MEMS DEVICE WITH CAPACITANCE ENHANCEMENT ON QUADRATURE COMPENSATION ELECTRODE

Abstract

A MEMS device includes a mass system capable of undergoing oscillatory drive motion along a drive axis and oscillatory sense motion along a sense axis perpendicular to the drive axis. A quadrature correction unit includes a fixed electrode and a movable electrode coupled to the movable mass system, each being lengthwise oriented along the drive axis. The movable electrode is spaced apart from the fixed electrode by a gap having an initial width. At least one of the fixed and movable electrodes includes an extrusion region extending toward the other of the fixed and movable electrodes. The movable electrode undergoes oscillatory motion with the mass system such that the extrusion region is periodically spaced apart from the other of the fixed and movable electrodes by a gap exhibiting a second width that is less than the first width thereby enabling capacitance enhancement between the electrodes.

Description

TECHNICAL FIELD OF THE INVENTION

The present invention relates generally to microelectromechanical systems (MEMS) devices. More specifically, the present invention relates to capacitance enhancement for a MEMS device, such as an angular rate sensor.

BACKGROUND OF THE INVENTION

Microelectromechanical systems (MEMS) technology has achieved wide popularity in recent years, as it provides a way to make very small mechanical structures and integrate these structures with electrical devices on a single substrate using conventional batch semiconductor processing techniques. One common application of MEMS is the design and manufacture of sensor devices. MEMS sensor devices are widely used in applications such as automotive, inertial guidance systems, household appliances, game devices, protection systems for a variety of devices, and many other industrial, scientific, and engineering systems. One example of a MEMS sensor is a MEMS angular rate sensor. Alternatively referred to as a “gyroscope”, “gyrometer,” “vibratory rate gyroscopes,” “gyroscope sensor,” or “yaw rate sensor,” an angular rate sensor senses angular speed or velocity around one or more axes.

In vibratory angular rate sensors, an inherent problem is the existence of undesirable interference signals, referred to as quadrature motion or quadrature error. Quadrature motion is defined as the direct coupling of the drive mode displacement to the sense mode of the angular rate sensor. Typically, quadrature motion occurs in vibrating angular rate sensors due to manufacturing imperfections that permit the sense mass to oscillate relative the sense axis in response to the drive mode displacement in an orthogonal direction. This oscillation can be confused with Coriolis acceleration and subsequently the rotation rate. Quadrature motion can result in offset error, reduced dynamic range, and increased noise for the device. A large quadrature error can even cause a device to rail so that the sense mass comes into contact with conductive electrodes potentially resulting in collision-related damage, such as a short. Accordingly, the introduction of MEMS angular rate sensors into the high-precision, low power consumption market has been problematic due at least in part to error sources, such as quadrature motion.

BRIEF DESCRIPTION OF THE DRAWINGS

The accompanying figures in which like reference numerals refer to identical or functionally similar elements throughout the separate views, the figures are not necessarily drawn to scale, and which together with the detailed description below are incorporated in and form part of the specification, serve to further illustrate various embodiments and to explain various principles and advantages all in accordance with the present invention.

FIG. 1 shows, in a simplified and representative form, a top view of a prior art angular rate sensor;

FIG. 2 shows a top view of an angular rate sensor in accordance with an embodiment;

FIG. 3 shows an enlarged top view of a fixed electrode and a movable electrode of the angular rate sensor of FIG. 2 in a first position relative to one another;

FIG. 4 shows an enlarged top view of a fixed electrode and a movable electrode of the angular rate sensor of FIG. 2 in a second position relative to one another;

FIG. 5 shows a chart of a time varying quadrature compensation force resulting from the implementation of the fixed and movable electrodes within the angular rate sensor of FIG. 2; and

FIG. 6 shows a generalized block diagram of a sensor package that includes the angular rate sensor of FIG. 2 in communication with a control circuit.

DETAILED DESCRIPTION

Embodiments disclosed herein entail microelectromechanical systems (MEMS) devices, such as angular rate sensors, in which a quadrature compensation unit is implemented to null or otherwise compensate for quadrature motion. The quadrature compensation unit includes pairs of fixed and movable electrodes, and the fixed and movable electrodes include extrusion regions extending toward one another. When the movable electrodes undergo oscillatory motion, the extrusion regions are periodically positioned between each pair of fixed and movable electrodes to effectively reduce a width of a gap between the movable and fixed electrodes. A force needed to compensate for the quadrature motion depends upon the width of the gap between movable and fixed electrodes, the voltage applied, and the total overlap area of the fixed and movable electrodes. The reduced width of the gap provides capacitance enhancement so as to reduce the voltage and the number of fixed and movable electrodes needed to effectively generate the quadrature compensation force.

The instant disclosure is provided to further explain in an enabling fashion the best modes, at the time of the application, of making and using various embodiments in accordance with the present invention. The disclosure is further offered to enhance an understanding and appreciation for the inventive principles and advantages thereof, rather than to limit in any manner the invention. The invention is defined solely by the appended claims including any amendments made during the pendency of this application and all equivalents of those claims as issued.

Referring to FIG. 1, FIG. 1 shows, in a simplified and representative form, a top view of a prior art angular rate sensor 20. In general, angular rate sensor 20 includes a movable mass system 22 flexibly coupled to a substrate 24 and a quadrature compensation unit 26. Quadrature compensation unit 26 includes pairs of fixed and movable electrodes 30, 32. More particularly, fixed electrode 30 of each pair extends from an anchor structure 34 coupled to substrate 24 and movable electrode 32 of each pair is coupled to and extends from movable mass system 22. Thus, movable electrode 32 is movable relative to fixed electrode 30. In the illustrated example, fixed and movable electrodes 30, 32 are lengthwise oriented in a first direction corresponding to an X-axis 36 in a three-dimensional coordinate system. Additionally, movable electrode 32 is laterally spaced apart from fixed electrode 30 by a gap 38 in a second direction corresponding to a Y-axis 40 that is perpendicular to X-axis 36. Gap 38 exhibits a width 42, labeled Y₀.

To operate angular rate sensor 20, a drive system (not shown for simplicity of illustration) in communication with movable mass system 22 enables oscillatory drive motion, as represented by a bi-directional arrow 44, of movable mass system 22 substantially parallel to a drive axis, which in this example is X-axis 36. Thus, X-axis 36 is referred to herein as drive axis 36. Oscillatory drive motion 44 of movable mass system 22 may be kept constant to maintain constant sensitivity of angular rate sensor 20. Additionally or alternatively, the frequency of oscillation can be locked to the mechanical resonance of movable mass system 22 to minimize drive power.

Once movable mass system 22 is put into oscillatory drive motion 44 parallel to drive axis 36, it is capable of detecting an angular rate, i.e., angular velocity as represented by a curved arrow 46, induced by angular rate sensor 20 being rotated about an axis of rotation, referred to herein as an input axis. In this example, the input axis is the Z-axis 48 in a three-dimensional coordinate system. Thus, Z-axis 48 is referred to herein as an input axis 48 in connection with angular rate sensor 20. As angular rate sensor 20 experiences angular velocity 46 about input axis 48, movable mass system 22 undergoes oscillatory sense motion, represented by a bi-directional arrow 50, substantially parallel to a sense axis, which in this example, is Y-axis 40. Thus, Y-axis 40 is referred to herein as sense axis 40 in connection with angular rate sensor 20. In particular, a Coriolis acceleration occurs relative to sense axis 40, which is perpendicular to both drive axis 36 and input axis 48. The Coriolis acceleration causes generally in-plane linear oscillatory sense motion 50 of movable mass system 22 parallel to sense axis 40. This linear oscillatory sense motion 50 has an amplitude that is proportional to angular velocity 46 of sensor 20 about input axis 48. Oscillatory sense motion 50 can be detected as changes in capacitance between fixed and movable sense electrodes of a sense system (not shown for simplicity) as known to those skilled in the art.

Movable mass system 22 is represented in greatly simplified form. It should be understood, however, that movable mass system 22 can include a great variety of shapes and configurations. For example, movable mass system 22 may include one or more drive masses suitably interconnected with one or more sense masses, where the sense mass(es) together with the drive mass(es) undergo oscillatory drive motion 44, and the sense mass(es) undergo oscillatory sense motion 50 in response to angular velocity 46. Alternatively, movable mass system 22 may include a single mass flexibly coupled to substrate 24 that can undergo oscillatory drive motion 44 and undergo oscillatory sense motion 50 in response to angular velocity 46.

As mentioned previously, movable mass system 22 may undergo quadrature motion, represented by an arrow 52. Quadrature motion 52 of movable mass system 22 can be a result of signal leakage from drive axis 36 to sense axis 40 caused by mass and spring imbalance due to manufacturing imperfections, anisoelastic coupling, and so forth. This quadrature motion 52 can result in a quadrature error signal that can be as large as thousands of degrees per second and can be ninety degrees out of phase with the Coriolis acceleration. Demodulation can eliminate some of the error component resulting from the quadrature motion 52. However, a small phase error may still overwhelm a sense loop circuit.

Accordingly, quadrature compensation unit 26 may be implemented with angular rate sensor 20 in order to apply an electrostatic force, referred to herein as a quadrature compensation force and represented by an arrow 54, via fixed and movable electrodes 30,32 in opposite phase relation to quadrature motion 52. Quadrature compensation force 54 is applied to compensate for, or otherwise null, quadrature motion 52. The arrow representing quadrature compensation force 54 is oriented in a direction opposite to that of the arrow representing quadrature motion 52 in order to emphasize the opposite phase relation. It should be understood, however, that quadrature motion 52 is an oscillatory motion. Therefore, quadrature compensation force 54 is an oscillatory motion in opposite phase relation to the oscillatory quadrature motion 52.

A gyroscope equation of motion with off-diagonal terms is represented, as follows:

$\begin{array}{cc}[\begin{array}{cc}{m}_d& 0\\ 0& m_s\end{array}][\begin{array}{c}\ddot{x}\\ \ddot{y}\end{array}]+[\begin{array}{cc}{c}_x& 0\\ 0& c_y\end{array}][\begin{array}{c}\stackrel{.}{x}\\ \stackrel{.}{y}\end{array}]+[\begin{array}{cc}{k}_x& k_{\mathrm{xy}}\\ k_{\mathrm{yx}}& k_y\end{array}][\begin{array}{c}x\\ y\end{array}]=[\begin{array}{c}{F}_d\\ -2m_c{\Omega }_z\stackrel{.}{x}\end{array}]& \left(1\right)\end{array}$

which yields the following:

m _s ÿ+c _y {dot over (y)}+k _y y=−2m_cΩ_z{dot over (x)}−k_yxx  (2)

In the equations presented above, F_d is the drive force needed to enable oscillatory drive motion 44 of movable mass system 22, where m_d is the mass of the drive mass portion of movable mass system 22, c_x is the damping coefficient in the drive (x) direction, k_x is the spring constant in the drive direction, k_xy is the spring constant cross-coupling force on sense axis (y) 40 that may cause displacement along drive axis (x) 36, {umlaut over (x)} is acceleration in the drive direction, {dot over (x)} is velocity in the drive direction, and x is the drive displacement. Additionally, m_s is the mass of the sense mass portion of movable mass system 22, c_y is the damping coefficient in the sense (y) direction, k_y is the spring constant in the sense direction, k_yx is the spring constant cross-coupling force on drive axis (x) 36 that may cause displacement along sense axis (y) 40, ÿ is acceleration in the sense direction, {dot over (y)} is velocity in the sense direction, and y is the sense displacement.

In equation (2), the righthand side of the equation reveals that sense motion 50 is a function of m_c, Ω_z and {dot over (x)}, where m_c is the mass of the “Coriolis mass” (i.e., the mass upon which Coriolis acceleration is being imposed upon), Ω_z is angular velocity 46 about input axis (z) 48, and k is the velocity in the drive direction. Additionally, quadrature motion 52 is a function of k_yx and x, where k_yx is the spring constant cross-coupling force on sense axis (y) 40 from drive axis (x) 36 and x is the drive displacement. Thus, a time varying force that is in phase with oscillatory drive motion 44 is needed to cancel quadrature motion 52, represented by k_yxx in equation (2).

Quadrature compensation force 54 needed to cancel quadrature motion 52 can be characterized by the following equations:

$\begin{array}{cc}E=\frac{1}{2}CV^2=\frac{1}{2}\left[C_0+N\varepsilon \frac{\mathrm{xh}}{y}\sin \left({\omega }_dt\right)\right]{\left(V_{\mathrm{pm}}-V_q\right)}^2\mathrm{and}& \left(3\right)\\ F_q=-\frac{\partial E}{\partial y}\propto \varepsilon hV_{\mathrm{pm}}\frac{NV_q}{y_0^2}x& \left(4\right)\end{array}$

In the equations presented above, E is the energy of a capacitor, C is capacitance, and V is voltage. Further, C₀ is static capacitance, N is the total overlap area of fixed and movable electrodes 30, 32, ε is permittivity of the free space, h is the structural thickness, y is the displacement along sense axis 40, sin(ω_dt) is the drive motion, ω_d is the drive frequency, t is time, V_pm is the voltage potential of the drive mass portion of movable mass system 22, and V_q is the voltage applied to fixed electrodes 30 of each pair of fixed and movable electrodes 30, 32.

In equation (4), F_q represents quadrature compensation force 54, i.e., the electrostatic force needed to compensate for or null quadrature motion 52. Quadrature compensation force 54 is a function of the partial derivative of the energy of a capacitor and the partial derivative of the displacement along sense axis. Thus, quadrature compensation force 54 is proportional to the product of the permittivity of free space (ε), the structural thickness (h), the voltage potential of the drive mass portion of movable mass system 22 (V_pm), displacement along drive axis 36 (x), and a fraction in which the numerator is a product of the overlap area (N) of fixed and movable electrodes 30, 32 and the voltage applied to fixed electrodes 30 of each pair of fixed and movable electrodes 30, 32 (V_q) and the denominator is the square of the width 42 (y₀) of gap 38 between fixed and movable electrodes 30, 32.

While application of quadrature compensation force (F_q) 54 can suppress quadrature motion 52, this technique requires relatively a large voltage (V_q) and large overlap area (N) for quadrature compensation electrodes (e.g., fixed and movable electrodes 30, 32), and/or precise phase matching between the quadrature error and the electrostatic compensation force. In order to save voltage (V_q) and area (N), it can be readily observed from equation (4) that a relatively small width 42 (y₀) of gap 38 is preferred. That is, quadrature compensation force (Fq) 54 is proportional to voltage (V_q) and area (N). However, the net quadrature compensation force (Fq) 54 increases quadratically by decreasing width 42 of gap 38 between fixed and movable electrodes 30, 32.

Unfortunately, width 42 is limited by the minimum-gap requirement of the fabrication process employed to fabricate fixed and movable electrodes 30, 32. By way of example, a minimum gap requirement of an etch process may be 1.5 microns. Accordingly, embodiments described below provide a technique for reducing the effective gap width between fixed and movable electrodes 30, 32 during travel of movable electrodes 32 along drive axis 36 without breaking the design rules of the minimum-gap requirement. Thus, the gap width can be much smaller than the minimum-gap width requirement of the fabrication process.

FIG. 2 shows a top view of an angular rate sensor 60 in accordance with an embodiment. In general, angular rate sensor 60 includes a movable mass system 62 flexibly coupled to a substrate 64 and a quadrature compensation unit 66. Quadrature compensation unit 66 includes pairs of fixed and movable electrodes 70, 72. More particularly, fixed electrode 70 of each pair extends from an anchor structure 74 coupled to substrate 64 and movable electrode 72 of each pair is coupled to and extends from movable mass system 62. Thus, movable electrode 72 is movable relative to fixed electrode 70. In the illustrated example, fixed and movable electrodes 70, 72 are lengthwise oriented in a first direction corresponding to drive axis 36.

Additionally, movable electrode 72 is laterally spaced apart from fixed electrode 70 by a first gap, referred to herein as an initial gap 76, in a second direction corresponding to sense axis 40 that is perpendicular to drive axis 36.

Like movable mass system 22, movable mass system 62 is represented in greatly simplified form. It should be understood, however, that movable mass system 62 can include a great variety of shapes, such as circular rings, disks, rectangles, and the like. In addition, movable mass system 62 may include one or more drive masses suitably interconnected with one or more sense masses. Alternatively, movable mass system 22 may include a single mass flexibly coupled to substrate 64. Such variances in structure will still include quadrature compensation electrodes (i.e., pairs of fixed and movable electrodes 70, 72) in association with the drive mass portion of movable mass system 62.

Furthermore, fixed and movable electrodes of a drive system and fixed and movable electrodes of a sense system are not shown in FIG. 2 for simplicity of illustration. It should be further understood that the use of relational terms herein, if any, such as first and second, top and bottom, and the like are used solely to distinguish one from another entity or action without necessarily requiring or implying any actual such relationship or order between such entities or actions.

In this example, quadrature compensation unit 66 includes two anchor structures 74, designated a first anchor structure 74A and a second anchor structure 74B. A pair of fixed and movable electrodes 70, 72 is distinguished by the subscript “1” and thus the electrodes include a first fixed electrode 70₁ and a first movable electrode 72₁. Similarly, another pair of fixed and movable electrodes 70, 72 is distinguished by the subscript “2” and thus the electrodes include a second fixed electrode 70₂ and a second movable electrode 72₂. Another pair of fixed and movable electrodes 70, 72 is distinguished the subscript “3” and thus the electrodes include a third fixed electrode 70₃ and a third movable electrode 72₃. Yet another pair of fixed and movable electrodes 70, 72 is distinguished by the subscript “4” and thus the electrodes include a fourth fixed electrode 70₄ and a fourth movable electrode 72₄.

First fixed electrode 70₁ extends from a first side 78 of first anchor structure 74A and second fixed electrode 70₂ extends from a second side 80 of first anchor structure 74A, where second side 80 is opposes first side 78. In addition, third fixed electrode 70₃ extends from a first side 82 of second anchor structure 74B and fourth fixed electrode 70₄ extends from a second side 84 of second anchor structure 74B, where second side 84 opposes first side. Each of electrodes 70, 72 is lengthwise oriented in a first direction substantially parallel to drive axis 36.

In some embodiments, first anchor structure 74A is designated for application of a quadrature voltage 86 (labeled −V_Q) to first and second fixed electrodes 70₁, 70₂ and second anchor structure 74B is designated for application of quadrature voltage 86 (labeled +V_Q) to third and fourth fixed electrodes 70₃, 70₄ in order to provide a time varying quadrature compensation force 88 to null or otherwise compensate for quadrature motion 90 of the sense mass portion of movable mass system 62. Only four pairs of fixed and movable electrodes 70, 72 are shown for simplicity of illustration. It should be understood, however, than any number of pairs of fixed and movable electrodes 70, 72 may be used to provide sufficient quadrature compensation force 88.

In accordance with an embodiment, each fixed electrode 70 includes an extrusion region 92 extending in the second direction substantially parallel to sense axis 40 toward its corresponding movable electrode 72. Additionally, each of movable electrodes 72 includes an extrusion region 94 extending in the second direction substantially parallel to sense axis 40 toward its corresponding fixed electrode 70. Extrusion regions 92, 94 represent material portions of their respective fixed and movable electrodes 70, 72 that are integral with and extend outwardly and laterally from the sides of electrodes 70, 72 toward the adjacent other one of the fixed and movable electrodes 70, 72.

Referring now to FIG. 3 in connection with FIG. 2, FIG. 3 shows an enlarged top view of fixed electrode 70₃ and movable electrode 72₃ of angular rate sensor 60 in a first position 96 relative to one another. FIG. 3 represents a condition in which movable electrode 72₃ is not undergoing oscillatory drive motion 98 (see FIG. 2). Thus, first position 96 represents the location of movable electrode 72₃ relative to fixed electrode 70₃ when movable electrode 72₃ has not yet been driven to oscillate. The enlarged view of FIG. 3, more clearly shows extrusion region 92 extending from fixed electrode 70₃ toward movable electrode 72₃ and extrusion region 94 extending from movable electrode 72₃ toward fixed electrode 70₃.

The following discussion refers to fixed and movable electrodes 70₃, 72₃ for simplicity of illustration. It should be understood, however, that the following discussion applies equivalently to all of fixed and movable electrodes 70, 72 of quadrature compensation unit 66 incorporated in angular rate sensor 60. As will be discussed in significantly greater detail below, the inclusion of extrusion regions 92, 94 provide capacitance enhancement to thereby enable a reduction of the applied quadrature voltage 86 and/or reduction of the overlap area (N) of fixed and movable electrodes 70, 72. I reduction in the overlap area effectively decreases the area needed for quadrature compensation unit 66.

Additionally, or alternatively, in some embodiments the pairs of fixed and movable electrodes that may be implemented within a drive system (not shown) or a sense system (not shown) of angular rate sensor 60 may also include extrusion regions, similar to extrusion regions 92, 94. In such configurations, capacitance enhancement may be achieved in order to minimize the drive actuation voltage and/or to maximize the sensing capacitance.

As shown in FIG. 3, movable electrode 72₃ is spaced apart from fixed electrode 70₃ by initial gap 76 in a direction parallel to sense axis 40, that is therefore perpendicular to drive axis 36. Initial gap 76 exhibits a first width, referred to herein as an initial width 100 and labeled Y_INIT. Initial width 100 is a minimum allowable spacing between fixed and movable electrodes 70₃, 72₃ as limited by the fabrication process, such as a deep reactive ion etch (DRIE) process, used to form fixed and movable electrodes 70₃, 72₃.

Furthermore, in first position 96, when movable electrode 72₃ is not undergoing oscillatory drive motion 98, extrusion regions 92, 94 are not positioned between fixed and movable electrodes 70₃, 72₃. That is, each of extrusion regions 92, 94 is displaced in the X-direction away from the longitudinal sides of the opposing movable or fixed electrode 72₃, 70₃. By fabricating extrusion regions 92, 94, at locations on fixed and movable electrodes 70₃, 72₃ that are not directly across from the longitudinal sides of the opposing movable or fixed electrode 72₃, 70₃, the minimum requirements for the width of gap 76 are not violated during the fabrication process.

Now referring to FIGS. 2 and 4, FIG. 4 shows an enlarged top view of fixed electrode 70₃ and movable electrode 72₃ of angular rate sensor 60 in a second position 102 relative to one another. In operation, movable electrode 72₃ is configured to undergo oscillatory drive motion 98 with movable mass system 62 such that extrusion regions 92, 94 are periodically positioned between fixed and movable electrodes 70₃, 72₃. That is, extrusion region 92 extending from fixed electrode 70₃ is periodically spaced apart from movable electrode 72₃ while concurrently, extrusion region 94 extending from movable electrode 72₃ is spaced apart from fixed electrode 70₃.

When movable electrode 72₃ oscillates into second position 102, a second gap 104 is formed between extrusion region 92 and movable electrode 72₃ and a third gap 106 is formed between extrusion region 94 and fixed electrode 70₃. However, some amount of spacing 108 may still exist between the adjacent extrusion regions 92, 94 so that extrusion regions 92, 94 do not contact one another. Movable electrode 72₃ moves a distance 110, labeled D, during a first half period (i.e., one direction of travel) of oscillatory drive motion 98 in accordance with a drive amplitude of oscillatory drive motion 98. In an embodiment, each of extrusion regions 92, 94 exhibits a length 112 in the X-direction, i.e., parallel to drive axis 36 that is at least equivalent to or greater than distance 110.

Each of second and third gaps 104, 106 exhibits a width 114, labeled Y₀, that is less than initial width 100. By way of example, width 114 may be approximately half of initial width 100. Thus, if initial width 100 is approximately 1.5 microns and limited by the minimal allowable spacing requirements of the fabrication process, width 114 of 0.8 microns may be achievable. Accordingly, the presence of extrusion regions 92, 94, each of length 112, enables the effective formation of second and third gaps 104, 106 having the narrower width 114 relative to initial width 100. Moreover, this narrower width 114 generally extends along a majority of the adjacent lengths of the quadrature compensation electrodes, i.e., fixed and movable electrodes 70₃, 72₃, of quadrature compensation unit 66.

With continued reference to FIGS. 2 and 4, in order to operate angular rate sensor 60, movable electrodes 70 together with movable mass system 62 are actuated to undergo oscillatory drive motion 98 substantially parallel to drive axis 36. Once movable mass system 62 is put into oscillatory drive motion 98, it is capable of detecting angular velocity 46 (see FIG. 2) induced by angular rate sensor 60 being rotated about input axis 48. As angular rate sensor 60 experiences angular velocity 46 about input axis 48, movable mass system 62 undergoes oscillatory sense motion, represented by a bi-directional arrow 116 in FIG. 2, substantially parallel to sense axis 40. In particular, a Coriolis acceleration occurs relative to sense axis 40, which is perpendicular to both drive axis 36 and input axis 48. The Coriolis acceleration causes generally in-plane linear oscillatory sense motion 116 of movable mass system 22 parallel to sense axis 40. This linear oscillatory sense motion 116 has an amplitude that is proportional to angular velocity 46 of sensor 20 about input axis 48. Oscillatory sense motion 116 can be detected as changes in capacitance between fixed and movable sense electrodes of a sense system (not shown for simplicity).

As the sense mass portion of movable mass system 62 undergoes quadrature motion 90 in response to drive motion 98, quadrature compensation unit 66 can apply an electrostatic force, i.e., quadrature compensation force 88, via fixed and movable electrodes 70, 72 in opposite phase relation to quadrature motion 90. Quadrature compensation force 88 is inherently modulated by drive motion 98 due to a relatively high drive amplitude. Furthermore, in accordance with equation (3) above, since width 114 of first and second gaps 104, 106 is significantly less than width 100 of initial gap 76, capacitances 118, 120, 122, 124 (labeled C₁, C₂, C₃, C₄ in FIG. 2) between corresponding movable and fixed electrodes 70, 72 can be enhanced from the nominal capacitances of movable and fixed electrodes 30, 32 (FIG. 1) beyond the minimum gap width capabilities of the fabrication process. Thus, quadrature compensation force 88 can compensate for, or otherwise null, quadrature motion 90 using a lower voltage (V_Q) and less electrode overlap area (N) than prior art quadrature compensation units.

As in FIG. 1, the arrow representing quadrature compensation force 88 is oriented in a direction opposite to that of the arrow representing quadrature motion 90 in order to emphasize the opposite phase relation. Again, it should be understood that quadrature motion 90 is an oscillatory motion. Therefore, quadrature compensation force 88 is an oscillatory motion in opposite phase relation to the oscillatory quadrature motion 90.

FIG. 5 shows a chart 130 of a time varying quadrature compensation force 88 resulting from the implementation of fixed and movable electrodes 70, 72 (FIG. 2) within angular rate sensor 60 (FIG. 2). As shown in FIG. 5, a first force curve 131 is produced by capacitance 118, labeled C₁, between first fixed and movable electrodes 70₁, 72₁. Similarly, a second force curve 132 is produced by capacitance 120, labeled C₂, between first fixed and movable electrodes 70₂, 72₂. Capacitances 118, 120 are produced when a suitable quadrature voltage 86 (FIG. 2) is applied to fixed electrodes 70_k, 70₂.

During a first half of a period, i.e., approximately 0-3 in chart 130, first force curve 131 resulting from capacitance 118 shows greater variance than second force curve 132. This is due to the reduced width 114 (FIG. 4) of second and third gaps 104, 106 (FIG. 4) between fixed and movable electrodes 70₁, 72₁ during the first half period of drive motion 98 (FIG. 4). Conversely, during a second half period, i.e., approximately 3-6 in chart 130, second force curve 132 shows greater variance resulting from capacitance 120 than first force curve 131. This is again due to the reduced width 114 of second and third gaps 104, 106 between fixed and movable electrodes 70₂, 72₂ (FIG. 2) during the second half period of drive motion 98 (FIG. 4).

A summation of first and second force curves 131, 132, corresponding to a summation of capacitances 118, 120, yields a full sine wave 132 in phase with drive motion 98 (FIG. 2). In accordance with equations (3) and (4) above, the magnitude of quadrature compensation force 88 is directly related to the capacitances between the pairs of fixed and movable electrodes 70, 72. The smaller width 114 (FIG. 4) of gaps 104, 106 relative to initial width 100 (FIG. 4), which is limited by the fabrication process, directly yields higher values of capacitances 118, 120 (i.e., capacitance enhancement is achieved). Thus, a higher magnitude of quadrature compensation force 88 can be produced corresponding to the higher values of capacitances 118, 120. Accordingly, the peak of each half period of sine wave 132 is the maximum quadrature compensation force 88 for two pairs of fixed and movable electrodes (i.e., first fixed and movable electrodes 70₁, 72₁ and second fixed and movable electrodes 70₂, 72₂) that can be applied to the sense mass portion of movable mass system 62 (FIG. 2) to null or otherwise compensate for quadrature motion 90. In some embodiments, this maximum quadrature compensation force 88 may be at least three and a half times greater than quadrature compensation force 54 (FIG. 1) of prior art designs that do not include extrusion regions 92, 94 (FIG. 2). As such, with the inclusion of the capacitance enhancement capability, quadrature voltage 86 (FIG. 2) and/or the area taken by the quadrature compensation electrodes (e.g., electrodes 70, 72) can be reduced relative to prior art configurations.

FIG. 6 shows a generalized block diagram of a MEMS device in the form of a sensor package 134 that includes angular rate sensor 60 in electrical communication with a control circuit 136, which may be an application specific integrated circuit (ASIC). More particularly, control circuit 136 may be adapted to receive an output signal 138, a portion of which includes a quadrature motion signal component. In some embodiments, control circuit 136 may be adapted to determine a magnitude of quadrature motion 90 imposed on sense axis 40 from oscillatory drive motion 98 applied to drive axis 36. Control circuit 136 may then apply a corrective voltage, i.e., quadrature voltage 86, to fixed electrodes 70 in order to generate quadrature compensation force 88 that is sufficient to null or otherwise compensate for quadrature motion 90.

Embodiments described herein comprise microelectromechanical systems (MEMS) devices, such as angular rate sensors, in which a quadrature compensation unit is implemented to null or otherwise compensate for quadrature motion. An embodiment of a MEMS device for capacitance enhancement includes a fixed electrode coupled to a substrate and lengthwise oriented in a first direction, a movable electrode coupled to and extending from a movable mass system, the movable electrode being lengthwise oriented in the first direction, the movable electrode being spaced apart from the fixed electrode by a gap in a second direction that is perpendicular to the first direction, and an extrusion region extending in the second direction from one of the fixed and movable electrodes toward the other of the fixed and movable electrodes.

Another embodiment of a MEMS device includes a mass system flexibly coupled to a substrate, the mass system being configured to undergo oscillatory drive motion relative to a drive axis and the mass system being further configured to undergo oscillatory sense motion relative to a sense axis that is perpendicular to the drive axis in response to an angular velocity about an input axis that is perpendicular to each of the drive and sense axes. The MEMS device further includes a quadrature correction unit in which the quadrature correction unit includes a fixed electrode coupled to the substrate and lengthwise oriented in a first direction that is substantially parallel to the drive axis and a movable electrode coupled to and extending from the mass system, the movable electrode being lengthwise oriented in the first direction, and the movable electrode being spaced apart from the fixed electrode in a second direction parallel to the sense axis by a first gap exhibiting a first width. A first extrusion region extends in the second direction from the fixed electrode toward the movable electrode and a second extrusion region extends in the second direction from the movable electrode toward the fixed electrode. The movable electrode is configured to undergo the oscillatory drive motion with the mass system such that the first extrusion region is periodically spaced apart from the movable electrode by a second gap exhibiting a second width and the second extrusion region is periodically spaced apart from the fixed electrode by a third gap exhibiting the second width, the second width being less than the first width.

The quadrature compensation unit having pairs of fixed and movable electrodes, in which the fixed and movable electrodes include extrusion regions extending toward one another is implemented to null or otherwise compensate for quadrature motion. When the movable electrodes undergo oscillatory motion, the extrusion regions are periodically positioned between each pair of fixed and movable electrodes to effectively reduce a width of a gap between the movable and fixed electrodes. The reduced width of the gap provides capacitance enhancement so as to reduce the voltage and the number of fixed and movable electrodes needed to effectively generate the quadrature compensation force.

This disclosure is intended to explain how to fashion and use various embodiments in accordance with the invention rather than to limit the true, intended, and fair scope and spirit thereof. The foregoing description is not intended to be exhaustive or to limit the invention to the precise form disclosed. Modifications or variations are possible in light of the above teachings. The embodiment(s) was chosen and described to provide the best illustration of the principles of the invention and its practical application, and to enable one of ordinary skill in the art to utilize the invention in various embodiments and with various modifications as are suited to the particular use contemplated. All such modifications and variations are within the scope of the invention as determined by the appended claims, as may be amended during the pendency of this application for patent, and all equivalents thereof, when interpreted in accordance with the breadth to which they are fairly, legally, and equitably entitled.

Claims

1. A MEMS device for capacitance enhancement comprising: a fixed electrode coupled to a substrate and lengthwise oriented in a first direction;a movable electrode coupled to and extending from a movable mass system, said movable electrode being lengthwise oriented in said first direction, said movable electrode being spaced apart from said fixed electrode by a gap in a second direction that is perpendicular to said first direction; andan extrusion region extending in said second direction from one of said fixed and movable electrodes toward the other of said fixed and movable electrodes.

2. The MEMS device of claim 1 wherein: said gap between said fixed and movable electrodes is a first gap exhibiting a first width; andsaid movable electrode is configured to undergo oscillatory motion with said mass system such that said extrusion region is periodically spaced apart from the other of said fixed and movable electrodes by a second gap exhibiting a second width, said second width being less than said first width.

3. The MEMS device of claim 2 wherein: said first width is a minimum allowable spacing between said fixed and movable electrodes limited by a fabrication process used to form said fixed and movable electrodes; andsaid second width is less than said minimum allowable spacing.

4. The MEMS device of claim 2 wherein when said movable electrode is not undergoing said oscillatory drive motion, said extrusion region is not positioned between said fixed and movable electrodes.

5. The MEMS device of claim 2 wherein said movable electrode moves a distance during a first half period of said oscillatory motion in accordance with an amplitude of said oscillatory motion, and said extrusion region exhibits a length in said first direction that is greater than said distance.

6. The MEMS device of claim 2 wherein said second width is approximately one half of said first width.

7. The MEMS device of claim 1 wherein said extrusion region is a first extrusion region extending from said fixed electrode toward said movable electrode, and said angular rate sensor further comprises a second extrusion region extending in said second direction from said movable electrode toward said fixed electrode.

8. The MEMS device of claim 7 wherein said movable electrode is configured to undergo said oscillatory motion with said movable mass system such that said first and second extrusion regions are periodically positioned between said fixed and movable electrodes.

9. The MEMS device of claim 8 wherein said first and extrusion regions are periodically positioned between said fixed and movable electrodes concurrently without contacting one another.

10. The MEMS device of claim 8 wherein: said gap between said fixed and movable electrodes is a first gap exhibiting a first width; andwhen said first and second extrusion regions are positioned between said fixed and movable electrodes, said first extrusion region is spaced apart from said movable electrode by a second gap and said second extrusion region is spaced apart from said fixed electrode by a third gap, each of said second and third gaps exhibiting a second width, said second width being less than said first width.

11. The MEMS device of claim 1 wherein said fixed electrode is a first fixed electrode, said movable electrode is a first movable electrode, said extrusion region is a first extrusion region, said gap is a first gap, said first fixed electrode extends from a first side of an anchor structure coupled to said substrate, and said MEMS device further comprises: a second fixed electrode extending from a second side of said anchor structure and lengthwise oriented in said first direction, said second side opposing said first side;a second movable electrode coupled to and extending from said movable mass system, said second movable electrode being lengthwise oriented in said first direction, said second movable electrode being spaced apart from said second fixed electrode in said second direction by said first gap, said first gap exhibiting a first width; anda second extrusion region extending in said second direction from one of said second fixed and second movable electrodes toward the other of said second fixed and second movable electrodes, wherein said first and second movable electrodes are configured to undergo oscillatory drive motion in phase opposition such that said first extrusion region is periodically spaced apart from the other of said first fixed and said first movable electrodes by a second gap exhibiting a second width, and said second extrusion region is periodically spaced apart from the other of said second fixed and second movable electrodes by a third gap exhibiting said second width, said second width being less than said first width.

12. The MEMS device of claim 1 wherein: said movable mass system is flexibly coupled to a substrate, said movable mass system being configured to undergo oscillatory drive motion relative to a drive axis that is substantially parallel to said first direction and said mass system being further configured to undergo oscillatory sense motion relative to a sense axis that is substantially parallel to said second direction in response to an angular velocity about an input axis that is perpendicular to each of said drive and sense axes; andsaid MEMS device further comprises a control circuit in electrical communication with said fixed electrode, said control circuit determining a magnitude of quadrature motion of said mass system in said second direction along said sense axis from said oscillatory drive motion in said first direction, and applying a corrective voltage to said fixed electrode to compensate for said quadrature motion.

13. A MEMS device comprising: a mass system flexibly coupled to a substrate, said mass system being configured to undergo oscillatory drive motion relative to a drive axis and said mass system being further configured to undergo oscillatory sense motion relative to a sense axis that is perpendicular to said drive axis in response to an angular velocity about an input axis that is perpendicular to each of said drive and sense axes; anda quadrature correction unit including: a fixed electrode coupled to said substrate and lengthwise oriented in a first direction that is substantially parallel to said drive axis;a movable electrode coupled to and extending from said mass system, said movable electrode being lengthwise oriented in said first direction, said movable electrode being spaced apart from said fixed electrode in a second direction parallel to said sense axis by a first gap exhibiting a first width;a first extrusion region extending in said second direction from said fixed electrode toward said movable electrode; anda second extrusion region extending in said second direction from said movable electrode toward said fixed electrode, wherein said movable electrode is configured to undergo said oscillatory drive motion with said mass system such that said first extrusion region is periodically spaced apart from said movable electrode by a second gap exhibiting a second width, and said second extrusion region is periodically spaced apart from said fixed electrode by a third gap exhibiting said second width, said second width being less than said first width.

14. The angular rate sensor of claim 13 wherein: said first width is a minimum allowable spacing between said fixed and movable electrodes limited by a fabrication process used to form said fixed and movable electrodes; andsaid second width is less than said minimum allowable spacing.

15. The angular rate sensor of claim 13 wherein when said movable electrode is not undergoing said oscillatory drive motion, neither of said first and second extrusion regions are positioned between said fixed and movable electrodes.

16. The angular rate sensor of claim 13 wherein said movable electrode moves a distance during a first half period of said oscillatory drive motion in accordance with a drive amplitude of said oscillatory drive motion, and each of said first and second extrusion regions exhibits a length in said first direction that is greater than said distance.

17. The angular rate sensor of claim 13 wherein said first and extrusion regions are periodically positioned between said fixed and movable electrodes concurrently without contacting one another.

18. An angular rate sensor comprising: a mass system flexibly coupled to a substrate, said mass system being configured to undergo oscillatory drive motion relative to a drive axis and said mass system being further configured to undergo oscillatory sense motion relative to a sense axis that is perpendicular to said drive axis in response to an angular velocity about an input axis that is perpendicular to each of said drive and sense axes; anda quadrature correction unit including: a fixed electrode coupled to said substrate and lengthwise oriented in a first direction that is substantially parallel to said drive axis;a movable electrode coupled to and extending from said mass system, said movable electrode being lengthwise oriented in said first direction, said movable electrode being spaced apart from said fixed electrode in a second direction parallel to said sense axis by a first gap exhibiting a first width; andan extrusion region extending in said second direction from one of said fixed and movable electrodes toward the other of said fixed and movable electrodes, wherein:said extrusion region is not positioned between said movable electrodes when said mass system is not undergoing said oscillatory drive motion;said movable electrode is configured to undergo said oscillatory drive motion with said mass system such that said extrusion region is periodically spaced apart from the other of said fixed and movable electrodes by a second gap exhibiting a second width, said second width being less than said first width;said movable electrode moves a distance during a first half period of said oscillatory drive motion in accordance with a drive amplitude of said oscillatory drive motion; andsaid extrusion region exhibits a length in said first direction that is greater than said distance.

19. The angular rate sensor of claim 18 wherein: said first width is a minimum allowable spacing between said fixed and movable electrodes limited by a fabrication process used to form said fixed and movable electrodes; andsaid second width is less than said minimum allowable spacing.

20. The angular rate sensor of claim 18 wherein said second width is approximately one half of said first width.