereto are at a high level (precharged through VAD2Eedge), and both the even-numbered first bit line BLa and the second bit line BLb electrically connected thereto are at a low level (precharged through VAD2OEdge).
In this way, adjacent bit lines in all the memory array tiles can be at different level values by only controlling voltage values of power supply terminals and operation states of corresponding switches, thereby facilitating execution of the bit line stress test.
In some embodiments, the memory 10 is further configured to control the first edge test power supply VAD2Eedge to be at the second voltage value, the second edge test power supply VAS2Oedge to be at the first voltage value, the first precharge power supply VAD2O to be at the fourth voltage value, and the second precharge power supply VAD2E to be at the third voltage value, and perform the bit line stress test operation.
It is assumed that the first voltage value=the third voltage value=a high level, the second voltage value=the fourth voltage value=a low level, and a memory structure shown in
(4) In the non-edge odd-numbered memory array tile (for example, the memory array tile 11_3, 11_5, . . . , or 11_63), the first bit lines BLa are all at a high level (precharged through VAD2E), and the second bit lines BLb are all at a low level (precharged through VAD2O).
(5) In the non-edge even-numbered memory array tile (for example, the memory array tile 11_2, 11_4, . . . , or 11_64), the first bit lines BLa are all at a low level (precharged through VAD2O), and the second bit lines BLb are all at a high level (precharged through VAD2E).
(6) For the memory array tiles 11_1 and 11_65, both the odd-numbered first bit line BLa and the second bit line BLb electrically connected thereto are at a low level (precharged through VAD2Eedge), and both the even-numbered first bit line BLa and the second bit line BLb electrically connected thereto are at a high level (precharged through VAD2OEdge).
In this way, the precharge power supplies are classified into two groups for management, and independent test power supplies are additionally disposed for the bit lines in the edge memory array tile, thereby efficiently implementing the bit line stress test.
To implement the foregoing test method, refer to
Ir can be learned from
That is, the bit line in the edge memory array tile is connected to an adjacent sense amplifier through the first offset cancellation switch 31 or the first isolation switch 32. Therefore, only the first offset cancellation switches 31 and the first isolation switches 32 that correspond to the readout amplifier module 12_1 and the readout amplifier module 12_64 need to be turned off, so that the edge memory array tiles can be electrically isolated from the adjacent sense amplifiers Sa. In this case, refer to
The command control circuit is configured to generate a test enable signal, an initial isolation signal IsoPre, and an initial offset cancellation signal OcPre. The test enable signal, the initial isolation signal IsoPre, and the initial offset cancellation signal OcPre are all in a valid state when the memory 10 is indicated to perform the bit line stress test operation.
The first preprocessing circuit 50 is configured to generate a first edge isolation signal IsobEdge and a second edge isolation signal IsoaEdge based on an edge test parameter group TmEdge<1:0> and the initial isolation signal IsoPre, and generate a first edge offset cancellation signal OcEnbEdge and a second edge offset cancellation signal OcEnaEdge based on the edge test parameter group TmEdge<1:0> and the initial offset cancellation signal OcPre.
The second preprocessing circuit 60 is configured to generate a first internal isolation signal IsobInter and a second internal isolation signal IsoaInter based on an internal test parameter group TmInter<1:0> and the initial isolation signal IsoPre, and generate a first internal offset cancellation signal OcEnbInter and a second internal offset cancellation signal OcEnaInter based on the internal test parameter group TmInter<1:0> and the initial offset cancellation signal OcPre.
The test enable signal is configured to control all the first test switches 13. In addition, (1) the first edge isolation signal IsobEdge is configured to control the first isolation switch 32 between an edge readout amplifier module and the edge memory array tile; (2) the second edge isolation signal IsoaEdge is configured to control the second isolation switch 34 between the edge readout amplifier module and the non-edge memory array tile; (3) the first edge offset cancellation signal OcEnbEdge is configured to control the first offset cancellation switch 31 between the edge readout amplifier module and the edge memory array tile; (4) the second edge offset cancellation signal OcEnaEdge is configured to control the second offset cancellation switch 33 between the edge readout amplifier module and the non-edge memory array tile; (5) the first internal isolation signal IsobInter is configured to control the first isolation switch 32 between a non-edge readout amplifier module and an adjacent memory array tile; (6) the second internal isolation signal IsoaInter is configured to control the second isolation switch 34 between the non-edge readout amplifier module and the adjacent memory array tile; (7) the first internal offset cancellation signal OcEnbInter is configured to control the first offset cancellation switch 31 between the non-edge readout amplifier module and the adjacent memory array tile; and (8) the second internal offset cancellation signal OcEnaInter is configured to control the second offset cancellation switch 33 between the non-edge readout amplifier module and the adjacent memory array tile.
In this way, the bit lines in the memory array tile are classified into two types. In a bit line stress test process, two continuously numbered first bit line BLa and second bit line BLb in the non-edge memory array tile are respectively charged through the first precharge power supply VAD2O and the second precharge power supply VAD2E, and two first bit lines BLa whose serial numbers are adjacent (and second bit lines BLb respectively and electrically connected thereto) in the edge memory array tile are respectively charged through the first edge test power supply VAD2Eedge and the second edge test power supply VAS2Oedge, so that adjacent bit lines in the entire memory array tile can be in different voltage states, thereby efficiently completing the bit line stress test, reducing energy consumption, and further avoiding a problem that the bit lines are overcharged and excessively stressed.
In a specific embodiment, as shown in
The first edge isolation signal IsobEdge and the first edge offset cancellation signal OcEnbEdge have the same levels as the initial isolation signal IsoPre and the initial offset cancellation signal OcPre in a one-to-one correspondence if the second test parameter TmEdge<1> is in a first state, or both the first edge isolation signal IsobEdge and the first edge offset cancellation signal OcEnbEdge are invalid if the second test parameter TmEdge<1> is in a second state.
The second edge isolation signal IsoaEdge and the second edge offset cancellation signal OcEnaEdge have the same levels as the initial isolation signal IsoPre and the initial offset cancellation signal OcPre in a one-to-one-correspondence if the first test parameter TmEdge<0> is in a first state, or both the second edge isolation signal IsoaEdge and the second edge offset cancellation signal OcEnaEdge are invalid if the first test parameter TmEdge<0> is in a second state.
The first internal isolation signal IsobInter and the first internal offset cancellation signal OcEnbInter have the same levels as the initial isolation signal IsoPre and the initial offset cancellation signal OcPre in a one-to-one correspondence if the fourth test parameter TmInter<1> is in a first state, or both the first internal isolation signal IsobInter and the first internal offset cancellation signal OcEnbInter are invalid if the fourth test parameter TmInter<1> is in a second state.
The second internal isolation signal IsoaInter and the second internal offset cancellation signal OcEnaInter have the same levels as the initial isolation signal IsoPre and the initial offset cancellation signal OcPre in a one-to-one correspondence if the third test parameter TmInter<0> is in a first state, or both the second internal isolation signal IsoaInter and the second internal offset cancellation signal OcEnaInter are invalid if the third test parameter TmInter<0> is in a second state.
In a process in which the memory is indicated to perform the bit line stress test operation, the second test parameter TmEdge<1> is in a second state, and the first test parameter TmEdge<0>, the third test parameter TmInter<0>, and the fourth test parameter TmInter<1> are each in a first state.
It should be noted that, corresponding switches are in an off state when the foregoing isolation signals, offset cancellation signals, and precharge signals are invalid, and corresponding switches are in an on state when the foregoing isolation signals, offset cancellation signals, and precharge signals are valid.
A specific operation scenario is provided: The first isolation switch 32, the second isolation switch 34, the first offset cancellation switch 31, and the second offset cancellation switch 33 are all N-type field effect transistors. “Valid” indicates a high level state, and “invalid” indicates a low level state.
Therefore, in a process of the bit line stress test operation, TmEdge<1:0>=01 and TmInter<1:0>=11. Therefore, the first edge isolation signal IsobEdge=the first edge offset cancellation signal OcEnbEdge=0, and the second edge isolation signal IsoaEdge=the second edge offset cancellation signal OcEnaEdge=1, so that the readout amplifier module 12_1 is electrically isolated from the memory array tile 11_1, and the readout amplifier module 12_64 is electrically isolated from the memory array tile 11_65, that is, the bit lines in the edge memory array tiles are electrically isolated from corresponding precharge power supplies. However, the readout amplifier module 12_1 is electrically communicated with the memory array tile 11_2, the readout amplifier module 12_64 is electrically communicated with the memory array tile 11_64, and the middle readout amplifier module 12_2 to readout amplifier module 12_63 are separately electrically communicated with memory array tiles on two sides, so that the bit lines in the non-edge memory array tiles are electrically communicated with corresponding precharge power supplies.
In the foregoing scenario, refer to
The second preprocessing circuit 60 includes:
In another specific embodiment, refer to
That is, the bit line in the first memory array tile 11_1 is electrically connected to an adjacent sense amplifier through the first offset cancellation switch or the first isolation switch, and the bit line 11_65 in the last memory array tile is electrically connected to an edge sense amplifier through the second offset cancellation switch or the second isolation switch. Refer to
The command control circuit (not shown in
The second preprocessing circuit 60 is configured to generate a first internal isolation signal IsobInter and a second internal isolation signal IsoaInter based on an internal test parameter group TmInter<1:0> and the initial isolation signal IsoPre, and generate a first internal offset cancellation signal OcEnbInter and a second internal offset cancellation signal OcEnaInter based on the internal test parameter group and the initial offset cancellation signal OcPre.
The third preprocessing circuit 70 is configured to generate a first head terminal isolation signal IsobEdge0 and a second head terminal isolation signal IsoaEdge0 based on a head terminal test parameter group TmEdge0<1:0> and the initial isolation signal IsoPre, and generate a first head terminal offset cancellation signal OcEnbEdge0 and a second head terminal offset cancellation signal OcEnaEdge0 based on the head terminal test parameter group and the initial offset cancellation signal OcPre.
The fourth preprocessing circuit 80 is configured to generate a first tail terminal isolation signal IsobEdgel and a second tail terminal isolation signal IsoaEdgel based on a tail terminal test parameter group TmEdge1<1:0> and the initial isolation signal IsoPre, and generate a first tail terminal offset cancellation signal OcEnbEdgel and a second tail terminal offset cancellation signal OcEnaEdgel based on the tail terminal test parameter group and the initial offset cancellation signal OcPre.
All test switches 13 are controlled by the test enable signal. The first isolation switch, the second isolation switch, the first offset cancellation switch, and the second offset cancellation switch between a first readout amplifier module 11_1 and an adjacent memory array tile are controlled by the first head terminal isolation signal IsobEdge0, the second head terminal isolation signal IsoaEdge0, the first head terminal offset cancellation signal OcEnbEdge0, and the second head terminal offset cancellation signal OcEnaEdge0 in a one-to-one correspondence. The first isolation switch 31, the second isolation switch 33, the first offset cancellation switch 32, and the second offset cancellation switch 34 between a last readout amplifier module 11_65 and an adjacent memory array tile are controlled by the first tail terminal isolation signal IsobEdge1, the second tail terminal isolation signal IsoaEdge1, the first tail terminal offset cancellation signal OcEnbEdge1, and the second tail terminal offset cancellation signal in a one-to-one correspondence. The first isolation switch 31, the second isolation switch 33, the first offset cancellation switch 32, and the second offset cancellation switch 34 between a non-edge readout amplifier module (11_2, 11_3, . . . , 11_64) and an adjacent memory array tile are controlled by the first internal isolation signal IsobInter, the second internal isolation signal IsoaInter, the first internal offset cancellation signal OcEnbInter, and the second internal offset cancellation signal OcEnaInter in a one-to-one correspondence.
In some embodiments, the internal test parameter group includes at least a third test parameter TmInter<0> and a fourth test parameter TmInter<1>. The head terminal test parameter group includes a fifth test parameter TmEdge0<0> and a sixth test parameter TmEdge0<1>. The tail terminal test parameter group includes a seventh test parameter TmEdge1<0> and an eighth test parameter TmEdge1<1>.
The second internal isolation signal IsoaInter and the second internal offset cancellation signal OcEnaInter have the same levels as the initial isolation signal IsoPre and the initial offset cancellation signal OcPre in a one-to-one correspondence if the third test parameter TmInter<0> is in a first state, or both the second internal isolation signal IsoaInter and the second internal offset cancellation signal OcEnaInter are invalid if the third test parameter TmInter<0> is in a second state.
The first internal isolation signal IsobInter and the first internal offset cancellation signal OcEnbInter have the same levels as the initial isolation signal IsoPre and the initial offset cancellation signal OcPre in a one-to-one correspondence if the fourth test parameter TmInter<1> is in a first state, or both the first internal isolation signal IsobInter and the first internal offset cancellation signal OcEnbInter are invalid if the fourth test parameter TmInter<1> is in a second state.
The second head terminal isolation signal IsoaEdge0 and the second head terminal offset cancellation signal OcEnaEdge0 have the same levels as the initial isolation signal IsoPre and the initial offset cancellation signal OcPre in a one-to-one correspondence if the fifth test parameter TmEdge0<0> is in a first state, or both the second head terminal isolation signal IsoaEdge0 and the second head terminal offset cancellation signal OcEnaEdge0 are invalid if the fifth test parameter TmEdge0<0> is in a second state.
The first head terminal isolation signal IsobEdge0 and the first head terminal offset cancellation signal OcEnbEdge0 have the same levels as the initial isolation signal IsoPre and the initial offset cancellation signal OcPre in a one-to-one correspondence if the sixth test parameter TmEdge0<1> is in a first state, or both the first head terminal isolation signal IsobEdge0 and the first head terminal offset cancellation signal OcEnbEdge0 are invalid if the sixth test parameter TmEdge0<1> is in a second state.
The second tail terminal isolation signal IsoaEdge1 and the second tail terminal offset cancellation signal OcEnaEdge1 have the same levels as the initial isolation signal IsoPre and the initial offset cancellation signal OcPre in a one-to-one correspondence if the seventh test parameter TmEdge1<0> is in a first state, or both the second tail terminal isolation signal IsoaEdge1 and the second tail terminal offset cancellation signal OcEnaEdgel are invalid if the seventh test parameter TmEdge1<0> is in a second state.
The first tail terminal isolation signal IsobEdge1 and the first tail terminal offset cancellation signal OcEnbEdge1 have the same levels as the initial isolation signal IsoPre and the initial offset cancellation signal OcPre in a one-to-one correspondence if the eighth test parameter TmEdge1<1> is in a first state, or both the first tail terminal isolation signal IsobEdgel and the first tail terminal offset cancellation signal OcEnbEdgel are invalid if the eighth test parameter TmEdge1<1> is in a second state.
In the process in which the memory is indicated to perform the bit line stress test operation, the sixth test parameter TmEdge0<1> and the seventh test parameter TmEdge1<0> are each in a second state, and the third test parameter TmInter<0>, the fourth test parameter TmInter<1>, the fifth test parameter TmEdge0<0>, and the eighth test parameter TmEdge1<1> are each in a first state.
Specifically, in the process of performing the bit line stress test operation, TmEdge0<1:0>=01, TmInter<1:0>=11, and TmEdge1<1:0>=10. Therefore, the readout amplifier module 12_1 is electrically isolated from the memory array tile 11_1, and the readout amplifier module 12_64 is electrically isolated from the memory array tile 11_65. However, the readout amplifier module 12_1 is electrically communicated with the memory array tile 11_2, and the readout amplifier module 12_64 is electrically communicated with the memory array tile 11_64. The readout amplifier module 12_2 to the readout amplifier module 12_63 are separately electrically communicated with memory array tiles on two sides. Therefore, the bit line in the non-edge memory array tile is precharged through the precharge power supply, but the bit line in the edge memory array tile cannot be precharged through the precharge power supply, but charged through the edge test power supply.
In the foregoing scenario, a structure of the second preprocessing circuit 60 in this case is the same as that shown in
Refer to
In this scenario, refer to
In conclusion, in the memory provided in this embodiment of the present disclosure, the area of the edge memory array tile is reduced to half of the area of another memory array tile. In addition, the precharge power supplies are classified into two groups for management, and an independent edge test power supply is additionally disposed for the bit line in the edge memory array tile, thereby efficiently implementing the bit line stress test, improving a test procedure of the memory of this structure, and ensuring as-shipped performance.
In a second specific embodiment, the bit line in the non-edge memory array tile (11_2, 11_3, . . . , 11_64) is further coupled to a respective precharge power supply through a column gating switch and a second test switch; and the first bit line in the edge memory array tile (11_1 and 11_65) is further coupled to a respective precharge power supply through a column gating switch and a second test switch. That is, the first bit line is electrically communicated with the respective precharge power supply only when both the column gating switch and the second test switch are turned on. The precharge power supply coupled to each bit line in each memory array tile is adopted as the stress test power supply.
The following provides specific description.
Refer to
In addition, in a possible implementation, each bit line in all the memory array tiles is coupled to the first precharge power supply VAD2O through a respective precharge switch 35. However, one type of bit line is connected to the first precharge power supply VAD2O through the column gating switch+the second test switch, and the other type of bit line is connected to the second precharge power supply VAD2E through the column gating switch+the second test switch. In this way, in a stress test process, the precharge switch 35 is turned off and the column gating switch+the second test switch are turned on, so that one of two adjacent bit lines (in an internal array tile) (or two continuously numbered first bit lines in an edge array tile) is precharged through the first precharge power supply VAD2O and the other is precharged through the second precharge power supply VAD2E. In a normal operation process, the precharge switch 35 is turned on, and the second test switch is turned off, so that all the bit lines are precharged through the first precharge power supplies VAD2O, thereby implementing a normal precharge function.
Similarly, in another possible implementation, each bit line in all the memory array tiles is coupled to the second precharge power supply VAD2E through a respective precharge switch 35. Alternatively, in still another possible implementation, some bit lines are coupled to the first precharge power supplies VAD2O through respective precharge switches 35, and the remaining bit lines are coupled to the second precharge power supplies VAD2E through respective precharge switches 35, for example, the case described in the foregoing embodiment.
Refer to
Specifically, the bit line in the non-edge memory array tile (11_2, 11_3, . . . , 11_64) is coupled to a respective local data line (IO/ION) through a respective column gating switch 38. (1) Local data lines coupled to the second bit line BLb in a non-edge odd-numbered memory array tile (11_3, 11_5, . . . , 11_63) and the first bit line BLa in a non-edge even-numbered memory array tile (11_2, 11_4, . . . , 11_64) are further connected to a first precharge power supply VAD20 through respective second test switches 14. (2) Local data lines coupled to the first bit line BLa in the non-edge odd-numbered memory array tile (11_3, 11_5, . . . , 11_63) and the second bit line BLb in the non-edge even-numbered memory array tile (11_2, 11_4, . . . , 11_64) are further connected to a second precharge power supply VAD2E through respective second test switches 14.
In addition, the first bit line in the edge memory array tile (11_1 and 11_65) is coupled to a respective local data line through a respective column gating switch.
In one case, refer to
In another case, for a first memory array tile 11_1, a local data line coupled to the odd-numbered first bit line BLao is coupled to a second precharge power supply VAD2E through the second test switch 14, and a local data line coupled to the even-numbered first bit line BLae is coupled to a first precharge power supply VAD2O through the second test switch 14, and for a last memory array tile 11_65, a local data line coupled to the odd-numbered first bit line BLao is coupled to a first precharge power supply VAD2O through the second test switch 14, and a local data line coupled to the even-numbered first bit line BLae is coupled to a second precharge power supply VAD2E through the second test switch 14.
Briefly, for the edge memory array tile, a precharge power supply connected to the first bit line through the precharge switch 35 may be different from a precharge power supply connected to the first bit line through the column gating switch 38+the second test switch 14. It is assumed in one case that all the first bit lines BLa in the memory array tile 11_1 are connected to the first precharge power supply VAD2O through the precharge switches 35, but BLao in the memory array tile 11_1 is coupled to the second precharge power supply VAD2E through the column gating switch 38+the second test switch 14, and BLae is coupled to the first precharge power supply VAD2O through the column gating switch 38+the second test switch 14. This is merely a possible case. In addition, in the bit line stress test process, all the bit lines are communicated with corresponding precharge power supplies through the column gating switches 38+the second test switches 14, but the precharge switches are turned off. In a conventional precharge operation, all the bit lines are communicated with the corresponding precharge power supplies through the precharge switches, but the column gating switches 38+the second test switches 14 are turned off.
Based on the structure in
The memory 10 is configured to control all isolation switches, offset cancellation switches, and precharge switches to be in an off state, control all column gating switches and second test switches to be in an on state, and control the first precharge power supply to be at a first voltage value and the second precharge power supply to be at a second voltage value, to perform one time of bit line stress test.
In this way, in the bit line stress test process, all the bit lines are communicated with the corresponding precharge power supplies through the column gating switches 38+the second test switches 14. It is assumed that the first voltage value=the third voltage value=a high level (for example, 1.55 V), and the second voltage value=the fourth voltage value=a low level (for example, 0 V). Refer to
In addition, the memory 10 is further configured to control all isolation switches, offset cancellation switches, and precharge switches to be in an off state, control all column gating switches and second test switches to be in an on state, and control the first precharge power supply to be at a second voltage value and the second precharge power supply to be at a first voltage value, to perform another time of bit line stress test.
It is assumed that the first voltage value=the third voltage value=a high level, and the second voltage value=the fourth voltage value=a low level. Refer to
In the memory provided in this embodiment of the present disclosure, each bit line is further connected to the precharge power supply through the column gating switch and the second test switch, so that the precharge power supply is adopted as the stress test power supply. On the one hand, the bit line stress test can be efficiently implemented, the test procedure of the memory of this structure can be improved, and as-shipped performance can be ensured. On the other hand, there is no need to dispose two groups of independent edge test power supplies for the edge memory array tiles, and a circuit area is reduced.
In a third specific embodiment, the bit line in the non-edge memory array tile (11_2, 11_3, . . . , 11_64) is further coupled to a respective preset test power supply through a column gating switch 38 and a second test switch 14; the first bit line in the edge memory array tile (11_1 and 11_65) is further coupled to a respective preset test power supply through a column gating switch and a second test switch; and the preset test power supply coupled to each bit line in each memory array tile is adopted as the stress test power supply.
That is, in addition to the precharge power supplies, two groups of preset test power supplies are further disposed in the memory 10, that is, first preset test power supplies Vintlp2o and second preset test power supplies Vintlp2o, which are respectively adopted as the stress test power supplies TXo and TXe.
The following provides specific description.
Refer to
In addition, the first bit line in the edge memory array tile (11_1 and 11_65) is coupled to a respective local data line through a respective column gating switch.
In one case, refer to
In another case, for a first memory array tile 11_1, a local data line coupled to the odd-numbered first bit line BLao is coupled to a second preset test power supply Vintlp2e through the second test switch 14, and a local data line coupled to the even-numbered first bit line BLae is coupled to a first preset test power supply Vintlp2o through the second test switch 14, and for a last memory array tile 11_65, a local data line coupled to the odd-numbered first bit line BLao is coupled to a first preset test power supply Vintlp2o through the second test switch 14, and a local data line coupled to the even-numbered first bit line BLae is coupled to a second preset test power supply Vintlp2e through the second test switch 14.
For example, the first preset test power supply may use a precharge power supply of the local data line IO, and the second preset test power supply may use a precharge power supply of the local data line ION, and no additional independent power supply is required, thereby reducing the circuit area.
Based on the structure in
The memory 10 is configured to control all isolation switches and offset cancellation switches to be in an off state, control all precharge switches to be in an on state, and control the precharge power supply VAD to be at a fifth voltage value; and control all column gating switches and second test switches to be in an on state, and control the first preset test power supply to be at a first voltage value and the second preset test power supply to be at a second voltage value, to perform one time of bit line stress test.
It should be noted that a voltage of the fifth voltage value is located between a voltage of the first voltage value and a voltage of the second voltage value. In this way, the first voltage value may be a high level (for example, 1.55 V), the second voltage value is a low level (for example, 0 V), and the fifth voltage value may be 0.5 V. Therefore, in the bit line stress test process, the pull-up unit NCS and the pull-down unit PCS are precharged through the precharge power supply VAD to 0.5 V through the precharge switch 38. In this way, the sense amplifier SA is not excessively stressed.
In the foregoing voltage conditions, as shown in
In addition, the memory 10 is further configured to control all isolation switches and offset cancellation switches to be in an off state, control all precharge switches to be in an on state, and control the precharge power supply to be at a fifth voltage value; and control all column gating switches and second test switches to be in an on state, and control the first preset test power supply to be at a second voltage value and the second preset test power supply to be at a first voltage value, to perform another time of bit line stress test.
It is assumed that the first voltage value=the third voltage value=a high level, the second voltage value=the fourth voltage value=a low level, and the fifth voltage value=0.5 V. Refer to
In short, in the bit line stress test process, all the bit lines are communicated with corresponding preset test power supplies through the column gating switches 38+the second test switches 14, and the precharge switches are turned on, so that the pull-up modules PCS and the pull-down modules NCS are approximately at 0.5 V, and the sense amplifiers SA are prevented from being excessively stressed. In a conventional precharge operation, all the bit lines are communicated with the corresponding precharge power supplies through the precharge switches, but the column gating switches 38+the second test switches 14 are turned off.
In the memory provided in this embodiment of the present disclosure, the area of the edge memory array tile is reduced to half of the area of another memory array tile, and two groups of preset test power supplies are further provided in addition to the precharge power supplies, thereby efficiently implementing the bit line stress test, improving the test procedure of the memory of this structure, and ensuring as-shipped performance.
In another embodiment of the present disclosure, a test method is provided. The test method is applied to the foregoing memory 10. The memory 10 includes N memory array tiles sequentially arranged in a first direction. The memory array tile includes multiple first bit lines and multiple second bit lines, and the first bit lines and the second bit lines are alternately arranged in a second direction. The first bit line is electrically isolated from an adjacent second bit line for a non-edge memory array tile, and the first bit line is electrically connected to an adjacent second bit line on a first side and the first bit line is electrically isolated from an adjacent second bit line on a second side for an edge memory array tile.
For ease of description, the memory array tiles are numbered in the first direction. A first one of bit lines in an odd-numbered memory array tile is a second bit line. A first one of bit lines in an even-numbered memory array tile is a first bit line. The first bit lines in each memory array tile are sequentially numbered in the second direction, and the second bit lines in each memory array tile are sequentially numbered in the second direction.
The method includes:
In the step S901, in a process of performing a bit line stress test operation, each first bit line in an edge memory array tile is charged through a stress test power supply corresponding to each first bit line; and each bit line in a non-edge memory array tile is charged through a stress test power supply corresponding to each bit line. The foregoing operations are simultaneously performed.
For the edge memory array tile, a voltage of a stress test power supply corresponding to an odd-numbered first bit line is different from that of a stress test power supply corresponding to an even-numbered first bit line. For a non-edge memory array tile, a voltage of a stress test power supply corresponding to the first bit line is different from that of a stress test power supply corresponding to an adjacent second bit line.
In conclusion, this embodiment of the present disclosure further provides a test method for the foregoing memory 10. Adjacent bit lines in all memory array tiles can be at different voltages by performing one step, thereby efficiently implementing the bit line stress test, improving a test procedure of the memory of this structure, and ensuring as-shipped performance.
It should be noted that in this specification, the terms “include”, “comprise”, or any other variant thereof are intended to cover non-exclusive inclusion, so that a process, method, article, or apparatus including a series of elements includes not only those elements but also other elements that are not expressly listed, or further includes elements inherent to such a process, method, article, or apparatus. An element preceded by “includes a . . . ” does not, without more constraints, preclude the presence of additional identical elements in the process, method, article, or apparatus including the element.
The sequence numbers of the foregoing embodiments of the present disclosure are merely for the purpose of description, and are not intended to indicate priorities of the embodiments. The methods disclosed in the several method embodiments provided in the present disclosure may be randomly combined when there is no conflict, to obtain new method embodiments. The features disclosed in the several product embodiments provided in the present disclosure may be randomly combined when there is no conflict, to obtain new product embodiments. The features disclosed in the several method or device embodiments provided in the present disclosure may be randomly combined when there is no conflict, to obtain new method embodiments or new device embodiments.
The foregoing descriptions are merely specific implementations of the present disclosure, but are not intended to limit the protection scope of the present disclosure. Any variation or replacement readily figured out by a person skilled in the art within the technical scope disclosed in the present disclosure shall fall within the protection scope of the present disclosure. Therefore, the protection scope of the present disclosure shall be subject to the protection scope of the claims.
| Number | Date | Country | Kind |
|---|---|---|---|
| 202311634142.9 | Nov 2023 | CN | national |
This application is a continuation of International Patent Application No. PCT/CN2024/127589 filed on Oct. 28, 2024, which claims priority to Chinese Patent Application No. 202311634142.9 filed on Nov. 28, 2023. The disclosures of the above-referenced applications are hereby incorporated by reference in their entirety.
| Number | Date | Country | |
|---|---|---|---|
| Parent | PCT/CN2024/127589 | Oct 2024 | WO |
| Child | 18968317 | US |
